This application is a continuation of application Ser. No. 284,275, filed on Dec. 14, 1988, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3770521 | Demsky et al. | Nov 1973 | |
3998675 | Langheinrich et al. | Dec 1976 | |
4028151 | Lindmayer | Jun 1977 | |
4132818 | Chappelow et al. | Jan 1979 | |
4178415 | Ovshinsky et al. | Dec 1979 | |
4317844 | Carlson | Mar 1982 | |
4342044 | Ovshinsky et al. | Jul 1982 | |
4353788 | Jeffrey et al. | Oct 1982 | |
4358326 | Doo | Nov 1982 | |
4359367 | Zukotynski et al. | Nov 1982 | |
4382099 | Legge et al. | May 1983 | |
4417092 | Moustakas et al. | Nov 1983 | |
4465529 | Arima et al. | Aug 1984 | |
4529617 | Chenevas-Paule et al. | Jul 1985 |
Number | Date | Country |
---|---|---|
0049942 | Jun 1978 | JPX |
0162224 | Dec 1980 | JPX |
0107575 | Jun 1984 | JPX |
2111534A | Jul 1983 | GBX |
2171844A | Sep 1986 | GBX |
Entry |
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Sze, S., VLSI Technology, Chapters 3 and 9, McGraw-Hill, 1983. |
Brodsky, M., Doping of Sputtered Amorphous Semiconductors, IBM Tech. Discl. Bul., vol. 19, No. 12, May 1977, pp. 4802-4803. |
Weissmantel, C., Ion Beam Sputtering and Its Applications for the Deposition of Semiconducting Films, Thin Solid Films, 13 (1972), pp. 359-366. |
Philips, P., Doping of Solids from the Vapor Phase, IBM Tech. DIscl. Bul., vol. 14, No. 3, Aug. 1971, pp. 923-924. |
Number | Date | Country | |
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Parent | 284275 | Dec 1988 |