The present invention relates to a scanning charged particle microscope and, more particularly, to a scanning charged particle microscope enabling observation of surfaces of samples such as semiconductor devices and novel materials and equipped with a means for analyzing the vibration frequencies of external disturbances that impair scanned images of the microscope.
Where an apparatus of scanning electron microscope (SEM) that is representative of a scanning charged particle microscope is installed in harsh external environments, the deflection of the electron beam relative to the sample is disturbed under the influence of the external disturbances and the images are impaired. Such a problem is disclosed in the cited reference 1.
Examples of typical external disturbances include mechanical vibrations arising from noises and the like and alternating magnetic fields from the outside. A typical SEM image suffering from disturbances is shown in
In the prior art method, when the stripe patterns are simple, the period of the stripes has been counted in the Y-direction and the frequency has been calculated. Where the stripe patterns are complex, a power spectral image (also known as an FFT image) of a two-dimensional fast Fourier transform (hereinafter also referred to as a 2D-FFT) of its image (having a size of imax×jmax pixels) as shown in
In the 2D-FFT image, the directions of the vertical axis (Y axis) and the lateral axis (X axis) are coincident respectively with the directions of the vertical axis and lateral axis in a real space. Physical quantities displayed by them are wave numbers (the numbers of waves per unit pixel length) providing a scale of a linear plot. The origin (f=0) of the wave numbers f [pixel−1] falls on the central position of the image. The left and right ends of the X axis of the image correspond to waves f=−½ and f=+½ in the X direction, respectively. The lower and upper ends of the Y axis of the image correspond to waves f=−½ and f=+½ in the Y direction, respectively. In the power spectral image, bright regions are high-power (large-component) wave number regions. In
The algorithm for identifying the wave numbers of disturbances by this 2D-FFT image analysis is complex because bright regions are broad and also dispersed in oblique directions. Furthermore, the identification accuracy is low. In addition, analyzable frequencies are normally restricted to hundreds of Hz or below.
It is an object of the present invention to analyze disturbance frequencies easily and accurately from a scanned image of a scanning charged particle microscope when the scanned image is impaired by external disturbances in order to identify the external disturbances. It is another object to increase the maximum analyzable frequency up to several kHz, which is a rotational frequency of turbomolecular pumps or the like often used as an evacuation pump for a scanning charged particle microscope.
In an FFT analysis of a stripe pattern that is an impairment of a scanned image, in order to clearly and accurately find the disturbance frequencies, a one-dimensional FFT (1D-FFT) is performed in the Y direction (auxiliary deflection direction of a charged particle beam) or a one-dimensional DFT (1D-DFT) is performed in the X direction (main deflection direction of the charged particle beam). To extend the maximum analyzable frequency up to several kHz, a 1D-FFT (or 1D-DFT) analysis is performed in the X direction (main deflection direction of the charged particle beam) along which the charged beam is scanned at a high scanning speed.
According to the present invention, a scanning charged particle microscope can be offered which enables the vibration frequencies of external disturbances to be identified easily and accurately from a scanned image. Furthermore, the vibration frequencies can be analyzed up to a high-frequency range of several kHz.
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Embodiments of the present invention are hereinafter described by referring to the drawings. Although, in the following embodiments, embodiments of a scanning electron microscope (SEM) are described, the invention is not limited to them. Similar advantageous effects can be obtained with a scanning transmission microscope (STEM) or a scanning ion microscope (SIM).
As an embodiment of the present invention, a scanning electron microscope (SEM) that is a typical example of scanning charged particles is shown in
First, a method of finding a disturbance frequency fh in Hz (=s−1) from an image is described.
The sample can be other than the microscale. When a sample having a vertical end surface is used, the edge portions look bright and disturbances can be clearly seen from the image. The vertical end surface narrows the peak width of a distribution of intensities of secondary electron emission for the vertical direction and thus improves the contrast of a high-density stripe pattern.
Taking the direction of the main deflection in which the scanning speed is high as the X direction, stripe patterns are superposed on bright portions of the left and right end portions of a rectangular scale in the Y direction. A disturbance wave number fp [pixel−1] is found by finding the period of this stripe pattern in the Y direction. A conversion of the disturbance wave frequency fh in Hz (=s−1) can be computed using the beam scanning speed VY [pixel/s] from the equation below. Here, the beam scanning speed VY is a quantity determined from conditions under which the image is taken.
f
h [Hz]=fp [pixel−1]×VY [pixel/s] (1)
In the conventional method, the disturbance wave number fp [pixel−1] has been computed by directly counting the number of stripes per pixel in the SEM image or from a power spectral image (see
In the present invention, the disturbance frequency fh [Hz] is identified using a power spectral image of 1D-FFT.
A flowchart for this is shown in
a
2) is an image (having a size of 256×256 pixels) obtained by rotating the analysis image (
In the present embodiment, the Y direction is selected.
A Y-direction 1D-FFT power spectrum is calculated from the pixel intensity Z(Xi, Yj: j=0, 1, . . . , jmax) at each Xi position.
The above-described Y-direction 1D-FFT normalized power spectrum is averaged in the X direction to compute an average power spectrum.
Since the positive and negative portions of the average power spectrum are symmetrical with respect to the wave number, identification of the frequency of the disturbance wave number fp [pixel−1] is described using wave numbers on the positive side. In the graph of the average power spectrum (see
V
Y [pixel/s]=number of pixels in Y width of original SEM image/frame scan time [s] (2)
The disturbance frequency fh can be converted to 2.4 and 4.8 Hz using Eq. (1). A vibration of 2.4 Hz corresponds to twice of the period of a vibration of 4.8 Hz. As can be seen from comparison between the 1D-FFT image (
Such a disturbance frequency can be displayed on a display device to inform users.
A 1D-FFT analysis in the X direction (main deflection direction of the charged-particle beam) is next described.
An embodiment of an X-direction 1D-FFT analysis using the same microscale sample as in Embodiment 1 is described. Using the total number of pixels (640×480 pixels) of the original SEM image and the frame scan time (40 s), the X-direction beam scanning speed VX is calculated to be VX=7680 [pixel/s] from the following equation:
V
X [pixel/s]=total number of pixels of original SEM image/frame scan time [s] (3)
a
1) is an SEM image (having a size of 256×256 pixels) where there are external disturbances.
f
h [Hz]=fp [pixel−1]×VX [pixel/s] (4)
In an analysis image of an X-direction 1D-FFT analysis, it is desirable to create it in such a way that only one of the left and right ends of the microscale is contained, because waves forming stripe patterns at individual ends are usually not in phase with each other between the left and right ends. That is, it is desired that two or more disturbances be not contained in the direction in which an analysis is made.
The X direction is the main deflection direction of the beam scanning. The beam scanning speed VX is higher than the Y-direction scanning speed VY by a factor of as many times as the number of pixels in the Y width of the original SEM image. A change by a factor of 200 in reduction of the frame scan time from 40 s to 0.2 s results in an increase by a factor of 200 in VX and VY. 1D-FFT analyses in the X and Y directions using SEM images in various frame scan times make it possible to analyze disturbance frequencies, respectively, of hundreds of Hz or lower and hundreds of Hz or higher. The maximum analyzable frequency is about 10 kHz or higher as a result of X-direction 1D-FFT. As a consequence, disturbance vibrations, for example, caused by a turbomolecular pump (having a rotational speed of thousands of revolutions per second) can be analyzed easily and accurately.
Around an SEM apparatus there exist factors of disturbance vibrations possessed by the apparatus itself such as mechanical resonant vibration frequencies, periodic motions such as by the turbomolecular pump, and electrical frequencies of a control power supply. When an SEM apparatus is installed under environments where disturbances such as floor vibrations and disturbance external magnetic fields have been suppressed and disturbance vibrations are analyzed from analysis images of a specific sample (for example, a microscale sample) under prescribed SEM observation conditions (such as electron irradiation energy, beam current, focusing conditions, observation magnification, and image scanning frame time), the disturbance vibration frequencies and their power values (magnitudes of the vibrational components) of the apparatus itself under normal SEM operating conditions are obtained. Since the disturbance vibration frequencies and their power values of the apparatus itself vary according to the environment where the SEM apparatus is installed, analysis of disturbance vibrations is performed and they are recorded in the control processor 9 together with information about the installation environment whenever the installation environment varies. In later analysis of disturbance vibrations (where the same specific sample as in the prescribed SEM observation conditions is adopted), the identified disturbance vibration frequencies and their power values can be compared with the recorded natural vibration frequencies of the apparatus and their power values and can be displayed. Where a new disturbance vibration frequency appears or where power values of the known disturbance vibration frequencies exceed specified tolerable values, their occurrences are displayed on the display device.
Incidentally, discrete Fourier transform (DFT) can also be used. The relationship between fast Fourier transform and discrete Fourier transform is now described.
Fast Fourier transform (FFT) is a technique for performing a transformation at high speed by taking notice of the symmetry of discrete Fourier transform (DFT) and reducing the amount of computation. In a DFT with period N, the multiplication operations of complex numbers are N2 times. In contrast, in FFT, the number can be reduced to N·log2 N/2. Where N is a power of 2, i.e., 2n, the ratio of the numbers of the multiplication operations is given by the following equation. The larger m (that is, N) is, the greater the reducing effect is.
[FFT]/[DFT]=m·2m−1/22m=m/2m+1
For example, when N=64, 128, 256, and 512, the above ratio is 0.047, 0.027, 0.016, and 0.0088, respectively. In DFT, the condition of FFT N=2n does not hold and the processing time is prolonged.
If DFT is adopted instead of FFT, there arises the advantage that the shape and size of analysis images can be set at will in such a way that stripe patterns are contained at a larger proportion without the image size being restricted to 2n (m=5 to 10) pixels. However, there is the disadvantage that the processing time for Fourier transform is increased. Where an analysis image of a large size needs to be processed at high speed, FFT is used. In Embodiments 1 and 2 described so far and in the following Embodiments 4 to 7, examples using FFT are given. If DFT is used, results equivalent to those with FFT are obtained under the aforementioned features of advantage and disadvantage.
