SYSTEM AND METHOD OF BEAM ENERGY IDENTIFICATION FOR SINGLE WAFER ION IMPLANTATION

Abstract

The present invention involves a beam energy identification system, comprising an accelerated ion beam, wherein the accelerated ion beam is scanned in a fast scan axis within a beam scanner, wherein the beam scanner is utilized to deflect the accelerated ion beam into narrow faraday cups downstream of the scanner, wherein a difference in scanner voltage or current to position the beam into the Faraday cups is utilized to calculated the energy of ion beam.

Description

FIELD OF INVENTION

The present invention relates generally to ion implantation, and particularly to systems and methods for identifying beam energy.

BACKGROUND OF THE INVENTION

Ion implantation is a physical process, as opposed to diffusion, which is a chemical process that is employed in semiconductor apparatus fabrication to selectively implant dopant into a semiconductor workpiece and/or wafer material. Thus, the act of implanting does not rely on a chemical interaction between a dopant and the semiconductor material. For ion implantation, dopant atoms/molecules are ionized and isolated, sometimes accelerated or decelerated, formed into a beam, and swept across a workpiece or wafer. The dopant ions physically bombard the workpiece, enter the surface and typically come to rest below the workpiece surface in the crystalline lattice structure thereof.

In RF based accelerators, ions are repeatedly accelerated through multiple RF voltage driven acceleration gaps. Due to the time varying nature of RF acceleration fields and the multiple numbers of acceleration gaps (usually greater than 20) there are a large number of parameters which influence the final beam energy. Although it may not be technically impossible, “set and forget” techniques can not be used in setting up the final beam energy and fine adjustments have to be performed on the parameters to maximize beam transmission through a filter with known passband.

An energy filter is used not only as a simple filter to reject unwanted portions of the energy spectrum, but also and more importantly as an energy standard to which all the acceleration parameters are tuned. In this sense, the energy filter plays the ultimate role in determining the final beam energy. However, quite often the design of the energy filter has to be compromised, mostly because of space restrictions or some other imposed conditions limiting proper functioning and as a result, precision in the final beam energy is uncertain. There have been several attempts to develop an independent measurement system of beam energy, but no particular method has been incorporated into production machines.

Accordingly, suitable systems or methods for identifying beam energy are desired, that accurately measures the final beam energy.

SUMMARY OF THE INVENTION

The following presents a simplified summary of the invention in order to provide a basic understanding of one or more aspects of the invention. This summary is not an extensive overview of the invention, and is neither intended to identify key or critical elements of the invention, nor to delineate the scope thereof. Rather, the primary purpose of the summary is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented later.

The present invention according to one or more embodiments creates a beam energy identification system utilizing a beam scanner which scans an accelerated ion beam at a frequency to create a wide uniform ion beam in one direction for uniform ion implantation on a workpiece, or a semiconductor wafer. One embodiment of this invention comprises two narrow Faraday cups placed at a distance downstream of scanner and a difference in scanner voltage (or current if the scanner is electromagnetic) to deflect the ion beam into each of the two narrow Faraday cups is used to calculate the energy of ion beam.

According to yet another aspect of the invention, two narrow Faraday cups are placed downstream of a scanner after going through a beam parallelizing lens (e.g., an electromagnetic lens, called an angle corrector magnet) to parallelize the fanning-out beam exiting the scanner. Again, a measured difference in scanner voltage (or current if the scanner is electromagnetic) to deflect the ion beam into each of the two Faraday cups is used to calculate the energy of the ion beam.

