Number | Date | Country | Kind |
---|---|---|---|
10-030178 | Feb 1998 | JP |
Number | Name | Date | Kind |
---|---|---|---|
5051380 | Maeda et al. | Sep 1991 | |
5212119 | Hah et al. | May 1993 | |
5376591 | Maeda et al. | Dec 1994 | |
5384288 | Ying | Jan 1995 | |
5532193 | Maeda et al. | Jul 1996 | |
5554570 | Maeda et al. | Sep 1996 | |
5569499 | Maeda et al. | Oct 1996 | |
5970383 | Lee | Oct 1999 | |
5981376 | Komatsu | Nov 1999 | |
6025263 | Tsai et al. | Feb 2000 |
Number | Date | Country |
---|---|---|
19651778 | Jun 1997 | DE |
653782 | Apr 1996 | EP |
820095 | Jan 1998 | EP |
6283513 | Oct 1994 | JP |
750295 | Feb 1995 | JP |
8203891 | Aug 1996 | JP |
Entry |
---|
Fujino, K. et al “Dependence of Deposition Characteristics on Base Materials in TEOS and Ozone CVD at Atmospheric Pressure” J. Electrochem Soc. vol. 138 No.2 Feb. 1991. |
Fujino, K. et al “Reaction Mechanism of TEOS and O3 Atmospheric CVD” VMIC Conference Jun. 11-12, 1991. |
Fujino, K. et al “Dependence of Deposition Rate on Base Materials” VMIC Conference, Jun. 11-12, 1990. |
Patent Abstracts of Japan, 07050295 A, Feb. 21, 1995. |
Patent Abstracts of Japan, 06283513 A, Oct. 7, 1994. |
Patent Abstracts of Japan, 08203891 A, Aug. 9, 1996. |