Lee Melbourne Cook

Person

Steelville, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Debris-removal groove for CMP polishing pad
- Patent number 10,875,146
- Issue date Dec 29, 2020
- Rohm and Haas Electronic Materials CMP Holdings
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Cationic particle containing slurries and methods of using them for...
- Patent number 10,037,889
- Issue date Jul 31, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Julia Kozhukh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for chemical mechanical polishing substrates containing ruth...
- Patent number 9,299,585
- Issue date Mar 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Hongyu Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing composition for polishing silicon waf...
- Patent number 9,150,759
- Issue date Oct 6, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stable, concentratable silicon wafer polishing composition and rela...
- Patent number 8,801,959
- Issue date Aug 12, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon wafer polishing composition and related methods
- Patent number 8,795,548
- Issue date Aug 5, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,869,350
- Issue date Mar 22, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,860,802
- Issue date Mar 1, 2005
- Rohm and Haas Electric Materials CMP Holdings, Inc.
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for electrochemical mechanical polishing
- Patent number 6,848,977
- Issue date Feb 1, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,843,712
- Issue date Jan 18, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Hydrolytically stable grooved polishing pads for chemical mechanica...
- Patent number 6,749,485
- Issue date Jun 15, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,739,962
- Issue date May 25, 2004
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved polishing pads for chemical mechanical planarization
- Patent number 6,736,709
- Issue date May 18, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,682,402
- Issue date Jan 27, 2004
- Rodel Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,648,733
- Issue date Nov 18, 2003
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,582,283
- Issue date Jun 24, 2003
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,518,188
- Issue date Feb 11, 2003
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,500,053
- Issue date Dec 31, 2002
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Method relating to a polishing system having a multi-phase polishin...
- Patent number 6,488,570
- Issue date Dec 3, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,454,634
- Issue date Sep 24, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,425,816
- Issue date Jul 30, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing slurry compositions capable of providing multi-modal part...
- Patent number 6,375,694
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- John V. H. Roberts
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing system having a multi-phase polishing substrate and metho...
- Patent number 6,375,559
- Issue date Apr 23, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,354,915
- Issue date Mar 12, 2002
- Rodel Holdings Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,325,703
- Issue date Dec 4, 2001
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Apparatus for photoelectrochemical polishing of silicon wafers
- Patent number 6,319,370
- Issue date Nov 20, 2001
- Rodel Holdings Inc.
- Lizhong Sun
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,293,852
- Issue date Sep 25, 2001
- Rodel Holdings Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,287,185
- Issue date Sep 11, 2001
- Rodel Holdings Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a porous polymeric material by electrophoreti...
- Patent number 6,284,114
- Issue date Sep 4, 2001
- Rodel Holdings Inc.
- Nina G. Chechik
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for chemical-mechanical polishing of semicond...
- Patent number 6,245,679
- Issue date Jun 12, 2001
- Rodel Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD WITH ENDPOINT DETECTION WINDOW
- Publication number 20240253177
- Publication date Aug 1, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yu-Chung SU
- B24 - GRINDING POLISHING
Information Patent Application
DEBRIS-REMOVAL GROOVE FOR CMP POLISHING PAD
- Publication number 20170274496
- Publication date Sep 28, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR CHEMICAL MECHANICAL POLISHING SUBSTRATES CONTAINING RUTH...
- Publication number 20160027663
- Publication date Jan 28, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Hongyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...
- Publication number 20150093900
- Publication date Apr 2, 2015
- NITTA HAAS INCORPORATED
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20050020082
- Publication date Jan 27, 2005
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Application
Process of producing printed circuit boards and the circuit boards...
- Publication number 20040084399
- Publication date May 6, 2004
- Shipley Company, L.L.C.
- Lee M. Cook
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048562
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048564
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20030027500
- Publication date Feb 6, 2003
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020155801
- Publication date Oct 24, 2002
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Electropolishing and chemical mechanical planarization
- Publication number 20020104764
- Publication date Aug 8, 2002
- Gautam Banerjee
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Apparatus and methods for chemical-mechanical polishing of semicond...
- Publication number 20020098702
- Publication date Jul 25, 2002
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020098782
- Publication date Jul 25, 2002
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020077036
- Publication date Jun 20, 2002
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing of dielectric materials
- Publication number 20020058462
- Publication date May 16, 2002
- Michael R. Oliver
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System for ordering and manufacturing a tangible device
- Publication number 20010032111
- Publication date Oct 18, 2001
- Elmer W. Jensen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20010024940
- Publication date Sep 27, 2001
- Lee Melbourne Cook
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Lee Melbourne Cook

Person

Patents Grantslast 30 patents

Debris-removal groove for CMP polishing pad

Cationic particle containing slurries and methods of using them for...

Method for chemical mechanical polishing substrates containing ruth...

Chemical mechanical polishing composition for polishing silicon waf...

Stable, concentratable silicon wafer polishing composition and rela...

Silicon wafer polishing composition and related methods

Polishing pads and methods relating thereto

Polishing pads for chemical mechanical planarization

Polishing pad for electrochemical mechanical polishing

Polishing pads and methods relating thereto

Hydrolytically stable grooved polishing pads for chemical mechanica...

Polishing pads and methods relating thereto

Grooved polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Polishing pads for chemical mechanical planarization

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing pads and methods relating thereto

Method relating to a polishing system having a multi-phase polishin...

Polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto

Polishing slurry compositions capable of providing multi-modal part...

Polishing system having a multi-phase polishing substrate and metho...

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Apparatus for photoelectrochemical polishing of silicon wafers

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Method of fabricating a porous polymeric material by electrophoreti...

Apparatus and methods for chemical-mechanical polishing of semicond...

Patents Applicationslast 30 patents

POLISHING PAD WITH ENDPOINT DETECTION WINDOW

DEBRIS-REMOVAL GROOVE FOR CMP POLISHING PAD

METHOD FOR CHEMICAL MECHANICAL POLISHING SUBSTRATES CONTAINING RUTH...

CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...

Polishing pads for chemical mechanical planarization

Process of producing printed circuit boards and the circuit boards...

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto

Electropolishing and chemical mechanical planarization

Apparatus and methods for chemical-mechanical polishing of semicond...

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Chemical mechanical polishing of dielectric materials

System for ordering and manufacturing a tangible device

Polishing pads and methods relating thereto