The present invention relates to the field of packaging and interconnection of integrated circuit assemblies and particularly to a method for providing near-hermetically coated, thermally protected integrated circuit assemblies.
Integrated circuit packages are produced for usage in a variety of products or for a variety of applications. For example, integrated circuit packages which are designed for use in military and avionics applications are often required to operate and survive under aggressive or rigorous operating conditions and environments. Because such integrated circuit packages (ex—hermetic packages) may typically be very costly to produce, they are often expected to have a long lifespan (i.e., remain functionally operable over a long period of time), such as for 20 years or more.
Contrastingly, most currently available integrated circuit packages are designed for usage in products which present relatively benign/much less rigorous operating conditions, such as desktop PC's, electronic games and cell phones. Such integrated circuit packages are commonly referred to as Commercial off the Shelf (COTS) devices. Because COTS devices may typically be relatively inexpensive to produce, they may tend to have a relatively short lifespan (ex—2 to 5 years).
In recent years the military electronics industry has sought a less expensive alternative to the high cost integrated circuit packages discussed above, which are currently implemented in highly rigorous military and avionics applications. One alternative has been to implement the currently available (and less expensive) COTS devices, in the more demanding military and avionics environments. However, when the currently available COTS devices have been subjected to these more rigorous conditions, they have been especially prone to failure due to higher operating temperatures, corrosion, or the like. Current methods of modifying or designing integrated circuit packages for improved thermal performance are typically very expensive and may be detrimental to reliability.
Another significant trend that has recently developed in the microelectronics industry is the concentration of higher power onto/into fewer functional areas. On the macro scale, this has led to integrated circuits that dissipate significantly more power than their predecessors, thereby requiring more efficient thermal management. A more significant issue is on the micro scale in which a power on an individual integrated circuit is not dissipated uniformly, but is instead concentrated at hot spots on the die. While the majority of the integrated circuit may be operating at a safe temperature, small hot spot regions may be significantly hotter and may greatly reduce the reliability of the entire circuit. The need to spread this power has, for example, led to increased use of multicore processors in an attempt to distribute the die level power dissipation over larger areas. Existing methods for hot spot thermal spreading, such as Chemical Vapor Deposition (CVD) diamond films, are very expensive to apply and may significantly disrupt other assembly processes.
Thus, it would be desirable to have a method for providing near-hermetically coated, thermally protected integrated circuit assemblies which address the problems associated with current solutions.
Accordingly, an embodiment of the present invention is directed to a method for providing an integrated circuit assembly, the integrated circuit assembly including an integrated circuit and a substrate, the method including: mounting the integrated circuit to the substrate; adding thermally conductive particles to a low processing temperature, at least near-hermetic, glass-based coating; during assembly of the integrated circuit assembly, applying the low processing temperature, at least near-hermetic, glass-based coating directly to at least one of the integrated circuit and the substrate; and curing the coating.
A further embodiment of the present invention is directed to a method for providing an electronic device, the electronic device including an integrated circuit assembly, the integrated circuit assembly including an integrated circuit and a substrate, the method including: mounting the integrated circuit to the substrate; adding thermally conductive particles to a low processing temperature, at least near-hermetic, glass-based coating; during assembly of the integrated circuit assembly, applying the low processing temperature, at least near-hermetic, glass-based coating directly to at least one of the integrated circuit and the substrate; curing the coating; and at least substantially enclosing the integrated circuit assembly within a housing.
A still further embodiment of the present invention is directed to an integrated circuit assembly, including: a substrate; and an integrated circuit configured for being mounted to the substrate, wherein at least one of the integrated circuit and the substrate are at least partially coated with a low processing temperature, at least near-hermetic, glass-based coating, the coating including thermally conductive particles for promoting reduction of thermal resistance of the integrated circuit assembly.
The numerous advantages of the present invention may be better understood by those skilled in the art by reference to the accompanying figures in which:
Reference will now be made in detail to the presently preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings.
In current embodiments, the integrated circuit assembly 100 includes the integrated circuit 104. For instance, the integrated circuit 104 (IC) may be a microcircuit, a chip, a microchip, a silicon chip, a computer chip, a monolithic integrated circuit, a hybrid integrated circuit, a die, or the like.
The integrated circuit 104 of the present invention is configured for being mounted to the substrate 102. In an exemplary embodiment, as shown in
In a present embodiment, at least one of the integrated circuit 104 and the substrate 102 of the integrated circuit assembly 100 may be at least partially coated with a coating 110. In a current embodiment, the coating 110 may be a hermetic (ex—airtight) or near-hermetic coating for promoting reliability of the integrated circuit assembly 100 in high temperature operating environments and/or corrosive operating environments, such as military or avionics environments. In further embodiments, the coating 110 may be a low processing temperature coating. For instance, the coating 110 may be formulated for being applied and/or cured at a temperature of less than or equal to 160 degrees Celsius. In further embodiments, higher temperatures may be used to shorten cure times. In additional embodiments, the coating 110 may be a glass-based coating. For example, the coating 110 may be an alkali silicate-based coating.
