The present disclosure relates to a semiconductor packaging process, and more particularly, to an electronic package with a heat dissipation mechanism and a manufacturing method thereof.
With the vigorous development of the electronic industry, electronic products are gradually developing towards multi-functional and high-performance trends. There are many technologies currently used in the field of chip packaging, such as chip scale package (CSP), direct chip attached (DCA), or multi-chip module (MCM) and other flip-chip packaging modules.
However, in the conventional semiconductor package 1, the semiconductor chip 10 with a high computing function, such as a System-On-Chip (SoC), will generate a large amount of heat during operation. Therefore, when the semiconductor chips 10, 11 with different functions are integrated in the same encapsulation layer 12, the heat generated by the semiconductor chip 10 with high computing function will be concentrated in the encapsulation layer 12, thereby causing the encapsulation layer 12 to overheat and affect the operation of the semiconductor chip 11 in other forms (such as memory).
Therefore, how to overcome the problems of the above-mentioned prior art has become an urgent problem to be solved at present.
In view of the aforementioned shortcomings of the prior art, the present disclosure provides an electronic package, comprising: an encapsulation layer; a first electronic element embedded in the encapsulation layer; a second electronic element embedded in the encapsulation layer and spaced apart from the first electronic element; a circuit structure disposed on the encapsulation layer and electrically connected to the first electronic element and the second electronic element, wherein the circuit structure has a hollow area corresponding to the first electronic element; and a heat dissipation structure disposed in the hollow area and thermally connected to the first electronic element.
The present disclosure also provides a method of manufacturing an electronic package, comprising: embedding a first electronic element and a second electronic element in an encapsulation layer in a manner of being spaced apart from each other; forming a circuit structure on the encapsulation layer to electrically connect the circuit structure to the first electronic element and the second electronic element, wherein the circuit structure has a hollow area corresponding to the first electronic element; and disposing a heat dissipation structure in the hollow area to connect the heat dissipation structure to the first electronic element.
In the aforementioned electronic package and method, the heat dissipation structure includes a heat dissipation member disposed in the hollow area and a heat dissipation material filled in the hollow area. For example, the heat dissipation member is a metal frame. Alternatively, wherein the heat dissipation material is liquid metal.
In the aforementioned electronic package and method, the heat dissipation structure is in a shape of a plug and inserted into the hollow area.
In the aforementioned electronic package and method, the hollow area penetrates through the circuit structure.
In the aforementioned electronic package and method, the hollow area is free from penetrating through the circuit structure.
In the aforementioned electronic package and method, the heat dissipation structure is extended on the circuit structure.
In the aforementioned electronic package and method, the first electronic element is provided with a heat dissipation body corresponding to the hollow area. For example, the heat dissipation body is a heat sink.
It can be seen from the above that, in the electronic package of the present disclosure and the manufacturing method thereof, by the design of the hollow area of the circuit structure, the heat dissipation structure can thermally connect the first electronic element to enhance the heat dissipation effect of the first electronic element. Therefore, compared with the prior art, when the first electronic element has a high computing function, the heat energy generated during the operation of the first electronic element will be dissipated quickly to the outside via the heat dissipation structure to avoid the problem of affecting the operation of the second electronic element due to the overheating of the encapsulation layer.
The following describes the implementation of the present disclosure with examples. Those skilled in the art can easily understand other advantages and effects of the present disclosure from the content disclosed in this specification.
It should be understood that, the structures, ratios, sizes, and the like in the accompanying figures are used for illustrative purposes to facilitate the perusal and comprehension of the content disclosed in the present specification by one skilled in the art, rather than to limit the conditions for practicing the present disclosure. Any modification of the structures, alteration of the ratio relationships, or adjustment of the sizes without affecting the possible effects and achievable proposes should still be deemed as falling within the scope defined by the technical content disclosed in the present specification. Meanwhile, terms such as “on,” “above,” “upper,” “a,” “one” and the like are merely used for clear explanation rather than limiting the practicable scope of the present disclosure, and thus, alterations or adjustments of the relative relationships thereof without essentially altering the technical content should still be considered in the practicable scope of the present disclosure.
As shown in
The carrier 9 is a board body made of a semiconductor material (such as silicon or glass) or other board materials, on which an adhesive layer 90 and a release layer 91 are sequentially formed.
