The present invention relates to semiconductor devices.
Chip-scale packaging is a concept driven by the idea of devising a semiconductor package which is nearly the size of the die contained therein. U.S. Pat. No. 6,624,522 illustrates several chip-scale packages, each of which includes a power semiconductor die, such as a power MOSFET, with at least one power electrode configured for direct electrical and mechanical connection to conductive pads on a substrate, such as a circuit board, by a conductive adhesive body such as solder, conductive epoxy or the like.
To facilitate such a direct connection a solderable body is formed on the power electrode in contact with a passivation body, which itself resides over the power electrode. It has been found that some metals in the solderable body, such as, silver, form dendrites after a period of use. The dendrites damage the passivation body, and in some cases may undesirably short the power electrode to a nearby conductive body. For example, in a power semiconductor package having a die disposed within a conductive clip, the dendrites may grow long enough to short the power electrode to the conductive clip. This condition may be worse when the conductive clip also includes a metal that exhibits a tendency to form dendrites, such as silver.
It is desirable to avoid the damage in order to ensure longer service life for the power semiconductor device.
In a device according to the present invention a gap exists between the passivation and the solderable body in order to prevent the formation of dendrites, and thus improve the service life of the device.
Specifically, a semiconductor device according to the present invention includes a semiconductor die having one side thereof configured for direct connection to a conductive pad with a conductive adhesive, the one side including at least one power electrode, a passivation body formed on the at least one electrode, an opening in the passivation body exposing the at least one electrode, a solderable body formed on the at least one electrode, the solderable body being less wide than the opening whereby a gap exists between the passivation and the solderable body.
The preferred embodiment of the present invention includes:
Other features and advantages of the present invention will become apparent from the following description of the invention which refers to the accompanying drawings.
Referring to
According to a first embodiment of the present invention at least one solderable body 16 is formed on first power electrode 12 and at least one solderable body 16 is formed on control electrode 14. Furthermore, in a device according to the present invention, a passivation body 18 which is formed preferably from an epoxy that can also function as a solder resist, is disposed on first power electrode 12 and control electrode 14, and includes opening 20 to expose solderable body 16 on first power electrode 14 and opening 22 to expose solderable body 16 on control electrode 14. In the preferred embodiment, electrodes 12, 14 are formed from aluminum or aluminum silicon, and solderable bodies 16 are formed from a trimetal stack or any solderable material that may tend to form dendrites. The trimetal stack may include a silver layer at the top thereof, such as Ti/Pd/Ag trimetal stack.
According to an aspect of the present invention, opening 20 is wider than solderable body 16. As a result, solderable body 16 is spaced from passivation 18 by a gap 24 which surrounds solderable body 16. It should be noted that in the preferred embodiment, opening 22 is also wider than solderable body 16 on control electrode 14 whereby gap 26 is created between passivation body 18 and solderable body 16 on control electrode 14.
In the preferred embodiment, passivation body 18 includes a plurality of openings 20 each being wider than and exposing a respective solderable body 16 on first power electrode 12 whereby a respective gap 24 is formed between each solderable body 16 and passivation body 18. Also, in the preferred embodiment, passivation body 18 is thicker than solderable bodies 16. As a result, solderable bodies 16 do not extend beyond passivation body 18. That is, each solderable body 16 is preferably disposed at the bottom of its respective opening 20 and does not reach the top thereof.
A semiconductor device according to the embodiment shown by
A device according to the present invention is not limited to vertical conduction type devices. Referring to
Referring next to
All three embodiments are similar in that in each case all of the electrodes on one side are configured for direct connection with a conductive adhesive such as solder or conductive epoxy to a conductive pad on a substrate such as a circuit board. That is, solderable bodies 16 are provided on all electrodes on the same surface to allow for direct connection to a conductive pad on a substrate, while advantageously a gap 24 between each solderable body 16 and passivation body 18 prevents the formation of dendrites.
Referring next to
Conductive clip 32 is preferably made from copper or an alloy of copper and may include gold or silver on its exterior surface. Preferably, conductive clip 32 includes a rim 36 which is integral with web portion 34 and defines an interior space within which a semiconductor device according to the present invention is received. Note that rim 36 acts as an electrical connector between web portion 34 (which is electrically connected to second power electrode 28) to preferably two terminal connection surfaces 38. Connection surfaces 38 serve to electrically connect conductive clip 32 to conductive pads 40 on a substrate 42 such as a circuit board. Note that connection surfaces 38 are electrically connected to pads 40 by a conductive adhesive 44 such as solder or a conductive epoxy. Also, as explained above, a semiconductor device according to the present invention is configured in order to have the electrodes on one side thereof directly electrically connected to the conductive pads of a substrate. Thus, as seen in
A semiconductor device according to the present invention may be manufactured according to the following process.
Referring to
Next, a contact metal layer is deposited and patterned in any known conventional manner. Thus, in the preferred embodiment a front metal layer is deposited over wafer 50 in which the MOSFETs are formed, and patterned to form first power electrode 12 (hereafter source contact or source electrode) and control electrode 14 (hereafter gate contact or gate electrode) for each die 10 as shown by
Next, a solderable front metal is deposited over the contact metal layer. The solderable front metal may be any suitable metal combination such as the trimetal combination Ti/Pd/Ag. In the preferred embodiment, the solderable front metal layer includes a top layer of silver.
Thereafter, the solderable front metal layer is patterned leaving at least one solderable body 16 over each contact e.g., source contact 12, as illustrated by
Thereafter, a back metal contact (not shown) is deposited over the back of the wafer 24 if such is required for a second power electrode for each die. Thus, for example, in the preferred embodiment, a drain back metal is formed in the back of the wafer. The drain back metal may be formed of Al or AlSi and further processed to include a solderable trimetal combination.
Next, a passivation body 18 is formed over the front side of wafer 50 as illustrated in
Thereafter, passivation 18 is removed from the top of each solderable body 16 over each contact. The removal of passivation 18 creates openings 20, 22 that extend to the contact layer below. Thus, in the preferred embodiment of the present invention, an opening is created in passivation 18 over each source electrode 12 and an opening is created over gate electrode 14 exposing respective solderable bodies thereon as seen in
According to an aspect of the present invention openings 20 and preferably openings 22 are created wide enough so that each solderable body 16 may be spaced from passivation 18 by a respective gap.
Next, each die is singulated by any known method, such as sawing. Each singulated die may then be packaged in a conductive clip 32 to obtain a semiconductor package as described herein.
Although the present invention has been described in relation to particular embodiments thereof, many other variations and modifications and other uses will become apparent to those skilled in the art. It is preferred, therefore, that the present invention be limited not by the specific disclosure herein, but only by the appended claims.
This application is based on and claims benefit of U.S. Provisional Application No. 60/575,656, filed on May 28, 2004, entitled Preparation of Front Contact for Surface Mounting, to which a claim of priority is hereby made and the disclosure of which is incorporated by reference.
| Number | Date | Country | |
|---|---|---|---|
| 60575656 | May 2004 | US |