Kevin Donohoe

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Use of a plasma source to form a layer during the formation of a se...
- Patent number 7,709,343
- Issue date May 4, 2010
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming high aspect ratio apertures
- Patent number 7,608,196
- Issue date Oct 27, 2009
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching system and method
- Patent number 7,507,672
- Issue date Mar 24, 2009
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a plasma source to form a layer during the formation of a se...
- Patent number 7,429,535
- Issue date Sep 30, 2008
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures
- Patent number 7,335,964
- Issue date Feb 26, 2008
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of pulsed grounding source in a plasma reactor
- Patent number 7,297,637
- Issue date Nov 20, 2007
- Micron Technology, Inc.
- Chuck E. Hedberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a plasma source to form a layer during the formation of a se...
- Patent number 7,294,578
- Issue date Nov 13, 2007
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for use of pulsed voltage in a plasma reactor
- Patent number 7,253,117
- Issue date Aug 7, 2007
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching methods
- Patent number 7,183,220
- Issue date Feb 27, 2007
- Micron Technology, Inc.
- Guy T. Blalock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming high aspect ratio apertures
- Patent number 7,163,641
- Issue date Jan 16, 2007
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods and apparatus and substrate assemblies produced the...
- Patent number 7,125,804
- Issue date Oct 24, 2006
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for use in processing chamber
- Patent number 7,114,532
- Issue date Oct 3, 2006
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching system and method
- Patent number 7,112,533
- Issue date Sep 26, 2006
- Micron Technology, Inc.
- Mirzafer K. Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of providing a structure using self-aligned features
- Patent number 7,109,112
- Issue date Sep 19, 2006
- Micron Technology, Inc.
- Dinesh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant and method of use
- Patent number 7,074,724
- Issue date Jul 11, 2006
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of pulsed grounding source in a plasma reactor
- Patent number 7,059,267
- Issue date Jun 13, 2006
- Micron Technology, Inc.
- Chuck E. Hedberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching of high aspect ration structures
- Patent number 7,033,954
- Issue date Apr 25, 2006
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling the temperature of a gas distribution plate...
- Patent number 6,960,534
- Issue date Nov 1, 2005
- Micron Technology, Inc.
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching methods
- Patent number 6,958,297
- Issue date Oct 25, 2005
- Micron Technology, Inc.
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor
- Patent number 6,946,053
- Issue date Sep 20, 2005
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for improved low pressure inductively coupled high densit...
- Patent number 6,939,813
- Issue date Sep 6, 2005
- Micron Technology, Inc.
- Guy T. Blalock
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Etching of high aspect ratio structures
- Patent number 6,921,725
- Issue date Jul 26, 2005
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional photonic band structures in solid materials
- Patent number 6,909,113
- Issue date Jun 21, 2005
- Micron Technology, Inc.
- Joseph E. Geusic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant and method of use
- Patent number 6,890,863
- Issue date May 10, 2005
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming materials over uneven surface topologies, and me...
- Patent number 6,890,858
- Issue date May 10, 2005
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling the temperature of a gas distribution pla...
- Patent number 6,833,049
- Issue date Dec 21, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching methods
- Patent number 6,812,154
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas pulsing for etch profile control
- Patent number 6,784,108
- Issue date Aug 31, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods and apparatus and substrate assemblies produced the...
- Patent number 6,784,111
- Issue date Aug 31, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of providing a structure using self-aligned features
- Patent number 6,759,330
- Issue date Jul 6, 2004
- Micron Technology, Inc.
- Dinesh Chopra
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
USE OF A PLASMA SOURCE TO FORM A LAYER DURING THE FORMATION OF A SE...
- Publication number 20090017634
- Publication date Jan 15, 2009
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of a plasma source to form a layer during the formation of a se...
- Publication number 20070123048
- Publication date May 31, 2007
- Micron Technology, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming high aspect ratio apertures
- Publication number 20070084826
- Publication date Apr 19, 2007
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHODS AND APPARATUS AND SUBSTRATE ASSEMBLIES PRODUCED THE...
- Publication number 20070077724
- Publication date Apr 5, 2007
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of pulsed grounding source in a plasma reactor
- Publication number 20060194437
- Publication date Aug 31, 2006
- Chuck E. Hedberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etchant and method of use
- Publication number 20060186087
- Publication date Aug 24, 2006
- Kevin G. Donohoe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF PROVIDING A STRUCTURE USING SELF-ALIGNED FEATURES
- Publication number 20060154483
- Publication date Jul 13, 2006
- Micron Technology, Inc.
- Dinesh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aspect ratio controlled etch selectivity using time modulated DC bi...
- Publication number 20060105577
- Publication date May 18, 2006
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for controlling the temperature of a gas distribution plate...
- Publication number 20060021969
- Publication date Feb 2, 2006
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Liner for use in processing chamber
- Publication number 20050230048
- Publication date Oct 20, 2005
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming materials over uneven surface topologies, and me...
- Publication number 20050206003
- Publication date Sep 22, 2005
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching a wafer in a plasma etch reactor
- Publication number 20050173376
- Publication date Aug 11, 2005
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of high aspect ration structures
- Publication number 20050032388
- Publication date Feb 10, 2005
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for improved low pressure inductively coupled high densit...
- Publication number 20050022935
- Publication date Feb 3, 2005
- Micron Technology, Inc.
- Guy T. Blalock
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Liner for use in processing chamber
- Publication number 20050011454
- Publication date Jan 20, 2005
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching methods and apparatus and substrate assemblies produced the...
- Publication number 20040262263
- Publication date Dec 30, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etchant and method of use
- Publication number 20040248413
- Publication date Dec 9, 2004
- Micron Technology, Inc.
- Kevin G. Donohoe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of providing a structure using self-aligned features
- Publication number 20040219738
- Publication date Nov 4, 2004
- Dinesh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Aspect ratio controlled etch selectivity using time modulated DC bi...
- Publication number 20040161941
- Publication date Aug 19, 2004
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for controlling the temperature of a gas distribution plate...
- Publication number 20040038551
- Publication date Feb 26, 2004
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for controlling the temperature of a gas distribution pla...
- Publication number 20040035531
- Publication date Feb 26, 2004
- Kevin G. Donohoe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for use of pulsed voltage in a plasma reactor
- Publication number 20030211754
- Publication date Nov 13, 2003
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching methods
- Publication number 20030207581
- Publication date Nov 6, 2003
- David S. Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming high aspect ratio apertures
- Publication number 20030192858
- Publication date Oct 16, 2003
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of pulsed voltage in a plasma reactor
- Publication number 20030168010
- Publication date Sep 11, 2003
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming three-dimensional photonic band structures in sol...
- Publication number 20030111665
- Publication date Jun 19, 2003
- Joseph E. Geusic
- G02 - OPTICS
Information Patent Application
Method of providing a structure using self-aligned features
- Publication number 20030096498
- Publication date May 22, 2003
- Dinesh Chopra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of modifying an RF circuit of a plasma chamber to increase c...
- Publication number 20030089681
- Publication date May 15, 2003
- Guy Blalock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor
- Publication number 20030062127
- Publication date Apr 3, 2003
- Micron Technology, Inc.
- Kevin G. Donohoe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for improved low pressure inductively coupled high densit...
- Publication number 20030041805
- Publication date Mar 6, 2003
- Micron Technology, Inc.
- Guy T. Blalock
- H01 - BASIC ELECTRIC ELEMENTS

Kevin Donohoe

Person

Patents Grantslast 30 patents

Use of a plasma source to form a layer during the formation of a se...

Method of forming high aspect ratio apertures

Plasma etching system and method

Use of a plasma source to form a layer during the formation of a se...

Semiconductor structures

Use of pulsed grounding source in a plasma reactor

Use of a plasma source to form a layer during the formation of a se...

Methods for use of pulsed voltage in a plasma reactor

Plasma etching methods

Method of forming high aspect ratio apertures

Etching methods and apparatus and substrate assemblies produced the...

Liner for use in processing chamber

Plasma etching system and method

Method of providing a structure using self-aligned features

Etchant and method of use

Use of pulsed grounding source in a plasma reactor

Etching of high aspect ration structures

Method for controlling the temperature of a gas distribution plate...

Plasma etching methods

Plasma reactor

Apparatus for improved low pressure inductively coupled high densit...

Etching of high aspect ratio structures

Three-dimensional photonic band structures in solid materials

Etchant and method of use

Methods of forming materials over uneven surface topologies, and me...

Apparatus for controlling the temperature of a gas distribution pla...

Plasma etching methods

Gas pulsing for etch profile control

Etching methods and apparatus and substrate assemblies produced the...

Method of providing a structure using self-aligned features

Patents Applicationslast 30 patents

USE OF A PLASMA SOURCE TO FORM A LAYER DURING THE FORMATION OF A SE...

Use of a plasma source to form a layer during the formation of a se...

Method of forming high aspect ratio apertures

ETCHING METHODS AND APPARATUS AND SUBSTRATE ASSEMBLIES PRODUCED THE...

Use of pulsed grounding source in a plasma reactor

Etchant and method of use

METHOD OF PROVIDING A STRUCTURE USING SELF-ALIGNED FEATURES

Aspect ratio controlled etch selectivity using time modulated DC bi...

Method for controlling the temperature of a gas distribution plate...

Liner for use in processing chamber

Methods of forming materials over uneven surface topologies, and me...

Method for etching a wafer in a plasma etch reactor

Etching of high aspect ration structures

Apparatus for improved low pressure inductively coupled high densit...

Liner for use in processing chamber

Etching methods and apparatus and substrate assemblies produced the...

Etchant and method of use

Method of providing a structure using self-aligned features

Aspect ratio controlled etch selectivity using time modulated DC bi...

Method for controlling the temperature of a gas distribution plate...

Apparatus for controlling the temperature of a gas distribution pla...

Methods for use of pulsed voltage in a plasma reactor

Plasma etching methods

Method of forming high aspect ratio apertures

Use of pulsed voltage in a plasma reactor

Method of forming three-dimensional photonic band structures in sol...

Method of providing a structure using self-aligned features

Method of modifying an RF circuit of a plasma chamber to increase c...

Plasma reactor

Apparatus for improved low pressure inductively coupled high densit...