The disclosure relates to an antenna device.
In modern life, the application of wireless communication technology has become ubiquitous. Providing wireless local area network has become a necessary facility in important cities or public spaces, and many people have even established their own wireless networks at home. With the advancement of wireless communication technology, many manufacturers are committed to developing antenna devices with improved performance. Currently, the antenna device has a complex internal circuit design, involving various different signals. If the distance between signal lines is too close, signals will easily interfere with each other, thereby affecting the performance of the antenna device.
At least one embodiment of the disclosure provides an antenna device, including a transparent substrate, a thin film circuit structure, a redistribution structure, multiple chips, and multiple antenna electrodes. The thin film circuit structure is located above the first surface of the transparent substrate and includes a first thin film conductive layer. The redistribution structure is located on the thin film circuit structure and includes a first redistribution layer. A thickness of the first thin film conductive layer is less than a thickness of the first redistribution layer. The chips are bonded to the redistribution structure. The antenna electrodes are located above a second surface of the transparent substrate opposite to the first surface. Each antenna electrode overlaps a corresponding one of the chips.
In the embodiment, the antenna device 1A includes the printed circuit boards 510 and 520 and the flexible circuit boards 610, 620, and 630. The printed circuit boards 510 and 520 are electrically connected to a redistribution structure (not shown in
In some embodiments, the modulator/demodulator is a device for encoding a digital signal and then modulating the digital signal to an analog signal for transmission, and demodulating the received analog signal and then decoding the analog signal to be converted into a digital signal.
The printed circuit boards 510 and 520 are electrically connected to the array of the antenna units 10A through the flexible circuit boards 610, 620, and 630.
The chip 410A includes a beamformer integrated circuit (BFIC) or other active/passive elements. The chip 410A may perform transmit beamforming (TX) and/or receive beamforming (RX).
In the embodiment, the antenna device 1A further includes an up/down converter (UDC) 430. The up/down converter 430 may be a chip connected to the redistribution structure on the transparent substrate 100 or a circuit directly manufactured on the transparent substrate 100. The printed circuit board 510 is electrically connected to the up/down converter 430 through the flexible circuit board 620 and the redistribution structure on the transparent substrate 100, and the up/down converter 430 is electrically connected to the chip 410A of the antenna unit 10A through the redistribution structure on the transparent substrate 100. For example, the printed circuit board 510 provides a signal with a relatively low frequency (for example, an intermediate frequency (IF) signal or a low frequency signal with a frequency below 10 GHz (for example, below 2 GHZ)), and the signal is transmitted to the up/down converter 430 via the flexible circuit board 620, and the signal frequency is then increased to become a radio frequency signal with a high frequency (for example, 10 to 300 GHz) by the up/down converter 430. In the embodiment, since the up/down converter 430 is disposed above the transparent substrate 100 instead of being disposed on the printed circuit board 510, there is no need to dispose an SMA connector for transmitting the radio frequency signal on the transparent substrate 100.
The antenna device 1A includes a transparent region TR and a non-transparent region NTR. In some embodiments, the printed circuit boards 510 and 520 are disposed in the non-transparent region NTR, and the antenna electrode 110 and the chip 410A of the antenna unit 10A are disposed in the transparent region TR. In some embodiments, the up/down converter 430 is also disposed in the transparent region TR. In some embodiments, the antenna device 1A may be, for example, applied to a window of a vehicle (for example, a sunroof of a car), a window of a building, etc.
The antenna electrode 110 is disposed on the first surface S1 of the transparent substrate 100.
A ground electrode 132 is disposed on the second surface S2 of the transparent substrate 110. In the embodiment, the ground electrode 132 has at least one opening 132h, and each opening 132h has a bonding structure 134. The bonding structure 134 is electrically connected to the antenna electrode 110 through a substrate conductive via 120. Therefore, an antenna signal of the antenna electrode 110 may be transmitted through the bonding structure 134 and the substrate conductive via 120. In other embodiments, the substrate conductive via 120 may be omitted, and the antenna signal of the antenna electrode 110 is transmitted by radiation between the antenna electrode 110 and a driving electrode (not shown) overlapping the opening 132h.
In some embodiments, the width of the ground electrode 132 is greater than or equal to the width of the antenna electrode 110.
In some embodiments, the materials of the antenna electrode 110, the ground electrode 132, the bonding structure 134, and the substrate conductive via 120 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), Nickel (Ni), tungsten (W), conductive oxide (for example, indium tin oxide, indium zinc oxide, etc.), other suitable materials, or combinations of the above materials.
In some embodiments, the manner of forming the substrate conductive via 120 includes a glass modification process and a process of filling a conductive material. For example, the glass modification process includes first forming a through hole on the transparent substrate 100 with a laser, and then enlarging the through hole using a wet etching process to form a via extending from the first surface S1 to the second surface S2. Finally, the conductive material is filled into the via to form the substrate conductive via 120.
In some embodiments, the method of forming the antenna electrode 110, the ground electrode 132, the bonding structure 134, and the substrate conductive via 120 includes first forming a seed layer on the first surface S1 and the second surface S2 of the transparent substrate 100 and in the via of the transparent substrate 100 through sputtering, chemical plating, or other suitable processes. Then, a metal layer is formed on the seed layer using an electroplating process. The formed seed layer and metal layer may be patterned through a photolithography process and an etching process to obtain the antenna electrode 110, the ground electrode 132, and the bonding structure 134. In other embodiments, the seed layer may be omitted.
The buffer layer 140 is located on the transparent substrate 100, the ground electrode 132, and the bonding structure 134. In some embodiments, the buffer layer 140 includes a transparent material, such as an organic material (for example, polyimide, polyethylene terephthalate, epoxy resin, etc.), an inorganic material (for example, silicon nitride, silicon oxide, etc.), or a combination of the above materials. In some embodiments, the thicknesses of the antenna electrode 110, the ground electrode 132, and the bonding structure 134 are 2 μm to 10 μm. In order to achieve planarization, the thickness of the buffer layer 140 is preferably 2 μm to 15 μm, and the thickness of the buffer layer 140 is not less than the thickness of the ground electrode 132. For example, the thickness of the buffer layer 140 is 1.3 times the thickness of the ground electrode 132. In order to achieve the thickness to achieve planarization, the buffer layer 140 is preferably made of an organic material.
A thin film circuit structure 200 is located above the ground electrode 132 and the bonding structure 134. In the embodiment, the thin film circuit structure 200 is located on the buffer layer 140. In some embodiments, the overall thickness of the thin film circuit structure 200 is less than 10 μm.
The thin film circuit structure 200 includes a first thin film conductive layer 210, a first dielectric layer 220, a second thin film conductive layer 230, and a second dielectric layer 240 that are sequentially deposited. In some embodiments, at least one contact portion PH1 of the second thin film conductive layer 230 passes through the first dielectric layer 220 and is electrically connected to the first thin film conductive layer 210. In some embodiments, the thin film circuit structure 200 may also include more conductive layers and dielectric layers. The disclosure does not limit the number of conductive layers and dielectric layers in the thin film circuit structure 200.
In some embodiments, the materials of the first thin film conductive layer 210 and the second thin film conductive layer 230 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), nickel (Ni), tungsten (W), conductive oxides (for example, indium tin oxide, indium zinc oxide, etc.), other suitable materials, or combinations of the above materials. Each of the first thin film conductive layer 210 and the second thin film conductive layer 230 has a single-layer structure or a multi-layer structure. For example, each of the first thin film conductive layer 210 and the second thin film conductive layer 230 has a molybdenum/aluminum/molybdenum laminate structure, a titanium/aluminum/titanium laminate structure, or a laminate structure composed of other conductive materials.
In some embodiments, the materials of the first dielectric layer 220 and the second dielectric layer 240 include organic polymers (for example, polyimide, polyethylene terephthalate, etc.), inorganic materials (for example, silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, zirconium oxide, hafnium oxide), other suitable materials, or combinations of the above materials.
In some embodiments, before forming the second thin film conductive layer 230, an opening exposing the first thin film conductive layer 210 is formed in the first dielectric layer 220 using a photolithography process and an etching process, and the second thin film conductive layer 230 is then deposited in the opening to form the contact portion PH1 of the second thin film conductive layer 230, so that the second thin film conductive layer 230 contacts the first thin film conductive layer 210.
A redistribution structure 300 is located on the thin film circuit structure 200. In the embodiment, the redistribution structure 300 is located on the second dielectric layer 240. In some embodiments, the overall thickness of the redistribution structure 300 is 14 μm to 150 μm.
The redistribution structure 300 includes a first redistribution layer 310, an insulating layer 320, and a second redistribution layer 330 that are sequentially deposited. In some embodiments, at least one contact portion PH2 of the first redistribution layer 310 passes through the second dielectric layer 240 and is electrically connected to the second thin film conductive layer 230. In some embodiments, the first redistribution layer 310 and/or the second redistribution layer 330 are electrically connected to the ground electrode 132 and the bonding structure 134 through a conductive via LH1. The conductive via LH1 passes through the thin film circuit structure 200 and the buffer layer 140, and optionally passes through the insulating layer 320. In some embodiments, the second redistribution layer 330 is electrically connected to the first redistribution layer 310 through at least one conductive via LH2 in the insulating layer 320. The redistribution structure 300 may also include more conductive layers and insulating layers. The disclosure does not limit the number of conductive layers and insulating layers in the redistribution structure 300.
In some embodiments, the materials of the first redistribution layer 310 and the second redistribution layer 330 include copper (Cu), aluminum (Al), gold (Au), silver (Ag), titanium (Ti), nickel (Ni), tungsten (W), conductive oxides (for example, indium tin oxide, indium zinc oxide, etc.), other suitable materials, or combinations of the above materials. In some embodiments, each of the first redistribution layer 310 and the second redistribution layer 330 includes a seed layer and a metal layer formed thereon. The seed layer is, for example, formed by sputtering, chemical plating, or other suitable methods, and the metal layer is formed by electroplating. In some embodiments, the seed layer may be omitted.
In some embodiments, the material of the insulating layer 320 includes an organic material (for example, polyimide, polyethylene terephthalate, epoxy resin, etc.), an inorganic material (for example, silicon nitride, silicon oxide, etc.), or a combination of the above materials. In some embodiments, the method of forming the insulating layer 320 includes pasting a dry film on the first redistribution layer 310 or coating a liquid organic material (for example, a liquid polyimide (PI) material) on the first redistribution layer 310.
In some embodiments, the insulating layer 320 has high transmittance and low dissipation factor (Df). For example, the transmittance of the insulating layer 320 for light rays with wavelengths of 400 nm to 800 nm is greater than or equal to 90%. In some embodiments, the dielectric constant (Dk) of the insulating layer 320 is lower than 4, and the dissipation factor is lower than 0.004.
In some embodiments, the first redistribution layer 310 of the redistribution structure 300 is configured to be used to transmit a ground signal, and the second redistribution layer 330 is configured to be used to transmit a chip power signal and a radio frequency (RF) signal (for example, an RF input signal (RF_in)). In some embodiments, the first thin film conductive layer 210 and the second thin film conductive layer 230 of the thin film circuit structure 200 include a digital signal line and an analog signal line, and the digital signal line and the analog signal line are respectively configured to be used to transmit a digital signal and an analog signal for controlling a circuit in the chip 410A or the thin film circuit structure 200. Since the operating frequencies of the digital signal and the analog signal transmitted in the thin film circuit structure 200 are low, even if the film thicknesses of the first thin film conductive layer 210, the first dielectric layer 220, the second thin film conductive layer 230, and the second dielectric layer 240 in the thin film circuit structure 200 are thin, there will not be significant signal loss. In comparison, since the redistribution structure 300 is used to transmit an RF signal with a high frequency, the insulating layer 320 in the redistribution structure 300 needs to have a thicker thickness. Therefore, the thickness of the insulating layer 320 is greater than the thickness of each of the first dielectric layer 220 and the second dielectric layer 240. In some embodiments, the thickness of the insulating layer 320 is 10 μm to 60 μm. In some embodiments, the thickness of each of the first dielectric layer 220 and the second dielectric layer 240 is 0.03 μm to 1 μm, such as 0.5 μm to 1 μm or 0.7 μm to 1 μm. In some embodiments, the thickness of each of the first thin film conductive layer 210 and the second thin film conductive layer 230 is less than the thickness of each of the first redistribution layer 310 and the second redistribution layer 330. In some embodiments, the thickness of each of the first thin film conductive layer 210 and the second thin film conductive layer 230 is 0.01 μm to 0.7 μm, such as 0.01 μm to 0.3 μm or 0.01 μm to 0.05 μm. In some embodiments, the thickness of each of the first redistribution layer 310 and the second redistribution layer 330 is 2 μm to 10 μm.
In some embodiments, before forming the first redistribution layer 310, an opening exposing the second thin film conductive layer 230 is formed in the second dielectric layer 240 using a photolithography process and an etching process, and the first redistribution layer 310 is then deposited in the opening to form the contact portion PH2 of the first redistribution layer 310, so that the first redistribution layer 310 contacts the second thin film conductive layer 230.
In some embodiments, before forming the first redistribution layer 310 and/or before forming the second redistribution layer 330, a laser drilling process is performed. For example, the laser drilling process is performed to form a laser hole, and the first redistribution layer 310 or the second redistribution layer 330 is then filled in the laser hole to form the conductive via LH1 or the conductive via LH2. In the embodiment, the conductive via LH2 passes through the insulating layer 320, and the second redistribution layer 330 contacts the first redistribution layer 310 through the conductive via LH2. The conductive via LH1 passes through the insulating layer 320, the second dielectric layer 240, the first dielectric layer 220, and the buffer layer 140, and the second redistribution layer 330 contacts the ground electrode 132 and the bonding structure 134 through the conductive via LH1. In the embodiment, since the forming manner of the contact portions PH1 and PH2, the forming manner of the conductive vias LH1 and LH2, and the forming manner of a sidewall of the substrate conductive via 120 are different, the three have different side wall inclination angles.
The chip 410A and the up/down converter 430 are bonded to the second redistribution layer 330. Each antenna electrode 110 overlaps a corresponding one of the chips 410A. In some embodiments, the width of the antenna electrode 110 is greater than or equal to the width of the chip 410A.
In some embodiments, the chip 410A and the up/down converter 430 are respectively bonded to the second redistribution layer 330 through conductive connecting structures 412 and 432. The conductive connecting structures 412 and 432 are, for example, solder, conductive glue, or other suitable structures. In some embodiments, electroless nickel immersion gold (ENIG), immersion silver plating, or other processing may be performed on the surface of the second redistribution layer 330 to improve the yield of a chip bonding process. In some embodiments, before the chip bonding process, an organic material such as organic solderability preservative (OSP) may be formed on the second redistribution layer 330 and may protect a metal pad from rusting (for example, vulcanization or oxidation) due to contact with air to improve the yield of the chip bonding process.
An underfill material 420 is formed between the chip 410A and the second redistribution layer 330 and between the up/down converter 430 and the second redistribution layer 330. In some embodiments, the underfill material 420 may include a thermal interface material (TIM) to facilitate heat dissipation from the chip 410A and the up/down converter 430. For example, the thermal conductivity of the underfill material 420 is greater than 0.3 W/m K.
In the embodiment, compared with a single chip corresponding to multiple antenna units, one chip 410A corresponding to one antenna unit 10A may disperse the heat source, so as to reduce the temperature of the antenna device 1A. Therefore, there is no need to install an additional heat dissipation structure on the chip 410A. In some embodiments, when the output power of the chip 410A is 60 mW and 70 mW, the surface temperatures of the chip 410A are respectively lower than 82 degrees Celsius and lower than 85.5 degrees Celsius.
Through omitting the heat dissipation structure, the weight and the thickness of the antenna device 1A may be significantly reduced while maintaining light transmittance, so that the antenna device 1A may be more easily combined with the vehicle sunroof.
In some embodiments, the chip 410A includes a beamformer integrated circuit (BFIC) or other active/passive elements. In some embodiments, the beamformer integrated circuit includes a variable gain amplifier (VGA), a phase shifter (PS), a signal control and memory circuit, a power amplifier (PA), and/or a low noise amplifier (LNA), etc. In some embodiments, a circuit including an active element may be disposed in the thin film circuit structure 200, so as to reduce circuits required to be disposed in the chip 410A, and therefore, the size of the chip 410A can be reduced. For example, the signal control and memory circuit in the beamformer integrated circuit may be disposed in the thin film circuit structure 200. In some embodiments, through each antenna unit 10A including one BFIC, the signal path between the BFIC and the antenna electrode 110 may be shortened. If one BFIC provides signals to multiple antenna electrodes 110, a longer signal path will need to be configured, thereby reducing the area of a light transmission region of the antenna device. In other words, in the embodiment, through each antenna unit 10A including one chip 410A, the area of the light transmission region LT of the antenna device 1A may be increased.
The printed circuit board 510 is electrically connected to the redistribution structure 300 through the flexible circuit board 620. For example, the flexible circuit board 620 is bonded to a pad P of the second redistribution layer 330 through solder, conductive glue, or other suitable structures. The up/down converter 430 is electrically connected to the printed circuit board 510 and the chip 410A. The up/down converter 430 may be used to convert a signal with a relatively low frequency from the printed circuit board 510 into an RF signal with a high frequency, and the RF signal with the high frequency is further transmitted to the chip 410A for processing.
In some embodiments, the thin film circuit structure 200 and the redistribution structure 300 are configured to be used to transmit various signals, such as ground signals (for example, AGND, DGND, RF_GND, etc.), power signals (for example, AVDD, DVDD, etc.), RF signals, RF enable signals (RF_en), reference voltage signals (Vref), bias voltage regulation signals (Rbias), circuit control signals (for example, CS, CLK, SDI, SDO, PDI, etc.), and antenna signals (for example, horizontally polarized electric field antenna signals (RF_out_H), vertically polarized electric field antenna signals (RF_out_V), etc.). In some embodiments, at least part of the power signals and the circuit control signals are provided by the printed circuit board 510.
In some embodiments, the usage descriptions and the main transmission layers of various signals are shown in Table 1.
In some embodiments, at least one of the first redistribution layer 310 and the second redistribution layer 330 includes one or more radio frequency signal lines 334, and the radio frequency signal line 334 is configured to transmit the radio frequency signal to the chip 410A. For example, each radio frequency signal line 334 is configured to transmit the radio frequency signals to the chips 410A arranged in a row through a serial feed manner (as shown in
In some embodiments, at least one of the first thin film conductive layer 210 and the second thin film conductive layer 230 includes one or more signal lines 211 and 221 for transmitting low frequency signals. The low frequency signals may be analog signals or digital signals and include power signals (for example, DVDD, etc.), radio frequency enable signals (RF_en), reference voltage signals (Vref), bias regulation signals (Rbias), and circuit control signals (for example, CS, CLK, SDI, SDO, PDI, etc.), etc. In some embodiments, the signal lines 211 and 221 may also be referred to as analog signal lines and/or digital signal lines. The thickness of the radio frequency signal line 334 is greater than the thickness of the signal line 211, 221.
