Patent Application
20230197514
The present application is a non-provisional patent application claiming priority to European Patent Application No. EP 21215780.4, filed Dec. 17, 2021, the contents of which are hereby incorporated by reference.
The present invention relates to the field of integrated circuits, and more in particular to a metallization process for forming an integrated circuit.
There is a constant drive to scale down integrated circuits. This drive translates into a need for reducing the size of the standard cell used in integrated circuits. In this respect, the type of transistor used and the way metal track lines are packed are key factors. In particular, the poly pitch (i.e., the pitch of successive transistor gates), the metal pitch (i.e., the pitch of successive metal track lines), and the cell height can, in principle, be minimized. However, further minimization and scaling of the poly pitch becomes increasingly challenging.
The difficulties in further minimizing and scaling of the poly pitch have motivated recent attempts to reduce the cell height. As illustrated in
For these reasons, the cell height remains stuck at the “five-track” level, i.e., a cell height that can vertically accommodate five tracks to access the pins.
There is therefore a need in the art for new methods and systems to scale down integrated circuits.
The present invention provides systems or methods for forming an integrated circuit.
One embodiment relates to a method for forming an integrated circuit or an intermediate in the formation thereof. The method includes comprising the steps of:
Another embodiment provides for the production of a scaled-down integrated circuit. In particular, the disclosed embodiment makes it possible to construct a standard cell having a “four tracks” height where current technology only allows the production of a “five tracks” high standard cell. It is an advantage of embodiments of the present invention that they enable the production of a standard cell having a height corresponding to “four tracks” wherein the metal track lines are no longer present along the standard cell vertical axis, but well along its horizontal axis. This allows standard cells obtainable by embodiments of the present invention to be “four tracks” high while actually comprising more than four tracks.
The above and other characteristics, features and advantages of the present invention will become apparent from the following detailed description, taken in conjunction with the accompanying drawings, which illustrate, by way of example, the principles of the invention. This description is given for the sake of example only, without limiting the scope of the invention. The reference figures quoted below refer to the attached drawings.
The above, as well as additional features will be better understood through the following illustrative and non-limiting detailed description, with reference to the appended drawings.
In the different figures, the same reference signs refer to the same or analogous elements.
The present disclosure will be described with respect to particular embodiments and with reference to certain drawings but is not limited only by the claims. The drawings described are only schematic and are non-limiting. In the drawings, the size of some of the elements may be exaggerated and not drawn on scale for illustrative purposes. The dimensions and the relative dimensions do not correspond to actual reductions to practice of the invention.
Furthermore, the terms first, second, third and the like in the description and in the claims, are used for distinguishing between similar elements and not necessarily for describing a sequence, either temporally, spatially, in ranking or in any other manner. It is to be understood that the terms so used are interchangeable under appropriate circumstances and that the embodiments of the invention described herein are capable of operation in other sequences than described or illustrated herein.
Moreover, the terms top, bottom, over, under and the like in the description and the claims are used for descriptive purposes and not necessarily for describing relative positions. It is to be understood that the terms so used are interchangeable under appropriate circumstances and that the embodiments of the invention described herein are capable of operation in other orientations than described or illustrated herein.
The term “comprising” as used in the claims should not be interpreted as being restricted to the elements listed thereafter; it does not exclude other elements or steps. Thus, the term “comprising” specifies the presence of the stated features, integers, steps or components as referred to, but does not preclude the presence or addition of one or more other features, integers, steps or components, or groups thereof. The term “comprising” therefore covers the situation where only the stated features are present (and can therefore always be replaced by “consisting of” in order to restrict the scope to the stated features) and the situation where these features and one or more other features are present. Thus, the scope of the expression “a device comprising means A and B” should not be interpreted as being limited to devices consisting only of components A and B. It means that with respect to the present invention, the only relevant components of the device are A and B.