The first electronic element 20 is an active element, a passive element, a package structure, or a combination thereof, wherein the active element is such as a semiconductor chip, and the passive element is such as a resistor, a capacitor, or an inductor.
In an embodiment, the first electronic element 20 is a semiconductor chip in the form of a System-On-Chip (SoC), and the first electronic element 20 has an active surface 20a and an inactive surface 20b opposing the active surface 20a. A plurality of electrode pads are formed on the active surface 20a, wherein a conductive bump 200 is formed on each of the electrode pads, and the first electronic element 20 is bonded to the release layer 91 via the inactive surface 20b. For example, the conductive bump 200 is a metal pillar (such as a copper pillar), a solder material, or a combination thereof.
Furthermore, a heat dissipation body 25 can be provided on the active surface 20a of the first electronic element 20 according to requirements. For example, the heat dissipation body 25 is in the form of a heat sink (e.g., a heat dissipation sheet), and the shape of the heat dissipation body 25 can be designed according to requirements, such as various geometric shapes shown in
The second electronic element 21 is an active element, a passive element, a package structure, or a combination thereof, wherein the active element is such as a semiconductor chip, and the passive element is such as a resistor, a capacitor, or an inductor.
In an embodiment, the second electronic element 21 is a semiconductor chip in the form of a memory, and the second electronic element 21 has an active surface 21a and an inactive surface 21b opposing the active surface 21a. A plurality of electrode pads are formed on the active surface 21a, wherein a conductive bump 210 is formed on each of the electrode pads, and the second electronic element 21 is bonded to the release layer 91 via the inactive surface 21b. For example, the conductive bump 210 is a metal pillar (such as a copper pillar), a solder material, or a combination thereof.
It should be understood that, based on the form of a chip, the width of the first electronic element 20 is greater than the width of the second electronic element 21.
As shown in
In an embodiment, the encapsulation layer 22 is made of an insulating material, such as polyimide (PI), dry film, epoxy resin, molding compound, or other suitable packaging materials. For example, the encapsulation layer 22 is formed on the carrier 9 by lamination or molding.
Moreover, partial materials of the first surface 22a of the encapsulation layer 22 can be removed by a leveling process or a thinning process, so that the heat dissipation body 25, the conductive bumps 200 on the active surface 20a of the first electronic element 20, the conductive bumps 210 on the active surface 21a of the second electronic element 21 and the first surface 22a of the encapsulation layer 22 are coplanar, such that the heat dissipation body 25 and the conductive bumps 200, 210 (or the active surface 20a of the first electronic element 20 and the active surface 21a of the second electronic element 21) are exposed from the encapsulation layer 22. For example, when forming the encapsulation layer 22 on the carrier 9, the encapsulation layer 22 covers the active surface 20a of the first electronic element 20 and the active surface 21a of the second electronic element 21 and the conductive bumps 200, 210 thereon, and then partial materials of the encapsulation layer 22 are removed by grinding or cutting (partial materials of the heat dissipation body 25 and the conductive bumps 200, 210 can also be removed at the same time according to the requirements), so that the heat dissipation body 25 and the conductive bumps 200, 210 (or the active surface 20a of the first electronic element 20 and the active surface 21a of the second electronic element 21) are flush with the first surface 22a of the encapsulation layer 22.
It should be understood that the degree of thinning of the first surface 22a of the encapsulation layer 22 can be designed according to requirements, so that a heat dissipation body 25a protrudes from the first surface 22a of the encapsulation layer 22 (as shown in an electronic package 2a of
As shown in
In an embodiment, the circuit structure 23 comprises at least one insulating layer 230, a circuit layer 231 formed on the insulating layer 230, and a plurality of conductive blind vias 232 formed in the insulating layer 230 and electrically connected to the conductive bumps 200, 210 and the circuit layer 231, wherein the outermost insulating layer 233 can be used as a solder resist layer, and the outermost circuit layer 231 is exposed from the solder resist layer to be bonded to a plurality of conductive elements 24 containing solder materials. For example, the circuit structure 23 is formed by manufacturing a redistribution layer (RDL), wherein the material for forming the circuit layer 231 is copper, and the material for forming the insulating layer 230 is such as polybenzoxazole (PBO), polyimide (PI), prepreg (PP), or other dielectric materials.
