German Office Action and English translation thereof. |
Characterization of Diazonaphthoquinone-Novolac Resin-Type Positive Photoresist for g-line and i-line Exposure using Water-Soluble Contrast Enhancement Materials, M. Endo et al., May 1989, Journal of Vacuum Science Technology, B7 (3), pp. 565-568. |
New Water-Soluble Contrast Enhancing Material for I-Line Lithography, M. Endo et al., Journal of the Electrochemical Society, vol. 136, No. 2, Feb. 1989, pp. 508-511. |
Proceedings of SPIE--The International Society for Optical Engineering , vol. 923, 1988, pp. 158-171. |
Proceedings of SPIE--The International Society for Optical Engineering, vol. 1086, 1989, pp. 34-47. |