Nigel Hacker

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to restore hydrophobicity in dielectric films and materials
- Patent number 8,440,388
- Issue date May 14, 2013
- Honeywell International Inc.
- Nigel P. Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method to restore hydrophobicity in dielectric films and materials
- Patent number 7,858,294
- Issue date Dec 28, 2010
- Honeywell International Inc.
- Nigel P. Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 7,678,462
- Issue date Mar 16, 2010
- Honeywell International, Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyorganosiloxane dielectric materials
- Patent number 7,504,470
- Issue date Mar 17, 2009
- Silecs Oy
- Juha T. Rantala
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method to restore hydrophobicity in dielectric films and materials
- Patent number 7,029,826
- Issue date Apr 18, 2006
- Honeywell International Inc.
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organosiloxanes
- Patent number 7,011,889
- Issue date Mar 14, 2006
- Honeywell International Inc.
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 7,012,125
- Issue date Mar 14, 2006
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,969,753
- Issue date Nov 29, 2005
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Colloidal silica composite films for premetal dielectric applications
- Patent number 6,967,172
- Issue date Nov 22, 2005
- Honeywell International Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organosiloxanes
- Patent number 6,962,727
- Issue date Nov 8, 2005
- Honeywell International Inc.
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,956,097
- Issue date Oct 18, 2005
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Deposition of fluorosilsesquioxane films
- Patent number 6,838,124
- Issue date Jan 4, 2005
- Honeywell International Inc.
- Nigel P. Hacker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,824,879
- Issue date Nov 30, 2004
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Synthesis of siloxane resins
- Patent number 6,743,856
- Issue date Jun 1, 2004
- Honeywell International Inc.
- Nigel P. Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolac polymer planarization films with high temperature stability
- Patent number 6,723,780
- Issue date Apr 20, 2004
- Honeywell International Inc.
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Dielectric films for narrow gap-fill applications
- Patent number 6,653,718
- Issue date Nov 25, 2003
- Honeywell International, Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Novolac polymer planarization films with high temperature stability
- Patent number 6,517,951
- Issue date Feb 11, 2003
- Honeywell International Inc.
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organohydridosiloxane resins with high organic content
- Patent number 6,512,071
- Issue date Jan 28, 2003
- Honeywell International Inc.
- Nigel P. Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolac polymer planarization films with high temperature stability
- Patent number 6,506,441
- Issue date Jan 14, 2003
- Honeywell International Inc.
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,506,497
- Issue date Jan 14, 2003
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolac polymer planarization films with high temperature stability
- Patent number 6,506,831
- Issue date Jan 14, 2003
- Honeywell International Inc.
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Deposition of organosilsesquioxane films
- Patent number 6,472,076
- Issue date Oct 29, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Dielectric films for narrow gap-fill applications
- Patent number 6,444,495
- Issue date Sep 3, 2002
- Honeywell International, Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of fluorosilsesquioxane films
- Patent number 6,440,550
- Issue date Aug 27, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,365,765
- Issue date Apr 2, 2002
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dielectric films from organohydridosiloxane resins with high organi...
- Patent number 6,361,820
- Issue date Mar 26, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organohydridosiloxane resins with low organic content
- Patent number 6,359,099
- Issue date Mar 19, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dielectric films from organohydridosiloxane resins with low organic...
- Patent number 6,358,559
- Issue date Mar 19, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Solvents for processing silsesquioxane and siloxane resins
- Patent number 6,287,477
- Issue date Sep 11, 2001
- Honeywell International Inc.
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-on glass anti-reflective coatings for photolithography
- Patent number 6,268,457
- Issue date Jul 31, 2001
- Allied-Signal, Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MAKING INTEGRATED CIRCUIT DEVICE
- Publication number 20100317179
- Publication date Dec 16, 2010
- Juha T. RANTALA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dielectric materials and methods for integrated circuit applications
- Publication number 20090278254
- Publication date Nov 12, 2009
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to restore hydrophobicity in dielectric films and materials
- Publication number 20070190735
- Publication date Aug 16, 2007
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nanoporous materials and methods of formation thereof
- Publication number 20070100109
- Publication date May 3, 2007
- Nigel Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method to restore hydrophobicity in dielectric films and materials
- Publication number 20060078827
- Publication date Apr 13, 2006
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel polyorganosiloxane dielectric materials
- Publication number 20060058487
- Publication date Mar 16, 2006
- Juha T. Rantala
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20050245717
- Publication date Nov 3, 2005
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Deposition of fluorosilsesquioxane films
- Publication number 20050116347
- Publication date Jun 2, 2005
- Honeywell International Inc.
- Nigel P. Hacker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dielectric materials and methods for integrated circuit applications
- Publication number 20050032357
- Publication date Feb 10, 2005
- Juha T. Rantala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Synthesis of siloxane resins
- Publication number 20050003215
- Publication date Jan 6, 2005
- Nigel Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dielectric films for narrow gap-fill applications
- Publication number 20040228967
- Publication date Nov 18, 2004
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novolac polymer planarization films with high temparature stability
- Publication number 20040192876
- Publication date Sep 30, 2004
- Nigel Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Deposition of organosilsesquioxane films
- Publication number 20040033371
- Publication date Feb 19, 2004
- Nigel P. Hacker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method to restore hydrophobicity in dielectric films and materials
- Publication number 20040013858
- Publication date Jan 22, 2004
- Nigel P. Hacker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organohydridosiloxane resins with high organic content
- Publication number 20030176614
- Publication date Sep 18, 2003
- Nigel Hacker
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novolac polymer planarization films with high temperature stability
- Publication number 20030130482
- Publication date Jul 10, 2003
- Nigel Hacker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20030120018
- Publication date Jun 26, 2003
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organosiloxanes
- Publication number 20030105264
- Publication date Jun 5, 2003
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dielectric films for narrow gap-fill applications
- Publication number 20030087485
- Publication date May 8, 2003
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organosiloxanes
- Publication number 20030031789
- Publication date Feb 13, 2003
- William B. Bedwell
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS
- Publication number 20020137260
- Publication date Sep 26, 2002
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition of organosilsesquioxane films
- Publication number 20020136910
- Publication date Sep 26, 2002
- Nigel P. Hacker
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020128388
- Publication date Sep 12, 2002
- AlliedSignal Inc.
- Joseph Kennedy
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Deposition of fluorosilsesquioxane films
- Publication number 20020127416
- Publication date Sep 12, 2002
- Honeywell International Inc.
- Nigel P. Hacker
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020095018
- Publication date Jul 18, 2002
- Teresa Baldwin
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020055000
- Publication date May 9, 2002
- Honeywell International Inc.
- Joseph Kennedy
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Novolac polymer planarization films with high temperature stability
- Publication number 20020012809
- Publication date Jan 31, 2002
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
NOVOLAC POLYMER PLANARIZATION FILMS WITH HIGH TEMPERATURE STABILITY
- Publication number 20020002265
- Publication date Jan 3, 2002
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novolac polymer planarization films with high temperature stability
- Publication number 20010000515
- Publication date Apr 26, 2001
- Nigel Hacker
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Nigel Hacker

