Bunshah et al., Deposition Technologies for Films & Coatings, (Noyes, Park Ridge, N.J.) c. 1982, pp. 92-93. |
Vossen et al., ("Harper"), Thin Film Processes, (Academic Press, NY) c. 1978, p. 186. |
Applied Optics; vol. 22, No. 1; Jan. 1, 1983 "Ion-Beam-Assisted Deposition of Thin Films". |
Journal of Materials Science 21 (1986) pp. 1-25, "Review Ion-Based Methods for Optical Thin Film Deposition". |
G. Dearnaley, et al., Ion Implantation, North-Holland Publishing Co., New York, 1973 (cover page only). |
John R. McNeil et al., Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Hombardment, in Applied Optics, vol. 23, No. 4, Feb. 15, 1984. |
M. Kawabe et al., Effects of Ion Etching on the Properties of GaAs, in Applied Optics, vol. 17, No. 16, Aug. 15, 1978. |
Shigeyuki Ishii et al., Optimization of Plasma for ECR-type Ion Source. |