To the accomplishment of the foregoing and related ends, the invention comprises the features hereinafter fully described and particularly pointed out in the claims. The following description and the annexed drawings set forth in detail certain illustrative aspects and implementations of the invention. These are indicative, however, of but a few of the various ways in which the principles of the invention may be employed. Other objects, advantages and novel features of the invention will become apparent from the following detailed description of the invention when considered in conjunction with the drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a simplified top view illustrating an ion implantation system in accordance with an aspect of the present invention;

FIG. 2 is a top view illustrating an embodiment of a beam energy identification system in accordance with an aspect of the present invention;

FIG. 3 is a top view illustrating yet another embodiment of a beam energy identification system in accordance with an aspect of the present invention;

FIG. 4 is a functional block diagram illustrating a beam energy identification method according to yet another embodiment of the present invention; and

FIG. 5 is a functional block diagram illustrating a beam energy identification method according to another embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

The present invention will now be described with reference to the attached drawings, wherein like reference numerals are used to refer to like elements throughout. It will be appreciated by those skilled in the art that the invention is not limited to the exemplary implementations and aspects illustrated and described hereinafter. For the sake of providing a clear description of the invention, the systems and the methods will be described in connection with scanned pencil ion beam implantation. However, it is to be expressly understood that these descriptions are not intended to be self-limiting in any manner Referring now to the figures, in accordance with one exemplary aspect of the present invention, FIG. 1 illustrates a typical hybrid parallel scan single wafer ion implantation system 100. The implantation system 100 is also a type referred to as a post acceleration implanter, since a main accelerator 113 is placed after a mass analyzer 104 and before an energy filter 130. Most ion implanters of this type have the energy filter 130 after the accelerator 113 to remove unwanted energy spectrum in the output of accelerator 113. The filtered ion beam goes through a beam scanner 119 and then through an angle corrector lens 120 to convert the fanned-out beam 111 into a parallel shifted ion beam 115.

A workpiece and/or substrate 134 is moved orthogonal (shown as moving in and out of the paper) to the ion beam 115 in the hybrid scan scheme to irradiate the entire surface of the workpiece 134 uniformly. As stated above, various aspects of the present invention may be implemented in association with any type of ion implantation system, including, but not limited to the exemplary system 100 of FIG. 1.

The exemplary hybrid parallel scan single wafer ion implantation system 100 comprises a source chamber assembly 112 which includes an ion source 102 and an extraction electrode assembly 121 to extract and accelerate ions to an intermediate energy. A mass analyzer 104 removes unwanted ion mass species; the accelerator assembly 113 accelerates the ions to a final energy. The beam scanner 119 scans a pencil beam exiting from the accelerator assembly 113 back and forth at a fast frequency into the angle corrector lens 120 to convert the fanning out scanned beam 111 from the beam scanner 119 to the parallel shifted beam 115 and the workpiece 134 which is housed in a process chamber.

The accelerator assembly 113, for example, can be RF linear particle accelerator (LINAC) in which ions are accelerated repeatedly by an RF field, or a DC accelerator, for example, a tandem electrostatic accelerator, which accelerates ions with a stationary DC high voltage. The beam scanner 119, either electrostatically or electromagnetically scans the ion beam 110 left to right into the angle corrector lens 120, which converts the fanning-out beam 111 into the parallel shifted ion beam 115. The angle corrector lens 120 is most likely to be an electromagnetic magnet as shown, but there is also an electrostatic version, for example. The final parallel shifted ion beam 115 out of the angle corrector lens 120 is directed onto the workpiece 134.

FIG. 2 illustrates a beam energy identification system 200 utilized in an exemplary hybrid parallel scan single wafer ion implantation system 100 (e.g., FIG. 1), wherein a stationary pencil ion beam 202 is scanned with an electrostatic beam scanner 204 in one axis, the fast scan axis (usually greater than 100 Hz), a fanned out beam 211 can be converted to a parallel shifted beam 215 by an angle corrector lens 220, typically an electromagnet (e.g., angle corrector magnet) and a wafer or workpiece 234 is mechanically moved orthogonal to the beam scanning axis. In this type of ion implantation system 100 the electrostatic beam scanner 204 is most often positioned after the ion beam 202 acquires full acceleration energy. The beam scanner 204 can be either electrostatic or electromagnetic, but for simplicity of discussion, it is assumed that the scanner 204 is an electrostatic scanner. For an electromagnetic scanner, the mathematical relationship is slightly more complex than for the electrostatic scanner 204 and it requires knowing the mass of the ions.

