Patent Grant
8154002
The present invention generally relates to nanotechnology and sub-microelectronic devices that can be used in circuitry and, in particular, to nanoscale wires and other nanostructures able to encode data.
Interest in nanotechnology, in particular sub-microelectronic technologies such as semiconductor quantum dots and nanowires, has been motivated by the challenges of chemistry and physics at the nanoscale, and by the prospect of utilizing these structures in electronic, optical, and related devices. While nanoscopic articles might be well-suited for transport of charge carriers and excitons (e.g. electrons, electron-hole pairs, electron pairs, etc.) and thus may be useful as building blocks in nanoscale electronics, optics, and other applications, much of nanotechnology and nanoelectronics is not well-developed. Thus there is a need in the art for new and improved articles and techniques involving nanoscale devices.
The present invention generally relates to nanoscale wires and other nanostructures, including those able to encode data. The subject matter of the present invention involves, in some cases, interrelated products, alternative solutions to a particular problem, and/or a plurality of different uses of one or more systems and/or articles.
In one aspect, the invention provides an electronic data storage device. According to one set of embodiments, the device includes a first electrode, a second electrode, a semiconductive material defining an electrical pathway between the first and second electrodes, and a material proximate the semiconductive material, switchable between at least a first polarization state and a second polarization state. In one embodiment, the semiconductive material is switchable between a first conductive state and a second conductive state in response to the first or second polarization states of the ferroelectric material, respectively, providing conductivity between the first and second electrodes, respectively, of a first conductivity and a second conductivity at least 1000 times the first conductivity.
The electronic data storage device, in another set of embodiments, includes a first electrode, a second electrode, and a semiconductive material defining an electrical pathway between the first and second electrodes. In one embodiment, the semiconductive material includes at least a first switch region and a second switch region along the electrical pathway, each of the first and second switch regions separately and independently switchable between a first conductive state and a second conductive state, which second state provides conductivity along the electrical pathway in the respective region at least 1000 times that of first state in the respective region.
In yet another set of embodiments, the electronic data storage device includes a semiconductive data storage element having an off state, and an on state providing electrical conductivity at least 1000 times that of the off state. The data storage element may have a write voltage able to switch the element from the on state to the off state and/or vice versa, and a read voltage through which the state of the element can be determined. In certain embodiments, the read and write voltages differ by no more than 1 or 2 V.
The invention, according to another aspect, is an article. In one set of embodiments, the article includes a first electrode, a second electrode, a semiconductive material defining an electrical pathway between the first and second electrodes, and at least two control terminals, each in electrical communication with the semiconductive material along the electrical pathway between the first and second electrodes.
The article, in another set of embodiments, includes a nanoscale wire comprising an electrically-polarizable region. The electrically-polarizable region, in one embodiment, is able to retain its polarization state in the absence of an electric field. The article, according to still another set of embodiments, includes a nanoscale wire comprising a core and a shell at least partially surrounding the core. In one embodiment, the core is semiconductive or conductive. In some cases, the shell includes a ferroelectric oxide material.
In yet another set of embodiments, the article includes a device comprising an array of nonvolatile memory elements. The article, in one embodiment, includes a plurality of memory elements each comprising a nanoscale wire comprising a transistor architecture. In still another set of embodiments, the article includes a nanoscale wire comprising a core and at least two shells, where each shell surrounding at least a portion of the core. The nanoscale wire comprises a ferroelectric oxide material in one embodiment. In another set of embodiments, the article includes a nanoscale wire comprising a transistor architecture. The nanoscale wire comprises a ferroelectric oxide material, in at least one embodiment. In yet another set of embodiments, the article includes a nanoscale wire comprising a core and a shell, where the nanoscale wire comprises Ba. The article, in still another set of embodiments, includes a nanoscale wire comprising a core and at least two shells, where at least one of the shells has a dielectric constant of at least about 15.
In one set of embodiments, the article comprises a nanoscale wire encoding more than one bit of data. According to another set of embodiments, the article includes a nanoscale wire comprising a region encoding a bit of data, where the region is not defined by the position of a second, movable nanoscale wire.
The article includes a device comprising an array of memory elements in one set of embodiments, each having an area of less than about 20 nm2/bit. According to yet another set of embodiments, the article includes a memory element having a reading voltage of less than about 1 Vabsolute at an on/off current differential ratio of at least 1000. The article, in still another set of embodiments, includes a memory element having a writing voltage of less than about 1 Vabsolute at an on/off current differential ratio of at least 1000. In yet another set of embodiments, the article includes a memory element having a read/write voltage ratio of less than about 1:1.5 at an on/off current differential ratio of at least 1000. The article includes a memory element having a first stable state having a first conductivity and a second stable state having a second conductivity, in still another set of embodiments, where the first conductivity is at least 1000 times greater than the second conductivity.
In yet another aspect, the invention provides a method. The method, in one set of embodiments, includes an act of polarizing, in a nanoscale wire comprising a core and a shell, at least a portion of the shell.
One set of embodiments provides a method comprising acts of encoding a first bit of data on a nanoscale wire, and encoding a second bit of data on the nanoscale wire without substantially altering the first bit of data. In another set of embodiments, the method includes acts of reading a first bit of data from a nanoscale wire, and reading a second bit of data, independent of the first bit, from the nanoscale wire. The method, in yet another sets of embodiments, includes an act of encoding at least one bit of data in an immobile nanoscale wire.
In another set of embodiments, the method includes acts of providing a source electrode, a drain electrode, and a semiconductive material in electrical communication with both the source and drain electrodes, and independently writing and reading at least two separate bits of data in the semiconductive material.
Yet another set of embodiments provides a method including an act of depositing a ferroelectric oxide material on at least a portion of a nanoscale wire comprising a core and a first shell to form a second shell different from the first shell. In another set of embodiments, the method includes an act of depositing a ferroelectric oxide material on at least a portion of a nanoscale wire not immobilized to a substrate. Still another set of embodiments provides a method including an act of depositing a material having a dielectric constant of at least about 15 on at least a portion of a nanoscale wire not immobilized to a substrate.
In another aspect, the present invention is directed to a method of making one or more of the embodiments described herein. In yet another aspect, the present invention is directed to a method of using one or more of the embodiments described herein.
Other advantages and novel features of the present invention will become apparent from the following detailed description of various non-limiting embodiments of the invention when considered in conjunction with the accompanying figures. In cases where the present specification and a document incorporated by reference include conflicting and/or inconsistent disclosure, the present specification shall control. If two or more documents incorporated by reference include conflicting and/or inconsistent disclosure with respect to each other, then the document having the later effective date shall control.
Non-limiting embodiments of the present invention will be described by way of example with reference to the accompanying figures, which are schematic and are not intended to be drawn to scale. In the figures, each identical or nearly identical component illustrated is typically represented by a single numeral. For purposes of clarity, not every component is labeled in every figure, nor is every component of each embodiment of the invention shown where illustration is not necessary to allow those of ordinary skill in the art to understand the invention. In the figures:
The present invention generally relates to nanotechnology and sub-microelectronic devices that can be used in circuitry and, in some cases, to nanoscale wires and other nanostructures able to encode data. One aspect of the invention provides a nanoscale wire or other nanostructure having a region that is electrically-polarizable, for example, a nanoscale wire may comprise a core and an electrically-polarizable shell. In some cases, the electrically-polarizable region is able to retain its polarization state in the absence of an external electric field. All, or only a portion, of the electrically-polarizable region may be polarized, for example, to encode one or more bits of data. In one set of embodiments, the electrically-polarizable region comprises a functional oxide or a ferroelectric oxide material, for example, BaTiO3, lead zirconium titanate, or the like. In some embodiments, the nanoscale wire (or other nanostructure) may further comprise other materials, for example, a separation region separating the electrically-polarizable region from other regions of the nanoscale wire. For example, in a nanoscale wire, one or more intermediate shells may separate the core from the electrically-polarizable shell.
One aspect of the invention provides a nanoscale wire having a core and a shell, where the shell comprises a functional oxide, and/or a ferroelectric oxide material such as a barium titanate (e.g., BaTiO3), for example, as shown in
In certain embodiments, such nanoscale wires are useful in devices such as nonvolatile memory devices. More than one bit of data may be encoded within the nanoscale wire in some cases, for example, within different portions of a shell that have been independently polarized. Data (i.e., bits) can be encoded within a portion of the shell by applying an electric field to that portion (e.g., using a “writing voltage”). For example, the wire may be polarized by creating a first voltage gradient between the portion of the shell and the core (e.g., representing a “1”), and depolarized by creating a second voltage gradient, which may be smaller or negative with respect to the first voltage gradient, between the portion of the shell and the core (e.g., representing a “0”). Upon removal of the voltage gradient, the portion of the shell is able to retain its polarization state, in some cases, for at least hours, days, weeks, or longer. Without wishing to be bound by any theory, in some cases, due to the “binary” nature of the electrically-polarizable region at the quantum scale (e.g., an “up” electric dipole moment and a “down” electric dipole moment), the portion of the shell is able to retain its polarization state for very long periods of time without any appreciable decay or “leakage,” as the quantum state of the portion of the electrically-polarizable region (e.g., an “up” electric dipole moment and a “down” electric dipole moment) prevents substantial leakage or intermediate values, and the nanoscale dimensions of the nanoscale wire allow the electrically-polarizable region to control the conductivity and/or other electrical properties of the nanoscale wire, as discussed herein. It should be noted that the designations of “1” for a polarized state and “0” for a depolarized or an oppositely polarized state are arbitrarily chosen, and that, in another embodiment of the invention, “0” may be chosen for a polarized state and “1” for a depolarized or an oppositely polarized state. With the benefit of the present disclosure, those of ordinary skill in the art will know of suitable techniques to read/write data to a nanoscale wire using any polarization encoding scheme.
In one embodiment, a polarized shell may change the conductance of the core proximate (i.e., in contact, or at least near) the polarized region with respect to an unpolarized shell, and higher amounts of polarization can have correspondingly greater effects on the conductivity in some cases (other embodiments are discussed in more detail, below). Thus, the polarization state of the shell may be determined by measuring the conductance of the core. For example, if the core comprises p-type doped silicon, a polarization state in a portion of the shell that is pointing towards the core (i.e., a “down” dipole moment) may decrease the conductance of the core, while a polarization state in the portion of the shell that is pointing away from the shell (i.e., an “up” dipole moment) will increase the conductance of the core. Additionally, the conductance of the core may be determined without changing the polarization state of the portion of the shell, e.g., by applying a voltage to the portion of the shell that is negative with respect to the voltage with which the polarization is written but smaller in value. One or more electrodes may be applied to the one or more portions of the shell in order to apply such voltages. Thus, by determining the conductance of the core proximate to each portion of the shell, the polarization state of that portion of the shell can be individually determined. For instance, higher conductance (e.g., with respect to the nanoscale wire before a reading voltage is applied) may indicate a lack of polarization in that portion of the shell (since a depolarized shell portion is typically not substantially altered by further depolarization), while a lower conductance may indicate polarization in that portion of the shell. Thus, the nanoscale wire may be treated as a transistor or a switch in some cases, where the core acts as a source and a drain, and each of the shell portions acts as a gate. By applying a reading voltage to each portion of the shell of a nanoscale wire in turn, the state of each portion of the nanoscale wire encoding data can be determined.
It should be understood that the invention is not limited only to barium titanate, but also includes other materials, such as ferroelectric oxide materials and/or other electrically-polarizable materials or functional oxide materials. For example, in one aspect, the invention includes a material able to retain its polarization state in the absence of an external electric field.
