Number | Date | Country | Kind |
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1-004999 | Jan 1989 | JPX | |
2-117544 | May 1990 | JPX |
This application is a continuation-in-part of a copending U.S. application Ser. No. 06/663,472 filed on Mar. 4, 1991 which is a continuation application of a U.S. application Ser. No. 07/462769 filed on Jan. 10, 1990, now patented as U.S. Pat. No. 4,998,788, the disclosure of the latter is hereby incorporated by reference.
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3761721 | Altshuler et al. | Sep 1973 | |
4532422 | Nomura et al. | Jul 1985 | |
4935625 | Hasegawa et al. | Jun 1990 | |
4950909 | Yokoto et al. | Aug 1990 | |
4998788 | Osakabe et al. | Mar 1991 |
Entry |
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Osakabe et al, "Observation of atomic steps by reflection electron holography", Japanese Journal of Applied Physics Letters, vol. 27, No. 9, Sep. 1988, pp. 1772-1774. |
Tonomura, "Applications of electron holography using a field-emission electron microscope," Journal of Electron Microscopy, vol. 33, No. 2, 1984, pp. 101-115. |
Missiroli et al, "Electron interferometry and interference electron microscopy", Journal of Physics E. Scientific Instruments, vol. 14, No. 6, 1981 pp. 649-653, 662, 664. |
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Number | Date | Country | |
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Parent | 462769 | Nov 1990 |
Number | Date | Country | |
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Parent | 663472 | Mar 1991 |