In the disclosure, the low frequency signals refer to signals operating at frequencies below 500 MHz, while high frequency signals refer to signals operating at frequencies above 500 MHz (for example, 10 GHz to 300 GHz or 10 GHz to 500 GHz). The high frequency signals include, for example, RF signals and antenna signals (RF_out).
In some embodiments, a wavelength 2 is the wavelength of a wireless signal that the antenna unit 10A intends to receive or send in the air. A pitch d of the antenna units 10A is approximately one-half of 2. The range of the array of the antenna units 10A may be defined by two parallel lines V1 and V2 and two other parallel lines H1 and H2. The horizontal lines H1 and H2 are perpendicular to the lines V1 and V2.
Please refer to
In some embodiments, the flexible circuit board 610 is used to transmit a digital signal and/or a power signal provided by the printed circuit board to the chip 410A of the antenna unit 10A. The digital signal and/or the power signal is, for example, transmitted by the thin film circuit structure 200 (for example, the digital signal line and/or the power signal line in the thin film circuit structure 200).
The flexible circuit board 620 is used to transmit an intermediate frequency (IF) or a low frequency signal provided by the printed circuit board to the redistribution structure and the up/down converter 430. The signal is processed by the up/down converter 430 and then converted into an RF signal, and transmitted to the chip 410A of the antenna unit 10A through the redistribution structure. The radio frequency signal is, for example, transmitted by the second redistribution layer 330 of the redistribution structure 300 (for example, the radio frequency signal line in the second redistribution layer 330).
In some embodiments, the flexible circuit boards 610 and 620 are disposed between the lines V1 and V2, and the line H1 defines a side of the array of the antenna units 10A close to the flexible circuit boards 610 and 620. In some embodiments, the radio frequency signal line is designed to have equal impedance from the up/down converter 430 to the line H1 (that is, every point from the up/down converter 430 to the line H1 has equal impedance). In some embodiments, the radio frequency signal line may be distributed from the up/down converter 430 to different antenna units 10A optionally via one or more power dividers (not shown).
The flexible circuit board 630 is used to transmit a power signal (for example, AVDD) and a ground signal (for example, AGND) provided by the printed circuit board to the chip 410A of the antenna unit 10A. For example, the power signal AVDD is transmitted by the second redistribution layer 330 of the redistribution structure 300 (for example, the power signal line in the second redistribution layer 330). The ground signal AGND is transmitted by the first redistribution layer 310 of the redistribution structure 300 (for example, the ground signal line in the second redistribution layer 330).
In some embodiments, in the array of the antenna units 10A (that is, within the range between the line H1 and the line H2), the power signal line, the digital signal line, and the radio frequency signal line extend along the horizontal direction.
Please refer to
When the chip 410A adopts the FDD technology, transmit beamforming TX and receive beamforming RX are, for example, executed through different antenna unit arrays, wherein the chip 410A in one of the antenna unit arrays executes the transmit beamforming TX of the radio frequency signal, and the chip 410A in another antenna unit array executes the receive beamforming RX.
When the chip 410A adopts the TDD technology, when executing the transmit beamforming TX, the radio frequency signal line 334 provides a radio frequency signal to the chip 410A. When executing the receive beamforming RX, the chip 410A provides a radio frequency signal to the radio frequency signal line 334. In the TDD technology, the chips 410A in the same antenna unit array execute the transmit beamforming TX and the receive beamforming RX at different times.
A signal line Data_1 to a signal line Data_N are respectively electrically connected to the antenna units 10A in the first row to the antenna units 10A in the Nth row (for example, the chip 410A of the antenna unit 10A). A signal line CLK_1 to a signal line CLK_N are respectively electrically connected to the antenna units 10A in the first row to the antenna units 10A in the Nth row (for example, the chip 410A of the antenna unit 10A). A signal line CS_1 to a signal line CS_N are respectively electrically connected to the antenna units 10A in the first row to the antenna units 10A in the Nth row (for example, the chip 410A of the antenna unit 10A).
In some embodiments, the signal line Data_1 to the signal line Data_N are used to transmit at least one of circuit control signals SDI and SDO. The signal line CLK_1 to the signal line CLK_N are used to transmit a circuit control signal CLK. The signal line CS_1 to the signal line CS_N are used to transmit a circuit control signal CS.
In the embodiment, according to step 1, step 2, step 3 . . . to step M, data writing/selection is sequentially performed on the M columns of the antenna units 10A, which may be achieved through the circuit control signal CLK (that is, a clock signal) transmitted by the signal line CLK_1 to the signal line CLK_N. For example, the antenna units 10A in the first column are simultaneously turned on using the signal line CLK_1 to the signal line CLK_N, so that after the signal line Data_1 to the signal line Data_N transmit signals to the antenna units 10A in the first column, the signal line CLK_1 to the signal line CLK_N then transmit signals to the antenna units 10A in the second column, and the antenna units 10A in the second column are turned on, so that signal line Data_1 to the signal line Data_N transmit signals to the antenna units 10A in the second column.
After executing step M, the antenna array is turned on using a clock signal provided by another signal line CLK_M+1 (not shown) and a radio frequency enable signal RF_en provided by a radio frequency enable signal line (not shown), and radiation is generated.
In some embodiments, the circuit control signals are transmitted to all the chips 410A in a serial feed manner. The circuit control signals transmitted to the chips 410A include, for example, SDI, SDO, CLK, CS, etc.
In some embodiments, the circuit control signal PDI, the radio frequency input signal RF_in, the radio frequency enable signal RF_en, the power signal AVDD, the power signal DVDD, the ground signal AGND, and the ground signal RF_GND are input to all the chips 410A using a juxtaposed manner.
In the embodiment, the ground signals (for example, AGND, RF_GND, etc.), the power signals (for example, AVDD, DVDD, etc.), the RF signals, the radio frequency enable signals (RF_en), the reference voltage signals (Vref), and various circuit control signals (for example, CS, CLK, SDI, SDO, PDI, etc.) are connected to the chips 410A.
In the embodiment, the circuit control signal is provided to a signal control circuit module SCC and a memory circuit module MC in the chip 410A. The signal control circuit module SCC provides signals to a variable gain amplifier and phase shifter module VGPS.
In the embodiment, a radio frequency signal RF signal is processed by a power divider and then provided to the variable gain amplifier and phase shifter module VGPS. The variable gain amplifier and phase shifter module VGPS provides signals to a power amplifier and/or low noise amplifier module PALNA.
The power amplifier and/or low noise amplifier module PALNA provides a first antenna signal (for example, the horizontally polarized electric field antenna signal (RF_out_H)) and a second antenna signal (for example, the vertically polarized electric field antenna signal (RF_out_V)) to the antenna electrode 110.
In some embodiments, other passive device PD, such as an inductor, a capacitor, and/or a resistor, may be additionally disposed in the antenna unit 10A. The passive device PD is connected to the power amplifier and/or low noise amplifier module PALNA of the chip 410A.
Please refer to
A thin film circuit structure 200C includes multiple thin film transistors T. For example, in the embodiment, a gate dielectric layer 250 is further included between the first dielectric layer 220 and the buffer layer 140. Multiple semiconductor layers SM are also included between the gate dielectric layer 250 and the buffer layer 140.
The first thin film conductive layer 210 is located on the gate dielectric layer 250 and includes a gate G overlapping the semiconductor layer SM. The first dielectric layer 220 covers the gate G. The second thin film conductive layer 230 is located on the first dielectric layer 220 and includes multiple sources/drains SD. In the embodiment, each thin film transistor T includes a corresponding semiconductor layer SM, a corresponding gate G, and a corresponding source/drain SD. In the embodiment, the thin film transistor T is a top gate thin film transistor, but the disclosure is not limited thereto. In other embodiments, the thin film transistor T is a bottom gate thin film transistor, a double gate thin film transistor, or other types of thin film transistors.
The thin film transistor T is electrically connected to the chip 410C and the signal line 221 (for example, a digital signal line) in the thin film circuit structure 200C. The thickness of the signal line 221 is less than the thickness of the radio frequency signal line 334. The signal line 221 is, for example, used to transmit any of the digital signals described in the foregoing embodiment.
In the embodiment, the antenna device 1D includes multiple antenna units 10C arrayed on a transparent substrate 100.
In some embodiments, the flexible circuit board 610 is used to transmit a digital signal and/or a power signal provided by the printed circuit board to the chip 410C of the antenna unit 10C. The digital signal and/or the power signal is, for example, transmitted by the thin film circuit structure 200 (for example, the digital signal line and/or the power signal line in the thin film circuit structure 200). In addition, the flexible circuit board 610 is also electrically connected to the gate driving circuit DR, and a clock signal (or a gate signal) is provided to the antenna unit 10C through the gate driving circuit DR and multiple signal lines CLK′ (also referred to as clock signal lines or gate signal lines).
In some embodiments, the radio frequency signal line is distributed from the up/down converter 430 to the antenna units 10C in different rows optionally via one or more power dividers SW. The radio frequency signal line is designed to have equal impedance from the power divider SW to the line H1 (that is, every point from the power divider SW to the line H1 has equal impedance).
The signal line Data_1 to the signal line Data_N are respectively electrically connected to the antenna units 10C in the first row to the antenna units 10C in the Nth row (for example, the signal control and memory circuit of the antenna unit 10C).