For small angles (i.e., angles less than about 10 degrees) the angle of deflection of the ion beam 202 by the electrostatic scanner 204 is a linear function of scan voltage (for an electrostatic scanner) and the inverse of beam energy. The calculation for a deflection angle (Δθ_1S) is shown below as Equation 1. In this embodiment of the present invention the angle corrector magnet 220 is deactivated which allows the deflected beam 211, deflected by the scanner to 25 pass through the angle corrector magnet 220 without deflection.

Δθ_1S=(K_1S)(ΔV_1S)/(E/q) (electrostatic equation)   (Eq. 1)

wherein:

• • Δθ_1S is a change of deflection angle
  • K_1S is a constant (of the 1st order) throughout the ranges of the beam energy (E) and scanner voltage (V_1S)
  • ΔV_1S is the change in electrostatic scanner voltage
  • E is the beam energy
  • q is the charge value of the ions

Rearranging the terms described above can be done to determine the beam energy (E), shown below as Equation 2:

E=(Δθ_1S)(q)/((K_1S)(ΔV_1S)) (electrostatic equation)   (Eq. 2)

Now referring to an electromagnetic scanner 215 (as opposed to an electrostatic scanner 204) the change of beam deflection angle (Δθ_1M) is shown below as Equation 3. In this embodiment of the present invention the angle corrector magnet 220 is deactivated which allows the scanner deflected beam 211 to pass through the angle corrector magnet 220 without deflection.

Δθ_1M=(K_1M)(q)(ΔB_1M)/(sqrt(Em)) (electromag. eq.)   (Eq. 3)

wherein:

• • Δθ_1M is the change of beam deflection angle;
  • K_1M is constant (of the 1st order) throughout the ranges of the beam energy (E) and a magnetic field in the electromagnetic scanner;
  • ΔB_1M is the change in the electromagnetic scanner magnetic field;
  • E is the beam energy;
  • q is the charge value of the ions; and
  • m is the mass of ions.

Rearranging terms to determine the beam energy (E) is shown below as Equation 4:

E=(K_1MΔB_1M q Δθ_1M)²/m (electromag. eq.)   (Eq. 4)

Yet another embodiment of the present invention is an ion beam energy identification system 300; depicted in FIG. 3 that can also be used in a hybrid scan single wafer ion implantation system 100. In this kind of system a beam scanner is most often situated after the ion beam 302 acquires full acceleration energy. The primary angle of deflection of the ion beam 202 by the scanner 204 is a linear function shown as Equation 5 that adds an additional correction factor f_1M.

The system 300 can be utilized in an exemplary hybrid parallel scan single wafer ion implantation system 100 (e.g., FIG. 1), wherein a stationary pencil ion beam 302 is scanned (usually at a frequency greater than 100 Hz) with an electrostatic beam scanner 304 in one axis. In the fast scan axis, a fanned out beam 311 is converted to a parallel shifted beam 315 by activating an angle corrector lens 320, typically an electromagnet (e.g., angle corrector magnet) and a wafer or workpiece 334 is mechanically moved orthogonal to the beam scanning axis. In this type of ion implantation system the beam scanner 304 is most often positioned after the ion beam 302 acquires full acceleration energy. The beam scanner 304 can be either electrostatic or electromagnetic, but for simplicity of discussion, it is first assumed that the scanner 304 is an electrostatic scanner. For an electromagnetic scanner as discussed supra, the mathematical relationship is slightly more complex than for an electrostatic scanner and it requires knowing the mass of the ions.

For small angles (i.e., angles less than about 10 degrees) the angle of deflection of the ion beam 302 by the electrostatic scanner 304 is a linear function of scan voltage (for an electrostatic scanner) and the inverse of the ion beam energy. The calculation for the shift of beam position (Δθ_2S) is shown below as Equation 5. In this embodiment of the present invention the angle corrector magnet 220 is activated which allows the fanned out beam 211 to be converted into a parallel ion beam 315 as illustrated in FIG. 3.

Δθ_2S=(f_2S)(k_2S)(ΔV_2S)/(E/q)   (Eq. 5)

wherein:

• • Δθ_2S is the shift of beam position;
  • f_2S is a correction factor to account for effect of corrector magnet;
  • K_2S is approximately constant throughout ranges of the beam energy and electrostatic scanner voltage;
  • ΔV_2S the change in electrostatic scanner voltage;
  • E the beam energy; and
  • q is the charge value of the ions.

Rearranging terms:

E=(Δθ_2S)(q)/((f_2S)(k_2S)(ΔV_2S))   (Eq. 6)

Now referring to another embodiment of the present invention is an electromagnetic scanner 315 (as opposed to the electrostatic scanner 204) the shift of beam position (Δθ_2M) is shown below as Equation 7. In this embodiment of the present invention the angle corrector magnet 320 is activated which allows the deflected beam by the scanner 311 to pass through the angle corrector magnet 320 and to be deflected into a parallel ion beam 315.

Δθ_2M=(f_2M)(k_2M)q(ΔB_2M)/sqrt(Em)   (Eq. 7)

wherein:

• • Δθ_2M is the shift of beam position;
  • f_2M is a correction factor to account for effect of corrector magnet;
  • K_2M is approximately constant throughout ranges of the beam energy and electromagnetic scanner current;
  • ΔB_2M the change in magnetic field in the electromagnetic scanner;
  • E the beam energy;
  • m is the mass of ions; and
  • q is the charge value of the ions.

Rearranging terms:

E=(q K_2M f_2M ΔB_2M Δθ_2M)²/m   (Eq. 8)

FIG. 4 illustrates an exemplary method of beam energy identification 400 that will be described in detail with respect to FIG. 2. Although the methodology 400 is illustrated and described hereinafter as a series of acts or events, it will be appreciated that the present invention is not limited by the illustrated ordering of such acts or events. For example, some acts may occur in different orders and/or concurrently with other acts or events apart from those illustrated and/or described herein, in accordance with one or more aspects of the present invention. In addition, not all illustrated steps may be required to implement a methodology in accordance with the present invention. Furthermore, the methodologies according to the present invention may be implemented in association with the formation and/or processing of structures illustrated and described herein as well as in association with other structures not illustrated.

The method 400 begins at 404 with generating an ion beam 202 and scanning the ion beam 202 in a fast scan axis with an ion beam scanner 204 (e.g., FIG. 2), for example. The ion beam 202 (FIG. 2) is extracted at 404 and scanned at a frequency of greater than 100 Hz. The ion beam 202 in this example is a pencil ion beam; however potential ion beams can be a divergent beam, a ribbon beam, and the like. The ion beam scanner 204 can be an electrostatic ion beam scanner 215 (FIG. 2) or an electromagnetic ion beam scanner 217.

Two or more Faraday cups and/or other type detection mechanism(s) and/or sensors can be employed to detect a deflected ion beam 211 (FIG. 2) and thus ascertain the ion beam energy associated therewith. At 406 a first Faraday cup 216 is located to capture a first deflected ion beam peak 211a and a second Faraday cup 218 is located to capture a second deflected ion beam peak 211b. It is determined at 408 if the scanner is an electrostatic scanner 215 or an electromagnetic scanner 217. If the scanner is the electrostatic scanner 215 the voltage is varied to obtain peak of a first deflected ion beam 211a (FIG. 2) in the first Faraday cup 216 (FIG. 2) and a second deflected ion beam peak 211b (FIG. 2) in the second Faraday cup 218 (FIG. 2). An angle corrector magnet 220 (FIG. 2) is deactivated so that the deflected ion beam 211 by the scanner travels to the Faraday cups 216 and 218 un-deflected. The beam energy (E) is calculated at 414 (FIG. 4) utilizing the change in voltage. Referring to the equation derived previously as Eq. 2.