Similarly, the term “coupled” as used in the claims should not intended to mean a direct connections. The terms “coupled” and “connected”, along with their derivatives, may be used. It should be understood that these terms are not intended as synonyms for each other. Thus, the scope of the expression “a device A coupled to a device B” should not be limited to devices or systems wherein an output of device A is directly connected to an input of device B. It means that there exists a path between an output of A and an input of B which may be a path including other devices or means. “Coupled” may mean that two or more elements are either in direct physical or electrical contact, or that two or more elements are not in direct contact with each other but yet still co-operate or interact with each other.
Reference throughout this specification to “one embodiment” or “an embodiment” means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment. Thus, appearances of the phrases “in one embodiment” or “in an embodiment” in various places throughout this specification are not necessarily all referring to the same embodiment, but may. Furthermore, the particular features, structures or characteristics may be combined in any suitable manner, as would be apparent to one of ordinary skill in the art from this disclosure, in one or more embodiments.
Similarly, the description of exemplary embodiments, various features are sometimes grouped together in a single embodiment, figure, or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of one or more of the various embodiments. This method of disclosure, however, is not intended to reflect any intention that the claims require more features than are expressly recited in each claim. Rather, as the following claims reflect, inventive aspects lie in less than all features of a single foregoing disclosed embodiment. Thus, the claims following the detailed description are hereby expressly incorporated into this detailed description, with each claim standing on its own as a separate embodiment.
Furthermore, while some embodiments described herein include some but not other features included in other embodiments, combinations of features of different embodiments are meant to be within the scope of this disclosure, and form different embodiments, as would be understood by those in the art. For example, in the following claims, any of the claimed embodiments can be used in any combination.
Furthermore, some of the embodiments are described herein as a method or combination of elements of a method that can be implemented by a processor of a computer system or by other means of carrying out the function. Thus, a processor with the necessary instructions for carrying out such a method or element of a method forms a means for carrying out the method or element of a method. Furthermore, an element described herein of an apparatus embodiment is an example of a means for carrying out the function performed by the element for the purpose of carrying out the invention.
In the description provided herein, numerous specific details are set forth. However, it is understood that embodiments of the invention may be practiced without these specific details. In other instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.
Based upon this detailed description of several embodiments, other embodiments can be configured according to the knowledge of persons skilled in the art without departing from the technical teaching of the disclosure, the disclosure is limited only by the terms of the appended claims.
Step g assures that the third and fourth electrically conductive vias (Vint1, and Vint2) are self-aligned with the first and second electrically conductive lines (Mintla, Mintlb). Even if there would be variability in the width or position of the first and second electrically conductive lines (Mintla, Mintlb), step g ensures that the third and fourth electrically conductive vias (Vint1, Vint2) are precisely aligned with the first and second electrically conductive lines (Mintla, Mintlb) respectively. This is a self-correcting mechanism. These vias going down from the set of second electrically conductive lines (Mintl) have for purpose carrying signals that have to reach the source and the drain. Connecting the electrically conductive lines (Mintl) with the source or drain contact (M0A) requires an electrical connection. The method according to the first aspect provides this connection.
In another embodiment, the method may further comprise the steps of:
These additional steps assure placement of the interruption (17), thereby assuring that the third electrically conductive via (Vint1) and the fourth electrically conductive via (Vint2) make contact with the first electrically conductive line (M0B). With these additional steps, the hard mask lines (141) are typically used twice as a mask, first for forming the electrically conductive vias (Vint1, and Vint2) aligned with the electrically conductive lines (Mintl), and second for forming the interruption (17) aligned with the first gap (15) between the third and the fourth electrically conductive via (Vint1, Vint2). Hence, even if there would be variability in the width or position of the first and second electrically conductive lines (Mintla, Mintlb), step g ensures that the third and fourth electrically conductive vias (Vint1, Vint2) are aligned with the first and second electrically conductive lines (Mintla, Mintlb) respectively and that the interruption is aligned with the first gap. This is a self-correcting mechanism.
