3907607

Information

• Patent Grant
• 3907607

• References
• Source

• Patent Number

  3,907,607

• Date Filed

  Not available

• Date Issued

  Tuesday, September 23, 1975
  49 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C23C16/545 - for coating elongated substrates
  • C30B31/106 - Continuous processes
  • C30B31/12 - Heating of the reaction chamber
  • C30B31/16 - Feed and outlet means for the gases Modifying the flow of the gases
  • C30B33/005 - Oxydation
  • H01L21/02129 - the material being boron or phosphorus doped silicon oxides
  • H01L21/02238 - silicon in uncombined form
  • H01L21/02255 - formation by thermal treatment
  • H01L21/02271 - deposition by decomposition or reaction of gaseous or vapour phase compounds
  • H01L21/223 - using diffusion into or out of a solid from or into a gaseous phase
  • H01L21/31662 - of silicon in uncombined form
  • H01L23/29 - characterised by the material
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • Y10S148/006 - Apparatus
  • Y10S148/051 - Etching
  • Y10S438/907 - Continuous processing

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 118 - Coating apparatus
  • 148 - Metal treatment
  • 216 - Etching a substrate: processes
  • 257 - Active solid-state devices
  • 427 - Coating processes