Vincent Burkhart

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mechanism for continuously varying radial position of a magnetron
- Patent number 8,685,215
- Issue date Apr 1, 2014
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron having continuously variable radial position
- Patent number 7,736,473
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid isolation of contact rings
- Patent number 7,138,039
- Issue date Nov 21, 2006
- Applied Materials, Inc.
- Vincent E. Burkhart
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method and apparatus for sealing electrical contacts during an elec...
- Patent number 7,067,045
- Issue date Jun 27, 2006
- Applied Materials, Inc.
- Arthur Keigler
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Selectable dual position magnetron
- Patent number 7,018,515
- Issue date Mar 28, 2006
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing electrolyte from electrical contacts and wafer...
- Patent number 6,869,516
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anode impedance control through electrolyte flow control
- Patent number 6,855,235
- Issue date Feb 15, 2005
- Applied Materials, Inc.
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Anode slime reduction method while maintaining low current
- Patent number 6,843,897
- Issue date Jan 18, 2005
- Applied Materials, Inc.
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method and apparatus for reducing migration of conductive material...
- Patent number 6,488,820
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing thermal gradients within a substr...
- Patent number 6,469,283
- Issue date Oct 22, 2002
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for sputter etch conditioning a ceramic body
- Patent number 6,395,157
- Issue date May 28, 2002
- Applied Materials, Inc.
- Nitin Khurana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for wafer detection
- Patent number 6,377,060
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Vincent E. Burkhart
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Laminated ceramic with multilayer electrodes and method of fabrication
- Patent number 6,303,879
- Issue date Oct 16, 2001
- Applied Materials, Inc.
- Vincent E. Burkhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conductive feed-through for creating a surface electrode connection...
- Patent number 6,291,777
- Issue date Sep 18, 2001
- Applied Materials, Inc.
- Vincent E. Burkhart
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Conductive feedthrough for a ceramic body and method of fabricating...
- Patent number 6,255,601
- Issue date Jul 3, 2001
- Applied Materials, Inc.
- Vince Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for wafer detection
- Patent number 6,075,375
- Issue date Jun 13, 2000
- Applied Materials, Inc.
- Vincent E. Burkhart
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck with improved spacing mask and workpiece detect...
- Patent number D425919
- Issue date May 30, 2000
- Applied Materials, Inc.
- Vincent E. Burkhart
- D15 - Machines not elsewhere specified
Information Patent Grant
Interlock safety device
- Patent number 6,053,756
- Issue date Apr 25, 2000
- Applied Materials, Inc.
- Allen Flanigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with improved spacing and charge migration redu...
- Patent number D420022
- Issue date Feb 1, 2000
- Applied Materials, Inc.
- Vincent E. Burkhart
- D15 - Machines not elsewhere specified
Information Patent Grant
Electrostatic chuck with improved spacing mask and workpiece detect...
- Patent number D420023
- Issue date Feb 1, 2000
- Applied Materials, Inc.
- Allen Flanigan
- D15 - Machines not elsewhere specified
Information Patent Grant
Monopolar electrostatic chuck having an electrode in contact with a...
- Patent number 5,982,607
- Issue date Nov 9, 1999
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for balancing an electrostatic force produced...
- Patent number 5,923,521
- Issue date Jul 13, 1999
- Applied Materials, Inc.
- Vincent E. Burkhart
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method and apparatus for predicting failure of an eletrostatic chuck
- Patent number 5,886,865
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- Vijay D. Parkhe
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck with improved spacing and charge migration redu...
- Patent number D407073
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- Vincent E. Burkhart
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Electrostatic chuck with improved spacing mask and workpiece detect...
- Patent number D406852
- Issue date Mar 16, 1999
- Applied Materials, Inc.
- Vincent E. Burkhart
- D15 - Machines not elsewhere specified
Information Patent Grant
Method and apparatus for sputter etch conditioning a ceramic body
- Patent number 5,861,086
- Issue date Jan 19, 1999
- Applied Materials, Inc.
- Nitin Khurana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulated wafer spacing mask for a substrate support chuck and meth...
- Patent number 5,825,607
- Issue date Oct 20, 1998
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for balancing an electrostatic force produced...
- Patent number 5,764,471
- Issue date Jun 9, 1998
- Applied Materials, Inc.
- Vincent E. Burkhart
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Monopolar electrostatic chuck having an electrode in contact with a...
- Patent number 5,745,332
- Issue date Apr 28, 1998
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer spacing mask for a substrate support chuck and method of fabr...
- Patent number 5,656,093
- Issue date Aug 12, 1997
- Applied Materials, Inc.
- Vincent E. Burkhart
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Mechanism for continuously varying radial position of a magnetron
- Publication number 20100243440
- Publication date Sep 30, 2010
- APPLIED MATERIALS, INCORPORATED
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetron having continuously variable radial position
- Publication number 20060076232
- Publication date Apr 13, 2006
- Keith A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selectable dual position magnetron
- Publication number 20050211548
- Publication date Sep 29, 2005
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Liquid isolation of contact rings
- Publication number 20040140203
- Publication date Jul 22, 2004
- Applied Materials,Inc
- Vincent E. Burkhart
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for removing electrolyte from electrical contacts and wafer...
- Publication number 20040074777
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Dmitry Lubomirsky
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for sealing electrical contacts during an elec...
- Publication number 20040074762
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Arthur Keigler
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Anode impedance control through electrolyte flow control
- Publication number 20030221957
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Anode slime reduction method while maintaining low current
- Publication number 20030221956
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Harald Herchen
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR SPUTTER ETCH CONDITIONING A CERAMIC BODY
- Publication number 20010040091
- Publication date Nov 15, 2001
- NITIN KHURANA
- H01 - BASIC ELECTRIC ELEMENTS

