Number | Date | Country | Kind |
---|---|---|---|
5-251265 | Oct 1993 | JPX |
This is a continuation of application Ser. No. 08/319,730 filed Oct. 7, 1994, abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3753774 | Velolic | Aug 1973 | |
4458410 | Sugaki et al. | Jul 1984 | |
4498223 | Goldman et al. | Feb 1985 | |
4555301 | Gibson et al. | Nov 1985 | |
4701349 | Koyanagi et al. | Oct 1987 | |
4873205 | Critchlow et al. | Oct 1989 | |
4965213 | Blake | Oct 1990 | |
4966868 | Murali et al. | Oct 1990 | |
5344793 | Zeininger et al. | Sep 1994 |
Number | Date | Country |
---|---|---|
2-290018 | Nov 1990 | JPX |
3-46323 | Feb 1991 | JPX |
2214708 | Sep 1989 | GBX |
Entry |
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Ishibashi, K., et al., "Formation of Uniform . . . ", Japanese J. Appl. Phys. Pt. 1, Aug. 1985, 24(8), 912-917. |
Fathauer, R., et al., "Columnar Growth of . . . ", Thin Solid Film, vol. 184, Jan. 1990, pp. 335-342. |
Wolf, S, Silicon Processing, vol. 2, 1990, Lattice Press, pp. 546-547, 67-76. |
Hsia et al., J. Appl. Phys., vol. 70, No. 12, Dec. 15, 1991, p. 7580. |
W. P. Maszara, Appl. Phys. Lett., vol. 62, No. 9, Mar. 1, 1993, p. 962. |
Sumi et al., "New Silicidation Technology by SITOX (Silicidation Through Oxide) and Its Impact on Sub-half Micron MOS Devices", IEDM 90, pp. 249-252. |
Number | Date | Country | |
---|---|---|---|
Parent | 319730 | Oct 1994 |