Shankar Venkataraman

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 12,203,171
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 12,009,228
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D NAND gate stack reinforcement
- Patent number 11,967,524
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Praket Prakash Jha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 11,594,428
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 11,408,075
- Issue date Aug 9, 2022
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing systems having multiple plasma configurations
- Patent number 11,024,486
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chuck for plasma processing systems
- Patent number 10,468,285
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced etching processes using remote plasma sources
- Patent number 10,424,485
- Issue date Sep 24, 2019
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 10,354,843
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Optical emission spectroscopy (OES) for remote plasma monitoring
- Patent number 10,319,649
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system and methods using capacitively coup...
- Patent number 10,283,321
- Issue date May 7, 2019
- Applied Materials, Inc.
- Jang-Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing systems having multiple plasma configurations
- Patent number 10,256,079
- Issue date Apr 9, 2019
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulated semiconductor faceplate designs
- Patent number 10,170,282
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Xinglong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 10,113,236
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 10,032,606
- Issue date Jul 24, 2018
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,991,134
- Issue date Jun 5, 2018
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,978,564
- Issue date May 22, 2018
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated bit-line airgap formation and gate stack post clean
- Patent number 9,773,695
- Issue date Sep 26, 2017
- Applied Materials, Inc.
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature chuck for plasma processing systems
- Patent number 9,728,437
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,704,723
- Issue date Jul 11, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,659,792
- Issue date May 23, 2017
- Applied Materials, Inc.
- Anchuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated bit-line airgap formation and gate stack post clean
- Patent number 9,496,167
- Issue date Nov 15, 2016
- Applied Materials, Inc.
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing systems and methods for halide scavenging
- Patent number 9,449,850
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Highly selective doped oxide removal method
- Patent number 9,406,523
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment and deposition for reduced outgassing
- Patent number 9,404,178
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated oxide recess and floating gate fin trimming
- Patent number 9,378,978
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing with DC assisted RF power for improved con...
- Patent number 9,373,517
- Issue date Jun 21, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
- Publication number 20240120193
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Shankar Venkataraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20230223281
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20220341042
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORIDE COATING TO IMPROVE CHAMBER PERFORMANCE
- Publication number 20220037126
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
3D NAND GATE STACK REINFORCEMENT
- Publication number 20210143058
- Publication date May 13, 2021
- Applied Materials, Inc.
- Praket Prakash Jha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
- Publication number 20190259580
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Tae Seung Cho
- G01 - MEASURING TESTING
Information Patent Application
INSULATED SEMICONDUCTOR FACEPLATE DESIGNS
- Publication number 20190139743
- Publication date May 9, 2019
- Applied Materials, Inc.
- Xinglong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20190048470
- Publication date Feb 14, 2019
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING
- Publication number 20180294198
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20170309509
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20170236691
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEMS HAVING MULTIPLE PLASMA CONFIGURATIONS
- Publication number 20170229289
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20170229326
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER
- Publication number 20170121813
- Publication date May 4, 2017
- Applied Materials, Inc.
- Maosheng ZHAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED BIT-LINE AIRGAP FORMATION AND GATE STACK POST CLEAN
- Publication number 20170040207
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...
- Publication number 20160300694
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- Jang-Gyoo Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES
- Publication number 20160284556
- Publication date Sep 29, 2016
- Applied Materials, Inc.
- Nitin K. Ingle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20160225652
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20160225651
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160064233
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WORDLINE 3D FLASH MEMORY AIR GAP
- Publication number 20160043099
- Publication date Feb 11, 2016
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED OXIDE RECESS AND FLOATING GATE FIN TRIMMING
- Publication number 20160035586
- Publication date Feb 4, 2016
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED BIT-LINE AIRGAP FORMATION AND GATE STACK POST CLEAN
- Publication number 20160035614
- Publication date Feb 4, 2016
- Vinod R. Purayath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20160027673
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20160005572
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD
- Publication number 20150371866
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Zhijun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20150329970
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
- Publication number 20150332930
- Publication date Nov 19, 2015
- Applied Materials, Inc.
- Anchuan Wang
- H01 - BASIC ELECTRIC ELEMENTS

Shankar Venkataraman

Person

Patents Grantslast 30 patents

Batch curing chamber with gas distribution and individual pumping

Flow control features of CVD chambers

Low temperature chuck for plasma processing systems

3D NAND gate stack reinforcement

Low temperature chuck for plasma processing systems

Batch curing chamber with gas distribution and individual pumping

Chemical control features in wafer process equipment

Semiconductor processing systems having multiple plasma configurations

Flow control features of CVD chambers

High temperature chuck for plasma processing systems

Enhanced etching processes using remote plasma sources

Chemical control features in wafer process equipment

Optical emission spectroscopy (OES) for remote plasma monitoring

Semiconductor processing system and methods using capacitively coup...

Semiconductor processing systems having multiple plasma configurations

Insulated semiconductor faceplate designs

Batch curing chamber with gas distribution and individual pumping

Semiconductor processing with DC assisted RF power for improved con...

Processing systems and methods for halide scavenging

Chemical control features in wafer process equipment

Integrated bit-line airgap formation and gate stack post clean

High temperature chuck for plasma processing systems

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Integrated bit-line airgap formation and gate stack post clean

Processing systems and methods for halide scavenging

Highly selective doped oxide removal method

Surface treatment and deposition for reduced outgassing

Integrated oxide recess and floating gate fin trimming

Semiconductor processing with DC assisted RF power for improved con...

Patents Applicationslast 30 patents

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

FLUORIDE COATING TO IMPROVE CHAMBER PERFORMANCE

3D NAND GATE STACK REINFORCEMENT

FLOW CONTROL FEATURES OF CVD CHAMBERS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING

INSULATED SEMICONDUCTOR FACEPLATE DESIGNS

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

OPTICAL EMISSION SPECTROSCOPY (OES) FOR REMOTE PLASMA MONITORING

HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

SEMICONDUCTOR PROCESSING SYSTEMS HAVING MULTIPLE PLASMA CONFIGURATIONS

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER

INTEGRATED BIT-LINE AIRGAP FORMATION AND GATE STACK POST CLEAN

SEMICONDUCTOR PROCESSING WITH DC ASSISTED RF POWER FOR IMPROVED CON...

ENHANCED ETCHING PROCESSES USING REMOTE PLASMA SOURCES

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

WORDLINE 3D FLASH MEMORY AIR GAP

INTEGRATED OXIDE RECESS AND FLOATING GATE FIN TRIMMING

INTEGRATED BIT-LINE AIRGAP FORMATION AND GATE STACK POST CLEAN

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

HIGHLY SELECTIVE DOPED OXIDE REMOVAL METHOD

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING