John V. H. Roberts

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for forming a porous reaction injection molded chemical m...
- Patent number 7,537,446
- Issue date May 26, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming a porous polishing pad
- Patent number 7,435,364
- Issue date Oct 14, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming a porous reaction injection molded chemical mech...
- Patent number 7,399,437
- Issue date Jul 15, 2008
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resilient polishing pad for chemical mechanical polishing
- Patent number 7,101,275
- Issue date Sep 5, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming a polishing pad with reduced stress window
- Patent number 7,018,581
- Issue date Mar 28, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Kyle W. David
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with high optical transmission window
- Patent number 6,984,163
- Issue date Jan 10, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Method of polishing a semiconductor device
- Patent number 6,903,021
- Issue date Jun 7, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Heinz F. Reinhardt
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for a semiconductor device having a dissolvable subst...
- Patent number 6,899,611
- Issue date May 31, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Heinz F. Reinhardt
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,869,350
- Issue date Mar 22, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for electrochemical mechanical polishing
- Patent number 6,848,977
- Issue date Feb 1, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,843,712
- Issue date Jan 18, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Hydrolytically stable grooved polishing pads for chemical mechanica...
- Patent number 6,749,485
- Issue date Jun 15, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,739,962
- Issue date May 25, 2004
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved polishing pads for chemical mechanical planarization
- Patent number 6,736,709
- Issue date May 18, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,682,402
- Issue date Jan 27, 2004
- Rodel Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Anti-scattering layer for polishing pad windows
- Patent number 6,676,483
- Issue date Jan 13, 2004
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,648,733
- Issue date Nov 18, 2003
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with a transparent portion
- Patent number 6,517,417
- Issue date Feb 11, 2003
- Rodel Holdings, Inc.
- William D. Budinger
- B24 - GRINDING POLISHING
Information Patent Grant
Method relating to a polishing system having a multi-phase polishin...
- Patent number 6,488,570
- Issue date Dec 3, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polymeric polishing pad having continuously regenerated work surface
- Patent number 6,439,989
- Issue date Aug 27, 2002
- Rodel Holdings Inc.
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,425,816
- Issue date Jul 30, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Molding a polishing pad having integral window
- Patent number 6,387,312
- Issue date May 14, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry compositions capable of providing multi-modal part...
- Patent number 6,375,694
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing system having a multi-phase polishing substrate and metho...
- Patent number 6,375,559
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Fixed abrasive polishing system for the manufacture of semiconducto...
- Patent number 6,337,281
- Issue date Jan 8, 2002
- Rodel Holdings Inc.
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,325,703
- Issue date Dec 4, 2001
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,293,852
- Issue date Sep 25, 2001
- Rodel Holdings Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,287,185
- Issue date Sep 11, 2001
- Rodel Holdings Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,245,679
- Issue date Jun 12, 2001
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,231,434
- Issue date May 15, 2001
- Rodel Holdings Inc.
- Lee Melbourne Cook
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
Method for forming a porous reaction injection molded chemical mech...
- Publication number 20060226568
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Apparatus for forming a porous reaction injection molded chemical m...
- Publication number 20060228439
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method for forming a porous polishing pad
- Publication number 20060226567
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pad with reduced stress window
- Publication number 20050275135
- Publication date Dec 15, 2005
- Kyle W. David
- B24 - GRINDING POLISHING
Information Patent Application
Polymeric polishing pad having continuously regenerated work surface
- Publication number 20050221741
- Publication date Oct 6, 2005
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pad with high optical transmission window
- Publication number 20050113008
- Publication date May 26, 2005
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Resilient polishing pad for chemical mechanical polishing
- Publication number 20050070216
- Publication date Mar 31, 2005
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Method of polishing a semiconductor device
- Publication number 20040224142
- Publication date Nov 11, 2004
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048562
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048564
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Multiple polymer belt used as a carrier in a linear belt polishing...
- Publication number 20030194960
- Publication date Oct 16, 2003
- Eric Staudt
- B24 - GRINDING POLISHING
Information Patent Application
Polymeric polishing pad having continuously regenerated work surface
- Publication number 20030068960
- Publication date Apr 10, 2003
- Heinz F. Reinhardt
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020155801
- Publication date Oct 24, 2002
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020077036
- Publication date Jun 20, 2002
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Apparatus and methods for chemical-mechanical polishing of semicond...
- Publication number 20020020495
- Publication date Feb 21, 2002
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with a transparent portion
- Publication number 20010031610
- Publication date Oct 18, 2001
- William D. Budinger
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20010024940
- Publication date Sep 27, 2001
- Lee Melbourne Cook
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

John V. H. Roberts

Person

Patents Grantslast 30 patents

Apparatus for forming a porous reaction injection molded chemical m...

Method for forming a porous polishing pad

Method for forming a porous reaction injection molded chemical mech...

Resilient polishing pad for chemical mechanical polishing

Method of forming a polishing pad with reduced stress window

Polishing pad with high optical transmission window

Method of polishing a semiconductor device

Polishing pad for a semiconductor device having a dissolvable subst...

Polishing pads and methods relating thereto

Polishing pad for electrochemical mechanical polishing

Polishing pads and methods relating thereto

Hydrolytically stable grooved polishing pads for chemical mechanica...

Polishing pads and methods relating thereto

Grooved polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto

Anti-scattering layer for polishing pad windows

Polishing pads and methods relating thereto

Polishing pad with a transparent portion

Method relating to a polishing system having a multi-phase polishin...

Polymeric polishing pad having continuously regenerated work surface

Polishing pads and methods relating thereto

Molding a polishing pad having integral window

Polishing slurry compositions capable of providing multi-modal part...

Polishing system having a multi-phase polishing substrate and metho...

Fixed abrasive polishing system for the manufacture of semiconducto...

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing pads and methods relating thereto

Patents Applicationslast 30 patents

Method for forming a porous reaction injection molded chemical mech...

Apparatus for forming a porous reaction injection molded chemical m...

Method for forming a porous polishing pad

Polishing pad with reduced stress window

Polymeric polishing pad having continuously regenerated work surface

Polishing pad with high optical transmission window

Resilient polishing pad for chemical mechanical polishing

Method of polishing a semiconductor device

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Multiple polymer belt used as a carrier in a linear belt polishing...

Polymeric polishing pad having continuously regenerated work surface

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing pad with a transparent portion

Polishing pads and methods relating thereto