As used herein, a “functional oxide” material is a material, comprising an oxide, forming a coating or a shell on at least a portion of a nanoscale wire. A functional oxide typically will functionally affect the nanowire with which it is associated, either by affecting an electronic and/or emissive and/or other property of the nanowire, or by serving as a platform at which to attach molecules materials that affect the nanowire or its function, or the like. Examples of functional oxide materials include, but are not limited to, a high-K dielectric material, a ferroelectric oxide material, a ferromagnetic oxide material, or the like, e.g. as described herein. Combinations of these and/or other materials are also contemplated in certain embodiments of the invention. In some cases, the functional oxide material may be deposited on a nanoscale wire using techniques such as atomic layer deposition or other techniques described herein.
As used herein, a “ferroelectric oxide material” is a material that can be reversibly and stably polarized by an external stimulus, for example, an electric field and/or mechanical stress, such that the material retains its polarization state even when the external stimulus is removed. (As is understood by those of ordinary skill in the art, it should also be noted that a “ferroelectric oxide” material, despite its name, is not restricted to iron-containing materials and/or materials containing oxygen.) Typically, the ferroelectric oxide material has two states, which may be referred to, variously, as a “polarized” state and a “depolarized” state (or an “oppositely polarized” state), an “up” electric dipole moment and a “down” electric dipole moment, a relatively high conductivity state and a relatively low conductivity state, a first state having a dipole moment and a second state not having a dipole moment, etc. It should be understood, in the descriptions herein, references to two states of a ferroelectric oxide material, such as a “polarized” and a “depolarized” state, are by way of example only, and that in that in other embodiments, the states of a ferroelectric oxide material may be referred to as an “up” electric dipole moment and a “down” electric dipole moment, a relatively high conductivity state and a relatively low conductivity state, etc. Non-limiting examples of ferroelectric oxide material include barium titanate (BaTiO3), lead titanate (PbTiO3), lead zirconium titanate (Pb(Zr1-xTix)O3), strontium bismuth tantalate (SrBi2Ta2O6), bismuth lanthanum titanate (Bi(LaxTi1-x)4O12), strontium barium titanate (BaxSr1-xTiO3), germanium telluride (GeTe), or the like.
In one set of embodiments, the ferroelectric oxide material includes a material having a perovskite crystal structure, or an ilmenite crystal structure. Such crystal structures may have two or more one stable atomic states, for example, a first stable state where the atoms within the unit cell of the crystal structure are in a first position, and a second stable state where the atoms within the unit cell of the crystal structure are in a second position that is different from the first position. The perovskite crystal structure can thus be an electrically polarizable material that can be polarized in the first state or in the second state using different applied electric fields. Those of ordinary skill in the art will be able to identify materials having perovskite or ilmenite crystal structures. Examples of atoms which may be present within certain perovskite materials include, but are not limited to, barium, zirconium, titanium, lead, germanium, strontium, etc., as well as certain oxides thereof. In certain cases, the ferroelectric oxide material may comprise more than one type of unit cell. For example, the ferroelectric oxide material may comprise barium titanate and lead titanate, barium titanate and lead zirconium titanate, lead titanate and lead zirconium titanate, etc.
As used herein, a material or region that is “electrically polarizable” is a material whose polarization state may be changed upon the application of an electric field. In some embodiments, of the invention, the material or region that is electrically polarizable may be able to retain its polarization state when the electric field is removed, for example, in embodiments where the electrically-polarizable region comprises a ferroelectric oxide material and/or a functional oxide material. Thus, for example, a first electric field applied to a ferroelectric oxide material may cause the material (or at least a portion thereof) to enter a “polarized” state, and a second electric field may cause the material (or at least a portion thereof) to enter a “depolarized” or an “oppositely polarized” state. In some cases, the first electric field and the second electric field may have opposite signs (i.e., positive and negative electric fields). The electric field applied to the material or region may have an intensity and/or a duration at least sufficient to change the polarization state of the material or region. As discussed in more detail below, in some cases, the electrically-polarizable region may include two or more portions that can be independently polarized, i.e., a first portion of the electrically-polarizable region can be polarized or depolarized without substantially altering the state of polarization of a second portion of the electrically-polarizable region, a first portion of the electrically-polarizable region in which the conductivity can be enhanced without substantially altering the conductivity of a second portion of the electrically-polarizable region, etc.
It should also be understood that the invention is not limited to nanoscale wires having a core and a shell, but also includes other arrangements of nanoscale wires and other nanostructures as well. For example, in one embodiment, a nanostructure may comprise a first layer or region that is electrically-polarizable, and a second layer or region that is semiconductive or conductive, e.g., as is illustrated in
One set of embodiments provides a nanoscale wire having a first region comprising a ferroelectric oxide material (e.g., as previously discussed), and a second region, which may be free of a ferroelectric oxide material. For example, the second region may comprise a semiconductor such as silicon, a conductor, a high-K dielectric material, a metal, etc. Another set of embodiments provides a nanoscale wire having a first region that comprise a perovskite crystal structure and/or an ilmenite crystal structure, and a second region that is free of a perovskite crystal structure and/or an ilmenite crystal structure. Yet another set of embodiments provides a nanoscale wire having a first region that is electrically-polarizable, and a second region that is not electrically-polarizable. Still another set of embodiments provides a nanoscale wire having a first region that has a dielectric constant of at least about 15, and a second region having a dielectric constant less than the first region. Yet another set of embodiments of the invention provides a nanoscale wire having a first region comprising a functional oxide material, and a second region which may be free of a functional oxide material. Combinations of these embodiments are also possible in some cases. More than two regions within a nanoscale wire are also possible (for example, the nanoscale wire may have two, three, four, five, or more such regions), and these regions may have unique compositions and/or some of these regions may comprise the same compositions, e.g., as is shown in
The regions may be positioned in any arrangement with respect to each other, for example, radially (e.g., as in a core/shell structure, as shells of a core/shell structure, etc.) or longitudinally (e.g., the regions may be adjacently positioned along a longitudinal axis of the nanoscale wire). Combinations of these arrangements are also possible. For example, a nanoscale wire may have a first region and a second region adjacently positioned to the first region along a longitudinal axis of the nanoscale wire, surrounded by at least one shell; the nanoscale wire may have two, three, or more shells at least partially surrounding a core, etc. Each region may have any shape or dimension. For instance, a region may have a smallest dimension of less than 1 micrometer, less than 100 nm, less than 10 nm, or less than 1 nm. In some cases, one or more regions may comprise a single monolayer of atoms. In certain arrangements, the region may be less than a single monolayer thick (for example, if some of the atoms within the monolayer are absent). The regions of the nanoscale wire may be distinct from each other with minimal cross-contamination (for example, the junction between two differing regions may be “atomically-abrupt,” where there is a sharp transition at the atomic scale between two adjacent regions that differ in composition), or the composition of the nanoscale wire may vary gradually from one region to the next. As an example, an “overlap region” between adjacent regions may be a few nanometers wide, for example, less than about 10 nm, less than about 20 nm, less than about 40 nm, less than about 50 nm, less than about 100 nm, or less than about 500 nm. In some cases, an additional, separation region may be added to the nanoscale wire to separate these regions. For instance, the separation region may prevent or at least reduce atomic diffusion between other regions of the nanoscale wire.
A nanoscale wire may have two, three, or more shells at least partially surrounding a core (e.g., a “core/shell arrangement”), according to some embodiments of the invention. For example, in
One set of embodiments of the invention additionally includes a high-K dielectric material, for example, positioned as a shell or other region of a nanoscale wire or other nanostructure. The high-K dielectric material may be positioned anywhere within the nanoscale wire. As used herein, a “high-K dielectric material” is a material that is generally a poor conductor of electricity, but is a relatively efficient supporter of an electric field, i.e., the material permits an electric field to be transmitted therethrough, but does not readily permit an electric current to pass. Such properties may be determined, for instance, by determining the dielectric constant (“K”) of the material, using techniques known to those of ordinary skill in the art. A high-K dielectric material may have a relatively high dielectric constant, for example, a dielectric constant of at least about 10, and in some cases, the dielectric constant may be at least about 15, at least about 20, at least about 25, at least about 30, at least about 40, or at least about 50. Non-limiting examples of materials having relatively high dielectric constants include certain ceramic materials, mica, glass, or certain polymers. In some embodiments, the high-K dielectric material may include materials that comprise compounds of zirconium, hafnium, aluminum, etc. having relatively high dielectric constants. In one embodiment, the high-K dielectric material includes one or more oxides (i.e., inorganic materials comprising one or more oxygen atoms). Those of ordinary skill in the art will know of oxides having suitable dielectric constants. Non-limiting examples include metal oxides, for example, comprising zirconium or hafnium; specific examples include ZrO2, ZrSiO4, HfO2, HfSiO4, Al2O3, or the like. In some cases, more than one material having a high dielectric constant may be used.
In some embodiments, the high-K dielectric material may be positioned between a semiconductive or conductive region of a nanoscale wire, and an electrically polarizable region in a nanoscale wire. The high-K dielectric material may be chosen to have a dielectric constant, according to some embodiments, such that the material is able to enhance the ability of the electrically polarizable region to retain its polarization state, for example, by preventing or at least limiting current flow between the semiconductive or conductive region and the electrically polarizable region. In some cases, e.g., if the nanoscale wire has a core/shell arrangement where the semiconductive or conductive region is the core and the electrically polarizable region is a shell of the nanoscale wire, the high-K dielectric material may be positioned as another shell of the nanoscale wire, for instance, positioned between at least a portion of the electrically polarizable shell and at least a portion of the core of the nanoscale wire. As an example, in
The high-K dielectric material may be positioned directly adjacent to the semiconductive or conductive region, and/or to the electrically polarizable region, or indirectly positioned such that an electric field created between the semiconductive or conductive region and the electrically polarizable region substantially contacts at least a portion of the high-K dielectric material (e.g., to an extent that can be measured). For example, another region of material (for example, comprising a metal, as discussed below) may be positioned between the high-K dielectric material and the electrically polarizable region.
As other examples, in some embodiments, the high-K dielectric material may be positioned, directly or indirectly, between two or more regions of a nanoscale wire, for example, between two or more regions as previously described. For instance, the high-K dielectric material may be positioned between a first region comprising a ferroelectric oxide material and a second region free of a ferroelectric oxide material, between a first region comprising a perovskite crystal structure and/or an ilmenite crystal structure and a second region free of a perovskite crystal structure and/or an ilmenite crystal structure, between a first region having a dielectric constant of at least about 15 and a second region having a dielectric constant less than the first region, between a first region comprising a functional oxide material and a second region free of a functional oxide material, etc.
Another set of embodiments of the invention additionally includes a separation region separating two or more other regions within a nanoscale wire or other nanostructure, for example, a semiconductive or conductive region, and/or an electrically polarizable region, or any of the other regions described above. The separation region may prevent (or at least reduce) atomic diffusion to other regions of the nanoscale wire. In some embodiments, the separation region can be defined by a material having an intraatomic diffusion coefficient that is less than the regions adjacent the separation region. In another embodiment, the separation region may include a metal (e.g., a noble metal, such as gold or platinum), or an oxide (e.g., SiO2). In yet another embodiment, the separation region includes, or is defined by, a high-K dielectric material. Thus, with reference to
In still another set of embodiments, the nanoscale wire or other nanostructure includes a region comprising a metal, for example, separating two or more other regions within a nanoscale wire, for instance, a semiconductive or conductive region, and/or an electrically polarizable region, or any of the other regions described above. The region comprising the metal may allow a better connection to be made between regions of the nanoscale wire, for example, due to a reduction in strain due to differences in atomic spacing between the different regions. In some cases, the metal region may also be used to prevent or at least reduce atomic diffusion to other regions of the nanoscale wire. Examples include, but are not limited to, noble metals such as gold, platinum, palladium, rhodium, silver, or iridium.
