Niroomand Ardavan

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,935,756
- Issue date Mar 19, 2024
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 11,335,563
- Issue date May 17, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,607,844
- Issue date Mar 31, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 10,096,483
- Issue date Oct 9, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,761,457
- Issue date Sep 12, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 9,305,782
- Issue date Apr 5, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 9,184,159
- Issue date Nov 10, 2015
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming high density patterns
- Patent number 8,871,648
- Issue date Oct 28, 2014
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch reduction technology using alternating spacer depositions dur...
- Patent number 8,852,851
- Issue date Oct 7, 2014
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor constructions
- Patent number 8,598,043
- Issue date Dec 3, 2013
- Micron Technology Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming high density structures and low density structur...
- Patent number 8,431,456
- Issue date Apr 30, 2013
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 8,338,959
- Issue date Dec 25, 2012
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming high density patterns
- Patent number 8,324,107
- Issue date Dec 4, 2012
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions
- Patent number 8,207,570
- Issue date Jun 26, 2012
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 8,030,217
- Issue date Oct 4, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Masking techniques and templates for dense semiconductor fabrication
- Patent number 8,003,310
- Issue date Aug 23, 2011
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 7,902,074
- Issue date Mar 8, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structures for flash memory and methods of making same
- Patent number 7,867,843
- Issue date Jan 11, 2011
- Intel Corporation
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intermediate semiconductor device structures
- Patent number 7,821,142
- Issue date Oct 26, 2010
- Micron Technology, Inc.
- Richard D. Holscher
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of forming semiconductor constructions
- Patent number 7,799,694
- Issue date Sep 21, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming multiple lines
- Patent number 7,790,360
- Issue date Sep 7, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified pitch doubling process flow
- Patent number 7,732,343
- Issue date Jun 8, 2010
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming high density patterns
- Patent number 7,659,208
- Issue date Feb 9, 2010
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuitry and gate stacks
- Patent number 7,576,400
- Issue date Aug 18, 2009
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming openings, and methods of forming container capac...
- Patent number 7,538,036
- Issue date May 26, 2009
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a dual-tone resist to form photomasks including alignment ma...
- Patent number 7,408,265
- Issue date Aug 5, 2008
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor structures, and DRAM arrays
- Patent number 7,321,149
- Issue date Jan 22, 2008
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming openings, and methods of forming container capac...
- Patent number 7,153,778
- Issue date Dec 26, 2006
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer assemblies comprising photoresist over silicon...
- Patent number 7,057,263
- Issue date Jun 6, 2006
- Micron Technology, Inc.
- John T. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a dual-tone resist to form photomasks including alignment ma...
- Patent number 6,815,308
- Issue date Nov 9, 2004
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20240222131
- Publication date Jul 4, 2024
- Lodestar Licensing Group LLC
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20220254644
- Publication date Aug 11, 2022
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20200203171
- Publication date Jun 25, 2020
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20180286693
- Publication date Oct 4, 2018
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20170372913
- Publication date Dec 28, 2017
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20160203993
- Publication date Jul 14, 2016
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch Reduction Technology Using Alternating Spacer Depositions Dur...
- Publication number 20150021744
- Publication date Jan 22, 2015
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20130105937
- Publication date May 2, 2013
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGH DENSITY PATTERNS
- Publication number 20130089977
- Publication date Apr 11, 2013
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming High Density Structures and Low Density Structur...
- Publication number 20120238077
- Publication date Sep 20, 2012
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20110316114
- Publication date Dec 29, 2011
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Semiconductor Constructions
- Publication number 20110008970
- Publication date Jan 13, 2011
- Micron Technology Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Constructions
- Publication number 20100295114
- Publication date Nov 25, 2010
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20100216307
- Publication date Aug 26, 2010
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGH DENSITY PATTERNS
- Publication number 20100112818
- Publication date May 6, 2010
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITRY AND GATE STACKS
- Publication number 20090294878
- Publication date Dec 3, 2009
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING HIGH DENSITY PATTERNS
- Publication number 20090149026
- Publication date Jun 11, 2009
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A DUAL TONE RESIST TO FORM PHOTOMASKS AND INTERMEDIATE SEMIC...
- Publication number 20080251951
- Publication date Oct 16, 2008
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor constructions, methods of forming multiple lines, and...
- Publication number 20080220600
- Publication date Sep 11, 2008
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURES FOR FLASH MEMORY AND METHODS OF MAKING SAME
- Publication number 20080149987
- Publication date Jun 26, 2008
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pitch reduction technology using alternating spacer depositions dur...
- Publication number 20080008969
- Publication date Jan 10, 2008
- Micron Technology, Inc.
- Baosuo Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Masking techniques and templates for dense semiconductor fabrication
- Publication number 20070261016
- Publication date Nov 8, 2007
- Gurtej S. Sandhu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Simplified pitch doubling process flow
- Publication number 20070238308
- Publication date Oct 11, 2007
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming semiconductor constructions
- Publication number 20070238295
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Ramakanth Alapati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED PITCH DOUBLING PROCESS FLOW
- Publication number 20070238299
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Ardavan Niroomand
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming openings, and methods of forming container capac...
- Publication number 20060009042
- Publication date Jan 12, 2006
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor structures, and DRAM arrays
- Publication number 20050269620
- Publication date Dec 8, 2005
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Openings, And Methods of Forming Container Capac...
- Publication number 20050186802
- Publication date Aug 25, 2005
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of a dual-tone resist to form photomasks including alignment ma...
- Publication number 20040259320
- Publication date Dec 23, 2004
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer assemblies comprising photoresist over silicon...
- Publication number 20040124441
- Publication date Jul 1, 2004
- John T. Moore
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Niroomand Ardavan

