Kam Leung Lee

Person

Putnam Valley, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low resistance contacts including intermetallic alloy of nickel, pl...
- Patent number 12,062,614
- Issue date Aug 13, 2024
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Low resistance contacts including intermetallic alloy of nickel, pl...
- Patent number 11,862,567
- Issue date Jan 2, 2024
- International Business Machines Corporation
- John Bruley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance contacts including intermetallic alloy of nickel, pl...
- Patent number 11,101,219
- Issue date Aug 24, 2021
- International Business Machines Corporation
- John Bruley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance contacts including intermetallic alloy of nickel, pl...
- Patent number 10,985,105
- Issue date Apr 20, 2021
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Fast recrystallization of hafnium or zirconium based oxides in insu...
- Patent number 10,833,150
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Martin M. Frank
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disposable laser/flash anneal absorber for embedded neuromorphic me...
- Patent number 10,541,151
- Issue date Jan 21, 2020
- International Business Machines Corporation
- Kam-Leung Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Shallow, abrupt and highly activated tin extension implant junction
- Patent number 10,529,832
- Issue date Jan 7, 2020
- International Business Machines Corporation
- John Bruley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance contacts including intermetallic alloy of nickel, pl...
- Patent number 10,269,714
- Issue date Apr 23, 2019
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method of junction control for lateral bipolar junction transistor
- Patent number 10,134,882
- Issue date Nov 20, 2018
- International Business Machines Corporation
- Pouya Hashemi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of junction control for lateral bipolar junction transistor
- Patent number 9,929,258
- Issue date Mar 27, 2018
- International Business Machines Corporation
- Pouya Hashemi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-germanium FinFET device with controlled junction
- Patent number 9,922,886
- Issue date Mar 20, 2018
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-germanium FinFET device with controlled junction
- Patent number 9,514,997
- Issue date Dec 6, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having diffusion barrier to reduce back channe...
- Patent number 9,406,569
- Issue date Aug 2, 2016
- GLOBALFOUNDRIES Inc.
- Gregory G. Freeman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having diffusion barrier to reduce back channe...
- Patent number 9,240,354
- Issue date Jan 19, 2016
- GLOBALFOUNDRIES Inc.
- Gregory G. Freeman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET extension regions
- Patent number 9,196,712
- Issue date Nov 24, 2015
- GLOBALFOUNDRIES Inc.
- Mohammad Hasanuzzaman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal doping for FinFET devices
- Patent number 9,105,559
- Issue date Aug 11, 2015
- International Business Machines Corporation
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Raised silicide contact
- Patent number 8,927,422
- Issue date Jan 6, 2015
- International Business Machines Corporation
- Emre Alptekin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charging-free electron beam cure of dielectric material
- Patent number 8,741,782
- Issue date Jun 3, 2014
- International Business Machines Corporation
- Christos D. Dimitrakopoulos
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Charging-free electron beam cure of dielectric material
- Patent number 8,525,123
- Issue date Sep 3, 2013
- International Business Machines Corporation
- Christos D. Dimitrakopoulos
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Shallow extension regions having abrupt extension junctions
- Patent number 8,114,748
- Issue date Feb 14, 2012
- International Business Machines Corporation
- Kam-Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance strained silicon FinFETs device and method for for...
- Patent number 7,705,345
- Issue date Apr 27, 2010
- International Business Machines Corporation
- Stephen W. Bedell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser processing method for trench-edge-defect-free solid phase epi...
- Patent number 7,691,733
- Issue date Apr 6, 2010
- International Business Machines Corporation
- Keith E. Fogel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser processing method for trench-edge-defect-free solid phase epi...
- Patent number 7,547,616
- Issue date Jun 16, 2009
- International Business Machines Corporation
- Keith E. Fogel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for slowing down dopant-enhanced diffusion in substrates and...
- Patent number 7,163,867
- Issue date Jan 16, 2007
- International Business Machines Corporation
- Kam-Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elevated source drain disposable spacer CMOS
- Patent number 7,074,684
- Issue date Jul 11, 2006
- International Business Machines Corporation
- Ronnen A. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for securing resources shared by multiple oper...
- Patent number 6,823,458
- Issue date Nov 23, 2004
- International Business Machines Corporation
- Kam Cheung Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Elevated source drain disposable spacer CMOS
- Patent number 6,777,298
- Issue date Aug 17, 2004
- International Business Machines Corporation
- Ronnen A. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial polysilicon sidewall process and rapid thermal spike an...
- Patent number 6,743,686
- Issue date Jun 1, 2004
- International Business Machines Corporation
- Kam Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
All-in-one disposable/permanent spacer elevated source/drain, self-...
- Patent number 6,727,135
- Issue date Apr 27, 2004
- International Business Machines Corporation
- Kam Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
All-in-one disposable/permanent spacer elevated source/drain, self-...
