Claims
- 1. A vacuum processing apparatus comprising:
a plurality of processing units for conducting processing; a transfer processing unit connected with said plurality of processing units for carrying wafers to said processing units; a transfer device disposed in said transfer processing unit and carrying the wafers and cassettes for containing the wafers; and a control unit for conducting transfer for control for transferring the wafers from respective cassettes to said transfer processing unit, in which the wafers are processed by using said plural processing units, wherein at least two of said cassettes are used, for parallel processing of applying different processing to the wafers contained on each of said cassettes by applying different recipes and returning the wafers after applying the parallel processing to the original cassette.
- 2. A vacuum processing apparatus according to claim 1, wherein four processing units are connected with said transfer unit.
- 3. A vacuum processing apparatus comprising:
a plurality of processing units for conducting processing; a transfer processing unit connected with said plurality of processing units for carrying wafers to said processing units; an atmospheric transferring unit for providing cassettes containing the wafers to said transfer processing unit; a transfer unit and a load lock chamber disposed between said processing units and said atmospheric transferring unit; and a control unit for conducting transfer control for carrying the wafers in said cassettes to said transfer unit, a lock chamber and said processing units, in which wafers processing is conducted by using said plural processing units, wherein at least two cassettes are used, for parallel processing of applying different processing by applying different recipes to the wafers contained in each of said cassettes and after applying the parallel processing, the wafers are returned to the original cassette.
- 4. A vacuum processing apparatus according to claim 3, wherein four processing units are connected with said transfer unit.
- 5. A vacuum processing apparatus according to claim 3, wherein said lock chamber comprises a load lock chamber and an unload lock chamber, and wafers applied with any of the parallel processing is returned from said unload lock chamber to the original cassette.
- 6. A vacuum processing method for carrying wafers contained in cassettes from a transfer unit to a lock chamber, and further, by way of a transfer processing unit to processing units and conducting processing of the wafers in at least two processing units, the method comprising the steps of:
utilizing at least two cassettes, processing the wafers contained in each of the cassettes in parallel by applying different processing of different recipes to the wafers of a respective cassette; and returning the wafers, after applying the parallel processing, to the original cassette.
- 7. A vacuum processing method according to claim 6, wherein the wafers are alternately extracted from the cassettes and have the parallel processing applied thereto.
Priority Claims (2)
Number |
Date |
Country |
Kind |
08-240147 |
Sep 1996 |
JP |
|
09-066097 |
Mar 1997 |
JP |
|
CROSS REFERENCE TO RELATED APPLICATION
[0001] This is a continuation of U.S. patent application Ser. No. 09/535,753, filed Mar. 27, 2000, which is a continuation of U.S. patent application Ser. No. 08/925,190, filed Sep. 8, 1997, now U.S. Pat. No. 6,069,096, the subject matter of which is incorporated by reference herein.
Continuations (2)
|
Number |
Date |
Country |
Parent |
09535753 |
Mar 2000 |
US |
Child |
10140120 |
May 2002 |
US |
Parent |
08925190 |
Sep 1997 |
US |
Child |
09535753 |
Mar 2000 |
US |