An identifier (operator of the apparatus) can identify the disturbance frequencies while visually checking the image and graph of the 1D-FFT normalized power spectrum displayed on the display means 10.
An embodiment for identifying the amplitude and its vibration direction in addition to the wave number of a disturbance vibration is described. The magnitude of the amplitude of the disturbance wave number can be evaluated by the magnitude of a 1D-FFT power. A specific amplitude value (in units of length) in a real space is computed by the following method. (1) In an FFT normalized power spectral image or power spectral graph, a bandpass filter that passes a wave number passband associated with the disturbance wave number is set. (2) The power spectrum passed through the bandpass filter is subjected to inverse FFT and a real-space image of a stripe pattern formed by the passband wave numbers is created. (3) The width of the stripe pattern is measured along the axis of the direction of the 1D-FFT. (4) The width (in pixels) of the stripe pattern is multiplied by the pixel size (for example, in nm/pixel) of the analysis image to obtain an amplitude value (for example, in nm). The 1D-FFT analysis means 11 has the function of the 1D-FFT inverse transform together with the 1D-FFT function.
a
1) is an analysis image, (b1) is a window screen for setting the wave numbers of the start and end of the passband using an FFT normalized power spectral image, (b2) is a window screen for setting the wave numbers of the start and end of the passband using a power spectral graph, and (a2) is a real-space image obtained by inverse FFT. “Band Pass” is selected from the filter display frame under the window screen of
The vibration direction of a specific wave number is next identified by the following procedure. (1) The rotation angle θ of the beam scanning is varied in steps (for example, in steps of 15 degrees within a range of 0=0 to 180 degrees) in synchronism with a sample for observation of disturbances and an SEM image is acquired at each rotation angular position. Note that the angle of deviation between the X axis of the coordinates of the sample and the direction of the main beam deflection (X axis direction) (at θ=0) is stored as a correction angle θo. (2) An FFT power spectral graph of an analysis image is created for each SEM image. (3) A power P(fp) at a wave number fp of interest of the power spectral graph is plotted with respect to the rotation angle θ, thus creating a graph. (4) In this graph, a direction given by adding the correction angle θo to a rotation angle θm at which the power value is maximized is a vibration direction of the wave number of interest (the positive and negative directions are not discriminated from each other).
An example of analysis of diurnal transition of an SEM apparatus under disturbance vibration environments is next described. First, (1) the control processor 9 periodically (for example, every specified day of the week) acquires an SEM image of a specified sample (for example, a microscale sample) under specified SEM image observation conditions and creates an analysis image. (2) A normalized power spectral image and a normalized power spectral graph of the analysis image are created. (3) These images and graphs are stored in the control processor 9. (4) When required, these stored images and graphs can be displayed on the display means 10 together with time transition information. The manner in which images are displayed can be selected from display of each individual image, display of plural images arranged side by side, and overlapped display of plural images successively with small downward shifts. On the other hand, display of graphs can be selected from display of each individual graph and display of plural overlapped graphs. Furthermore, a diurnal transition plot display of the power P(fp) at a specific wave number can also be provided.
In analysis of a diurnal transition under the disturbance vibration environments, a threshold value power spectrum can be set beforehand in a power spectrum of a normalized power spectral graph. When a wave number at which the power spectrum exceeds the threshold value appears, its occurrence can be displayed on the display means 10 or stored in the control processor 9.
In a scanned image in which impairments (stripe patterns) by disturbance vibrations show up, once the disturbance frequencies can be identified, processing for removing the image impairments can be performed. This embodiment is described.
In removal of image impairments, it is not necessary to find the disturbance frequency fh in Hz (=s−1) of Embodiment 1. If the vibration wave numbers (in pixel−1) are identified, image impairments can be removed.
On a production line such as for semiconductor products and so on, plural SEMs 101-104 are connected via a network with a management master computer 105 for metrology management of semiconductor device patterns or the like as shown in
In the above embodiment, the master computer 105 picks up evaluated values of a disturbance vibrations from each apparatus. The master computer 105 may pick up images for analyzing disturbance vibrations from each apparatus and analyses of the disturbance vibrations may be performed on the side of the master computer 105. On the side of each apparatus, the work time for the analysis of disturbance vibrations can be passed to other work time. In busy cases, this is effective in that the inspection throughput is not deteriorated.
Embodiments of scanning electron microscopes (SEMs) have been described so far. Similar advantageous effects can be obtained with a scanning transmission electron microscope (STEM) and a scanning ion microscope (SIM). That is, any apparatus can yield the advantageous effects of the present invention as long as it is a microscope using a scanning beam made of focused charged particles. Furthermore, a 1D-FFT (or 1D-DFT) analysis is used to identify the vibration frequencies of external disturbances. The invention can also be applied to cases where observations using a scanning charged particle microscope are employed in identifying the natural frequencies or excitation frequencies of single parts or composites fabricated by microfabrication technology or the like.
Number | Date | Country | Kind |
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2008-259186 | Oct 2008 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2009/005091 | 10/2/2009 | WO | 00 | 6/27/2011 |