Person

Patents Grantslast 30 patents

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Pitch reduction technology using alternating spacer depositions dur...

Simplified pitch doubling process flow

Method for forming high density patterns

Pitch reduction technology using alternating spacer depositions dur...

Methods of forming semiconductor constructions

Methods of forming high density structures and low density structur...

Simplified pitch doubling process flow

Method for forming high density patterns

Semiconductor constructions

Simplified pitch doubling process flow

Masking techniques and templates for dense semiconductor fabrication

Simplified pitch doubling process flow

Gate structures for flash memory and methods of making same

Intermediate semiconductor device structures

Methods of forming semiconductor constructions

Methods of forming multiple lines

Simplified pitch doubling process flow

Method for forming high density patterns

Circuitry and gate stacks

Methods of forming openings, and methods of forming container capac...

Use of a dual-tone resist to form photomasks including alignment ma...

Capacitor structures, and DRAM arrays

Methods of forming openings, and methods of forming container capac...

Semiconductor wafer assemblies comprising photoresist over silicon...

Use of a dual-tone resist to form photomasks including alignment ma...

Patents Applicationslast 30 patents

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

Pitch Reduction Technology Using Alternating Spacer Depositions Dur...

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

METHOD FOR FORMING HIGH DENSITY PATTERNS

Methods of Forming High Density Structures and Low Density Structur...

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

Methods of Forming Semiconductor Constructions

Semiconductor Constructions

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

METHOD FOR FORMING HIGH DENSITY PATTERNS

CIRCUITRY AND GATE STACKS

METHOD FOR FORMING HIGH DENSITY PATTERNS

USE OF A DUAL TONE RESIST TO FORM PHOTOMASKS AND INTERMEDIATE SEMIC...

Semiconductor constructions, methods of forming multiple lines, and...

GATE STRUCTURES FOR FLASH MEMORY AND METHODS OF MAKING SAME

Pitch reduction technology using alternating spacer depositions dur...

Masking techniques and templates for dense semiconductor fabrication

Simplified pitch doubling process flow

Methods of forming semiconductor constructions

SIMPLIFIED PITCH DOUBLING PROCESS FLOW

Methods of forming openings, and methods of forming container capac...

Capacitor structures, and DRAM arrays

Methods of Forming Openings, And Methods of Forming Container Capac...

Use of a dual-tone resist to form photomasks including alignment ma...

Semiconductor wafer assemblies comprising photoresist over silicon...