This application is a division of Ser. No. 07/649,172, filed Feb. 1, 1991 now U.S. Pat. No. 5,166,101 as a File Wrapper Continuation of Ser. No. 07/413,800, filed Nov. 13, 1989, and now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3584264 | McLouski et al. | Jun 1971 | |
4268711 | Gurev | May 1981 | |
4791005 | Becker et al. | Dec 1988 | |
4818335 | Karnett | Apr 1989 | |
4845054 | Mitchener | Jul 1989 | |
4872947 | Wang et al. | Oct 1989 | |
4892753 | Wang et al. | Jan 1990 | |
5094984 | Liu et al. | Mar 1992 |
Number | Date | Country |
---|---|---|
0212691 | Mar 1987 | EPX |
0272140 | Jun 1988 | EPX |
0086746 | May 1983 | JPX |
0188145 | Oct 1984 | JPX |
0171741 | Sep 1985 | JPX |
0250356 | Oct 1990 | JPX |
2137808 | Oct 1984 | GBX |
Entry |
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Ghandhi, VLSI Fabrication Principles, p. 423, Wiley & Sons. |
Sze, Semiconductor Devices, Physics & Technology, p. 341, Wiley & Sons. |
Sze, VLSI Technology, p. 95, 107-108, McGraw-Hill. |
Shioya, Yoshimi, et al., "Comparison of Phosphosilicate Glass Films Deposited by Three Different Chemical Vapor Deposition Methods", Journal of the Electrochemical Society, vol. 133, No. 9, Sep., 1986, pp. 1943-1950. |
Tong, Jerry E., et al., "Process and Film Characterization of PECVD Borophosphosilicate Films for VLSI Applications", Solid State Technology, Jan., 1984, pp. 161-170. |
Wolf, Stanley, et al., Silicon Processing for the VLSI Era, vol. 1: Process Technology, Sunset Beach, Calif.: Lattice Press, pp. 188-191. |
Number | Date | Country | |
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Parent | 649172 | Feb 1991 |
Number | Date | Country | |
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Parent | 413800 | Nov 1989 |