In exemplary embodiments, the coating 110 may include thermally conductive particles for promoting improved thermal conductivity of the coating, thereby promoting reduction of thermal resistance, such as a junction-to-case thermal resistance or an overall junction to ambient thermal resistance, of the integrated circuit assembly 100. For instance, the coating 110 may include one or more of the following: diamond particles, Gallium Nitride particles, Silicon Carbide particles; aluminum nitride particles, beryllium oxide particles, metals (ex—copper), metal particles, CNTs (Carbon Nanotubes), graphite, or the like, for promoting improved thermal conductivity of the coating and for modifying a thermal expansion coefficient of the coating to achieve a better match to a coated surface (ex—surface of an integrated circuit, substrate, etc.). The particles may be in the form of spheres, flakes, whiskers or the like. Further, the particles may be varying sizes, such as nanoparticles, microparticles, or the like. In further embodiments, the thermally conductive particles may have a thermal conductivity of at least two hundred watts per meters-Kelvin (200 W/m·K). Still further, the coating may be a variety of formulations, such as any one or more of the formulations described in U.S. patent application Ser. No. 11/508,782 entitled: Integrated Circuit Protection and Ruggedization Coatings and Methods filed Aug. 23, 2006, (pending) which is herein incorporated by reference in its entirety.
In exemplary embodiments, as shown in
In alternative exemplary embodiments, as shown in
In embodiments in which the integrated circuit 104 is flip-chip bonded to the substrate 102, the coating 110 may be applied as an underfill 124 between a bottom surface 122 of the integrated circuit 104 and a top surface 126 of the substrate 102, as shown in
In a present embodiment, one or more of the integrated circuit assembly 100, substrate 102 and integrated circuit 104 may be devices which are available for at least one of sale, lease and license to a general public. For instance, the integrated circuit assembly 100, substrate 102 and/or integrated circuit 104 may be a Commercial off the Shelf (COTS) device.
In further embodiments, the method 200 further includes, during assembly of the integrated circuit assembly, applying the low processing temperature, at least near-hermetic, glass-based coating directly to at least one of the integrated circuit and the substrate 206. For instance, in exemplary embodiments, the coating may be maintained/stored and/or applied at atmospheric pressure. In additional embodiments, the method 200 further includes curing the coating 208. In exemplary embodiments, the steps of applying the coating 206 and curing the coating 208 may be performed at a temperature one hundred sixty (160) degrees Celsius or less. In still further embodiments, applying the coating 204 may include applying the coating in one or more layers in such a manner which may promote prevention of cracking of the coating during curing.
In additional embodiments, prior to applying the coating, nanoparticles/nano-sized particles (ex—particles having at least one dimension less than 100 nm) may be added to the coating for promoting corrosion resistance of the assembly. For example, nano-sized particles of calcium carbonate, zinc oxide, divalent metal cations (ex—transition metal oxides, alkaline earth oxides, etc.), rare earth oxides and/or the like may be added to the coating for promoting corrosion resistance of the integrated circuit assembly.
In exemplary embodiments, the method 300 further includes, during assembly of the integrated circuit assembly, applying the low processing temperature, at least near-hermetic, glass-based coating directly to at least one of the integrated circuit and the substrate 306. In further embodiments, the method 300 further includes curing the coating 308. In exemplary embodiments, the steps of applying the coating 306 and curing the coating 308 may be performed at a temperature of one hundred sixty (160) degrees Celsius or less. In still further embodiments, applying the coating 306 may include applying the coating in one or more layers to promote prevention of cracking of the coating during curing.
In additional embodiments, prior to applying the coating, nanoparticles/nano-sized particles (ex—particles having at least one dimension less than 100 nm) may be added to the coating for promoting corrosion resistance of the assembly. For example, nano-sized particles of calcium carbonate, zinc oxide, and/or the like may be added to the coating for promoting corrosion resistance of the integrated circuit assembly.
In further embodiments, the method 300 further includes at least substantially enclosing the integrated circuit assembly within a housing 310. For example, as shown in
It is to be noted that the foregoing described embodiments according to the present invention may be conveniently implemented using conventional general purpose digital computers programmed according to the teachings of the present specification, as will be apparent to those skilled in the computer art. Appropriate software coding may readily be prepared by skilled programmers based on the teachings of the present disclosure, as will be apparent to those skilled in the software art.
It is to be understood that the present invention may be conveniently implemented in forms of a software package. Such a software package may be a computer program product which employs a computer-readable storage medium including stored computer code which is used to program a computer to perform the disclosed function and process of the present invention. The computer-readable medium may include, but is not limited to, any type of conventional floppy disk, optical disk, CD-ROM, magnetic disk, hard disk drive, magneto-optical disk, ROM, RAM, EPROM, EEPROM, magnetic or optical card, or any other suitable media for storing electronic instructions.
It is understood that the specific order or hierarchy of steps in the foregoing disclosed methods are examples of exemplary approaches. Based upon design preferences, it is understood that the specific order or hierarchy of steps in the method can be rearranged while remaining within the scope of the present invention. The accompanying method claims present elements of the various steps in a sample order, and are not meant to be limited to the specific order or hierarchy presented.
It is believed that the present invention and many of its attendant advantages will be understood by the foregoing description. It is also believed that it will be apparent that various changes may be made in the form, construction and arrangement of the components thereof without departing from the scope and spirit of the invention or without sacrificing all of its material advantages. The form herein before described being merely an explanatory embodiment thereof, it is the intention of the following claims to encompass and include such changes.
The present application is a continuation-in-part application and claims priority under 35 U.S.C. §120 to the U.S. patent application Ser. No. 11/508,782 entitled: Integrated Circuit Protection and Ruggedization Coatings and Methods filed Aug. 23, 2006, now U.S. Pat. No. 8,076,185 which is herein incorporated by reference in its entirety.
Number | Name | Date | Kind |
---|---|---|---|
3508974 | Bressler | Apr 1970 | A |
3654528 | Barkan | Apr 1972 | A |
3723790 | Dumbaugh et al. | Mar 1973 | A |
3812404 | Barkan et al. | May 1974 | A |
4177015 | Davidson | Dec 1979 | A |
4294658 | Humphreys et al. | Oct 1981 | A |
4410874 | Scapple et al. | Oct 1983 | A |
4505644 | Meisner et al. | Mar 1985 | A |
4513029 | Sakai | Apr 1985 | A |
4560084 | Wolfson | Dec 1985 | A |
4572924 | Wakely et al. | Feb 1986 | A |
4622433 | Frampton | Nov 1986 | A |
4761518 | Butt et al. | Aug 1988 | A |
4765948 | Deluca et al. | Aug 1988 | A |
4773826 | Mole | Sep 1988 | A |
4802531 | Nathenson et al. | Feb 1989 | A |
4882212 | SinghDeo et al. | Nov 1989 | A |
5041342 | Umeda et al. | Aug 1991 | A |
5136365 | Pennisi et al. | Aug 1992 | A |
5140109 | Matsumoto et al. | Aug 1992 | A |
5184211 | Fox | Feb 1993 | A |
5195231 | Fanning et al. | Mar 1993 | A |
5232970 | Solc et al. | Aug 1993 | A |
5244726 | Laney et al. | Sep 1993 | A |
5265136 | Yamazaki et al. | Nov 1993 | A |
5315155 | O'Donnelly et al. | May 1994 | A |
5502889 | Casson et al. | Apr 1996 | A |
5581286 | Hayes et al. | Dec 1996 | A |
5686703 | Yamaguchi | Nov 1997 | A |
5702963 | Vu et al. | Dec 1997 | A |
5863605 | Bak-Boychuk et al. | Jan 1999 | A |
5916944 | Camilletti et al. | Jun 1999 | A |
5958794 | Bruxvoort et al. | Sep 1999 | A |
5965947 | Nam et al. | Oct 1999 | A |
5991351 | Woolley | Nov 1999 | A |
6010956 | Takiguchi et al. | Jan 2000 | A |
6019165 | Batchelder | Feb 2000 | A |
6021844 | Batchelder | Feb 2000 | A |
6027791 | Higashi et al. | Feb 2000 | A |
6028619 | Saita et al. | Feb 2000 | A |
