Abe, Y., Kaga, Y., Kawamura, M., Sasaki, K., “Effects of O2 gas flow ratio and flow rate on the formation of RuO2 thin films by reactive sputtering”, May 2000, AIP for American Vacuum Society, vol. 18 No. 3, p. 1348-51.* |
Wang, Q., “Dependence of composition and microstructure of RuOx films on target status and substrate temperature in reactive sputtering deposition”, Apr. 7, 1996, Materials Research Society, Ferroelectric Thin Films V. Symposium, p. 151-6.* |
Petrov, I., Orlinow, V., Misiuk, A., “Highly oriented ZnO films obtained by DC reactive sputtering of a zinc target”, Oct. 5,1984, Thin Solid Films, vol. 120 No. 1, p. 55-67. |