In some embodiments, the electrically conductive material making the second electrically conductive lines (Mintl) may be different from the electrically conductive material making the first electrically conductive line (MOB) and can be etched selectively with respect to the first electrically conductive line (MOB) during step i. That way, even if the hard mask lines (141) are entirely consumed before or during step i, step i can still occur. However, the penalty of losing the hard mask lines (141) is that the possibility to process the vias (V1) self-aligned to the second electrically conductive lines (Mintl) in step j (see below) is lost. Accordingly, in some embodiments, hard mask lines (141) are not entirely consumed before the end of step i.
In another embodiment, the method may further comprise after step i, the step j of forming:
In another embodiment, step j may comprise:
In some embodiments, in step ii, the hard mask (14) is removed selectively with respect to the dielectric material (18), and most typically with respect to the dielectric material (18) and any material exposed during step ii which is not the hard mask (14).
An alternative starting point for the example method is where the first electrically conductive via (VOA1) is electrically connecting the first electrically conductive line (MOB) with a first electrically conductive contact (MOA1) on a first side, here the n-type side (5n), of a first (3a) of the transistor structures (3a, 3b), while the second electrically conductive via (V0A2) is electrically connecting the first electrically conductive line (MOB) with a second electrically conductive contact (M0A2) on a first side, here also an n-type side (5p), of a second (3b) of the transistor structures (3a, 3b).
Another alternative starting point for the method is where the first electrically conductive via (VOA1) is electrically connecting the first electrically conductive line (MOB) with a first electrically conductive contact (MOA1) on a first side, here the n-type side (5n), of a first (3a) of the transistor structures (3a, 3b), while the second electrically conductive via (V0A2) is electrically connecting the first electrically conductive line (MOB) with a second electrically conductive contact (M0A2) on a first side, here a p-type side (5p), of a second (3b) of the transistor structures (3a, 3b).
Each of the example alternative starting points are valid starting points for performed thereon steps b and following.
In some embodiments, the example method may be for forming a standard cell of the integrated circuit or of the intermediate in the formation thereof.
In an embodiment, the standard cell may comprise four second electrically conductive lines (Mintl) and more than four third electrically conductive lines (M11).
In an embodiment, the two transistor structures (3a, 3b) may be two nanosheet transistor structures (3a, 3b), each nanosheet transistor structure comprising two nanosheet stacks, one stack forming the pMOS side (5p) of a first doping type, and another stack forming the nMOS side (5n) of a second doping type, each side (5p, 5n) comprising a plurality of vertically stacked nanosheets (7), the plurality forming a channel structure, a source portion, and a drain portion, the source portion and the drain portion being horizontally separated by the channel structure.
In another embodiment, the two transistor structures (3a, 3b) may be two transistor structures (3a, 3b), wherein the pMOS side (5p) of a first doping type and the nMOS side (5n) of a second doping type are separated by a dielectric wall (6), each side (5p, 5n) comprising a plurality of vertically stacked nanosheets (7), the plurality forming a channel structure, a source portion, and a drain portion, the source portion and the drain portion being horizontally separated by the channel structure, each nanosheet (7) having one side (8) touching the dielectric wall (6).
In some embodiments, the dielectric separation may be made of SiO2.
The source and the drain electrically conductive contacts (MOA1, M0A2) can for instance be SiGe:B (p-MOS) or Si:P (n-MOS).
In an embodiment, the first electrically conductive line (MOB) may be embedded in a dielectric material (8).
In an embodiment, the first electrically conductive line (MOB) is provided as part of a set of parallel first electrically conductive lines (MOB), all arranged within a first metallization level and each extending along a same first direction.
In another embodiment, the set of first electrically conductive lines (MOB) may be arranged at a pitch of from 20 to 60 nm, from 30 to 50 nm, from 35 to 45 nm, from 37 to 41 nm, and from 38 to 40 nm. This pitch being relatively large, there is enough space between the set of first electrically conductive lines (MOB) to form a via connecting directly a line amongst the set of second electrically conductive lines (Mintl) with a gate.
The planar dielectric material may for instance be SiO2.
In one or more embodiments, the opening performed during step c may be obtained by plasma etching through a hard mask.
