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CHEMICAL MECHANICAL POLISHING PAD
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Publication number 20250100099
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Publication date Mar 27, 2025
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DuPont Electronic Materials Holding, Inc.
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Fengji YEH
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B24 - GRINDING POLISHING
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CMP INNER RING IN SMART HEAD
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Publication number 20250100105
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Publication date Mar 27, 2025
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Applied Materials, Inc.
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Michael Prestoza DECENA
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B24 - GRINDING POLISHING
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SLURRY AND POLISHING METHOD
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Publication number 20250084294
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Publication date Mar 13, 2025
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Resonac Corporation
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Satoyuki NOMURA
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C01 - INORGANIC CHEMISTRY
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POLISHING PAD
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Publication number 20250083278
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Publication date Mar 13, 2025
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KURARAY CO., LTD.
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Azusa SUNAYAMA
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B24 - GRINDING POLISHING
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MULTILAYER CMP PADS
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Publication number 20250073842
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Publication date Mar 6, 2025
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Rajeev BAJAJ
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B24 - GRINDING POLISHING
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LEVERAGED POROMERIC POLISHING PAD
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Publication number 20250058426
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Publication date Feb 20, 2025
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Rohm and Haas Electronic Materials CMP Holdings, INC.
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Wei-Wen TSAI
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B24 - GRINDING POLISHING