3490964

Information

• Patent Grant
• 3490964

• References
• Source

• Patent Number

  3,490,964

• Date Filed

  Not available

• Date Issued

  Tuesday, January 20, 1970
  54 years ago

• CPC

  • H01L21/22 - Diffusion of impurity materials
  • C30B31/06 - by contacting with diffusion material in the gaseous state
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
  • Y10S148/017 - Clean surfaces
  • Y10S148/04 - Dopants, special
  • Y10S148/041 - Doping control in crystal growth
  • Y10S148/043 - Dual dielectric
  • Y10S148/049 - Equivalence and options
  • Y10S148/144 - Shallow diffusion
  • Y10S148/173 - Washed emitter
  • Y10S438/92 - Controlling diffusion profile by oxidation
  • Y10S438/934 - Sheet resistance

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment