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David (Wei) Wang
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Cupertino, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Electrolytes for lithium metal electrodes and rechargeable batterie...
Patent number
11,387,450
Issue date
Jul 12, 2022
Massachusetts Institute of Technology
Yet-Ming Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Media access control security (MACsec) management with a layer mana...
Patent number
8,635,392
Issue date
Jan 21, 2014
Broadcom Corporation
David (Wei) Wang
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposi...
Patent number
6,167,834
Issue date
Jan 2, 2001
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
PECVD of compounds of silicon from silane and nitrogen
Patent number
6,040,022
Issue date
Mar 21, 2000
Applied Materials, Inc.
Mei Chang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for PECVD of silicon oxide using TEOS decomposition
Patent number
RE36623
Issue date
Mar 21, 2000
Applied Materials, Inc.
David Nin-Kou Wang
427 - Coating processes
Information
Patent Grant
Bomine and iodine etch process for silicon and silicides
Patent number
6,020,270
Issue date
Feb 1, 2000
Applied Materials, Inc.
Jerry Yuen Kui Wong
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Multiple chamber integrated process system
Patent number
5,882,165
Issue date
Mar 16, 1999
Applied Materials, Inc.
Dan Maydan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Bromine and iodine etch process for silicon and silicides
Patent number
5,874,362
Issue date
Feb 23, 1999
Applied Materials, Inc.
Jerry Yuen-Kui Wong
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for protecting against deposition on a selected region of a...
Patent number
5,871,811
Issue date
Feb 16, 1999
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
PECVD of silicon nitride films
Patent number
5,773,100
Issue date
Jun 30, 1998
Applied Materials, Inc.
Mei Chang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus for preventing deposition gases from contacting a selecte...
Patent number
5,755,886
Issue date
May 26, 1998
Applied Materials, Inc.
David Nin-Kou Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
RAM based FIFO memory half-full detection apparatus and method
Patent number
5,490,257
Issue date
Feb 6, 1996
Advanced Micro Devices, Inc.
Barry A. Hoberman
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Plasma-enhanced CVD process using TEOS for depositing silicon oxide
Patent number
5,362,526
Issue date
Nov 8, 1994
Applied Materials, Inc.
David N. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Thermal chemical vapor deposition of silicon dioxide and in-situ mu...
Patent number
5,354,715
Issue date
Oct 11, 1994
Applied Materials, Inc.
David N-K. Wang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Boron phosphorus silicate glass composite layer on semiconductor wafer
Patent number
5,354,387
Issue date
Oct 11, 1994
Applied Materials, Inc.
Peter W. Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Two step process for forming void-free oxide layer over stepped sur...
Patent number
5,314,845
Issue date
May 24, 1994
Applied Materials, Inc.
Peter W. Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
UHF/VHF plasma for use in forming integrated circuit structures on...
Patent number
5,300,460
Issue date
Apr 5, 1994
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Multichamber integrated process system
Patent number
5,292,393
Issue date
Mar 8, 1994
Applied Materials, Inc.
Dan Maydan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for planarizing an integrated circuit structure using low me...
Patent number
5,244,841
Issue date
Sep 14, 1993
Applied Materials, Inc.
Jeffrey Marks
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Materials and methods for etching silicides, polycrystalline silico...
Patent number
5,219,485
Issue date
Jun 15, 1993
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetic field-enhanced plasma etch reactor
Patent number
5,215,619
Issue date
Jun 1, 1993
Applied Materials, Inc.
David Cheng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus for removing deposits from backside and end edge of semic...
Patent number
5,213,650
Issue date
May 25, 1993
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
VHF/UHF reactor system
Patent number
5,210,466
Issue date
May 11, 1993
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for planarizing an integrated circuit structure using low me...
Patent number
5,204,288
Issue date
Apr 20, 1993
Applied Materials, Inc.
Jeffrey Marks
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for forming a boron phosphorus silicate glass composite laye...
Patent number
5,166,101
Issue date
Nov 24, 1992
Applied Materials, Inc.
Peter W. Lee
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for planarizing an integrated circuit structure using low me...
Patent number
5,112,776
Issue date
May 12, 1992
Applied Materials, Inc.
Jeffrey Marks
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Materials and methods for etching silicides, polycrystalline silico...
Patent number
5,112,435
Issue date
May 12, 1992
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for removing deposits from backside and end edge of semicon...
Patent number
5,075,256
Issue date
Dec 24, 1991
Applied Materials, Inc.
David N. Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for selective deposition of tungsten on semiconductor wafer
Patent number
5,043,299
Issue date
Aug 27, 1991
Applied Materials, Inc.
Mei Chang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for CVD deposition of tungsten layer on semiconductor wafer
Patent number
5,028,565
Issue date
Jul 2, 1991
Applied Materials, Inc.
Mei Chang
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ELECTROLYTES FOR LITHIUM METAL ELECTRODES AND RECHARGEABLE BATTERIE...
Publication number
20200028165
Publication date
Jan 23, 2020
Massachusetts Institute of Technology
Yet-Ming Chiang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MEDIA ACCESS CONTROL SECURITY MANAGEMENT IN PHYSICAL LAYER
Publication number
20110035580
Publication date
Feb 10, 2011
BROADCOM CORPORATION
David (Wei) Wang
H04 - ELECTRIC COMMUNICATION TECHNIQUE