Masks where at least part of the patterns comprise no opaque or semi-opaque pattern elements

Industry

CPC
G03F1/0084

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/0084Masks where at least part of the patterns comprise no opaque or semi-opaque pattern elements

Industries

Patents Grantslast 30 patents

Information Patent Grant
Nanopatterning method and apparatus
- Patent number 9,465,296
- Issue date Oct 11, 2016
- Rolith, Inc.
- Boris Kobrin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography masks for improved line-end patterning
- Patent number 7,816,061
- Issue date Oct 19, 2010
- Intel Corporation
- Richard Schenker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid phase-shift mask and manufacturing method thereof
- Patent number 7,582,396
- Issue date Sep 1, 2009
- Toppan Chunghwa Electronics Co., Ltd.
- Tzu-Chang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for creating phase edge structures in a phase shift mask
- Patent number 7,563,546
- Issue date Jul 21, 2009
- International Business Machiens Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,541,118
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for checking phase shift angle of phase shift mask, lithogra...
- Patent number 7,498,105
- Issue date Mar 3, 2009
- United Microelectronics Corp.
- Yung-Feng Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of controlling transmittance and phase of ligh...
- Patent number 7,465,524
- Issue date Dec 16, 2008
- Samsung Electronics Co., Ltd.
- Jin-hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method utilizing phase-edges as sub-re...
- Patent number 7,399,559
- Issue date Jul 15, 2008
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,361,434
- Issue date Apr 22, 2008
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a phase shift mask
- Patent number 7,338,736
- Issue date Mar 4, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting 3D mask effects
- Patent number 7,308,673
- Issue date Dec 11, 2007
- Synopsys, Inc.
- Lawrence S. Melvin, III
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask useful for transferring a pattern using extreme ult...
- Patent number 7,282,307
- Issue date Oct 16, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Scott D. Hector
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Etching method for making a reticle
- Patent number 7,226,866
- Issue date Jun 5, 2007
- Fujitsu Limited
- Hisatsugu Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask
- Patent number 7,141,337
- Issue date Nov 28, 2006
- United Microelectronics Corp.
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of inspecting a lithography template
- Patent number 7,132,225
- Issue date Nov 7, 2006
- Molecular Imprints, Inc.
- Ronald D. Voisin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods of manufacturing a lithography template
- Patent number 7,037,639
- Issue date May 2, 2006
- Molecular Imprints, Inc.
- Ronald D. Voisin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical proximity correction method utilizing phase-edges as sub-re...
- Patent number 7,026,081
- Issue date Apr 11, 2006
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,979,519
- Issue date Dec 27, 2005
- Synopsys, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,818,385
- Issue date Nov 16, 2004
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reticles and methods of forming and using the same
- Patent number 6,818,359
- Issue date Nov 16, 2004
- Micron Technology, Inc.
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vortex phase shift mask for optical lithography
- Patent number 6,811,933
- Issue date Nov 2, 2004
- Marc David Levenson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask and blanks for halftone phase shift...
- Patent number 6,709,791
- Issue date Mar 23, 2004
- Dai Nippon Printing Co., Ltd.
- Hiroshi Mohri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,566,023
- Issue date May 20, 2003
- Numerical Technology, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,436,590
- Issue date Aug 20, 2002
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,420,074
- Issue date Jul 16, 2002
- Numerial Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,258,493
- Issue date Jul 10, 2001
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Phase shifting circuit manufacture method and apparatus
- Patent number 6,228,539
- Issue date May 8, 2001
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming resist pattern
- Patent number 6,177,233
- Issue date Jan 23, 2001
- Sony Corporation
- Fumikatsu Uesawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and its manufacturing method and semiconductor dev...
- Patent number 5,994,001
- Issue date Nov 30, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Shuji Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sputter deposition of hydrogenated amorphous carbon film and applic...
- Patent number 5,830,332
- Issue date Nov 3, 1998
- International Business Machines Corporation
- Edward D. Babich
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
NANOPATTERNING METHOD AND APPARATUS
- Publication number 20120274004
- Publication date Nov 1, 2012
- Rolith, Inc.
- Boris Kobrin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for etching glass or metal substrates using negative photore...
- Publication number 20100126367
- Publication date May 27, 2010
- Ji-Su Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND PATTERN FORM
- Publication number 20100086877
- Publication date Apr 8, 2010
- Toppan Printing Co., Ltd.
- Munehisa Soma
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Lithography masks for improved line-end patterning
- Publication number 20080318137
- Publication date Dec 25, 2008
- Richard Schenker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-RESOLUTION ASSIST FEATURE OF A PHOTOMASK
- Publication number 20080241708
- Publication date Oct 2, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME
- Publication number 20080102383
- Publication date May 1, 2008
- Samsung Electronics Co., Ltd.
- Myung-Ah KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning masks, methods, and systems
- Publication number 20080070126
- Publication date Mar 20, 2008
- Yayi Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid phase-shift mask and manufacturing method thereof
- Publication number 20070269722
- Publication date Nov 22, 2007
- Toppan Chunghwa Elctronics Co., Ltd.
- Tzu-Chang Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070121090
- Publication date May 31, 2007
- ASML NETHERLANDS B.V.
- Alek Chi-Heng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHECKING PHASE SHIFT ANGLE OF PHASE SHIFT MASK, LITHOGRA...
- Publication number 20060292455
- Publication date Dec 28, 2006
- Yung-Feng Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for correcting 3D mask effects
- Publication number 20060156270
- Publication date Jul 13, 2006
- Lawrence S. Melvin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective mask useful for transferring a pattern using extreme ult...
- Publication number 20050282072
- Publication date Dec 22, 2005
- Scott D. Hector
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050277065
- Publication date Dec 15, 2005
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
- Publication number 20050271953
- Publication date Dec 8, 2005
- ASML MASKTOOLS B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle manufacturing method
- Publication number 20050266318
- Publication date Dec 1, 2005
- FUJITSU LIMITED
- Hisatsugu Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR CREATING PHASE EDGE STRUCTURES
- Publication number 20050164097
- Publication date Jul 28, 2005
- International Business Machines Corporation
- Jason M. Benz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and method of controlling transmittance and phase of ligh...
- Publication number 20050158636
- Publication date Jul 21, 2005
- SAMSUNG ELECTRONICS CO., LTD.
- Jin-hong Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift mask and fabrication thereof
- Publication number 20050112476
- Publication date May 26, 2005
- Robert A. Bellman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask
- Publication number 20050084771
- Publication date Apr 21, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of fabricating the same
- Publication number 20040248018
- Publication date Dec 9, 2004
- Myung-Ah Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifting circuit manufacture method and apparatus
- Publication number 20040197680
- Publication date Oct 7, 2004
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
A phase shift mask
- Publication number 20040197671
- Publication date Oct 7, 2004
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticles and methods of forming and using the same
- Publication number 20040043304
- Publication date Mar 4, 2004
- Byron N. Burgess
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Vortex phase shift mask for optical lithography
- Publication number 20040002010
- Publication date Jan 1, 2004
- Marc David Levenson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of inspecting a lithography template
- Publication number 20030205658
- Publication date Nov 6, 2003
- Molecular Imprints, Inc.
- Ronald D. Voisin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods of manufacturing a lithography template
- Publication number 20030205657
- Publication date Nov 6, 2003
- Ronald D. Voisin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Phase shifting circuit manufacture method and apparatus
- Publication number 20030165754
- Publication date Sep 4, 2003
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
- Publication number 20030064298
- Publication date Apr 3, 2003
- ASML MASKTOOLS, B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifting circuit manufacture method and apparatus
- Publication number 20020168578
- Publication date Nov 14, 2002
- Numerical Technologies, Inc.
- Yao-Ting Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photolithography process for producing gates and conductive lines
- Publication number 20020110765
- Publication date Aug 15, 2002
- United Microelectronics Corp.
- Chien-Wen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Masks where at least part of the patterns comprise no opaque or semi-opaque pattern elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Nanopatterning method and apparatus