It should be understood that any combination of the regions described above are contemplated in certain embodiments of the invention. Thus, for example, a nanoscale wire or another nanostructure may comprise a semiconductive or conductive region, a high-K dielectric material, a region comprising a metal, and an electrically polarizable region, and in some cases, these regions may be distributed in a core/shell arrangement. Thus, as is illustrated in
In one set of embodiments, the nanoscale wire or other nanostructure comprises an electrically-polarizable region that includes two or more portions that can be independently polarized. For instance, a first portion of an electrically-polarizable region can be polarized or depolarized without substantially altering the polarization state of an adjacent portion of the nanoscale wire. Thus, upon electrically polarizing or depolarizing the first portion of the electrically-polarizable region, the polarization state of the second portion of the electrically-polarizable region is not substantially altered (e.g., the second portion is not simultaneously polarized or depolarized), and when read (as discussed below), results in the same data as prior to polarization or depolarization of the first portion.
In one embodiment, the portions of the electrically-polarizable region that can be independently polarized or depolarized are separated by a distance (center-to-center) of at least 3 unit cells, and in some cases, the portions may be separated by a distance of at least 4 unit cells, at least 5 unit cells, at least 7 unit cells, at least 10 unit cells, at least 15 unit cells, at least 20 unit cells, at least 25 unit cells, at least 50 unit cells, etc. As used herein, a “unit cell” is the simplest repeating unit in the crystal structure of the electrically-polarizable region. Those of ordinary skill in the art will know of suitable techniques for determining the unit cell size of a material. As a specific example, if the electrically-polarizable region comprises a BaTiO3 perovskite crystal structure, the unit cell size may be about 0.4 nm.
In another embodiment, the portions of the electrically-polarizable region that can be independently polarized or depolarized are defined by one or more electrodes, each independently positioned in contact or proximate to the electrically-polarizable region (i.e., at a distance such that, when an electric field of suitable intensity and duration is applied using the electrode, the portion of the electrically-polarizable region proximate the electrode is polarized of depolarized without adjacent regions of the nanoscale wire being substantially altered). In some cases, at least one electrode is in contact or is proximate to the electrically-polarizable region, and in some cases, at least 2, 3, 5, 10, 20, 50, 75, or 100 electrodes each are in contact and/or are proximate to the electrically-polarizable region, for example, in contact or proximate to different portions of the electrically-polarizable region. In certain, but not all, instances, for example, due to practical considerations, no more than 100, 50, 20, or 10 electrodes each are in contact or are proximate to the electrically-polarizable region. As further discussed below, in some cases, a nanoscale wire may be used to encode more than one bit of data, and in certain embodiments of the invention, each electrode may be used to encode and/or read bits of data in the nanoscale wire.
In some embodiments, the electrodes may be positioned such that they are separated by a distance of at least a 3 unit-cell spacing of the electrically-polarizable region. In other embodiments, however, the electrodes may be positioned such that they are separated by greater distances. For example, in some cases, the electrodes are positioned such that they are separated by a distance of at least 4 unit cells, at least 5 unit cells, at least 7 unit cells, at least 10 unit cells, at least 15 unit cells, at least 20 unit cells, at least 25 unit cells, at least 50 unit cells, etc. with respect to the electrically-polarizable region. In other cases, the electrodes may be separated by a distance of at least about 1 nm, at least about 2 nm, at least about 3 nm, at least about 5 nm, at least about 10 nm, at least about 15 nm, at least about 20 nm, at least about 25 nm, at least about 30 nm, at least about 40 nm, at least about 50 mm, at least about 75 nm, at least about 100 nm, at least about 150 nm, at least about 200 nm, at least about 250 nm, at least about 300 nm, at least about 500 nm, or at least about 1 micron.
In one embodiment, as schematically illustrated in
The electrodes can be fabricated from any material able to transmit a voltage to the nanoscale wire, e.g., to the electrically-polarizable region. The electrodes may each independently be fabricated from the same or different materials. For example, the electrodes can comprise a metal (e.g., nickel, copper, a noble metal, such as gold or platinum, etc.), or a semiconductor material (e.g., silicon, gallium, germanium, etc.). In one embodiment, one or more or electrodes may comprise another nanoscale wire.
The electrodes can be positioned in contact or at least proximate to the electrically-polarizable region of the nanoscale wire using any suitable technique known to those of ordinary skill in the art, for example, using electron beam lithography or photolithography techniques, for instance, followed by metal deposition (e.g. thermal evaporation, electron beam evaporation, etc. of a metal such as nickel, titanium, noble metals such as palladium, etc.). Typically, the electrodes are immobilized with respect to the nanoscale wire (i.e., the electrode does not move with respect to the nanoscale wire). Thus, the immobilized electrode can be used to define, in some embodiments, a portion of the electrically-polarizable region of the nanoscale wire that can be used to encode a bit of data.
It should be noted, however; that electrodes are not necessarily required in all embodiments. For instance, in some cases, an electric field may be applied to the nanoscale using a device external to the nanoscale wire. For example, a probe such as an atomic force microscope (“AFM”) probe may be positioned proximate to or in contact with the nanoscale wire, and used to apply an electric field to the portion of the electrically-polarizable region of the nanoscale wire.
In some aspects of the invention, one or more bits of data may be encoded into a nanoscale wire or other nanostructure of the invention, for instance, by using a nanoscale wire comprising an electrically-polarizable region that includes two or more portions that can be independently polarized, as described above. For example, a first polarization state can be assigned “0” (for example, a depolarized state, a relatively high conductivity state, etc.) and a second polarization state can be assigned “1” (for example, a polarized state, a relatively low conductivity state, etc.). It should be noted that, as used herein, the term “bit” or “bits” is used relative to data and typically has two states, often referred to as “0” and “1”; while the term “bit” or “bits,” as used to measure information content in an information theory sense (for example, when a computer file is mathematically “compressed” to reduce the file size, such that each “bit” is thereby used to encode multiple pieces of information) is not used herein.
Thus, a nanoscale wire of the invention may include an electrically-polarizable region comprising any number of portions that can each be independently polarized or depolarized, and such a nanoscale wire may be used to encode a similar number of bits of data. For example, at least 1, 2, 3, 5, 10, 20, 50, 75, or 100 bits of data may be encoded within a nanoscale wire of the invention. The actual number of a nanoscale wire may depend on factors such as the size or length of the nanoscale wire, the number of electrodes positioned adjacent or proximate the nanoscale wire, etc. In certain instances, for example, due to practical considerations, no more than 100, 50, 20, or 10 bits of data may be encoded within the nanoscale wire.
As previously discussed, in certain embodiments of the invention, one or more electrodes positioned in contact or at least proximate to the electrically-polarizable region may be used to define one or more portions of the electrically-polarizable region, each independently capable of encoding a bit of data. The electrodes may be used to encode (write) and/or read bits of data to/from the nanoscale wire.
In one set of embodiments, a portion of an electrically-polarizable region may be polarized (e.g., to encode a bit of data, for example, a “1”) by applying an electric field to that portion that has an intensity and/or a duration at least sufficient to cause that portion to be polarized (e.g., using a “writing” voltage to create the electric field). Thus, according to this embodiment, if the portion was previously depolarized, the region is now polarized; if the portion was previously polarized, the region remains polarized. The electric field may be applied to the portion of an electrically-polarizable region using any suitable technique. For example, the electric field may be created using the nanoscale wire (for instance, by applying a current to a semiconductive or conductive region of a nanoscale wire), or the electric field may be externally applied to the nanoscale wire, for example, using an electrode, an external probe, etc. As a specific, non-limiting example, in
Relatively low “writing” voltages may be used in some cases, due to the nanoscopic nature of the wire. For example, in one set of embodiments, voltages having a magnitude (i.e., ignoring sign) of less than about 5 V, less than about 4.5 V, less than about 4 V, less than about 3.5 V, less than about 3 V, less than about 2.5 V, less than about 2 V, less than about 1.8 V, less than about 1.6 V, less than 1.4 V, less than about 1.2 V, less than about 1 V, less than about 0.8 V, or less than about 0.5 V may be used to alter the polarization state of the portion of an electrically-polarizable region. In some cases, the writing voltage may also be greater than a certain value, for example, greater than 2 V, greater than 3 V, greater than 4 V, etc. As non-limiting examples, the writing voltage may be between about 3 V and about 5 V, between about 4 V and about 5 V, etc. The voltage applied may be sufficient to alter the polarization state of the electrically-polarizable region (for example, from a depolarized state to a polarized state).
In some embodiments, the magnitude voltage required to polarize the portion of the electrically-polarizable region may be greater than (or less than) the magnitude of the voltage required to depolarize the portion of the electrically polarizable region, i.e., the magnitudes of the polarization and depolarization voltages are not equal. As an example, in one embodiment, the voltage that may be required to polarize (“writing”) the portion of the electrically polarizable region may be between +4 V and +5 V, while the voltage required to depolarize (“erase”) the portion of the electrically polarizable region bay be between −3 V and −4 V.
In one embodiment, an electric field is created by creating a potential difference between an electrode or other probe positioned in contact or at least proximate to the portion of the electrically-polarizable region, and a semiconductive or conductive region of the nanoscale wire. For example, a voltage may be applied to the electrode while the semiconductive or conductive region is grounded or a voltage of the opposite sign is applied to the semiconductive or conductive region, or a relatively larger voltage may be applied to the electrode while a relatively smaller voltage is applied to the semiconductive or conductive region or the region is grounded. Similarly, the portion of the electrically-polarizable region may be depolarized (e.g., to encode a bit of data, for example, a “0”) by applying an electric field to that portion that has an intensity and/or a duration at least sufficient to cause that portion to be depolarized, for example, by applying an electric field, having an opposite sign to the polarizing electric field, to that portion of the electrically-polarizable region using techniques similar to those described above. As before, if the portion was previously polarized, the region is now depolarized; if the portion was previously depolarized, the region remains depolarized (or oppositely polarized).
If the nanoscale wire comprises more than one portion that can be electrically polarized, the various portions may be independently polarized or depolarized. For example, in one embodiment, a first electric field may be applied to a first portion, and a second electric field (which may be the same or different than the first electric field, or which may be absent, i.e., having zero intensity) may be applied to a second portion of the nanoscale wire. As a specific example, with reference to
The polarization state of the portion of an electrically-polarizable region may be determined using any suitable technique, including those previously described. For example, in one set of embodiments, the polarization state may be determined by applying a voltage (i.e., a “reading” voltage) to the portion of the electrically-polarizable region while simultaneously measuring the conductance of a semiconductive or conductive region of the nanoscale wire positioned adjacent or proximate the electrically-polarizable region (i.e., positioned such that the polarization state of the portion of the electrically-polarizable region alters the conductance of the semiconductive or conductive region), for example, if the electrically-polarizable region comprises a ferroelectric oxide material or a functional oxide material. In some cases, the voltage may be applied to the portion of the electrically-polarizable region using an electrode positioned in contact or at least proximate to the portion of the electrically-polarizable region. In certain instances, the electrode or other probe may also be the electrode used to polarize (“write” or “encode”) the electrically-polarizable region.
Typically, the voltage applied to the portion of the electrically-polarizable region does not have an intensity and/or a duration sufficient to alter the polarization state of the portion of the electrically-polarizable region. For example, if the electrically-polarizable semiconductive region comprises p-type doped silicon, and polarization is “written” to at least one portion of the electrically-polarizable region, then a positive voltage applied to a polarized portion may decrease the conductance of the semiconductive or conductive region, relative to the absence of the applied voltage, while a negative voltage applied to the polarized portion may increase the conductance of the semiconductive or conductive region, relative to the absence of the applied voltage. Thus, as a specific, non-limiting example, with reference to
In certain instances, relatively low “reading” voltages may be used to determine the polarization state, due to the nanoscopic nature of the wire. For example, in one set of embodiments, voltages having a magnitude of less than about 5 V, less than about 3 V, less than about 2.5 V, less than about 2 V, less than about 1.8 V, less than about 1.6 V, less than 1.4 V, less than about 1.2 V, less than about 1 V, less than about 0.8 V, or less than about 0.5 V may be used to determine the polarization state of the portion of an electrically-polarizable region. Additionally, in other embodiments, the read/write voltage ratio may also be kept relatively low. For example, the ratio between the reading voltage and the writing voltage may be less than about 1:10, less than about 1:5, less than about 1:3, less than about 1:2.5, less than about 1:2, less than about 1:1.8, less than about 1:1.6, less than about 1:1.5, less than about 1:1.4, less than about 1:1.3, less than about 1:1.2, or less than about 1:1.1. In some embodiments, different ratios of read/write voltages may be used for different portions of the nanoscale wire.
If the nanoscale wire comprises more than one portion that can be electrically-polarized, each portion may be independently determined (and/or combinations of portions may be determined, in some cases, for example, as discussed below in Example 1). For example, in one embodiment, a first electric field may be applied to a first portion, and a second electric field (which may be the same or different than the first electric field, or which may be absent, i.e., having zero intensity) may be applied to a second portion of the nanoscale wire. As a specific example, with reference to
It should also be noted that certain aspects of the invention can be used as a transistor or a switch. For instance, in one set of embodiments, an electrically-polarizable region of a nanoscale wire or other nanostructure may be used as a “gate,” while a semiconductive or conductive region of the nanoscale wire positioned in contact or at least proximate the electrically-polarizable region may be used as a “source” and a “drain” of the transistor or switch. Thus, as a specific example,
Additionally, in some cases, the nanoscale wire transistor may have more than one control terminal or “gate.” For example, in some embodiments, each electrode positioned in contact or proximate to a portion of an electrically-polarizable region of a nanoscale wire may define a terminal or “gate” region of that portion of the electrically-polarizable region. As a non-limiting example, with reference to
Thus, one aspect of the invention provides devices comprising any of the nanoscale wire or nanostructure embodiments described herein, including memory devices and/or devices comprising transistors, switches, or the like. Some devices may include one, or more than one, of the nanoscale wire embodiments described herein.
In one set of embodiments of the present invention, a nonvolatile memory is provided. A nanoscale wire of the invention may be used to encode one, or more than one, bit of data, and such nanoscale wires can retain the data even in the absence of power. In some cases, an array of nanoscale wires may be used as nonvolatile memory. In certain embodiments, a relatively high density of memory elements can be achieved. For example, in some cases, the device may comprise an array of memory elements, each having an area of less than about 100 nm2/bit, less than about 75 nm2/bit, less than about 50 nm2/bit, less than about 30 nm2/bit, less than about 25 nm2/bit, less than about 20 nm2/bit, less than about 15 nm2/bit, less than about 10 nm2/bit, less than about 8 nm2/bit, less than about 6 nm2/bit, or less than about 4 nm2/bit.
In one embodiment, an array of memory elements can be assembled using one or more nanoscale wires of the invention, crossed with one or more electrodes (e.g., as described herein). The electrodes may contact single nanoscale wires, or in some cases, the electrodes may contact more than one nanoscale wire, for example, as is illustrated in
One non-limiting example of a memory array is as follows. With reference to
In this example, data may be written to an intersection by causing the nanoscale wire and the electrode defining the electrode to have potentials such that their difference is at least sufficient to encode a desired polarization state, while simultaneously “floating” the other nanoscale wires and electrodes (e.g., at an intermediate voltage, or at the voltage applied to the nanoscale wire), such that the electric potentials appearing elsewhere are not able to alter the polarization at those respective locations. Now referring to the schematic diagram of
Reading data from the memory array, in this example, can be performed by creating a potential across one of the nanoscale wires while simultaneously “floating” the other nanoscale wires (i.e., such that the potential difference across those nanoscale wires is negligible, for example, at the reading voltage), and applying voltages to each of the electrodes in turn and measuring the resulting conductivity of the nanoscale wire with the potential. Referring now to
In some cases, due to the nanoscale size of the instant device, relatively high read/write operations can be achieved. For example, data may be read and/or written to the device at a speed of at least about 5 Mb/s, at least about 10 Mb/s, at least about 15 Mb/s, at least about 20 Mb/s, at least about 25 Mb/s, at least about 30 Mb/s, at least about 35 Mb/s, at least about 40 Mb/s, at least about 50 Mb/s, at least about 55 Mb/s, at least about 60 Mb/s, at least about 65 Mb/s, at least about 70 Mb/s, at least about 75 Mb/s, at least about 80 Mb/s, at least about 85 Mb/s, at least about 85 Mb/s, at least about 90 Mb/s, at least about 95 Mb/s, or at least about 100 Mb/s or mote.
In still another set of embodiments, a nanoscale wire of the invention may be used as part of a ferroelectric random-access memory (FeRAM) component, for example, as part of a “smart” card, a radiofrequency identification (RFID) tag, or the like. For example, one or more nanoscale wires may be used in certain memory architectures. For example, the nanoscale wire may be used in a 1T1C architecture (one transistor “T”/one capacitor “C”) (e.g., as shown in
In yet other embodiments, the invention includes devices such as field effect transistors (FETs), bipolar junction transistors (BJTs), tunnel diodes, modulation doped superlattices, complementary inverters, light emitting devices, light sensing devices, biological system imagers, biological and chemical detectors or sensors, thermal or temperature detectors, Josephine junctions; nanoscale light sources, photodetectors such as polarization-sensitive photodetectors, gates, inverters, AND, NAND, NOT, OR, TOR, and NOR gates, latches, flip-flops, registers, switches, clock circuitry, static or dynamic memory devices and arrays, state machines, gate arrays, and any other dynamic or sequential logic or other digital devices including programmable circuits that use any of the nanoscale wire embodiments described herein. Also included are analog devices and circuitry, including but not limited to, amplifiers, switches and other analog circuitry using active transistor devices or switch devices, as well as mixed signal devices and signal processing circuitry. In some embodiments, the nanoscale wires of the present invention may be manufactured during the device fabrication process. In other embodiments, the nanoscale wires of the present inventions may first be synthesized, then assembled in a device.
Another aspect of the invention provides for the fabrication of any of the embodiments described herein. For example, one set of embodiments provides a method of depositing a material on a nanoscale wire (or other nanostructure) to form a region that is electrically-polarizable. Another set of embodiments provides a method of depositing a ferroelectric oxide material on a nanoscale wire to form a region comprising the ferroelectric oxide material. Yet another set of embodiments provides a method of depositing a functional oxide material on a nanoscale wire to form a region comprising the functional oxide material. Still another set of embodiments provides a method of depositing a material comprising a perovskite crystal structure and/or an ilmenite crystal structure on a nanoscale wire. Yet another set of embodiments provides a method of depositing a material having a dielectric constant of at least about 15 on a nanoscale wire. Another set of embodiments provides a method of depositing a metal on a nanoscale wire. Combinations of these embodiments are also possible in some cases. For instance, in certain embodiments, one or more materials may be deposited on the nanoscale wire to form one or more shells, each of which at least partially surrounding the nanoscale wire. In some instances, the nanoscale wire may be not immobilized, relative to a substrate, e.g., the nanoscale wire is not permanently attached to a substrate.
In certain cases, a material may be deposited using atomic layer deposition, using suitable precursor materials. Those of ordinary skill in the art will be able to determine suitable precursor materials, depending on the particular nanoscale wire to be synthesized. For example, water may be used as an oxygen source, zirconium chloride may be used as a zirconium source, barium bis(pentamethylcyclopentadienyl) may be used as a barium source, titanium tetraisopropoxide may be used as a titanium source, etc., to deposit a material on a nanoscale wire using atomic layer deposition. More than one source may be used, simultaneously or sequentially, in some cases. For example, to deposit BaTiO3 on a nanoscale wire, barium bis(pentamethylcyclopentadienyl), and titanium tetraisopropoxide may be supplied on an alternating basis during an atomic layer deposition process. In one embodiment, an atomic layer deposition reaction may be performed to deposit material on a substrate (which may be up to one atom in thickness in some cases) by providing the substrate (e.g., a nanoscale wire), applying a pulse of a reactant, followed by a purge. Optionally, additional reactants and/or purges may be applied. The thickness of the deposition layer may be controlled by the number and/or duration of the reactants and/or purge cycles. As one non-limiting example, with reference to
Other techniques useful for fabricating nanoscale wires include, but are not limited to, vapor phase reactions (e.g., chemical vapor deposition (“CVD”) techniques such as metal-catalyzed CVD techniques, catalytic chemical vapor deposition (“C-CVD”) techniques, organometallic vapor phase deposition-MOCVD techniques, atomic layer deposition, chemical beam epitaxy, etc.), solution phase reactions (e.g., hydrothermal reactions, solvothermal reactions), physical deposition methods (e.g., thermal evaporation, electron-beam evaporation, laser ablation, molecular beam epitaxy), vapor-liquid-solid (“VLS”) growth techniques, laser catalytic growth (“LCG”) techniques, surface-controlled chemical reactions, or the like, for instance, as disclosed in Ser. No. 10/196,337, entitled “Nanoscale Wires and Related Devices,” filed Jul. 16, 2002, published as Publication No. 2003/0089899 on May 15, 2003, incorporated herein by reference. As a non-limiting example, if a nanoscale wire having a core/shell arrangement is to be fabricated, the core may be fabricated using one of these techniques, and one or more shells may be at least partially coated on at least a portion of the core, for example, using CVD techniques, LCG techniques, atomic layer deposition, or the like.
The following definitions will aid in the understanding of the invention. Certain devices of the invention may include wires or other components of scale commensurate with nanometer-scale wires, which includes nanotubes and nanowires. In some embodiments, however, the invention comprises articles that may be greater than nanometer size (e.g., micrometer-sized). As used herein, “nanoscopic-scale,” “nanoscopic,” “nanometer-scale,” “nanoscale,” the “nano-” prefix (for example, as in “nanostructured”), and the like generally refers to elements or articles having widths or diameters of less than about 1 micrometer, and less than about 100 nm in some cases. In all embodiments, specified widths can be a smallest width (i.e. a width as specified where, at that location, the article can have a larger width in a different dimension), or a largest width (i.e. where, at that location, the article has a width that is no wider than as specified, but can have a length that is greater).
The term “plurality,” as used herein, means two or more. A “set” of items may include one or more of such items.
The term “fluid” generally refers to a substance that tends to flow and to conform to the outline of its container. Typically, fluids are materials that are unable to withstand a static shear stress. When a shear stress is applied to a fluid, it experiences a continuing and permanent distortion. Typical fluids include liquids and gases, but may also include free-flowing solid particles, viscoelastic fluids, and the like.
As used herein, a “wire” generally refers to any material having a conductivity of or of similar magnitude to any semiconductor or any metal, and in some embodiments may be used to connect two electronic components such that they are in electronic communication with each other. For example, the terms “electrically conductive” or a “conductor” or an “electrical conductor” when used with reference to a “conducting” wire or a nanoscale wire, refers to the ability of that wire to pass charge. Typically, an electrically conductive nanoscale wire will have a resistivity comparable to that of metal or semiconductor materials, and in some cases, the electrically conductive nanoscale wire may have lower resistivities, for example, a resistivity lower than about 10−3 Ohm m, lower than about 10−4 Ohm m, or lower than about 10−6 Ohm m or 10−7 Ohm m.
A “nanoscopic wire” (also known herein as a “nanoscopic-scale wire” or “nanoscale wire”) generally is a wire, that at any point along its length, has at least one cross-sectional dimension and, in some embodiments, two orthogonal cross-sectional dimensions less than 1 micron, less than about 500 nm, less than about 200 nm, less than about 150 nm, less than about 100 nm, less than about 70, less than about 50 nm, less than about 20 nm, less than about 10 nm, or less than about 5 nm. In other embodiments, the cross-sectional dimension can be less than 2 nm or 1 nm. In one set of embodiments, the nanoscale wire has at least one cross-sectional dimension ranging from 0.5 nm to 100 nm or 200 nm. In some cases, the nanoscale wire is electrically conductive. In some embodiments, the nanoscale wire is cylindrical. In other embodiments, however, the nanoscale wire can be faceted, i.e., the nanoscale wire may have a polygonal cross-section. Where nanoscale wires are described having, for example, a core and a shell, the above dimensions generally relate to those of the core. The cross-section of a nanoscopic wire may be of any arbitrary shape, including, but not limited to, circular, square, rectangular, annular, polygonal, or elliptical, and may be a regular or an irregular shape. The nanoscale wire may be solid or hollow. Any nanoscale wire can be used in any of the embodiments described herein, including carbon nanotubes, molecular wires (i.e., wires formed of a single molecule), nanorods, nanowires, nanowhiskers, organic or inorganic conductive or semiconducting polymers, and the like, unless otherwise specified. Other conductive or semiconducting elements that may not be molecular wires, but are of various small nanoscopic-scale dimensions, can also be used in some instances, e.g. inorganic structures such as main group and metal atom-based wire-like silicon, transition metal-containing wires, gallium arsenide, gallium nitride, indium phosphide, germanium, cadmium selenide, etc. A wide variety of these and other nanoscale wires can be grown on and/or applied to surfaces in patterns useful for electronic devices in a manner similar to techniques described herein involving the specific nanoscale wires used as examples, without undue experimentation. The nanoscale wires, in some cases, may be formed having dimensions of at least about 1 micrometer, at least about 3 micrometers, at least about 5 micrometers, or at least about 10 micrometers or about 20 micrometers in length, and can be less than about 100 nm, less than about 80 nm, less than about 60 nm, less than about 40 nm, less than about 20 nm, less than about 10 nm, or less than about 5 nm in thickness (height and width). The nanoscale wires may have an aspect ratio (length to thickness) of greater than about 2:1, greater than about 3:1, greater than about 4:1, greater than about 5:1, greater than about 10:1, greater than about 25:1, greater than about 50:1, greater than about 75:1, greater than about 100:1, greater than about 150:1, greater than about 250:1, greater than about 500:1, greater than about 750:1, or greater than about 1000:1 or more in some cases.
A “nanowire” (e.g. comprising silicon and/or another semiconductor material) is a nanoscopic wire that is typically a solid wire, and may be elongated in some cases. Preferably, a nanowire (which is abbreviated herein as “NW”) is an elongated semiconductor, i.e., a nanoscale semiconductor. A “non-nanotube nanowire” is any nanowire that is not a nanotube. In one set of embodiments of the invention, a non-nanotube nanowire having an unmodified surface can be used in any arrangement of the invention described herein in which a nanowire or nanotube can be used.
As used herein, a “nanotube” (e.g. a carbon nanotube) is a nanoscopic wire that is hollow, or that has a hollowed-out core, including those nanotubes known to those of ordinary skill in the art. “Nanotube” is abbreviated herein as “NT.” Nanotubes are used as one example of small wires for use in the invention and, in certain embodiments, devices of the invention include wires of scale commensurate with nanotubes.
As used herein, an “elongated” article (e.g. a semiconductor or a section thereof) is an article for which, at any point along the longitudinal axis of the article, the ratio of the length of the article to the largest width at that point is greater than 2:1.
As used herein, a “width” of an article is the distance of a straight line from a point on a perimeter of the article, through the center of the article, to another point on the perimeter of the article. As used herein, a “width” or a “cross-sectional dimension” at a point along a longitudinal axis of an article is the distance along a straight line that passes through the center of a cross-section of the article at that point and connects two points on the perimeter of the cross-section. The “cross-section” at a point along the longitudinal axis of an article is a plane at that point that crosses the article and is orthogonal to the longitudinal axis of the article. The “longitudinal axis” of an article is the axis along the largest dimension of the article. Similarly, a “longitudinal section” of an article is a portion of the article along the longitudinal axis of the article that can have any length greater than zero and less than or equal to the length of the article. Additionally, the “length” of an elongated article is a distance along the longitudinal axis from end to end of the article.
As used herein, a “cylindrical” article is an article having an exterior shaped like a cylinder, but does not define or reflect any properties regarding the interior of the article. In other words, a cylindrical article may have a solid interior, may have a hollowed-out interior, etc. Generally, a cross-section of a cylindrical article appears to be circular or approximately circular, but other cross-sectional shapes are also possible, such as a hexagonal shape. The cross-section may have any arbitrary shapes including, but not limited to, square, rectangular, or elliptical. Regular and irregular shapes are also included.
As used herein, an “array” of articles (e.g., nanoscopic wires) comprises a plurality of the articles, for example, a series of aligned nanoscale wires, which may or may not be in contact with each other. As used herein, a “crossed array” or a “crossbar array” is an array where at least one of the articles contacts either another of the articles or a signal node (e.g., an electrode).
Many nanoscopic wires as used in accordance with the present invention are individual nanoscopic wires. As used herein, “individual nanoscopic wire” means a nanoscopic wire free of contact with another nanoscopic wire (but not excluding contact of a type that may be desired between individual nanoscopic wires, e.g., as in a crossbar array). For example, an “individual” or a “free-standing” article may, at some point in its life, not be attached to another article, for example, with another nanoscopic wire, or the free-standing article may be in solution. This is in contrast to nanotubes produced primarily by laser vaporization techniques that produce materials formed as ropes having diameters of about 2 nm to about 50 nm or more and containing many individual nanotubes (see, for example, Thess, et al., “Crystalline Ropes of Metallic Carbon Nanotubes,” Science, 273:483-486 (1996)). This is also in contrast to conductive portions of articles which differ from surrounding material only by having been altered chemically or physically, in situ, i.e., where a portion of a uniform article is made different from its surroundings by selective doping, etching, etc. An “individual” or a “free-standing” article is one that can be (but need not be) removed from the location where it is made, as an individual article, and transported to a different location and combined with different components to make a functional device such as those described herein and those that would be contemplated by those of ordinary skill in the art upon reading this disclosure.
In some embodiments, at least a portion of a nanoscopic wire may be a bulk-doped semiconductor. As used herein, a “bulk-doped” article (e.g. an article, or a section or region of an article) is an article for which a dopant is incorporated substantially throughout the crystalline lattice of the article, as opposed to an article in which a dopant is only incorporated in particular regions of the crystal lattice at the atomic scale, for example, only on the surface or exterior. For example, some articles such as carbon nanotubes are typically doped after the base material is grown, and thus the dopant only extends a finite distance from the surface or exterior into the interior of the crystalline lattice. It should be understood that “bulk-doped” does not define or reflect a concentration or amount of doping in a semiconductor, nor does it necessarily indicate that the doping is uniform. In particular, in some embodiments, a bulk-doped semiconductor may comprise two or more bulk-doped regions. Thus, as used herein to describe nanoscopic wires, “doped” refers to bulk-doped nanoscopic wires, and, accordingly, a “doped nanoscopic (or nanoscale) wire” is a bulk-doped nanoscopic wire. “Heavily doped” and “lightly doped” are terms the meanings of which are clearly understood by those of ordinary skill in the art. In some cases, one or more regions may comprise a single monolayer of atoms (“delta-doping”). In certain cases, the region may be less than a single monolayer thick (for example, if some of the atoms within the monolayer are absent). As a specific example, the regions may be arranged in a layered structure within the nanoscale wire, and one or more of the regions may be delta-doped or partially delta-doped.
As used herein, the term “Group,” with reference to the Periodic Table, is given its usual definition as understood by one of ordinary skill in the art. For instance, the Group II elements include Mg and Ca, as well as the Group II transition elements, such as Zn, Cd, and Hg. Similarly, the Group III elements include B, Al, Ga, In and Tl; the Group IV elements include C, Si, Ge, Sn, and Pb; the Group V elements include N, P, As, Sb and Bi; and the Group VI elements include O, S, Se, Te and Po. Combinations involving more than one element from each Group are also possible. For example, a Group II-VI material may include at least one element from Group II and at least one element from Group VI, for example, ZnS, ZnSe, ZnSSe, ZnCdS, CdS, or CdSe. Similarly, a Group III-V material may include at least one element from Group III and at least one element from Group V, for example GaAs, GaP, GaAsP, InAs, InP, AlGaAs, or InAsP. Other dopants may also be included with these materials and combinations thereof, for example, transition metals such as Fe, Co, Te, Au, and the like.
As used herein, a “semiconductor” is given its ordinary meaning in the art, i.e., an element having semiconductive or semi-metallic properties (i.e., between metallic and non-metallic properties). An example of a semiconductor is silicon. Other non-limiting examples include elemental semiconductors, such as gallium, germanium, diamond (carbon), tin, selenium, tellurium, boron, or phosphorous. The semiconductor may be undoped or doped (e.g., p-type or n-type).
As used herein, a “single crystal” item (e.g., a semiconductor) is an item that has covalent bonding, ionic bonding, or a combination thereof throughout the item. Such a single crystal item may include defects in the crystal, but is distinguished from an item that includes one or more crystals, not ionically or covalently bonded, but merely in close proximity to one another.
The following U.S. provisional and utility patent application documents are incorporated herein by reference in their entirety for all purposes: Ser. No. 60/633,733, entitled “Nanoscale Wire Based Data Storage,” filed Dec. 6, 2004; Ser. No. 60/142,216, entitled “Molecular Wire-Based Devices and Methods of Their Manufacture,” filed Jul. 2, 1999; Ser. No. 60/226,835, entitled, “Semiconductor Nanowires,” filed Aug. 22, 2000; Ser. No. 10/033,369, entitled “Nanoscopic Wire-Based Devices and Arrays,” filed Oct. 24, 2001, published as Publication No 2002/0130353 on Sep. 19, 2002; Ser. No. 60/254,745, entitled, “Nanowire and Nanotube Nanosensors,” filed Dec. 11, 2000; Ser. No. 60/292,035, entitled “Nanowire and Nanotube Nanosensors,” filed May 18, 2001; Ser. No. 60/292,121, entitled, “Semiconductor Nanowires,” filed May 18, 2001; Ser. No. 60/292,045, entitled “Nanowire Electronic Devices Including Memory and Switching Devices,” filed May 18, 2001; Ser. No. 60/291,896, entitled “Nanowire Devices Including Emissive Elements and Sensors,” filed May 18, 2001; Ser. No. 09/935,776, entitled “Doped Elongated Semiconductors, Growing Such Semiconductors, Devices Including Such Semiconductors, and Fabricating Such Devices,” filed Aug. 22, 2001, published as Publication No. 2002/0130311 on Sep. 19, 2002; Ser. No. 10/020,004, entitled “Nanosensors,” filed Dec. 11, 2001, published as Publication No. 2002/0117659 on Aug. 29, 2002; Ser. No. 60/348,313, entitled “Transistors, Diodes, Logic Gates and Other Devices Assembled from Nanowire Building Blocks,” filed Nov. 9, 2001; Ser. No. 60/354,642, entitled “Nanowire Devices Including Emissive Elements and Sensors,” filed Feb. 6, 2002; Ser. No. 10/152,490, entitled, “Nanoscale Wires and Related Devices,” filed May 20, 2002; Ser. No. 10/196,337, entitled, “Nanoscale Wires and Related Devices,” filed Jul. 16, 2002, published as Publication No. 2003/0089899 on May 15, 2003; Ser. No. 60/397,121, entitled “Nanowire Coherent Optical Components,” filed Jul. 19, 2002; Ser. No. 10/624,135, entitled “Nanowire Coherent Optical Components,” filed Jul. 21, 2003; Ser. No. 60/524,301, entitled, “Nanoscale Arrays and Related Devices,” filed Nov. 20, 2003; Ser. No. 60/397,121, entitled “Nanowire Coherent Optical Components,” filed Dec. 11, 2003; Ser. No. 60/544,800, entitled “Nanostructures Containing Metal-Semiconductor Compounds,” filed Feb. 13, 2004; Ser. No. 10/347,121, entitled, “Array-Based Architecture for Molecular Electronics,” filed Jan. 17, 2003; Ser. No. 10/627,405, entitled “Stochastic Assembly of Sublithographic Nanoscale Interfaces,” filed Jul. 24, 2003; Ser. No. 10/627,406, entitled “Sublithographic Nanoscale Memory Architecture,” filed Jul. 24, 2003; Ser. No. 60/524,301, entitled “Nanoscale Arrays and Related Devices,” filed Nov. 20, 2003; Ser. No. 60/551,634, entitled “Robust Nanostructures,” filed Mar. 8, 2004; and a patent application entitled “Nanoscale Arrays, Robust Nanostructures, and Related Devices,” filed Nov. 22, 2004. The following International Patent Publication is incorporated herein by reference in their entirety for all purposes: Application Serial No. PCT/US00/18138, entitled “Nanoscopic Wire-Based Devices, Arrays, and Methods of Their Manufacture,” filed Jun. 30, 2000, published as Publication No. WO 01/03208 on Jan. 11, 2001; Application Serial No. PCT/US01/26298, entitled “Doped Elongated Semiconductors, Growing Such Semiconductors, Devices Including Such Semiconductors, and Fabricating Such Devices,” filed Aug. 22, 2001, published as Publication No. WO 02/17362 on Feb. 28, 2002; Application Serial No. PCT/US01/48230, entitled “Nanosensors,” filed Dec. 11, 2001, published as Publication No. WO 02/48701 on Jun. 20, 2002; Application Serial No. PCT/US02/16133, entitled “Nanoscale Wires and Related Devices,” filed May 20, 2002, published as Publication No. WO 03/005450 on Jan. 16, 2003.
The following examples are intended to illustrate certain embodiments of the present invention, but do not exemplify the full scope of the invention.
This example demonstrates the synthesis of semiconductor/dielectric oxide/ferroelectric oxide core/shell/shell nanoscale wire structure, specifically p-Si/ZrO2/BaTiO3 core/shell/shell nanoscale wires (
The synthesis starts from chemical vapor deposition growth of p-type silicon nanoscale wires using gold colloids as a catalyst, silane as a reactant, and diborane as a dopant in the well-known VLS growth process. After growth, the growth wafer was transferred directly into an atomic layer deposition reactor. ZrO2 high-K dielectric oxide was deposited onto the Si nanoscale wires to make p-Si/ZrO2 core/shell nanoscale wires by using ZrCl4 as a Zr source and water vapor as an oxygen source. ZrO2 can function as a high-K dielectric, which can enhance performance of the Si nanoscale wire field-effect transistor by providing a stronger electric field coupling between the Si channel and the metal gate of the transistor. ZrO2 may also be effective as a diffusion barrier to stop compositional diffusion from BaTiO3 towards Si. ZrO2 may also help to achieve a longer retention time by reducing the speed of degradation/lose of data stored in BaTiO3 shell (also known as depolarization time). In some cases, ZrO2 may be chemically etched away, which may allow ohmic contacts to be made with the Si nanoscale wire core. However, in other embodiments, other dielectric oxides can also be used, for example, Al2O3 and/or HfO2, and in some cases, more than one dielectric oxide may be used, for example, ZrO2 and Al2O3, ZrO2 and HfO2, etc.
After depositing about 2 nm to about 3 nm of ZrO2 on the Si nanoscale wire core, the precursors were changed to allow for the deposition of BaTiO3 on the Si/ZrO2 core/shell nanoscale wires to make the final Si/ZrO2/BaTiO3 core/shell/shell nanoscale wire. The precursors used in this example were barium bis(pentamethylcyclopentadienyl) as the barium source, titanium tetraisopropoxide as the titanium source, and water vapor as the oxygen source.
Examples of nanoscale wires produced using these techniques are illustrated in
After synthesis, the core/shell/shell nanoscale wires were characterized by elemental mapping.
Electrostatic force microscopy was used to characterize the ferroelectric behavior of the core/shell/shell wires. In these experiments, a conductive atomic force microscopy tip was used to apply a local electric field on BaTiO3 shell of the Si/ZrO2/BaTiO3 nanoscale wire, and at the same time, ground the Si nanoscale wire core from the source and the drain. In
To demonstrate memory devices based on these Si/ZrO2/BaTiO3 core/shell/shell nanoscale wires, a FET type device was fabricated with source-drain metal contacts on the Si core by chemically etching the BaTiO3 and ZrO2 shells away and adding a top metal gate on the BaTiO3 shell, using techniques analogous to MFIS (Metal gate/Ferroelectric oxide/Insulator/Semiconductor) planar devices. Transport data (
In some cases, these nanoscale wires can be used to store multiple bits of data per transistor. To demonstrate this feature, three metal top gates (A, B, and C) were fabricated onto one Si/ZrO2/BaTiO3 nanoscale wire (
Additional data can be seen in
Dense arrays of nanoscale wires are also possible, as ferroelectric states can persist down to the domain thickness of 1.2 nm. In some cases, other nanowires, for example NiSi nanowires as discussed in U.S. Provisional Patent Application Ser. No. 60/544,800, filed Feb. 13, 2004, entitled “Nanostructures Containing Metal-Semiconductor Compounds,” by Lieber, et al., or International Patent Application Serial No. PCT/US2005/004459 filed Feb. 14, 2005, entitled “Nanostructures Containing Metal Semiconductor Compounds,” by Lieber, et al., each incorporated herein by reference, may be crossed with the Si/ZrO2/BaTiO3 nanoscale wires to achieve a high density for data storage.
This example illustrates the fabrication of silicon-functional oxide core-shell nanowire heterostructures by atomic layer deposition (ALD), in which the conformal coating of various materials, including oxides, on silicon nanowires was achieved through cycled self-limiting surface reactions by alternating pulse and purge cycles for different reactants. The thickness of the coating was controlled by the number of deposition cycles down to the atomic scale, and thus, the technique may be suitable for fabricating multi-compositional heterostructures with clean interfaces.
One of the example structures synthesized was a silicon (Si)-zirconium oxide (ZrO2)-barium titanate (BaTiO3) semiconductor-dielectric oxide-ferroelectric oxide core-shell-shell nanowire heterostructure (
P-type Si nanowires were synthesized via chemical vapor deposition using monodisperse gold nanoclusters (Ted Pella, Inc., Redding, Calif.) as catalysts, silane (SiH4) as a vapor-phase reactant, and diborane (B2H6) as a dopant precursor. Following synthesis, the growth substrate with uniform diameter, free-standing Si nanowires was loaded into an ASM Microchemistry F120 atomic layer deposition system followed by deposition of ZrO2 and then BaTiO3. Zirconium chloride (ZrCl4) was used as the precursor for ZrO2. Barium bis(pentamethylcyclopentadienyl) (Ba(C5Me5)2) and titanium tetraisopropoxide (Ti(O-i-Pr)4) were used as precursors for BaTiO3. In both cases, water (H2O) vapor was used as oxygen source. After the depositions, the substrate was annealed at 800° C. in a tube furnace for 30 minutes. The annealing was carried out in oxygen with flow rate of 200 sccm (standard cubic centimeters per minute) at pressure of 450 Torr.
Transmission electron microscopy (TEM) studies (
The diametrical contrast observed in the TEM images (
Further detailed examination of microtomed cross sections of the core-shell nanowire heterostructures by high-resolution TEM (
The zone axes were further confirmed by the consistency between the crystal structures simulations (insets,
This example illustrates the synthesis of a well-defined semiconductor-functional oxide core-shell nanowire heterostructure with a clean interface. In this example, a field-effect transistor (FET) device was prepared based on a Si/ZrO2/BaTiO3 core-shell nanowire heterostructure (
Further measurements of the source-drain conductance versus gate voltage a bias voltage of −1.5 V showed a hysteresis loop in the gate sweep (
To show that the origin of the hysteresis loop was polarization switching in ferroelectric BaTiO3, electrostatic force microscopy (EFM) measurements were performed on the FET devices without a top gate (
In the EFM measurements a conductive AFM tip was used (silicon coated with Pt/Ir) as a local gate to replace the metal top gate. The device was grounded and scanned at the tip voltage to write polarization from −25 V to +25 V and then back to −25 V with 5 V intervals. The tip was kept at a constant height of 6 nm above the topological features during the writing. For EFM imaging of the polarization status, the device was also grounded and the tip was kept at +2 V with a constant height of 30 nm above the topological features. The electrostatic interaction between the BaTiO3 shell and the tip was sensed by the shift of resonant frequency of the tip cantilever. After writing at every data point, the device was biased at −1 V to monitor the conductance change.
These results generally showed that a ferroelectric polarization was locally generated in the BaTiO3 shell by a gate voltage applied on the conductive atomic force microscope (AFM) tip, which was retained until a sufficiently large opposite gate voltage was applied to flip the direction of the polarization. In these experiments, because a positive gate voltages was used to turn “off” the p-type FET device that was normally “on” at large conductances, the two polarization states, which corresponded to the bi-stable states at the gate sweep at 0 V gate voltage, were arbitrarily assigned as “0” for the state with high conductance “on” state (upper inset,
The switching speed and endurance of the core-shell nanowire heterostructure FET device was also characterized (
An FET device based on the heterostructure discussed above showed that the writing/erasing speed of the ferroelectric polarization was at least 100 ns, using pulses generated by a waveform function generator (insets,
The switching behavior was retained without obvious fatigue degradation, even after 107 cycles of writing and erasing (
This is illustrated in more detail in
In this example, for the FET-type memory devices based on ferroelectric oxide, the critical thickness for the ferroelectric oxides and the minimum gate width/pitch were examined. To address the first issue, core-shell nanowire heterostructures with thinner BaTiO3 shells were fabricated. Transport measurements (data not shown) showed that when the thickness of BaTiO3 shell was decreased to 10 nm, the expected depolarizing electrostatic field caused by dipoles at the ferroelectric oxide-metal gate interfaces substantially diminished the ferroelectric properties of the oxides. However, this can be overcome using strained perovskite oxide superlattice structures, which may reduce the critical thickness down to single-unit cell level.
A series of devices were fabricated with different gate widths from 500 nm to 20 nm (
The above examples suggest that different ferroelectric polarizations can exist on different domains in a small region of the nanowires without crosstalk, and their polarization statuses can still be distinguished individually. A device having these characteristics was prepared in this example (
Specifically, multiple gates crossing one FET devices were fabricated (
Using a similar approach, one can also store other combinations, such as 001, 110, etc., to the memory array, and correctly read them out. Further calculations (not shown) showed that the number of the distinguishable bits of data per transistor can be determined by the magnitude difference in the readout conductance between the fully correct readout and one mismatch, which can be extended by further optimizing FET performance. Moreover, this FET device with multiple gates may be considered as non-volatile NOR logic with multiple inputs, in which any input (polarizations created by positive gate voltage, regarded as “1”) will turn off the conducting channel and result the output (source voltage) to be low (“0”).
Additionally, several devices were prepared to integrate these core-shell nanowire heterostructures into large scale memory arrays and NOR logic device arrays by fabricating multiple gates crossing multiple well-aligned nanowires. However, during the writing procedure, the positive electric field applied on one gate could write polarizations into all the nanowires crossing the gate. To ensure that these cross points were individually addressable, compensation voltages were applied during writing. The function of the compensation voltages applied on both nanowires and gates was to create a relatively small potential drop cross the ferroelectric oxide to avoid any extra writing or disturbance to the possible existence of polarizations at other cross points.
For example, in a memory array (right inset,
The left inset in
A similar strategy was also adopted during the following writing of the cross point between nanowire W3 and gate E (red point in the inset, in
These results show that such strategy of applying writing and compensation voltage was efficient and allowed individual addressing of the cross points in the array. Further statistical analysis (
While several embodiments of the present invention have been described and illustrated herein, those of ordinary skill in the art will readily envision a variety of other means and/or structures for performing the functions and/or obtaining the results and/or one or more of the advantages described herein, and each of such variations and/or modifications is deemed to be within the scope of the present invention. More generally, those skilled in the art will readily appreciate that all parameters, dimensions, materials, and configurations described herein are meant to be exemplary and that the actual parameters, dimensions, materials, and/or configurations will depend upon the specific application or applications for which the teachings of the present invention is/are used. Those skilled in the art will recognize, or be able to ascertain using no more than routine experimentation, many equivalents to the specific embodiments of the invention described herein. It is, therefore, to be understood that the foregoing embodiments are presented by way of example only and that, within the scope of the appended claims and equivalents thereto, the invention may be practiced otherwise than as specifically described and claimed. The present invention is directed to each individual feature, system, article, material, kit, and/or method described herein. In addition, any combination of two or more such features, systems, articles, materials, kits, and/or methods, if such features, systems, articles, materials, kits, and/or methods are not mutually inconsistent, is included within the scope of the present invention.
All definitions, as defined and used herein, should be understood to control over dictionary definitions, definitions in documents incorporated by reference, and/or ordinary meanings of the defined terms.
The indefinite articles “a” and “an,” as used herein in the specification and in the claims, unless clearly indicated to the contrary, should be understood to mean “at least one.”
The phrase “and/or,” as used herein in the specification and in the claims, should be understood to mean “either or both” of the elements so conjoined, i.e., elements that are conjunctively present in some cases and disjunctively present in other cases. Multiple elements listed with “and/or” should be construed in the same fashion, i.e., “one or more” of the elements so conjoined. Other elements may optionally be present other than the elements specifically identified by the “and/or” clause, whether related or unrelated to those elements specifically identified. Thus, as a non-limiting example, a reference to “A and/or B”, when used in conjunction with open-ended language such as “comprising” can refer, in one embodiment, to A only (optionally including elements other than B); in another embodiment, to B only (optionally including elements other than A); in yet another embodiment, to both A and B (optionally including other elements); etc.
As used herein in the specification and in the claims, “or” should be understood to have the same meaning as “and/or” as defined above. For example, when separating items in a list, “or” or “and/or” shall be interpreted as being inclusive, i.e., the inclusion of at least one, but also including more than one, of a number or list of elements, and, optionally, additional unlisted items. Only terms clearly indicated to the contrary, such as “only one of” or “exactly one of,” or, when used in the claims, “consisting of,” will refer to the inclusion of exactly one element of a number or list of elements. In general, the term “or” as used herein shall only be interpreted as indicating exclusive alternatives (i.e. “one or the other but not both”) when preceded by terms of exclusivity, such as “either,” “one of,” “only one of,” or “exactly one of.” “Consisting essentially of”, when used in the claims, shall have its ordinary meaning as used in the field of patent law.
As used herein in the specification and in the claims, the phrase “at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements. This definition also allows that elements may optionally be present other than the elements specifically identified within the list of elements to which the phrase “at least one” refers, whether related or unrelated to those elements specifically identified. Thus, as a non-limiting example, “at least one of A and B” (or, equivalently, “at least one of A or B,” or, equivalently “at least one of A and/or B”) can refer, in one embodiment, to at least one, optionally including more than one, A, with no B present (and optionally including elements other than B); in another embodiment, to at least one, optionally including more than one, B, with no A present (and optionally including elements other than A); in yet another embodiment, to at least one, optionally including more than one, A, and at least one, optionally including more than one, B (and optionally including other elements); etc.
It should also be understood that, unless clearly indicated to the contrary, in any methods claimed herein that include more than one step or act, the order of the steps or acts of the method is not necessarily limited to the order in which the steps or acts of the method are recited.
In the claims, as well as in the specification above, all transitional phrases such as “comprising,” “including,” “carrying,” “having,” “containing,” “involving,” “holding,” “composed of,” and the like are to be understood to be open-ended, i.e., to mean including but not limited to. Only the transitional phrases “consisting of” and “consisting essentially of” shall be closed or semi-closed transitional phrases, respectively, as set forth in the United States Patent Office Manual of Patent Examining Procedures, Section 2111.03.
This application is a U.S. National Stage Application of PCT/US2005/044212, filed Dec. 6, 2005, entitled “Nanoscale Wire-Based Data Storage,” by Lieber, et al. which claims the benefit of U.S. Provisional Patent Application Ser. No. 60/633,733, filed Dec. 6, 2004, entitled “Nanoscale Wire Based Data Storage,” by Lieber, et al., which is incorporated herein by reference.
Various aspects of the present invention were sponsored by the Office of Naval Research, Grant Nos. N-00014-01-1-0651 and N00014-04-1-0591. The U.S. Government has certain rights in the invention.
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/US2005/044212 | 12/6/2005 | WO | 00 | 9/19/2008 |
| Publishing Document | Publishing Date | Country | Kind |
|---|---|---|---|
| WO2007/044034 | 4/19/2007 | WO | A |
| Number | Name | Date | Kind |
|---|---|---|---|
| 3873359 | Lando | Mar 1975 | A |
| 3873360 | Lando | Mar 1975 | A |
| 3900614 | Lando | Aug 1975 | A |
| 4673474 | Ogawa | Jun 1987 | A |
| 4939556 | Eguchi et al. | Jul 1990 | A |
| 5023139 | Birnboim et al. | Jun 1991 | A |
| 5089545 | Pol | Feb 1992 | A |
| 5252835 | Lieber et al. | Oct 1993 | A |
| 5274602 | Glenn | Dec 1993 | A |
| 5453970 | Rust et al. | Sep 1995 | A |
| 5475341 | Reed | Dec 1995 | A |
| 5512131 | Kumar et al. | Apr 1996 | A |
| 5524092 | Park | Jun 1996 | A |
| 5537075 | Miyazaki | Jul 1996 | A |
| 5539214 | Lynch et al. | Jul 1996 | A |
| 5581091 | Moskovits et al. | Dec 1996 | A |
| 5589692 | Reed | Dec 1996 | A |
| 5607876 | Biegelsen et al. | Mar 1997 | A |
| 5620850 | Bamdad et al. | Apr 1997 | A |
| 5640343 | Gallagher et al. | Jun 1997 | A |
| 5726524 | Debe | Mar 1998 | A |
| 5739057 | Tiwari et al. | Apr 1998 | A |
| 5747180 | Miller et al. | May 1998 | A |
| 5751156 | Muller et al. | May 1998 | A |
| 5776748 | Singhvi et al. | Jul 1998 | A |
| 5824470 | Baldeschwieler et al. | Oct 1998 | A |
