Harmeet Singh

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 11,171,021
- Issue date Nov 9, 2021
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with features for preventing electrical arcing...
- Patent number 11,069,553
- Issue date Jul 20, 2021
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for correcting non-uniformities in plasma proce...
- Patent number 10,872,748
- Issue date Dec 22, 2020
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with thermal zones for semiconductor processing
- Patent number 10,720,346
- Issue date Jul 21, 2020
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for coordinating pressure pulses and RF modulation in a smal...
- Patent number 10,636,625
- Issue date Apr 28, 2020
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,585,347
- Issue date Mar 10, 2020
- Lam Research Corporation
- Saravanapriyan Sriraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of fault detection for multiplexed heater array
- Patent number 10,568,163
- Issue date Feb 18, 2020
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,515,816
- Issue date Dec 24, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component of a plasma processing apparatus having a protective in s...
- Patent number 10,497,544
- Issue date Dec 3, 2019
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 10,424,461
- Issue date Sep 24, 2019
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable multi-zone gas injection system
- Patent number 10,403,475
- Issue date Sep 3, 2019
- Lam Research Corporation
- David J. Cooperberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component of a substrate support assembly producing localized magne...
- Patent number 10,388,493
- Issue date Aug 20, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of calibrating a reluctance actuator assembly, reluctance ac...
- Patent number 10,372,045
- Issue date Aug 6, 2019
- ASML Netherlands B.V.
- Johannes Antonius Gerardus Akkermans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-pulsing during a state
- Patent number 10,256,077
- Issue date Apr 9, 2019
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch of oxide metal oxide metal stack
- Patent number 10,242,883
- Issue date Mar 26, 2019
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supports with multi-layer structure including independent...
- Patent number 10,236,193
- Issue date Mar 19, 2019
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 10,224,221
- Issue date Mar 5, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and component thereof including an opti...
- Patent number 10,217,615
- Issue date Feb 26, 2019
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,197,908
- Issue date Feb 5, 2019
- Lam Research Corporation
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,186,426
- Issue date Jan 22, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling ion energy within a plasma chamber
- Patent number 10,141,163
- Issue date Nov 27, 2018
- Lam Research Corporation
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting substrate temperature to improve CD uniformity
- Patent number 10,056,225
- Issue date Aug 21, 2018
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for atomic layering etching
- Patent number 10,014,192
- Issue date Jul 3, 2018
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-pulsing during a state
- Patent number 9,997,333
- Issue date Jun 12, 2018
- Lam Research Corporation
- John C. Valcore
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Semiconductor processing system having multiple decoupled plasma so...
- Patent number 9,947,557
- Issue date Apr 17, 2018
- Lam Research Corporation
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-pulsing during a state
- Patent number 9,812,294
- Issue date Nov 7, 2017
- Lam Research Corporation
- John C. Valcore
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 9,805,941
- Issue date Oct 31, 2017
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lithographic apparatus
- Patent number 9,696,640
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Adrianus Hendrik Koevoets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High aspect ratio etch with combination mask
- Patent number 9,659,783
- Issue date May 23, 2017
- Lam Research Corporation
- Joydeep Guha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating plate with heating zones for substrate processing and metho...
- Patent number 9,646,861
- Issue date May 9, 2017
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
C-shroud Modification For Plasma Uniformity Without Impacting Mecha...
- Publication number 20240014015
- Publication date Jan 11, 2024
- LAM RESEARCH CORPORATION
- Pratik Mankidy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER
- Publication number 20230331633
- Publication date Oct 19, 2023
- LAM RESEARCH CORPORATION
- Lin XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS
- Publication number 20230317424
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Harmeet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORTS WITH MULTILAYER STRUCTURE INCLUDING COUPLED HEAT...
- Publication number 20230274954
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Harmeet SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20200161139
- Publication date May 21, 2020
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR CORRECTING NON-UNIFORMITIES IN PLASMA PROCE...
- Publication number 20190371576
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20190250501
- Publication date Aug 15, 2019
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20190139778
- Publication date May 9, 2019
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER
- Publication number 20190103253
- Publication date Apr 4, 2019
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK
- Publication number 20180374712
- Publication date Dec 27, 2018
- LAM RESEARCH CORPORATION
- Joydeep GUHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sub-Pulsing During a State
- Publication number 20180294140
- Publication date Oct 11, 2018
- LAM RESEARCH CORPORATION
- John C. Valcore
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Semiconductor Processing System Having Multiple Decoupled Plasma So...
- Publication number 20180240686
- Publication date Aug 23, 2018
- LAM RESEARCH CORPORATION
- John Patrick Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sub-Pulsing During a State
- Publication number 20180033596
- Publication date Feb 1, 2018
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20180033635
- Publication date Feb 1, 2018
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...
- Publication number 20180012785
- Publication date Jan 11, 2018
- LAM RESEARCH CORPORATION
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER FILLER KIT FOR DIELECTRIC ETCH CHAMBER
- Publication number 20180005851
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Benson Q. TONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20170363950
- Publication date Dec 21, 2017
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE SUPPORTS WITH MULTI-LAYER STRUCTURE INCLUDING INDEPENDENT...
- Publication number 20170229327
- Publication date Aug 10, 2017
- LAM RESEARCH CORPORATION
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TRANSFER MICROCLIMATE TECHNIQUES AND APPARATUSES, INCLUDING H...
- Publication number 20170125272
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- James Stephen van Gogh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20170117159
- Publication date Apr 27, 2017
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER
- Publication number 20160379804
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Thorsten Lill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN S...
- Publication number 20160365228
- Publication date Dec 15, 2016
- Lam Research Corporation
- Harmeet Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH THERMAL ZONES FOR SEMICONDUCTOR PROCESSING
- Publication number 20160300741
- Publication date Oct 13, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-PULSING DURING A STATE
- Publication number 20160276137
- Publication date Sep 22, 2016
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SYNCHRONIZING RF PULSES IN A PLASMA PROCE...
- Publication number 20160268100
- Publication date Sep 15, 2016
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING SYSTEM
- Publication number 20160211156
- Publication date Jul 21, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20160203995
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160203990
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System, Method and Apparatus for Generating Pressure Pulses in Smal...
- Publication number 20160204007
- Publication date Jul 14, 2016
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160181130
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS

Harmeet Singh

Person

Patents Grantslast 30 patents

Internal plasma grid for semiconductor fabrication

Electrostatic chuck with features for preventing electrical arcing...

Systems and methods for correcting non-uniformities in plasma proce...

Substrate support with thermal zones for semiconductor processing

System for coordinating pressure pulses and RF modulation in a smal...

Photoresist design layout pattern proximity correction through fast...

Methods of fault detection for multiplexed heater array

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Component of a plasma processing apparatus having a protective in s...

Controlling ion energy within a plasma chamber

Tunable multi-zone gas injection system

Component of a substrate support assembly producing localized magne...

Method of calibrating a reluctance actuator assembly, reluctance ac...

Sub-pulsing during a state

High aspect ratio etch of oxide metal oxide metal stack

Substrate supports with multi-layer structure including independent...

Internal plasma grid for semiconductor fabrication

Plasma processing apparatus and component thereof including an opti...

Photoresist design layout pattern proximity correction through fast...

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Controlling ion energy within a plasma chamber

Adjusting substrate temperature to improve CD uniformity

Apparatus for atomic layering etching

Sub-pulsing during a state

Semiconductor processing system having multiple decoupled plasma so...

Sub-pulsing during a state

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Lithographic apparatus

High aspect ratio etch with combination mask

Heating plate with heating zones for substrate processing and metho...

Patents Applicationslast 30 patents

C-shroud Modification For Plasma Uniformity Without Impacting Mecha...

SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER

EROSION RESISTANT PLASMA PROCESSING CHAMBER COMPONENTS

SUBSTRATE SUPPORTS WITH MULTILAYER STRUCTURE INCLUDING COUPLED HEAT...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

SYSTEMS AND METHODS FOR CORRECTING NON-UNIFORMITIES IN PLASMA PROCE...

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER

HIGH ASPECT RATIO ETCH OF OXIDE METAL OXIDE METAL STACK

Sub-Pulsing During a State

Semiconductor Processing System Having Multiple Decoupled Plasma So...

Sub-Pulsing During a State

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING...

CHAMBER FILLER KIT FOR DIELECTRIC ETCH CHAMBER

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

SUBSTRATE SUPPORTS WITH MULTI-LAYER STRUCTURE INCLUDING INDEPENDENT...

WAFER TRANSFER MICROCLIMATE TECHNIQUES AND APPARATUSES, INCLUDING H...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

CONTROLLING ION ENERGY WITHIN A PLASMA CHAMBER

COMPONENT OF A PLASMA PROCESSING APPARATUS HAVING A PROTECTIVE IN S...

SUBSTRATE SUPPORT WITH THERMAL ZONES FOR SEMICONDUCTOR PROCESSING

SUB-PULSING DURING A STATE

METHODS AND APPARATUS FOR SYNCHRONIZING RF PULSES IN A PLASMA PROCE...

ION BEAM ETCHING SYSTEM

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

System, Method and Apparatus for Generating Pressure Pulses in Smal...

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION