Claims
- 1. A composition for forming porous film, the composition comprising siloxane polymer and one or more quaternary ammonium salts represented by following formula (1) or (2):
- 2. The composition for forming porous film according to claim 1 wherein said siloxane polymer has a weight-average molecular weight of 10,000 to 1,000,000 using polyethylene as a standard.
- 3. A method for forming porous film comprising steps of applying said composition of claim 1 on a substrate to form a film and heating the film.
- 4. A porous film obtainable from said composition of claim 1.
- 5. An interlevel insulator film formable by said composition of claim 1.
- 6. A semiconductor device comprising internal porous film which is formable by
applying on a substrate a composition for forming porous film comprising siloxane polymer and one or more quaternary ammonium salts represented by following formula (1) or (2):[(R1)4N]+[R2X]− (1)Hk[(R1)4N]m+Yn− (2)wherein R1 independently represents a straight chain or branched alkyl or aryl group having 1 to 10 carbons which may have a substituent and R1s may be same or different; R2 represents a hydrogen atom or an straight chain or branched alkyl or aryl group having 1 to 10 carbons which may have a substituent; X represents CO2 OSO3 or SO3; Y represents SO4, SO3, CO3, O2C—CO2, NO3 or NO2; and k is 0 or 1, m is 1 or 2 and n is 1 or 2 in proviso that m=l, and n=2 requires k=0 and m=2, or k=1 and m=1; and heating.
- 7. The semiconductor device according to claim 6 wherein said siloxane polymer has a weight-average molecular weight between 10,000 and 1,000,000 using polyethylene as a standard.
- 8. The semiconductor device according to claim 6 wherein said porous film is between metal interconnections in a same layer of multi-level interconnects, or is between upper and lower metal interconnection layers.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2002-329124 |
Nov 2002 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATION
[0001] The present application claims priority to Japanese Patent Application No. 2002-329124, filed Nov. 13, 2002, the disclosure of which is incorporated herein by reference in its entirely.