| 5830538 | Gates et al. | Nov 1998 | A |
| 5840435 | Lieber et al. | Nov 1998 | A |
| 5847565 | Narayanan | Dec 1998 | A |
| 5858862 | Westwater et al. | Jan 1999 | A |
| 5864823 | Levitan | Jan 1999 | A |
| 5866434 | Massey et al. | Feb 1999 | A |
| 5897945 | Lieber et al. | Apr 1999 | A |
| 5900160 | Whitesides et al. | May 1999 | A |
| 5903010 | Flory et al. | May 1999 | A |
| 5908692 | Hamers et al. | Jun 1999 | A |
| 5916642 | Chang | Jun 1999 | A |
| 5932903 | Miyamoto | Aug 1999 | A |
| 5942443 | Parce et al. | Aug 1999 | A |
| 5997832 | Lieber et al. | Dec 1999 | A |
| 6004444 | Aksay et al. | Dec 1999 | A |
| 6036774 | Lieber et al. | Mar 2000 | A |
| 6038060 | Crowley | Mar 2000 | A |
| 6060121 | Hidber et al. | May 2000 | A |
| 6060724 | Flory et al. | May 2000 | A |
| 6069380 | Chou et al. | May 2000 | A |
| 6123819 | Peeters | Sep 2000 | A |
| 6128214 | Kuekes et al. | Oct 2000 | A |
| 6143184 | Martin et al. | Nov 2000 | A |
| 6149819 | Martin et al. | Nov 2000 | A |
| 6159742 | Lieber et al. | Dec 2000 | A |
| 6180239 | Whitesides et al. | Jan 2001 | B1 |
| 6187165 | Chien et al. | Feb 2001 | B1 |
| 6190634 | Lieber et al. | Feb 2001 | B1 |
| 6203864 | Zhang et al. | Mar 2001 | B1 |
| 6207392 | Weiss et al. | Mar 2001 | B1 |
| 6211464 | Mochizuki et al. | Apr 2001 | B1 |
| 6231744 | Ying et al. | May 2001 | B1 |
| 6256767 | Kuekes et al. | Jul 2001 | B1 |
| 6270074 | Rasmussen et al. | Aug 2001 | B1 |
| 6278231 | Iwasaki et al. | Aug 2001 | B1 |
| 6286226 | Jin | Sep 2001 | B1 |
| 6287765 | Cubicciotti | Sep 2001 | B1 |
| 6314019 | Kuekes et al. | Nov 2001 | B1 |
| 6325904 | Peeters | Dec 2001 | B1 |
| 6340822 | Brown et al. | Jan 2002 | B1 |
| 6346189 | Dai et al. | Feb 2002 | B1 |
| 6355198 | Kim et al. | Mar 2002 | B1 |
| 6359288 | Ying et al. | Mar 2002 | B1 |
| 6437329 | Yedur et al. | Aug 2002 | B1 |
| 6440637 | Choi et al. | Aug 2002 | B1 |
| 6451113 | Givargizov | Sep 2002 | B1 |
| 6459095 | Heath et al. | Oct 2002 | B1 |
| 6465132 | Jin | Oct 2002 | B1 |
| 6468657 | Hou et al. | Oct 2002 | B1 |
| 6468677 | Benton et al. | Oct 2002 | B1 |
| 6503375 | Maydan et al. | Jan 2003 | B1 |
| 6528020 | Dai et al. | Mar 2003 | B1 |
| 6538367 | Choi et al. | Mar 2003 | B1 |
| 6559468 | Kuekes et al. | May 2003 | B1 |
| 6586095 | Wang et al. | Jul 2003 | B2 |
| 6628053 | Den et al. | Sep 2003 | B1 |
| 6716409 | Hafner et al. | Apr 2004 | B2 |
| 6741019 | Filas et al. | May 2004 | B1 |
| 6743408 | Lieber et al. | Jun 2004 | B2 |
| 6756025 | Colbert et al. | Jun 2004 | B2 |
| 6756795 | Hunt et al. | Jun 2004 | B2 |
| 6762056 | Peeters | Jul 2004 | B1 |
| 6781166 | Lieber et al. | Aug 2004 | B2 |
| 6803840 | Hunt et al. | Oct 2004 | B2 |
| 6808746 | Dai et al. | Oct 2004 | B1 |
| 6815706 | Li et al. | Nov 2004 | B2 |
| 6846565 | Korgel et al. | Jan 2005 | B2 |
| 6872645 | Duan et al. | Mar 2005 | B2 |
| 6882051 | Majumdar et al. | Apr 2005 | B2 |
| 6882767 | Yang et al. | Apr 2005 | B2 |
| 6902720 | McGimpsey | Jun 2005 | B2 |
| 6946197 | Yadav et al. | Sep 2005 | B2 |
| 6958216 | Kelley et al. | Oct 2005 | B2 |
| 6962823 | Empedocles et al. | Nov 2005 | B2 |
| 6974706 | Melker et al. | Dec 2005 | B1 |
| 6996147 | Majumdar et al. | Feb 2006 | B2 |
| 7048903 | Colbert et al. | May 2006 | B2 |
| 7129554 | Lieber et al. | Oct 2006 | B2 |
| 7172953 | Lieber et al. | Feb 2007 | B2 |
| 7211464 | Lieber et | May 2007 | B2 |
| 7335908 | Samuelson et al. | Feb 2008 | B2 |
| 7385267 | Lieber et al. | Jun 2008 | B2 |
| 7399691 | Lieber et al. | Jul 2008 | B2 |
| 20010054709 | Heath et al. | Dec 2001 | A1 |
| 20020013031 | Chen et al. | Jan 2002 | A1 |
| 20020040805 | Swager | Apr 2002 | A1 |
| 20020055239 | Tuominen et al. | May 2002 | A1 |
| 20020084502 | Jang et al. | Jul 2002 | A1 |
| 20020086335 | Massey et al. | Jul 2002 | A1 |
| 20020112814 | Hafner et al. | Aug 2002 | A1 |
| 20020117659 | Lieber et al. | Aug 2002 | A1 |
| 20020122766 | Lieber et al. | Sep 2002 | A1 |
| 20020130311 | Lieber et al. | Sep 2002 | A1 |
| 20020130353 | Lieber et al. | Sep 2002 | A1 |
| 20020146714 | Lieber et al. | Oct 2002 | A1 |
| 20020158342 | Tuominen et al. | Oct 2002 | A1 |
| 20020172820 | Majumdar et al. | Nov 2002 | A1 |
| 20020175408 | Majumdar et al. | Nov 2002 | A1 |
| 20020179434 | Dai et al. | Dec 2002 | A1 |
| 20020187504 | Reich et al. | Dec 2002 | A1 |
| 20030001091 | Nakayama et al. | Jan 2003 | A1 |
| 20030003300 | Korgel et al. | Jan 2003 | A1 |
| 20030032892 | Erlach et al. | Feb 2003 | A1 |
| 20030048619 | Kaler et al. | Mar 2003 | A1 |
| 20030073071 | Fritz et al. | Apr 2003 | A1 |
| 20030089899 | Lieber et al. | May 2003 | A1 |
| 20030098488 | O'Keeffe et al. | May 2003 | A1 |
| 20030113713 | Glezer et al. | Jun 2003 | A1 |
| 20030113940 | Erlanger et al. | Jun 2003 | A1 |
| 20030121764 | Yang et al. | Jul 2003 | A1 |
| 20030124509 | Kenis et al. | Jul 2003 | A1 |
| 20030124717 | Awano et al. | Jul 2003 | A1 |
| 20030134267 | Kang et al. | Jul 2003 | A1 |
| 20030134433 | Gabriel et al. | Jul 2003 | A1 |
| 20030135971 | Liberman et al. | Jul 2003 | A1 |
| 20030156992 | Anderson et al. | Aug 2003 | A1 |
| 20030186522 | Duan | Oct 2003 | A1 |
| 20030186544 | Matsui et al. | Oct 2003 | A1 |
| 20030189202 | Li et al. | Oct 2003 | A1 |
| 20030197456 | Den et al. | Oct 2003 | A1 |
| 20030200521 | DeHon et al. | Oct 2003 | A1 |
| 20040005723 | Empedocles et al. | Jan 2004 | A1 |
| 20040026684 | Empedocles | Feb 2004 | A1 |
| 20040067530 | Gruner | Apr 2004 | A1 |
| 20040075464 | Samuelson et al. | Apr 2004 | A1 |
| 20040095658 | Buretea et al. | May 2004 | A1 |
| 20040106203 | Stasiak et al. | Jun 2004 | A1 |
| 20040112964 | Empedocles et al. | Jun 2004 | A1 |
| 20040113138 | DeHon et al. | Jun 2004 | A1 |
| 20040113139 | DeHon et al. | Jun 2004 | A1 |
| 20040118448 | Scher et al. | Jun 2004 | A1 |
| 20040136866 | Pontis et al. | Jul 2004 | A1 |
| 20040146560 | Whiteford et al. | Jul 2004 | A1 |
| 20040157414 | Gole et al. | Aug 2004 | A1 |
| 20040188721 | Lieber et al. | Sep 2004 | A1 |
| 20040213307 | Lieber et al. | Oct 2004 | A1 |
| 20050037374 | Melker et al. | Feb 2005 | A1 |
| 20050064185 | Buretea et al. | Mar 2005 | A1 |
| 20050064731 | Park et al. | Mar 2005 | A1 |
| 20050066883 | Dubrow et al. | Mar 2005 | A1 |
| 20050072213 | Besnard et al. | Apr 2005 | A1 |
| 20050079533 | Samuelson et al. | Apr 2005 | A1 |
| 20050079659 | Duan et al. | Apr 2005 | A1 |
| 20050100960 | Dai et al. | May 2005 | A1 |
| 20050101026 | Sailor et al. | May 2005 | A1 |
| 20050109989 | Whiteford et al. | May 2005 | A1 |
| 20050110064 | Duan et al. | May 2005 | A1 |
| 20050117441 | Lieber et al. | Jun 2005 | A1 |
| 20050161662 | Majumdar et al. | Jul 2005 | A1 |
| 20050181587 | Duan et al. | Aug 2005 | A1 |
| 20050201149 | Duan et al. | Sep 2005 | A1 |
| 20050202615 | Duan et al. | Sep 2005 | A1 |
| 20050212079 | Stumbo et al. | Sep 2005 | A1 |
| 20050214967 | Scher et al. | Sep 2005 | A1 |
| 20050219788 | Chow et al. | Oct 2005 | A1 |
| 20050230356 | Empedocles et al. | Oct 2005 | A1 |
| 20050253137 | Whang et al. | Nov 2005 | A1 |
| 20050266662 | Yi | Dec 2005 | A1 |
| 20050287717 | Heald et al. | Dec 2005 | A1 |
| 20060008942 | Romano et al. | Jan 2006 | A1 |
| 20060009003 | Romano et al. | Jan 2006 | A1 |
| 20060019472 | Pan et al. | Jan 2006 | A1 |
| 20060054936 | Lieber et al. | Mar 2006 | A1 |
| 20060057360 | Samuelson et al. | Mar 2006 | A1 |
| 20060175601 | Lieber et al. | Aug 2006 | A1 |
| 20060237749 | Lieber et al. | Oct 2006 | A1 |
| 20060269927 | Lieber et al. | Nov 2006 | A1 |
| 20070026645 | Lieber et al. | Feb 2007 | A1 |
| 20070032023 | Lieber et al. | Feb 2007 | A1 |
| 20070032051 | Lieber et al. | Feb 2007 | A1 |
| 20070032052 | Lieber et al. | Feb 2007 | A1 |
| 20070048492 | Lieber et al. | Mar 2007 | A1 |
| 20070158766 | Lieber et al. | Jul 2007 | A1 |
| 20070252136 | Lieber et al. | Nov 2007 | A1 |
| 20070281156 | Lieber et al. | Dec 2007 | A1 |
| 20080106846 | Drab et al. | May 2008 | A1 |
| 20080191196 | Lu et al. | Aug 2008 | A1 |
| 20090004852 | Lieber et al. | Jan 2009 | A1 |
| Number | Date | Country |
|---|---|---|
| 1110786 | Oct 1995 | CN |
| 1 087 413 | Mar 2001 | EP |
| 1170799 | Jan 2002 | EP |
| 09-191104 | Jul 1997 | JP |
| 11-11917 | Jan 1999 | JP |
| 2000-31462 | Jan 2000 | JP |
| 2001281965 | Oct 2001 | JP |
| WO 9106036 | May 1991 | WO |
| WO 9502709 | Jan 1995 | WO |
| WO 9629629 | Sep 1996 | WO |
| WO 9732571 | Sep 1997 | WO |
| WO 9733737 | Sep 1997 | WO |
| WO 9734025 | Sep 1997 | WO |
| WO 9734140 | Sep 1997 | WO |
| WO 9839250 | Sep 1998 | WO |
| WO 9842620 | Oct 1998 | WO |
| WO 9848456 | Oct 1998 | WO |
| WO 9924823 | May 1999 | WO |
| WO 9963347 | Dec 1999 | WO |
| WO 0009443 | Feb 2000 | WO |
| WO 0017101 | Mar 2000 | WO |
| WO 0019494 | Apr 2000 | WO |
| WO 0029617 | May 2000 | WO |
| WO 0051186 | Aug 2000 | WO |
| WO 0103208 | Jan 2001 | WO |
| WO 0144796 | Jun 2001 | WO |
| WO 0217362 | Feb 2002 | WO |
| WO 0231183 | Apr 2002 | WO |
| WO 0248701 | Jun 2002 | WO |
| WO 02080280 | Oct 2002 | WO |
| WO 02086480 | Oct 2002 | WO |
| WO 03005450 | Jan 2003 | WO |
| WO 03016901 | Feb 2003 | WO |
| WO 03053851 | Jul 2003 | WO |
| WO 03054931 | Jul 2003 | WO |
| WO 03063208 | Jul 2003 | WO |
| WO 2004003535 | Jan 2004 | WO |
| WO 2004010552 | Jan 2004 | WO |
| WO 2004032190 | Apr 2004 | WO |
| WO 2004032193 | Apr 2004 | WO |
| WO 2004034025 | Apr 2004 | WO |
| WO 2004038767 | May 2004 | WO |
| WO 2005114282 | Feb 2005 | WO |
| WO 2005089165 | Sep 2005 | WO |
| WO 2005093831 | Oct 2005 | WO |
| WO 2005094440 | Oct 2005 | WO |
| WO 2005119753 | Dec 2005 | WO |
| WO 2006107312 | Oct 2006 | WO |
| WO 2006132659 | Dec 2006 | WO |
| WO 2007044034 | Apr 2007 | WO |
| WO 2007145701 | Dec 2007 | WO |
| WO 2008027078 | Mar 2008 | WO |
| WO 2008033303 | Mar 2008 | WO |
| WO 2008123869 | Oct 2008 | WO |
| WO 2008127314 | Oct 2008 | WO |
| Number | Date | Country | |
|---|---|---|---|
| 20090095950 A1 | Apr 2009 | US |
| Number | Date | Country | |
|---|---|---|---|
| 60633733 | Dec 2004 | US |
