Philip D. Schumaker

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Nanoimprint lithography with a six degrees-of-freedom imprint head...
- Patent number 10,996,561
- Issue date May 4, 2021
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Optical system for use in stage control
- Patent number 10,416,576
- Issue date Sep 17, 2019
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 10,248,018
- Issue date Apr 2, 2019
- Canon Kabushiki Kaisha
- Philip D. Schumaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus, imprint method, and method of manufacturing article
- Patent number 10,120,276
- Issue date Nov 6, 2018
- Canon Kabushiki Kaisha
- Philip D. Schumaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High throughput imprint based on contact line motion tracking control
- Patent number 9,090,014
- Issue date Jul 28, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
High throughput imprint based on contact line motion tracking control
- Patent number 8,945,444
- Issue date Feb 3, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Tessellated patterns in imprint lithography
- Patent number 8,850,980
- Issue date Oct 7, 2014
- Canon Nanotechnologies, Inc.
- Sidlgata V. Sreenivasan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Residual layer thickness measurement and correction
- Patent number 8,647,554
- Issue date Feb 11, 2014
- Molecular Imprints, Inc.
- Christopher Ellis Jones
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Robust optimization to generate drop patterns in imprint lithograph...
- Patent number 8,586,126
- Issue date Nov 19, 2013
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drop pattern generation with edge weighting
- Patent number 8,512,797
- Issue date Aug 20, 2013
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment for edge field nano-imprinting
- Patent number 8,432,548
- Issue date Apr 30, 2013
- Molecular Imprints, Inc.
- Byung-Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical system for use in stage control
- Patent number 8,345,242
- Issue date Jan 1, 2013
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning a plurality of fields on a substrate to compensate for d...
- Patent number 8,142,850
- Issue date Mar 27, 2012
- Molecular Imprints, Inc.
- Sidlgata V. Sreenivasan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Drop pattern generation for imprint lithography
- Patent number 8,119,052
- Issue date Feb 21, 2012
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interferometric analysis method for the manufacture of nano-scale d...
- Patent number 7,880,872
- Issue date Feb 1, 2011
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for detecting a particle in a nanoimprint lithography system
- Patent number 7,854,867
- Issue date Dec 21, 2010
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Enhanced multi channel alignment
- Patent number 7,785,096
- Issue date Aug 31, 2010
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System to transfer a template transfer body between a motion stage...
- Patent number 7,665,981
- Issue date Feb 23, 2010
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Interferometric analysis method for the manufacture of nano-scale d...
- Patent number 7,630,067
- Issue date Dec 8, 2009
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- G01 - MEASURING TESTING
Information Patent Grant
Interferometric analysis for the manufacture of nano-scale devices
- Patent number 7,292,326
- Issue date Nov 6, 2007
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint lithography template having opaque alignment marks
- Patent number 7,136,150
- Issue date Nov 14, 2006
- Molecular Imprints, Inc.
- Sidlgata V. Sreenivasan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system to measure characteristics of a film disposed on...
- Patent number 7,019,835
- Issue date Mar 28, 2006
- Molecular Imprints, Inc.
- Ian M. McMackin
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Efficient method for modeling and simulation of the impact of local...
- Patent number 6,978,229
- Issue date Dec 20, 2005
- PDF Solutions, Inc.
- Sharad Saxena
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
NANOIMPRINT LITHOGRAPHY WITH A SIX DEGREES-OF-FREEDOM IMPRINT HEAD...
- Publication number 20190196324
- Publication date Jun 27, 2019
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OPTICAL SYSTEM FOR USE IN STAGE CONTROL
- Publication number 20180074418
- Publication date Mar 15, 2018
- Canon Kabushiki Kaisha
- Seth J. Bamesberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHODS FOR NANOIMPRINT LITHOGRAPHY
- Publication number 20170282439
- Publication date Oct 5, 2017
- Canon Kabushiki Kaisha
- XIAOMING LU
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20160288403
- Publication date Oct 6, 2016
- Canon Kabushiki Kaisha
- Philip D. Schumaker
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20160288404
- Publication date Oct 6, 2016
- Philip D. Schumaker
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
High Throughput Imprint Based on Contact Line Motion Tracking Control
- Publication number 20150140149
- Publication date May 21, 2015
- Canon Nanotechnologies, Inc.
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Residual Layer Thickness Measurement and Correction
- Publication number 20100286811
- Publication date Nov 11, 2010
- Molecular Imprints, Inc.
- Christopher E. Jones
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Alignment for Edge Field Nano-Imprinting
- Publication number 20100110434
- Publication date May 6, 2010
- Molecular Imprints, Inc.
- Byung-Jin Choi
- B82 - NANO-TECHNOLOGY
Information Patent Application
DISPENSE SYSTEM SET-UP AND CHARACTERIZATION
- Publication number 20100112220
- Publication date May 6, 2010
- Molecular Imprints, Inc.
- Jared L. Hodge
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical System for Use in Stage Control
- Publication number 20100102487
- Publication date Apr 29, 2010
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Drop Deposition Control
- Publication number 20100104747
- Publication date Apr 29, 2010
- Molecular Imprints, Inc.
- Van Nguyen Truskett
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPH...
- Publication number 20100097590
- Publication date Apr 22, 2010
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Drop Pattern Generation with Edge Weighting
- Publication number 20100098859
- Publication date Apr 22, 2010
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Interferometric Analysis Method for the Manufacture of Nano-Scale D...
- Publication number 20100038827
- Publication date Feb 18, 2010
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- G01 - MEASURING TESTING
Information Patent Application
Enhanced Multi Channel Alignment
- Publication number 20090169662
- Publication date Jul 2, 2009
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Application
Spatial Phase Feature Location
- Publication number 20090147237
- Publication date Jun 11, 2009
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Alignment Using Moire Patterns
- Publication number 20090148032
- Publication date Jun 11, 2009
- Molecular Imprints, Inc.
- Philip D. Schumaker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
High Throughput Imprint Based on Contact Line Motion Tracking Control
- Publication number 20090140445
- Publication date Jun 4, 2009
- MOLECULAR IMPRINTS
- Xiaoming Lu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Drop Pattern Generation for Imprint Lithography
- Publication number 20090115110
- Publication date May 7, 2009
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Drop Pattern Generation for Imprint Lithography
- Publication number 20090014917
- Publication date Jan 15, 2009
- Molecular Imprints, Inc.
- Jared L. Hodge
- B82 - NANO-TECHNOLOGY
Information Patent Application
Tesselated Patterns in Imprint Lithography
- Publication number 20070247608
- Publication date Oct 25, 2007
- Molecular Imprints, Inc.
- Sidlgata V. Sreenivasan
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for Detecting a Particle in a Nanoimprint Lithography System
- Publication number 20070246850
- Publication date Oct 25, 2007
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Patterning a Plurality of Fields on a Substrate to Compensate for D...
- Publication number 20070231981
- Publication date Oct 4, 2007
- Molecular Imprints, Inc.
- Sidlgata V. Sreenivasan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Enhanced Multi Channel Alignment
- Publication number 20070231421
- Publication date Oct 4, 2007
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Application
Residual Layer Thickness Measurement and Correction
- Publication number 20070228593
- Publication date Oct 4, 2007
- Molecular Imprints, Inc.
- Christopher E. Jones
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
System to couple a body and a docking plate
- Publication number 20070074635
- Publication date Apr 5, 2007
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
System to transfer a template transfer body between a motion stage...
- Publication number 20070071582
- Publication date Mar 29, 2007
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to transfer a template transfer body between a motion stage...
- Publication number 20070064384
- Publication date Mar 22, 2007
- Molecular Imprints, Inc.
- Philip D. Schumaker
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Interferometric analysis for the manufacture of nano-scale devices
- Publication number 20060126058
- Publication date Jun 15, 2006
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- B82 - NANO-TECHNOLOGY
Information Patent Application
Interferometric analysis method for the manufacture of nano-scale d...
- Publication number 20060114450
- Publication date Jun 1, 2006
- Molecular Imprints, Inc.
- Pawan Kumar Nimmakayala
- G01 - MEASURING TESTING

