1. Field
The embodiments discussed herein are directed to a printed circuit board and a method of manufacturing the same, and in more detail to a printed circuit board and a method of manufacturing the same where protective plating, such as gold plating, is applied as a surface treatment of a wiring pattern formed on the printed circuit board.
2. Description of the Related Art
The so-called “subtract method” has often been used to form wiring patterns on printed circuit boards. However, since there is a tendency for the wiring patterns of printed circuit boards to become finer, conventionally, printed circuit boards are manufactured using a semi-additive method that can form finer wiring patterns.
In the semi-additive method, the resist is patterned in accordance with the wiring pattern to be formed on the conductive layer that may be formed extremely thinly, and a conductive part that will become the wiring pattern may be formed by electroplating, so that it is possible to form a finer wiring pattern compared to the subtract method that forms the wiring pattern by etching a conductive layer formed with a predetermined thickness. However, when the wiring pattern 22 has been formed by the semi-additive method, as illustrated in
It is an aspect of the embodiments discussed herein to provide a method of manufacturing a printed circuit board that can form a high density wiring pattern without forming bus bars for electroplating and can provide a highly reliable printed circuit board by covering the wiring pattern exposed on the substrate, including the side surfaces of the wiring pattern, with protective plating such as gold plating.
To achieve the aspect stated above, a method of manufacturing a printed circuit board according to an exemplary embodiment includes: a operation of forming a conductive layer, which is to be used as a plating power supplying layer, on a substrate; a operation of forming a first mask pattern for forming a predetermined wiring pattern on a surface of the conductive layer, carrying out electroplating with the conductive layer as the plating power supplying layer to form a conductive part on the conductive layer, and then removing the first mask pattern; a operation of forming a second mask pattern that exposes required parts of the conductive part on the substrate, on which the conductive part has been formed on the conductive layer, carrying out electroplating with the conductive layer as the plating power supplying layer to form protective plating on exposed parts of the conductive part, and then removing the second mask pattern; and a operation of forming a wiring pattern on the substrate by removing parts of the conductive layer exposed on the substrate, and covering the wiring pattern formed on the substrate, aside from parts on which the protective plating has been formed, with a protective film.
It should be noted that a variety of methods such as a method that uses a dry film and a method that uses a photosensitive resist can be used as the method of forming the first and second mask patterns. Also, to form the protective plating, it is possible to carry out a plating process such as nickel electroplating and gold electroplating.
When forming the second mask pattern so as to expose the required parts of the conductive part, the second mask pattern may be formed so as to expose an upper surface and side surfaces of the conductive part, parts of the conductive layer exposed on the substrate may then be removed, and the protective plating may be formed on outer surfaces of the conductive part and the conductive layer that forms a base of the conductive part by electroplating with the conductive layer as the plating power supplying layer. By forming the protective plating after exposed parts of the conductive layer have been removed with the upper surface and side surfaces of the conductive part in an exposed state, it is possible to apply the protective plating on the outer surfaces including the side surfaces of the conductive part and the conductive layer.
Also, when parts of the conductive layer exposed on the substrate may be removed, the parts of the conductive layer that are exposed may be selectively etched using chemical etching. By doing so, the exposed parts of the conductive layer can be removed easily.
Also, it is effective to form a copper plating layer as the conductive part by carrying out copper electroplating with the conductive layer as the plating power supplying layer.
A printed circuit board according to an exemplary embodiment is a printed circuit board on which protective plating has been carried out as a surface treatment on exposed surfaces of a wiring pattern formed on a surface of a substrate, wherein part of the wiring pattern may be formed with an upper surface and side surfaces of a conductive part composing the wiring pattern being exposed on the substrate, and all surfaces of exposed parts of the conductive part including the upper surface and the side surfaces are covered with the protective plating.
The conductive part of the wiring pattern may be made of copper and the protective plating may have a dual layer construction with nickel plating provided as an inner layer and gold plating provided as an outer layer.
According to the method of manufacturing a printed circuit board according to an exemplary embodiment, using the first mask pattern and the second mask pattern, the conductive part of the wiring pattern may be formed by electroplating and the protective plating may be formed, so that the conductive part of the wiring pattern formed on the substrate is prevented from being exposed to the outside. This means that corrosion and the like of the conductive part of the wiring pattern are prevented and a reliable printed circuit board can be manufactured. Also, with the printed circuit board according to an exemplary embodiment, outer surfaces of the wiring pattern exposed on the substrate are covered with the protective plating, so that corrosion of the wiring pattern is prevented and highly reliable products can be provided.
These together with other aspects and advantages which will be subsequently apparent, reside in the details of construction and operation as more fully hereinafter described and claimed, reference being had to the accompanying drawings forming a part hereof, wherein like numerals refer to like parts throughout.