6039896 | Miyamoto et al. | Mar 2000 | A |
6048656 | Akram et al. | Apr 2000 | A |
6087018 | Uchiyama | Jul 2000 | A |
6110656 | Eichorst et al. | Aug 2000 | A |
6121175 | Drescher et al. | Sep 2000 | A |
6124224 | Sridharan et al. | Sep 2000 | A |
6159910 | Shimizu et al. | Dec 2000 | A |
6356334 | Mathew et al. | Mar 2002 | B1 |
6423415 | Greene et al. | Jul 2002 | B1 |
6451283 | Kuznicki et al. | Sep 2002 | B1 |
6452090 | Takato et al. | Sep 2002 | B2 |
6486087 | Saling et al. | Nov 2002 | B1 |
6586087 | Young | Jul 2003 | B2 |
6599643 | Heimann et al. | Jul 2003 | B2 |
6658861 | Ghoshal et al. | Dec 2003 | B1 |
6665186 | Calmidi et al. | Dec 2003 | B1 |
6708501 | Ghoshal et al. | Mar 2004 | B1 |
6798072 | Kajiwara et al. | Sep 2004 | B2 |
6800326 | Uchiyama | Oct 2004 | B1 |
6918984 | Murray et al. | Jul 2005 | B2 |
7045905 | Nakashima | May 2006 | B2 |
7078263 | Dean | Jul 2006 | B2 |
7131286 | Ghoshal et al. | Nov 2006 | B2 |
7176564 | Kim | Feb 2007 | B2 |
7202598 | Juestel et al. | Apr 2007 | B2 |
7293416 | Ghoshal | Nov 2007 | B2 |
7296417 | Ghoshal | Nov 2007 | B2 |
7297206 | Naruse et al. | Nov 2007 | B2 |
7340904 | Sauciuc et al. | Mar 2008 | B2 |
7342787 | Bhatia | Mar 2008 | B1 |
7348665 | Sauciuc et al. | Mar 2008 | B2 |
7391060 | Oshio | Jun 2008 | B2 |
7491431 | Chiruvolu et al. | Feb 2009 | B2 |
7692259 | Suehiro | Apr 2010 | B2 |
7737356 | Goldstein | Jun 2010 | B2 |
20010015443 | Komoto | Aug 2001 | A1 |
20010046933 | Parkhill et al. | Nov 2001 | A1 |
20020000630 | Coyle | Jan 2002 | A1 |
20020054976 | Nakamura et al. | May 2002 | A1 |
20020078856 | Hahn et al. | Jun 2002 | A1 |
20020086115 | Lamers et al. | Jul 2002 | A1 |
20020170173 | Mashino | Nov 2002 | A1 |
20020189495 | Hayashi et al. | Dec 2002 | A1 |
20020189894 | Davis et al. | Dec 2002 | A1 |
20030047735 | Kyoda et al. | Mar 2003 | A1 |
20030080341 | Sakano et al. | May 2003 | A1 |
20030218258 | Charles et al. | Nov 2003 | A1 |
20030228424 | Dove et al. | Dec 2003 | A1 |
20040106037 | Cho et al. | Jun 2004 | A1 |
20040116577 | Naruse et al. | Jun 2004 | A1 |
20040156995 | Komiyama et al. | Aug 2004 | A1 |
20040194667 | Reuscher | Oct 2004 | A1 |
20050003947 | Mazany et al. | Jan 2005 | A1 |
20050082691 | Ito et al. | Apr 2005 | A1 |
20050099775 | Pokharna et al. | May 2005 | A1 |
20050123684 | Makowski et al. | Jun 2005 | A1 |
20050179742 | Keenan et al. | Aug 2005 | A1 |
20060045755 | McDonald et al. | Mar 2006 | A1 |
20060068218 | Hooghan et al. | Mar 2006 | A1 |
20060095677 | Hakura et al. | May 2006 | A1 |
20060113066 | Mongia et al. | Jun 2006 | A1 |
20060135342 | Anderson et al. | Jun 2006 | A1 |
20060158849 | Martin et al. | Jul 2006 | A1 |
20060250731 | Parkhurst et al. | Nov 2006 | A1 |
20060268525 | Jeong | Nov 2006 | A1 |
20060283546 | Tremel et al. | Dec 2006 | A1 |
20070075323 | Kanazawa et al. | Apr 2007 | A1 |
20070102833 | Hack et al. | May 2007 | A1 |
20070108586 | Uematsu et al. | May 2007 | A1 |
20070224400 | Meguro et al. | Sep 2007 | A1 |
20080006204 | Rusinko et al. | Jan 2008 | A1 |
20080050512 | Lower et al. | Feb 2008 | A1 |
20080063875 | Robinson et al. | Mar 2008 | A1 |
20080142966 | Hirano et al. | Jun 2008 | A1 |
Number | Date | Country |
---|---|---|
60-013875 | Jan 1985 | JP |
02-064071 | Mar 1990 | JP |
2003-332505 | Nov 2003 | JP |
WO-2006095677 | Sep 2006 | WO |
WO 2006095677 | Sep 2006 | WO |
PCTUS2008074224 | Aug 2008 | WO |
PCTUS2008075591 | Sep 2008 | WO |
PCTUS2009031699 | Jan 2009 | WO |
Number | Date | Country | |
---|---|---|---|
20080299300 A1 | Dec 2008 | US |
Number | Date | Country | |
---|---|---|---|
Parent | 11508782 | Aug 2006 | US |
Child | 11732981 | US |