Philip D. Schumaker

Person

Patents Grantslast 30 patents

Nanoimprint lithography with a six degrees-of-freedom imprint head...

Optical system for use in stage control

Imprint apparatus and method of manufacturing article

Imprint apparatus, imprint method, and method of manufacturing article

High throughput imprint based on contact line motion tracking control

High throughput imprint based on contact line motion tracking control

Tessellated patterns in imprint lithography

Residual layer thickness measurement and correction

Robust optimization to generate drop patterns in imprint lithograph...

Drop pattern generation with edge weighting

Alignment for edge field nano-imprinting

Optical system for use in stage control

Patterning a plurality of fields on a substrate to compensate for d...

Drop pattern generation for imprint lithography

Interferometric analysis method for the manufacture of nano-scale d...

Method for detecting a particle in a nanoimprint lithography system

Enhanced multi channel alignment

System to transfer a template transfer body between a motion stage...

Interferometric analysis method for the manufacture of nano-scale d...

Interferometric analysis for the manufacture of nano-scale devices

Imprint lithography template having opaque alignment marks

Method and system to measure characteristics of a film disposed on...

Efficient method for modeling and simulation of the impact of local...

Patents Applicationslast 30 patents

NANOIMPRINT LITHOGRAPHY WITH A SIX DEGREES-OF-FREEDOM IMPRINT HEAD...

OPTICAL SYSTEM FOR USE IN STAGE CONTROL

SYSTEM AND METHODS FOR NANOIMPRINT LITHOGRAPHY

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE

High Throughput Imprint Based on Contact Line Motion Tracking Control

Residual Layer Thickness Measurement and Correction

Alignment for Edge Field Nano-Imprinting

DISPENSE SYSTEM SET-UP AND CHARACTERIZATION

Optical System for Use in Stage Control

Drop Deposition Control

ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPH...

Drop Pattern Generation with Edge Weighting

Interferometric Analysis Method for the Manufacture of Nano-Scale D...

Enhanced Multi Channel Alignment

Spatial Phase Feature Location

Alignment Using Moire Patterns

High Throughput Imprint Based on Contact Line Motion Tracking Control

Drop Pattern Generation for Imprint Lithography

Drop Pattern Generation for Imprint Lithography

Tesselated Patterns in Imprint Lithography

Method for Detecting a Particle in a Nanoimprint Lithography System

Patterning a Plurality of Fields on a Substrate to Compensate for D...

Enhanced Multi Channel Alignment

Residual Layer Thickness Measurement and Correction

System to couple a body and a docking plate

System to transfer a template transfer body between a motion stage...

Method to transfer a template transfer body between a motion stage...

Interferometric analysis for the manufacture of nano-scale devices

Interferometric analysis method for the manufacture of nano-scale d...