E=(Δθ_1S)(q)/((K_1S)(ΔV_1S)) (electrostatic equation)   (Eq. 2)

wherein:

• • Δθ_1S is an shift of beam angle;
  • K_1S is a constant (of the 1st order) throughout the ranges of beam energy (E_1S) and scanner voltage (V_1S);
  • ΔV_1S is the change in electrostatic scanner voltage;
  • E is the beam energy; and
  • q is the charge value of the ions.

If it is determined at 408 that the scanner is the electromagnetic scanner 217 the current is varied to obtain the peak of a first deflected ion beam peak 211a (FIG. 2) in the first Faraday cup 216 (FIG. 2) and a second deflected ion beam peak 211b (FIG. 2) in the second Faraday cup 218 (FIG. 2). The angle corrector magnet 220 (FIG. 2) is deactivated so that the deflected ion beam 211 by the scanner travels to the cups 216 and 218 un-deflected. The beam energy (E) is calculated utilizing the change in magnetic field in the scanner at 25414. Referring to the equation derived previously as Eq. 4.

E=(K_1M ΔB_1M q Δθ_1M)²/m   (Eq. 4)

wherein:

• • Δθ_1M is shift of beam angle;
  • K_1M is a constant (of the 1st order) throughout the ranges of the beam energy (E) and scanner current;
  • ΔB_1M is the change in the magnetic field in electromagnetic scanner;
  • E is the beam energy
  • m is the mass of ions; and
  • q is the charge value of the ions.

FIG. 5 illustrates yet another exemplary method for beam energy identification 500 that will be described in detail with respect to FIG. 3. Although the methodology 500 is illustrated and described hereinafter as a series of acts or events, it will be appreciated that the present invention is not limited by the illustrated ordering of such acts or events. For example, some acts may occur in different orders and/or concurrently with other acts or events apart from those illustrated and/or described herein, in accordance with one or more aspects of the present invention. In addition, not all illustrated steps may be required to implement a methodology in accordance with the present invention. Furthermore, the methodologies according to the present invention may be implemented in association with the formation and/or processing of structures illustrated and described herein as well as in association with other structures not illustrated.

The method 500 begins at 504 with generating an ion beam 302 and scanning the ion beam 302 in a fast scan axis with an ion beam scanner 304 (e.g., FIG. 3), for example. The ion beam 302 (FIG. 3) is extracted at 504 and scanned at a frequency of greater than 100 Hz. The ion beam 302 in this example is a pencil ion beam; however potential ion beams can be a divergent beam, a ribbon beam, and the like. The ion beam scanner 304 can be an electrostatic ion beam scanner 315 (FIG. 3) or an electromagnetic ion beam scanner 317.

Two or more Faraday cups and/or other type detection mechanism(s) and/or sensors can be employed to detect a parallel ion beamlets created from the parallel ion beam 315 (FIG. 3) and thus ascertain the ion beam energy associated therewith. At 506 a first faraday cup 322 is located to capture a first parallel ion beam peak 315a and a second faraday cup 324 is located to capture a second parallel ion beam peak 315b. It is determined at 508 if the scanner 304 is an electrostatic scanner 313 or an electromagnetic scanner 317. If the scanner 304 is an electrostatic scanner 313 the voltage is varied to obtain a first parallel ion beam peak 315a (FIG. 3) in the first Faraday cup 322 (FIG. 3) and a second parallel ion beam peak 315b (FIG. 3) in the second Faraday cup 324 (FIG. 3). An angle corrector magnet 320 (FIG. 3) is activated so that the parallel ion beam 315 travels to the cups 322 and 324. The ion beam energy (E) is calculated at 514 (FIG. 5) utilizing the change in scanner voltage. Referring to the equation derived previously as Eq. 6.

E=(Δθ_2S)(q)/((f_2S)(k_2S)(ΔV_2S)) (electrostatic equation)   (Eq. 6)

wherein:

• • Δθ_2S is the second electrostatic shift of beam position;
  • f_2S is a correction factor to account for effect of corrector magnet;
  • K_2S is approximately constant throughout ranges of the second electrostatic beam energy 2and electrostatic scanner voltage;
  • ΔV_2S the second change in electrostatic scanner voltage;
  • E the beam energy; and
  • q is the charge value of the ions.

Wherein, the method 500 ends if the scanner was the electrostatic scanner 313.

If it is determined at 508 that the scanner 304 (FIG. 3) is an electromagnetic scanner 317 the current is varied to obtain a parallel ion beam peak 315a (FIG. 3) in the first Faraday cup 322 (FIG. 3) and a second parallel ion beam peak 315b (FIG. 3) in the second Faraday cup 324 (FIG. 3). The angle corrector magnet 320 (FIG. 3) is activated so that the parallel ion beam 315 travels to the cups 322 and 324. The beam energy (E) is calculated utilizing the change in current at 514. Referring to the equation derived previously as Eq. 8.

E=(K_2M ΔB_2M q Δθ_2M)²/m (electromagnetic equation)   (Eq. 8)

wherein:

• • Δθ_2M is the shift of beam position;
  • K_2M is a constant (of the 1st order) throughout the ranges of a beam energy (E) and scanner current;
  • ΔB_2M is the change in a magnetic field of the electromagnetic scanner;
  • E is a beam energy; and
  • q is a charge value of the ions.

Wherein, the method 500 ends if the scanner is an electromagnetic scanner 317.

Although the invention has been illustrated and described with respect to one or more implementations, equivalent alterations and modifications will occur to others skilled in the art upon the reading and understanding of this specification and the annexed drawings. In particular regard to the various functions performed by the above described components (assemblies, apparatus, circuits, systems, etc.), the terms (including a reference to a “means”) used to describe such components are intended to correspond, unless otherwise indicated, to any component which performs the specified function of the described component (e.g., that is functionally equivalent), even though not structurally equivalent to the disclosed structure which performs the function in the herein illustrated exemplary implementations of the invention. In addition, while a particular feature of the invention may have been disclosed with respect to only one of several implementations, such feature may be combined with one or more other features of the other implementations as may be desired and advantageous for any given or particular application. Furthermore, to the extent that the terms “including”, “includes”, “having”, “has”, “with”, or variants thereof are used in either the detailed description and the claims, such terms are intended to be inclusive in a manner similar to the term “comprising.”

Claims

1. A beam energy identification system, comprising: an accelerated ion beam; wherein the accelerated ion beam is deflected in a fast scan axis, within a beam scanner;wherein a scanner voltage to peak the beam at a first Faraday cup and a second Faraday cup is measured.

2. The system of claim 1, wherein a beam energy is estimated from the difference in scanner voltage to peak at the first Faraday cup and a second Faraday cup and, wherein the beam scanner is an electrostatic beam scanner.

3. The system of claim 1, wherein a beam energy is approximated utilizing the difference in scanner magnetic field to peak the beam at the first Faraday cup and second Faraday cup and the beam scanner is an electromagnetic beam scanner.

4. The system of claim 2, wherein the beam energy (E) is defined by: E=(Δθ1S)(q)/((K1S)(ΔV1S))wherein: Δθ1S is a shift of beam angle;K1S is a constant (of the 1st order) throughout the ranges of beam energy and electrostatic scanner voltage;ΔV1S is the change in electrostatic scanner voltage;E is the beam energy; andq is a charge value of the ions.

5. The system of claim 3, wherein the beam energy (E) is defined by; E=(K1M*(ΔB)(q))2/((m)(Δθ1M))wherein: Δθ1M is a shift of beam angle;K1M is constant (of the 1st order) throughout the ranges of beam energy and scanner current;ΔB1M is the change in a scanner magnetic field;E is the beam energy;q is a charge value of the ions; andm is a mass of ions.

6. The system of claim 1, wherein the beam energy identification system is a part of an ion implantation system, comprising: an ion source operable to produce an extracted ion beam;a mass analyzer that receives the ion beam from the ion source and provides a mass analyzed ion beam comprising ions of a desired mass range;a main accelerator for further accelerating the analyzed ion beam;an energy filter to remove unwanted energy spectrum in the output of accelerator; a beam scanner to create a fanned-out beam in one direction andthe beam energy identification system is positioned downstream of the beam scanner.

7. A beam energy identification system, comprising: an ion beam; wherein the ion beam is deflected in a fast scan axis, within a beam scanner;an angle corrector magnet, wherein the angle corrector magnet is activated to create a parallel ion beam;wherein a scanner voltage to peak the beam at a first Faraday cup and a second Faraday cup is measured.

8. The system of claim 7, wherein a beam energy is estimated from the difference in scanner voltage to peak at the third Faraday cup and a forth Faraday cup; and, wherein the beam scanner is an electrostatic beam scanner.

9. The system of claim 7, wherein a beam energy is estimated from the difference in scanner current peak at the third Faraday cup and a forth Faraday cup; and wherein the beam scanner is an electromagnetic beam scanner.

10. The system of claim 7, wherein the beam energy (E) is defined by: E=(Δθ2S)(q)/((K2S)(ΔV2S))wherein: Δθ2S is a shift of beam angle;K2S is a constant (of the 1 st order) throughout the ranges of the beam energy (E2S) and scanner voltage (V2S);ΔV2S is the change in a electrostatic scanner voltage;E is the beam energy; andq is a charge value of the ions.

11. The system of claim 7, wherein the beam energy (E) is defined by; E=(K2M ΔB2M q Δθ2M)2/m wherein:Δθ2M is the second electromagnetic shift of beam angle;K2M is constant (of the 1st order) throughout the ranges of the electromagnetic beam energy (E) and a scanner current;ΔB2M is the change in a second electromagnetic scanner magnetic field;E is the beam energy;q is the charge value of the ions; andm is a mass of ions.

12. The system of claim 7, wherein the beam scanner frequency is greater than 100 Hz.

13. A beam energy identification method, comprising: scanning an ion beam in a fast scan axis with a ion beam scanner;locating a first faraday cup to capture a first fanned out ion beam peak and a second faraday cup to capture a second fanned out ion beam peak;positioning first shift in ion beam position in first Faraday cup and second Faraday cup downstream of the scanner;varying scanner voltage to obtain first fanned out ion beam peak that enters the first Faraday cup and second fanned out ion beam peak that enters the second Faraday cup; andestimating a beam energy from the difference in scanner voltage to peak at the first Faraday cup and a second Faraday cup.

14. The method of claim 13, wherein the beam energy (E) is defined by; E=(Δθ1S)(q)/((K1S)(ΔV1S))wherein:Δθ1S is a shift of beam angle;K1S is a constant (of the 1st order) throughout the ranges of the beam energy and electrostatic scanner voltage;ΔV1S is the change in electrostatic scanner voltage;E is the beam energy; andq is the charge value of the ions.

15. A beam energy identification method, comprising: deflecting an ion beam with a beam scanner in a fast scan axis;moving a workpiece orthogonal to the fast scan axis;positioning second shift in ion beam position (Δθ2) in third faraday cup and forth faraday cup downstream of the scanner;varying a scanner voltage to obtain fanned out ion beam;activating a angle corrector magnet to create a parallel ion beam;capturing a first parallel ion beam peak in a third Faraday cup;capturing a second parallel ion beam peak in a third Faraday cup; andestimating a beam energy (E) from the difference in scanner voltage to peak at the third Faraday cup and the fourth Faraday cup.

16. The method of claim 13, wherein the beam energy (E) is defined by; E=(Δθ2)(q)/((K2)(ΔV2S))where: Δθ2 is a shift of beam positionK2 is approximately constant throughout ranges of the beam energy and scanner voltage,ΔVs2 is a change in scanner voltage,E is a beam energy,q is a charge value of the ions.

17. The system of claim 13, wherein the ion beam comprises a pencil beam, a scanned beam and a broad beam.