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3895390
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Information
Patent Grant
3895390
References
Source
Patent Number
3,895,390
Date Filed
Not available
Date Issued
Tuesday, July 15, 1975
49 years ago
CPC
H01L29/7816 - Lateral DMOS transistors
H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/033 - comprising inorganic layers
H01L29/513 - the variation being perpendicular to the channel plane
H01L29/518 - the insulating material containing nitrogen
H01L29/7801 - DMOS transistors
H01L29/511 - with a compositional variation
Y10S148/151 - Simultaneous diffusion
Y10S148/167 - Two diffusions in one hole
US Classifications
257 - Active solid-state devices
148 - Metal treatment
438 - Semiconductor device manufacturing: process
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