In an embodiment, each of the first electrically conductive line (MOB), the first and second electrically conductive vias (VOA1, V0A2), the planar electrically conductive material (13), and the set of second electrically conductive lines (Mintl), may be made of a metal independently selected from metals such as Cu, Mo, Ru, or W, amongst others.
In an embodiment, the set of parallel lines (141) may be equidistant.
In an embodiment, the set of parallel lines (141) may be arranged at a pitch of from 9 to 30 nm, from 12 to 25 nm, from 14 to 22 nm, from 16 to 20 nm, and from 18 to 20 nm.
In another example embodiment, step g of etching the electrically conductive layer (Mint) and the planar electrically conductive material may be performed by any suitable method. For instance, if the electrically conductive layer (Mint) and the planar electrically conductive material (13) are both made of Ru, etching can be performed by plasma etching using Cl2 and/or O2 and Cl2 as etchant gas in an inductively coupled plasma etching chamber.
The first electrically conductive line (MOB) can be made of either the same conductive material as a top portion of the planar electrically conductive material (13) or another conductive material as a top portion of the planar electrically conductive material (13).
If the first electrically conductive line (MOB) is made of the same conductive material as a top portion of the planar electrically conductive material (13), in some embodiments, step d may include filling the opening (11) with a planar electrically conductive material (13) comprising a bottom portion made of a different conductive material than a top portion, wherein the conductive material making the bottom portion is different from the conductive material making the first electrically conductive line (MOB) and can be etched selectively with respect to the first electrically conductive line (MOB) during step g. The thickness of the bottom portion may be smaller than the thickness of the top portion. The bottom portion serves as an etch stop layer.
If the first electrically conductive line (MOB) is made of another conductive material as a top portion of the planar electrically conductive material (13), it is preferable if step d comprises filling the opening (11) with a single planar electrically conductive material (13) which is different from the conductive material making the first electrically conductive line (MOB) and which can be etched selectively with respect to the first electrically conductive line (MOB) during step g.
In an embodiment, the set of second electrically conductive lines (Mintl) may be arranged at a pitch of from 9 to 30 nm, from 12 to 25 nm, from 14 to 22 nm, from 16 to 20 nm, and from 18 to 20 nm.
In many embodiments, the pitch of the set of parallel lines (141) is the same as the pitch of the set of second electrically conductive lines (Mintl).
In an embodiment, the set of second electrically conductive lines (Mintl) may be arranged at a pitch and the width of the interruption (17) is equal to 0.5 times the pitch.
In an embodiment, the distance separating the third electrically conductive via (Vint1) and the fourth electrically conductive via (Vint2) is 0.5 times the pitch of the set of second electrically conductive lines (Mintl).
In an embodiment, the width of each of the third and fourth vias (Vint1, Vint2) measured along the first direction from 5 to 13 nm, from 6 to 12 nm, from 7 to 11 nm, and from 8 to 10 nm. In some embodiments, the width for these two vias is 9 nm.
In an embodiment, the distance separating the third electrically conductive via (Vint1) and the fourth electrically conductive via (Vint2) may be from 5 to 13 nm, from 6 to 12 nm, from 7 to 11 nm, and from 8 to 10 nm. In some embodiments, these two vias are separated by 9 nm.
The hard mask (14) may be resistant to the etching so that by the time step i is finished, some hard mask material remains. This way, the set of second electrically conductive lines (Mintl) is not consumed during step i.
In some embodiments, the interruption (17) formed in step i may be from 5 to 13 nm, from 6 to 12 nm, from 7 to 11 nm, and from 8 to 10 nm. This interruption may have a width of 9 nm. Such a small interruption, let alone with precise alignment to the gap, has up to now been very challenging.
It is to be understood that although some embodiments, specific constructions and configurations, as well as materials, have been discussed herein for devices according to the present invention, various changes or modifications in form and detail may be made without departing from the scope of this invention. For example, any formulas given above are merely representative of procedures that may be used. Functionality may be added or deleted from the block diagrams and operations may be interchanged among functional blocks. Steps may be added or deleted to methods described within the scope of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 21215780.4 | Dec 2021 | EP | regional |