Person

Patents Grantslast 30 patents

Method to restore hydrophobicity in dielectric films and materials

Method to restore hydrophobicity in dielectric films and materials

Spin-on-glass anti-reflective coatings for photolithography

Polyorganosiloxane dielectric materials

Method to restore hydrophobicity in dielectric films and materials

Organosiloxanes

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Colloidal silica composite films for premetal dielectric applications

Organosiloxanes

Spin-on-glass anti-reflective coatings for photolithography

Deposition of fluorosilsesquioxane films

Spin-on-glass anti-reflective coatings for photolithography

Synthesis of siloxane resins

Novolac polymer planarization films with high temperature stability

Dielectric films for narrow gap-fill applications

Novolac polymer planarization films with high temperature stability

Organohydridosiloxane resins with high organic content

Novolac polymer planarization films with high temperature stability

Spin-on-glass anti-reflective coatings for photolithography

Novolac polymer planarization films with high temperature stability

Deposition of organosilsesquioxane films

Dielectric films for narrow gap-fill applications

Deposition of fluorosilsesquioxane films

Spin-on-glass anti-reflective coatings for photolithography

Dielectric films from organohydridosiloxane resins with high organi...

Organohydridosiloxane resins with low organic content

Dielectric films from organohydridosiloxane resins with low organic...

Solvents for processing silsesquioxane and siloxane resins

Spin-on glass anti-reflective coatings for photolithography

Patents Applicationslast 30 patents

METHOD FOR MAKING INTEGRATED CIRCUIT DEVICE

Dielectric materials and methods for integrated circuit applications

Method to restore hydrophobicity in dielectric films and materials

Nanoporous materials and methods of formation thereof

Method to restore hydrophobicity in dielectric films and materials

Novel polyorganosiloxane dielectric materials

Spin-on-glass anti-reflective coatings for photolithography

Deposition of fluorosilsesquioxane films

Dielectric materials and methods for integrated circuit applications

Synthesis of siloxane resins

Dielectric films for narrow gap-fill applications

Novolac polymer planarization films with high temparature stability

Deposition of organosilsesquioxane films

Method to restore hydrophobicity in dielectric films and materials

Organohydridosiloxane resins with high organic content

Novolac polymer planarization films with high temperature stability

Spin-on-glass anti-reflective coatings for photolithography

Organosiloxanes

Dielectric films for narrow gap-fill applications

Organosiloxanes

DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS

Deposition of organosilsesquioxane films

Spin-on-glass anti-reflective coatings for photolithography

Deposition of fluorosilsesquioxane films

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Novolac polymer planarization films with high temperature stability

NOVOLAC POLYMER PLANARIZATION FILMS WITH HIGH TEMPERATURE STABILITY

Novolac polymer planarization films with high temperature stability