Vincent Burkhart

Person

Patents Grantslast 30 patents

Mechanism for continuously varying radial position of a magnetron

Magnetron having continuously variable radial position

Liquid isolation of contact rings

Method and apparatus for sealing electrical contacts during an elec...

Selectable dual position magnetron

Method for removing electrolyte from electrical contacts and wafer...

Anode impedance control through electrolyte flow control

Anode slime reduction method while maintaining low current

Method and apparatus for reducing migration of conductive material...

Method and apparatus for reducing thermal gradients within a substr...

Method and apparatus for sputter etch conditioning a ceramic body

Method and apparatus for wafer detection

Laminated ceramic with multilayer electrodes and method of fabrication

Conductive feed-through for creating a surface electrode connection...

Conductive feedthrough for a ceramic body and method of fabricating...

Apparatus for wafer detection

Electrostatic chuck with improved spacing mask and workpiece detect...

Interlock safety device

Electrostatic chuck with improved spacing and charge migration redu...

Electrostatic chuck with improved spacing mask and workpiece detect...

Monopolar electrostatic chuck having an electrode in contact with a...

Method and apparatus for balancing an electrostatic force produced...

Method and apparatus for predicting failure of an eletrostatic chuck

Electrostatic chuck with improved spacing and charge migration redu...

Electrostatic chuck with improved spacing mask and workpiece detect...

Method and apparatus for sputter etch conditioning a ceramic body

Insulated wafer spacing mask for a substrate support chuck and meth...

Method and apparatus for balancing an electrostatic force produced...

Monopolar electrostatic chuck having an electrode in contact with a...

Wafer spacing mask for a substrate support chuck and method of fabr...

Patents Applicationslast 30 patents

Mechanism for continuously varying radial position of a magnetron

Magnetron having continuously variable radial position

Selectable dual position magnetron

Liquid isolation of contact rings

Method for removing electrolyte from electrical contacts and wafer...

Method and apparatus for sealing electrical contacts during an elec...

Anode impedance control through electrolyte flow control

Anode slime reduction method while maintaining low current

METHOD AND APPARATUS FOR SPUTTER ETCH CONDITIONING A CERAMIC BODY