- Patent number 6,614,079
- Issue date Sep 2, 2003
- International Business Machines Corporation
- Kam Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...
- Publication number 20210343647
- Publication date Nov 4, 2021
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...
- Publication number 20210193576
- Publication date Jun 24, 2021
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
FAST RECRYSTALLIZATION OF HAFNIUM OR ZIRCONIUM BASED OXIDES IN INSU...
- Publication number 20200020762
- Publication date Jan 16, 2020
- International Business Machines Corporation
- Martin M. Frank
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPOSABLE LASER/FLASH ANNEAL ABSORBER FOR EMBEDDED NEUROMORPHIC ME...
- Publication number 20200020542
- Publication date Jan 16, 2020
- International Business Machines Corporation
- Kam-Leung Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...
- Publication number 20190157203
- Publication date May 23, 2019
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...
- Publication number 20190067198
- Publication date Feb 28, 2019
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SHALLOW, ABRUPT AND HIGHLY ACTIVATED TIN EXTENSION IMPLANT JUNCTION
- Publication number 20180175174
- Publication date Jun 21, 2018
- International Business Machines Corporation
- John Bruley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF JUNCTION CONTROL FOR LATERAL BIPOLAR JUNCTION TRANSISTOR
- Publication number 20180083125
- Publication date Mar 22, 2018
- International Business Machines Corporation
- Pouya HASHEMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Junction Control For Lateral Bipolar Junction Transistor
- Publication number 20180083126
- Publication date Mar 22, 2018
- International Business Machines Corporation
- Pouya HASHEMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...
- Publication number 20180068950
- Publication date Mar 8, 2018
- International Business Machines Corporation
- John Bruley
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SILICON-GERMANIUM FINFET DEVICE WITH CONTROLLED JUNCTION
- Publication number 20170018466
- Publication date Jan 19, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-GERMANIUM FINFET DEVICE WITH CONTROLLED JUNCTION
- Publication number 20160284606
- Publication date Sep 29, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DOPING FOR FINFET DEVICES
- Publication number 20150079773
- Publication date Mar 19, 2015
- GLOBALFOUNDRIES INC.
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING DIFFUSION BARRIER TO REDUCE BACK CHANNE...
- Publication number 20150056760
- Publication date Feb 26, 2015
- International Business Machines Corporation
- Gregory G. Freeman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING DIFFUSION BARRIER TO REDUCE BACK CHANNE...
- Publication number 20140131782
- Publication date May 15, 2014
- International Business Machines Corporation
- Gregory G. Freeman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RAISED SILICIDE CONTACT
- Publication number 20130334693
- Publication date Dec 19, 2013
- International Business Machines Corporation
- Emre Alptekin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL
- Publication number 20120302011
- Publication date Nov 29, 2012
- International Business Machines Corporation
- Christos D. Dimitrakopoulos
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ANNEALING TECHNIQUES FOR HIGH PERFORMANCE COMPLEMENTARY METAL OXIDE...
- Publication number 20120190216
- Publication date Jul 26, 2012
- International Business Machines Corporation
- Kevin K. Chan
- B82 - NANO-TECHNOLOGY
Information Patent Application
LOW-TEMPERATURE ABSORBER FILM AND METHOD OF FABRICATION
- Publication number 20110254138
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW EXTENSION REGIONS HAVING ABRUPT EXTENSION JUNCTIONS
- Publication number 20100327375
- Publication date Dec 30, 2010
- International Business Machines Corporation
- Kam-Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEAL SEQUENCE INTEGRATION FOR CMOS DEVICES
- Publication number 20090186457
- Publication date Jul 23, 2009
- International Business Machines Corporation
- Kam-Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL
- Publication number 20090181534
- Publication date Jul 16, 2009
- International Business Machines Corporation
- Christos D. Dimitrakopoulos
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
LASER PROCESSING METHOD FOR TRENCH-EDGE-DEFECT-FREE SOLID PHASE EPI...
- Publication number 20080286917
- Publication date Nov 20, 2008
- International Business Machines Corporation
- Keith E. Fogel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser processing method for trench-edge-defect-free solid phase epi...
- Publication number 20060275971
- Publication date Dec 7, 2006
- International Business Machines Corporation
- Keith E. Fogel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE FORMING METHOD AND STRUCTURE FOR RETARDING DO...
- Publication number 20060220112
- Publication date Oct 5, 2006
- International Business Machines Corporation
- Huilong Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High performance strained silicon FinFETs device and method for for...
- Publication number 20050145941
- Publication date Jul 7, 2005
- International Business Machines Corporation
- Stephen W. Bedell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for slowing down dopant-enhanced diffusion in substrates and...
- Publication number 20050026403
- Publication date Feb 3, 2005
- International Business Machines Corporation
- Kam-Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Elevated source drain disposable spacer CMOS
- Publication number 20040266124
- Publication date Dec 30, 2004
- Ronnen A. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Elevated source drain disposable spacer CMOS
- Publication number 20030232464
- Publication date Dec 18, 2003
- Ronnen A. Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
All-in-one disposable/permanent spacer elevated source/drain, self-...
- Publication number 20030209765
- Publication date Nov 13, 2003
- International Business Machines Corporation
- Kam Leung Lee
- H01 - BASIC ELECTRIC ELEMENTS

Kam Leung Lee

Person

Patents Grantslast 30 patents

Low resistance contacts including intermetallic alloy of nickel, pl...

Low resistance contacts including intermetallic alloy of nickel, pl...

Low resistance contacts including intermetallic alloy of nickel, pl...

Low resistance contacts including intermetallic alloy of nickel, pl...

Fast recrystallization of hafnium or zirconium based oxides in insu...

Disposable laser/flash anneal absorber for embedded neuromorphic me...

Shallow, abrupt and highly activated tin extension implant junction

Low resistance contacts including intermetallic alloy of nickel, pl...

Method of junction control for lateral bipolar junction transistor

Method of junction control for lateral bipolar junction transistor

Silicon-germanium FinFET device with controlled junction

Silicon-germanium FinFET device with controlled junction

Semiconductor device having diffusion barrier to reduce back channe...

Semiconductor device having diffusion barrier to reduce back channe...

FinFET extension regions

Conformal doping for FinFET devices

Raised silicide contact

Charging-free electron beam cure of dielectric material

Charging-free electron beam cure of dielectric material

Shallow extension regions having abrupt extension junctions

High performance strained silicon FinFETs device and method for for...

Laser processing method for trench-edge-defect-free solid phase epi...

Laser processing method for trench-edge-defect-free solid phase epi...

Method for slowing down dopant-enhanced diffusion in substrates and...

Elevated source drain disposable spacer CMOS

Apparatus and method for securing resources shared by multiple oper...

Elevated source drain disposable spacer CMOS

Sacrificial polysilicon sidewall process and rapid thermal spike an...

All-in-one disposable/permanent spacer elevated source/drain, self-...

All-in-one disposable/permanent spacer elevated source/drain, self-...

Patents Applicationslast 30 patents

LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...

LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...

FAST RECRYSTALLIZATION OF HAFNIUM OR ZIRCONIUM BASED OXIDES IN INSU...

DISPOSABLE LASER/FLASH ANNEAL ABSORBER FOR EMBEDDED NEUROMORPHIC ME...

LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...

LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...

SHALLOW, ABRUPT AND HIGHLY ACTIVATED TIN EXTENSION IMPLANT JUNCTION

METHOD OF JUNCTION CONTROL FOR LATERAL BIPOLAR JUNCTION TRANSISTOR

Method Of Junction Control For Lateral Bipolar Junction Transistor

LOW RESISTANCE CONTACTS INCLUDING INTERMETALLIC ALLOY OF NICKEL, PL...

SILICON-GERMANIUM FINFET DEVICE WITH CONTROLLED JUNCTION

SILICON-GERMANIUM FINFET DEVICE WITH CONTROLLED JUNCTION

CONFORMAL DOPING FOR FINFET DEVICES

SEMICONDUCTOR DEVICE HAVING DIFFUSION BARRIER TO REDUCE BACK CHANNE...

SEMICONDUCTOR DEVICE HAVING DIFFUSION BARRIER TO REDUCE BACK CHANNE...

RAISED SILICIDE CONTACT

CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL

ANNEALING TECHNIQUES FOR HIGH PERFORMANCE COMPLEMENTARY METAL OXIDE...

LOW-TEMPERATURE ABSORBER FILM AND METHOD OF FABRICATION

SHALLOW EXTENSION REGIONS HAVING ABRUPT EXTENSION JUNCTIONS

ANNEAL SEQUENCE INTEGRATION FOR CMOS DEVICES

CHARGING-FREE ELECTRON BEAM CURE OF DIELECTRIC MATERIAL

LASER PROCESSING METHOD FOR TRENCH-EDGE-DEFECT-FREE SOLID PHASE EPI...

Laser processing method for trench-edge-defect-free solid phase epi...

SEMICONDUCTOR DEVICE FORMING METHOD AND STRUCTURE FOR RETARDING DO...

High performance strained silicon FinFETs device and method for for...

Method for slowing down dopant-enhanced diffusion in substrates and...

Elevated source drain disposable spacer CMOS

Elevated source drain disposable spacer CMOS

All-in-one disposable/permanent spacer elevated source/drain, self-...