Furthermore, at the innermost insulating layer 230, the conductive blind vias 232 surround the heat dissipation body 25, as shown in
Also, the hollow area S penetrates through the circuit structure 23. Alternatively, if the heat dissipation body 25a protrudes from the first surface 22a of the encapsulation layer 22, as shown in
As shown in
In an embodiment, the heat dissipation structure 26 includes a heat dissipation member 260 and a heat dissipation material 261, wherein the heat dissipation member 260 is like a metal frame, which is inserted into the hollow area S to contact the heat dissipation body 25 (or the active surface 20a of the first electronic element 20). For example, the heat dissipation member 260 includes a top sheet and a plurality of pillars connected to the top sheet. The shape of the top sheet of the heat dissipation member 260 can be designed according to requirements, such as various geometric shapes shown in
Furthermore, the heat dissipation member 260 is inserted into the hollow area S with a thinner pillar, so the heat dissipation material 261 can be filled into the hollow area S first to fill up the hollow area S, and then the heat dissipation member 260 can be inserted. For example, the heat dissipation material 261 may use liquid metal or other fluids (such as silver glue or copper paste) as a thermal interface material (TIM). Alternatively, in an electronic package 3a shown in
Also, in another embodiment, a heat dissipation structure 36 may also be a metal plug. In an electronic package 3b shown in
Further, in an electronic package 3c shown in
As shown in
As shown in
Therefore, in the manufacturing method of the present disclosure, by the design of the hollow area S of the circuit structure 23, the heat dissipation structure 26, 36 can thermally connect the active surface 20a of the first electronic element 20 to enhance the heat dissipation effect of the first electronic element 20. Therefore, compared with the prior art, when the first electronic element 20 has a high computing function, the heat energy generated during the operation of the first electronic element 20 will be dissipated quickly to the outside via the heat dissipation structure 26, 36 to avoid the problem of affecting the operation of the second electronic element 21 due to the overheating of the encapsulation layer 22.
The present disclosure further provides an electronic package 2, 2a, 3a, 3b, 3c, comprising: an encapsulation layer 22, a first electronic element 20 embedded in the encapsulation layer 22, a second electronic element 21 embedded in the encapsulation layer 22, a circuit structure 23 disposed on the encapsulation layer 22, and a heat dissipation structure 26, 36.
The second electronic element 21 is embedded in the encapsulation layer 22 in a manner of being spaced apart from the first electronic element 20.
The circuit structure 23 is electrically connected to the first electronic element 20 and the second electronic element 21, wherein the circuit structure 23 has a hollow area S corresponding to the first electronic element 20.
The heat dissipation structure 26, 36 is disposed in the hollow area S to thermally connect the first electronic element 20.
In one embodiment, the heat dissipation structure 26 includes a heat dissipation member 260, 360 disposed on the hollow area S and a heat dissipation material 261 filled in the hollow area S. For example, the heat dissipation member 260, 360 is a metal frame. Alternatively, the heat dissipation material 261 is liquid metal.
In one embodiment, the heat dissipation structure 36 is in the shape of a plug and is inserted into the hollow area S.
In one embodiment, the hollow area S penetrates through or is free from penetrating through the circuit structure 23.
In one embodiment, the heat dissipation structure 26, 36 is extended on the circuit structure 23.
In one embodiment, the first electronic element 20 is provided with a heat dissipation body 25, 25a corresponding to the hollow area S. For example, the heat dissipation body 25, 25a is a heat sink.
To sum up, in the electronic package of the present disclosure and the manufacturing method thereof, by the design of the hollow area of the circuit structure, the heat dissipation structure can thermally connect the first electronic element to enhance the heat dissipation effect of the first electronic element. Therefore, when the first electronic element has a high computing function, the heat energy generated during the operation of the first electronic element will be dissipated quickly to the outside via the heat dissipation structure to avoid the problem of affecting the operation of the second electronic element due to the overheating of the encapsulation layer.
The above embodiments are provided for illustrating the principles of the present disclosure and its technical effect, and should not be construed as to limit the present disclosure in any way. The above embodiments can be modified by one of ordinary skill in the art without departing from the spirit and scope of the present disclosure. Therefore, the scope claimed of the present disclosure should be defined by the following claims.
Number | Date | Country | Kind |
---|---|---|---|
112105031 | Feb 2023 | TW | national |