3481781

Information

• Patent Grant
• 3481781

• References
• Source

• Patent Number

  3,481,781

• Date Filed

  Not available

• Date Issued

  Tuesday, December 2, 1969
  55 years ago

• CPC

  • H01L21/31625 - Deposition of boron or phosphorus doped silicon oxide
  • C03C1/00 - Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
  • C23C16/401 - containing silicon
  • C23D5/00 - Coating with enamels or vitreous layers
  • H01L21/02129 - the material being boron or phosphorus doped silicon oxides
  • H01L21/02142 - the material containing silicon and at least one metal element
  • H01L21/02145 - the material containing aluminium
  • H01L21/02211 - the compound being a silane
  • H01L21/02271 - deposition by decomposition or reaction of gaseous or vapour phase compounds
  • H01L21/31604 - Deposition from a gas or vapour
  • B05D2490/50 - compositions varying with a gradient perpendicular to the surface
  • Y10S148/043 - Dual dielectric
  • Y10S148/118 - Oxide films
  • Y10S148/173 - Washed emitter

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment
  • 257 - Active solid-state devices
  • 427 - Coating processes