It should be noted that the conductive layer 12 may be used as the plating power supplying layer when a wiring pattern may be formed by electroplating and may be formed by electroless copper plating or sputtering. Since parts that are not needed may be removed by chemical etching in a later process, to facilitate such removal by etching, the conductive layer 12 may be formed thinly but thick enough to conduct electricity (with a thickness of around 1 μm or below).
The dry film 30 is exposed and developed in accordance with the wiring pattern to be formed on the substrate 10 and concaves 30a, 30b where the conductive layer 12 is exposed at bottom surfaces thereof are formed at parts where the wiring pattern will be formed.
Next, electroplating may be carried out with the conductive layer 12 as the plating power supplying layer to form copper plating layers 16a, 16b that build up inside the concaves 30a, 30b.
Conventionally in a semi-additive method, after the copper plating layer has been formed, protective plating, such as gold plating, is carried out, but in an exemplary embodiment of the present invention, only the copper plating layers 16a and 16b are formed.
As illustrated in
The substrate 10 may be chemically etched to remove parts of the conductive layer 12 exposed on the substrate 10 in the state illustrated in
When the conductive layer 12 is etched by chemical etching, there is the possibility of the etching liquid also soaking into parts of the copper plating layers 16a, 16b exposed on the substrate 10, but since the conductive layer 12 is much thinner than the copper plating layers 16a, 16b, the copper plating layers 16a, 16b are hardly affected when the conductive layer 12 is etched and removed. This etching operation leaves, on the substrate 10, the conductive layer 12 in a region, aside from the copper plating layer 16b, that is covered by the dry film 32 and the conductive layer 12 in parts that are the bases of the copper plating layers 16a in the region 32a.
Next, electro nickel plating and electro gold plating are carried out with the conductive layer 12 as the plating power supplying layer to form protective plating on the copper plating layers 16a, 16b.
In a process that forms the protective layers 34a, 34b, the copper plating layers 16a, 16b are not covered by the dry film 32 and parts that are exposed to the outside are covered with the protective layers 34a, 34b. Since the conductive layer 12 remains as a base layer at the parts where the copper plating layers 16a, 16b have been formed, it is possible to form the protective layers 34a, 34b at exposed parts of the copper plating layers 16a, 16b by electroplating.
The end surfaces of the copper plating layers 16a are also covered with the nickel plating layer 35 and the gold plating layer 36 so that the parts of the copper plating layer 16a illustrated in
The dry film 32 that covers the substrate 10 is separated and removed (see, for example,
The conductive layer 12 exposed on the substrate 10 is removed by chemical etching (see, for example,
By doing so, wiring patterns 40, 42 are formed on the substrate 10 as independent patterns. The wiring patterns 40 are formed as leader lines and the wiring pattern 42 may be formed as a separate island.
In the illustrated example, the solder resist 38 may be provided so as to expose ends of the wiring patterns 40 that are covered with the protective plating 34a and an inner part of a region of the wiring pattern 42 covered with the protective plating 34b, and to cover other parts of the wiring patterns 40, 42. In this way, the only parts where the printed circuit board 50 is exposed to the outside are parts that are covered by the protective plating 34a, 34b.
In the printed circuit board 50 illustrated in
In the same way as the semi-additive method, the method of manufacturing a printed circuit board according to an exemplary embodiment of the present invention forms the conductive layer 12 thinly on the substrate 10 and then forms the wiring patterns 40, 42, so that the wiring patterns 40, 42 may be formed more finely compared to the subtract method.
In addition, by using the semi-additive method, bus bars for electroplating do not need to be disposed even when forming wiring patterns as separate islands, which also makes it possible to dispose wiring patterns at high density.
Further, according to an aspect of the embodiments, any combinations of the described features, functions and/or operations can be provided.
The many features and advantages of the embodiments are apparent from the detailed specification and, thus, it is intended by the appended claims to cover all such features and advantages of the embodiments that fall within the true spirit and scope thereof. Further, since numerous modifications and changes will readily occur to those skilled in the art, it is not desired to limit the inventive embodiments to the exact construction and operation illustrated and described, and accordingly all suitable modifications and equivalents may be resorted to, falling within the scope thereof.
Number | Date | Country | Kind |
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2004-303736 | Oct 2004 | JP | national |
This application is a divisional application of and claims benefit to U.S. application Ser. No. 11/028,040 filed Jan. 4, 2005, now allowed and is related to and claims priority to Japanese Patent Application No. 2004-303736, filed Jan. 4, 2005, in the Japanese Patent Office and incorporated by reference herein.
Number | Date | Country | |
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Parent | 11028040 | Jan 2005 | US |
Child | 12289532 | US |