R.D. Allen et al., “193 nm Single Layer Positive Resists Building Etch Resistance Into a High Resolution Imaging System” SPIE vol. 2438, pp. 474-485. (1991). |
Ko Wakabayashi et al., “Studies on s-Triazines. I. Contrimerization of Trichloracetonitrile with Other Nitriles”, Bulletin of the Chemical Society of Japan, vol. 42, pp. 2924-2930.(1969). |
R.D. Allen et al., “High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications”, J. Vac. Sci. Technol. B, 9, 3357 (1991). |
D.F. Eaton, “Advances in Photchemistry”, edited by B. Voman et al., vol. 13, pp 427-488. (1986). |
M.P. Joshi et al., “Three-dimensional Optical Circuitry using Two-Photon-assisted Polymerization”, Applied Physics Letters, vol. 74, pp. 170-172. (1999). |
S. Shionoya et al., “Phosphor Handbook” Chap. 12, section 1, pp. 643-650. (1998). |
A. Buroff et al., “New Photographic Material for Printed Circuits”, pp. 205-210. |
Denny et al., “Two-Photon Up-Converted Fluorescence Facilitated Photopolymerization”, Polymer Preprints, vol. 41, No. 1, p. 3, 2000. |
Cockcroft, “Application of Energy Upconversion Spectroscropy to Novel Laser and Phosphor Design”, Journal of Alloys and Compounds, vol. 207/208, pp. 33-44, 1994. |
Yi et al, “Investigation of Multiphoton Upconversion Thin Film Materials”, Proceedings of the SPIE, vol. 3280, pp. 140-142, 1998. |
Mita Y, “Phosphor Handbook”, 1999 CRC Press XP008016062, p. 643-650. |