Lithography masks for improved line-end patterning

Hybrid phase-shift mask and manufacturing method thereof

Process for creating phase edge structures in a phase shift mask

Phase shift mask

Method for checking phase shift angle of phase shift mask, lithogra...

Photomask and method of controlling transmittance and phase of ligh...

Optical proximity correction method utilizing phase-edges as sub-re...

Phase shift mask

Method of fabricating a phase shift mask

Method and apparatus for correcting 3D mask effects

Reflective mask useful for transferring a pattern using extreme ult...

Etching method for making a reticle

Phase shift mask

Methods of inspecting a lithography template

Methods of manufacturing a lithography template

Optical proximity correction method utilizing phase-edges as sub-re...

Phase shifting circuit manufacture method and apparatus

Phase shifting circuit manufacture method and apparatus

Reticles and methods of forming and using the same

Vortex phase shift mask for optical lithography

Halftone phase shift photomask and blanks for halftone phase shift...

Phase shifting circuit manufacture method and apparatus

Phase shifting circuit manufacture method and apparatus

Phase shifting circuit manufacture method and apparatus

Phase shifting circuit manufacture method and apparatus

Phase shifting circuit manufacture method and apparatus

Method of forming resist pattern

Phase shift mask and its manufacturing method and semiconductor dev...

Sputter deposition of hydrogenated amorphous carbon film and applic...

Patents Applicationslast 30 patents

NANOPATTERNING METHOD AND APPARATUS

Method for etching glass or metal substrates using negative photore...

PATTERN FORMING METHOD AND PATTERN FORM

Lithography masks for improved line-end patterning

SUB-RESOLUTION ASSIST FEATURE OF A PHOTOMASK

PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME

Patterning masks, methods, and systems

Hybrid phase-shift mask and manufacturing method thereof

Lithographic apparatus and device manufacturing method

METHOD FOR CHECKING PHASE SHIFT ANGLE OF PHASE SHIFT MASK, LITHOGRA...

Method and apparatus for correcting 3D mask effects

Reflective mask useful for transferring a pattern using extreme ult...

Method of manufacturing a semiconductor device

Optical proximity correction method utilizing phase-edges as sub-re...

Reticle manufacturing method

PROCESS FOR CREATING PHASE EDGE STRUCTURES

Photomask and method of controlling transmittance and phase of ligh...

Phase-shift mask and fabrication thereof

Phase shift mask

Phase shift mask and method of fabricating the same

Phase shifting circuit manufacture method and apparatus

A phase shift mask

Reticles and methods of forming and using the same

Vortex phase shift mask for optical lithography

Methods of inspecting a lithography template

Methods of manufacturing a lithography template

Phase shifting circuit manufacture method and apparatus

Optical proximity correction method utilizing phase-edges as sub-re...

Phase shifting circuit manufacture method and apparatus

Photolithography process for producing gates and conductive lines