Number | Date | Country | Kind |
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6-151507 | Jun 1994 | JPX |
This is a division of application Ser. No. 08/451,675 filed May 26, 1995, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
T938004 | Lehman et al. | Sep 1975 | |
3558974 | Stewart | Jan 1971 | |
3926508 | Harmsen | Dec 1975 | |
3991234 | Chang et al. | Nov 1976 | |
4052520 | Chang et al. | Oct 1977 | |
4061800 | Anderson | Dec 1977 | |
4624859 | Akira et al. | Nov 1986 | |
4717943 | Wolf et al. | Jan 1988 | |
4851370 | Dolklan et al. | Jul 1989 | |
4869781 | Euen et al. | Sep 1989 | |
5085904 | Deak et al. | Feb 1992 | |
5302208 | Grimm et al. | Apr 1994 | |
5319230 | Nakao | Jun 1994 | |
5429995 | Nishiyama et al. | Jul 1995 | |
5436481 | Egawa et al. | Jul 1995 | |
5470801 | Kapoor et al. | Nov 1995 | |
5571576 | Qlan et al. | Nov 1996 |
Number | Date | Country |
---|---|---|
406330290 A | Nov 1994 | JPX |
Entry |
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Silicon Processing for the VLSI Era, vol. 1, "Process Technology", S. Wolf and R. Tauber, p. 182, 1986. |
Comparison Between CVD and Thermal Oxide Dielectric Integrity, Lee et al., IEEE Electron Device Letters, vol. EDL-7, No. 9, pp. 506-509, Sep. 1986. |
Silicon Processing for the VLSI Era, vol. 2, "Process Integration", Stanley Wolf, pp. 188-199, 1990. |
Silicon Processing for the VLSI Era, vol. 2, "Electron-Cyclotron-Resonance Plasma CVD", pp. 237-238, 1990. |
Number | Date | Country | |
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Parent | 451675 | May 1995 |