Number | Date | Country | Kind |
---|---|---|---|
89104948.8 | Mar 1989 | EPX |
Number | Name | Date | Kind |
---|---|---|---|
3647807 | Bossert et al. | Mar 1972 | |
3773773 | Bossert | Nov 1973 | |
3776735 | Bauer et al. | Dec 1973 | |
3803314 | Bossert et al. | Apr 1974 | |
3883543 | Bossert | May 1975 | |
3901710 | Ranz et al. | Aug 1975 | |
3946028 | Bossert et al. | Mar 1976 | |
4604340 | Grossa | Aug 1986 | |
4849051 | Ahne et al. | Jul 1989 |
Number | Date | Country |
---|---|---|
0300326A1 | Jan 1989 | EPX |
3716629A1 | Dec 1988 | DEX |
1575281 | Sep 1980 | GBX |
Entry |
---|
"Angew. Chem."--Applied Chemistry, vol. 94 (1982), pp. 471-485. |
Patent Abstracts of Japan, vol. 8, No. 79 (P. 267) (1516) Apr. 11, 1984 "Positive Type Photosensitive Composition". |
Research Disclosure, No. 174, Oct. 1978 "Photosensitive Materials Suited for the Production of Positive Photoresists". |
Polymer Engineering and Science, vol. 23, No. 17 (1983) pp. 953-956 "Possibilities for Photoimaging Using Onium Salts". |