In some embodiments, the signal line Data_1 to the signal line Data_N are used to transmit at least one of the circuit control signals SDI and SDO.
The signal line CLK_1 to the signal line CLK_M are respectively electrically connected to the antenna unit 10C in the first column to the antenna units 10C in the Mth column (for example, the signal control and memory circuit of the antenna unit 10C).
In the embodiment, according to step 1, step 2, step 3 . . . to step M, data writing/selection is sequentially performed on the M rows of the antenna units 10C, which may be achieved through clock signals (which may be gate signals for controlling transistors in some embodiments) transmitted by the signal line CLK_1 to the signal line CLK_M. The signal line CLK_1 to the signal line CLK_M are electrically connected to the gate driving circuit DR (please refer to
After executing step M, the antenna array is turned on using a clock signal provided by another signal line CLK_M+1 (not shown) and the radio frequency enable signal RF_en provided by the radio frequency enable signal line (not shown), and radiation is generated.
In some embodiments, the circuit control signals are transmitted to the antenna units 10C in the same row along the horizontal direction. The circuit control signals include, for example, SDI, SDO, CLK, CS, etc.
The clock signals (which may also be referred to as gate signals in some embodiments) are input to the antenna units 10C in the same column along the vertical direction (for example, the signal control and memory circuit of the antenna unit 10C or the chip 410C).
In some embodiments, the circuit control signal PDI, the radio frequency enable signal RF_en, the radio frequency input signal RF_in, the power signal AVDD, the power signal DVDD, the ground signal AGND, and the ground signal RF_GND are input to all the chips 410C using a juxtaposed manner.
In the embodiment, ground signals (for example, AGND, RF_GND, etc.), power signals (for example, AVDD, etc.), RF signals, and reference voltage signals (Vref) are connected to the chip 410C, and various circuit control signals (for example, SDI, SDO, PDI, etc.), radio frequency enable signals (RF_en), and power signals (for example, DVDD, etc.) are connected to the phase control module PC. The signal lines CLK′ are respectively connected to the phase control modules PC of the antenna units 10C in different columns.
In the embodiment, the circuit control signal is provided to the phase control module PC. The phase control module PC provides the signal to the chip 410C, such as the variable gain amplifier and phase shifter module VGPS in the chip 410C.
In the embodiment, the radio frequency signal RF signal is processed by a divider and then provided to the variable gain amplifier and phase shifter module VGPS. The variable gain amplifier and phase shifter module VGPS provides the signal to the power amplifier and/or low noise amplifier module PALNA.
The power amplifier and/or low noise amplifier module PALNA provides the first antenna signal (for example, the horizontally polarized electric field antenna signal (RF_out_H)) and the second antenna signal (for example, the vertically polarized electric field antenna signal (RF_out_V)) to the antenna electrode 110.
In some embodiments, other passive device PD, such as an inductor, a capacitor, and/or a resistor, may be additionally disposed in the antenna unit 10C. The passive device is the power amplifier and/or low noise amplifier module PALNA connected to the chip 410C.
Please refer to
Signal lines D1 to D5 are connected to the first switching elements T1. In some embodiments, each of the signal lines D1 to D5 is connected to corresponding two of the first switching elements T1. A horizontal polarization/vertical polarization selection line HVS is electrically connected to a gate of the first switching element T1, and provides a gate signal to the gate of the first switching element T1 to control the on and off of the first switching element T1. In some embodiments, among the 10 first switching elements T1 shown in
A radio frequency enable signal line is electrically connected to a gate of the second switching element T2 and provides a radio frequency enable signal RF_en to the gate of the second switching element T2 to control the on and off of the second switching element T2.
In some embodiments, the horizontal polarization/vertical polarization selection line HVS, the radio frequency enable signal line, the signal lines D1 to D5, the first switching element T1, the first memory circuit MC1, the second switching element T2, and a second memory circuit M1 are disposed in the thin film circuit structure 200C (please refer to
In some embodiments, a circuit control signal CLK (that is, a clock signal) provided by the signal line CLK′ is used to control the storage of the first memory circuit MC1, and the first memory circuit MC1 may be used to preload data to be written next. The radio frequency enable signal RF_en is used to control the second memory circuit MC2, and the second memory circuit is used to maintain a current state of radiation. The signal line CLK′ of
In some embodiments, the circuit layout of each of the first memory circuits MC1 and the second memory circuits MC2 is as shown in
In the embodiment, since the antenna device is installed on a vehicle, a vehicle computer system may provide a signal to the modulator/demodulator module 730, and the vehicle power system may provide a direct current power to the power module 760.
Data/circuit control signals are transmitted between the global positioning system/gravity meter module 710 and the field programmable logic gate array module 720, between the global positioning system/gravity meter module 710 and the modulator/demodulator module 730, between the field programmable logic gate array module 720 and the digital to analog converter 740, and between the field programmable logic gate array module 720 and the analog to digital converter 750.
In some embodiments, the field programmable logic gate array module 720 may perform digital signal processing and timing management. The field programmable logic gate array module 720 may transmit data to the digital to analog converter 740 in the form of digital signals or receive data from the analog to digital converter 750 in the form of digital signals.
The power module 760 provides direct current signals to the field programmable logic gate array module 720, the modulator/demodulator module 730, the digital to analog converter 740, and the analog to digital converter 750. In addition, the power module 760 also provides direct current signals to the up/down converter 430 and the antenna unit 10C disposed in the transparent region TR. The direct current signals include, for example, ground signals (for example, AGND, DGND, RF_GND, etc.), power signals (for example, AVDD, DVDD, etc.), reference voltage signals (Vref), or other similar signals.
The transparent region TR of the antenna device includes the gate driving circuit DR, the up/down converter 430, a power divider SW1, and the antenna unit 10C. In the embodiment, the antenna unit 10C includes the chip 410C, the phase control module PC (for example, the signal control and memory circuit TC shown in
The up/down converter 430 receives an intermediate frequency signal from the digital to analog converter 740 or transmits an intermediate frequency signal to the analog to digital converter 750. In some embodiments, the frequency of the intermediate frequency signal is less than 10 GHz. The up/down converter 430 may convert an intermediate frequency signal into a radio frequency signal with a high frequency or convert a radio frequency signal with a high frequency into an intermediate frequency signal. In some embodiments, the frequency of the radio frequency signal is greater than or equal to 10 GHz.
The radio frequency signal is transmitted to the chip 410C via the power divider SW1 and is processed in the chip 410C. It must be noted here that the chip 410C in
The power divider SW2 distributes the radio frequency signal between the chip 410C and the antenna electrode 110. In some embodiments, the power divider SW2 may be integrated into the chip 410C or disposed in the thin film circuit structure 200C (please refer to
In the embodiment, the global positioning system/gravity meter module 710, the field programmable logic gate array module 720, the modulator/demodulator module 730, the digital to analog converter 740, the analog to digital converter 750, and the power module 760 are disposed in the non-transparent region NTR, but the disclosure is not limited thereto. In other embodiments, one or more of the global positioning system/gravity meter module 710, the field programmable logic gate array module 720, the modulator/demodulator module 730, the digital to analog converter 740, the analog to digital converter 750, and the power module 760 are disposed in the transparent region TR, that is, disposed above the transparent substrate 100, as shown in
The difference between an antenna device of
In an array composed of antenna units 10C-1, an up/down converter 430-1 provides a radio frequency signal to a chip 410C-1 and performs the transmit beamforming TX. An antenna 110-1 outputs a corresponding radiation signal. In some embodiments, a gate driving circuit DR1 provides a circuit control signal (for example, a gate signal or a clock signal) to a phase control module PC1, and the field programmable logic gate array module 720 provides a circuit control signal (for example, a clock signal) to the phase control module PC1. The phase control module PC1 outputs a circuit control signal to the chip 410C-1 and performs the transmit beamforming TX.
In the array composed of the antenna units 10C-2, an antenna 110-2 receives the corresponding radiation signal. A chip 410C-2 performs the receive beamforming RX. An up/down converter 430-2 receives a radio frequency signal from the chip 410C-2. In some embodiments, a gate driving circuit DR2 provides a circuit control signal (for example, a gate signal or a clock signal) to a phase control module PC2, and the field programmable logic gate array module 720 provides a circuit control signal (for example, a clock signal) to the phase control module PC2. The phase control module PC2 outputs a circuit control signal to the chip 410C-2 and performs the receive beamforming RX.
In some embodiments, the array composed of the antenna units 10C-1 and the array composed of the antenna units 10C-2 may be disposed in different areas on the same transparent substrate 100 or may be respectively disposed on two transparent substrates 100.
In summary, the antenna device of the disclosure includes the thin film circuit structure, and the thin film conductive layer in the thin film circuit structure may be used to transmit the circuit control signal. Since the thickness of the thin film conductive layer is thin, the overall thickness of the antenna device can be reduced. In addition, since each antenna unit includes the chip, the heat source of the antenna device can be dispersed.
Number | Date | Country | Kind |
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113126978 | Jul 2024 | TW | national |
113143748 | Nov 2024 | TW | national |
This application claims the priority benefit of U.S. provisional application Ser. No. 63/606,806, filed on Dec. 6, 2023, Taiwan application serial no. 113126978, filed on Jul. 18, 2024, and Taiwan application serial no. 113143748, filed on Nov. 14, 2024. The entirety of each of the above-mentioned patent applications is hereby incorporated by reference herein and made a part of this specification.
Number | Date | Country | |
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63606806 | Dec 2023 | US |