Qiwei Liang

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-assembled monolayer deposition from low vapor pressure organic...
- Patent number 12,142,467
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pin-less substrate transfer apparatus and method for a processing c...
- Patent number 11,948,828
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Sultan Malik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,899,366
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for high pressure processing chamber
- Patent number 11,756,803
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system
- Patent number 11,749,555
- Issue date Sep 5, 2023
- Applied Materials, Inc.
- Sultan Malik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated cluster tool for selective area deposition
- Patent number 11,725,274
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of improving graphene deposition for processes using microw...
- Patent number 11,682,556
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Jie Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery system for high pressure processing chamber
- Patent number 11,527,421
- Issue date Dec 13, 2022
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch curing chamber with gas distribution and individual pumping
- Patent number 11,408,075
- Issue date Aug 9, 2022
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source ion beam etch system
- Patent number 11,387,071
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas delivery module
- Patent number 11,361,978
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Adib M. Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for graphene formation using microwave surface-wave plasma...
- Patent number 11,289,331
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Jie Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monopole antenna array source for semiconductor process equipment
- Patent number 11,244,808
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate transfer blade
- Patent number D941787
- Issue date Jan 25, 2022
- Applied Materials, Inc.
- Sultan Malik
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Monopole antenna array source with gas supply or grid filter for se...
- Patent number 11,222,769
- Issue date Jan 11, 2022
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,222,771
- Issue date Jan 11, 2022
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,112,697
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas abatement apparatus
- Patent number 11,110,383
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Adib Khan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method and apparatus for thin wafer carrier
- Patent number 11,094,573
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Jingyu Qiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical delivery chamber for self-assembled monolayer processes
- Patent number 11,066,747
- Issue date Jul 20, 2021
- APPLIED MATERIALS, INC.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
High temperature vapor delivery system and method
- Patent number 10,954,594
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low vapor pressure chemical delivery
- Patent number 10,947,621
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Adib Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery module
- Patent number 10,748,783
- Issue date Aug 18, 2020
- Applied Materials, Inc.
- Adib M. Khan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas delivery system for high pressure processing chamber
- Patent number 10,720,341
- Issue date Jul 21, 2020
- Micromaterials, LLC
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ CVD and ALD coating of chamber to control metal contamination
- Patent number 10,704,141
- Issue date Jul 7, 2020
- Applied Materials, Inc.
- Sultan Malik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas abatement apparatus
- Patent number 10,675,581
- Issue date Jun 9, 2020
- Applied Materials, Inc.
- Adib Khan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma reactor with non-power-absorbing dielectric gas shower plate...
- Patent number 10,615,007
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIASABLE ELECTROSTATIC CHUCK
- Publication number 20240234108
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Paneendra Prakash Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS
- Publication number 20240160117
- Publication date May 16, 2024
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING
- Publication number 20230161260
- Publication date May 25, 2023
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20230093374
- Publication date Mar 23, 2023
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...
- Publication number 20220350251
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING
- Publication number 20220341042
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Adib KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...
- Publication number 20220319896
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Graphene Formation
- Publication number 20220172948
- Publication date Jun 2, 2022
- Applied Materials, Inc.
- Jie Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENT
- Publication number 20220139668
- Publication date May 5, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20220004104
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...
- Publication number 20210375600
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PIN-LESS SUBSTRATE TRANSFER APPARATUS AND METHOD FOR A PROCESSING C...
- Publication number 20210225687
- Publication date Jul 22, 2021
- Applied Materials, Inc.
- Sultan MALIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CARBON COMPOUND FILM DEPOSITION
- Publication number 20210217585
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Qiwei LIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE ION BEAM ETCH SYSTEM
- Publication number 20210104374
- Publication date Apr 8, 2021
- Applied Materials, Inc.
- Qiwei Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ABATEMENT APPARATUS
- Publication number 20200368666
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Adib KHAN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER
- Publication number 20200350183
- Publication date Nov 5, 2020
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY MODULE
- Publication number 20200343103
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Adib M. KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20200185260
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Sultan MALIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR THIN WAFER CARRIER
- Publication number 20200161156
- Publication date May 21, 2020
- Applied Materials, Inc.
- Jingyu QIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods For Graphene Formation
- Publication number 20200105525
- Publication date Apr 2, 2020
- Applied Materials, Inc.
- Jie Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS ABATEMENT APPARATUS
- Publication number 20200038797
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Adib KHAN
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS DELIVERY MODULE
- Publication number 20200035509
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Adib M. KHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS
- Publication number 20200035513
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Adib KHAN
- F01 - MACHINES OR ENGINES IN GENERAL ENGINE PLANTS IN GENERAL STEAM ENGINES
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
IN-SITU CVD AND ALD COATING OF CHAMBER TO CONTROL METAL CONTAMINATION
- Publication number 20190368035
- Publication date Dec 5, 2019
- Applied Materials, Inc.
- Sultan MALIK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CLUSTER TOOL FOR SELECTIVE AREA DEPOSITION
- Publication number 20190301009
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Tobin KAUFMAN-OSBORN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190244792
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE WAFER PROCESSING SYSTEMS AND RELATED METHODS
- Publication number 20190198367
- Publication date Jun 27, 2019
- Micromaterials, LLC.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Qiwei Liang

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Self-assembled monolayer deposition from low vapor pressure organic...

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Pin-less substrate transfer apparatus and method for a processing c...

Method and apparatus for post exposure processing of photoresist wa...

Gas delivery system for high pressure processing chamber

Semiconductor processing system

Integrated cluster tool for selective area deposition

Methods of improving graphene deposition for processes using microw...

Gas delivery system for high pressure processing chamber

Batch curing chamber with gas distribution and individual pumping

Multi-source ion beam etch system

Gas delivery module

Methods for graphene formation using microwave surface-wave plasma...

Chemical control features in wafer process equipment

Monopole antenna array source for semiconductor process equipment

Substrate transfer blade

Monopole antenna array source with gas supply or grid filter for se...

Chemical control features in wafer process equipment

Method and apparatus for post exposure processing of photoresist wa...

Gas abatement apparatus

Method and apparatus for thin wafer carrier

Chemical delivery chamber for self-assembled monolayer processes

High temperature vapor delivery system and method

Low vapor pressure chemical delivery

Gas delivery module

Gas delivery system for high pressure processing chamber

In-situ CVD and ALD coating of chamber to control metal contamination

Gas abatement apparatus

Plasma reactor with non-power-absorbing dielectric gas shower plate...

Patents Applicationslast 30 patents

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

BIASABLE ELECTROSTATIC CHUCK

PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS

CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...

BATCH CURING CHAMBER WITH GAS DISTRIBUTION AND INDIVIDUAL PUMPING

ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...

Methods For Graphene Formation

MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENT

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...

PIN-LESS SUBSTRATE TRANSFER APPARATUS AND METHOD FOR A PROCESSING C...

METHODS AND APPARATUS FOR CARBON COMPOUND FILM DEPOSITION

MULTI-SOURCE ION BEAM ETCH SYSTEM

GAS ABATEMENT APPARATUS

GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

GAS DELIVERY MODULE

SEMICONDUCTOR PROCESSING SYSTEM

METHOD AND APPARATUS FOR THIN WAFER CARRIER

FLOW CONTROL FEATURES OF CVD CHAMBERS

Methods For Graphene Formation

GAS ABATEMENT APPARATUS

GAS DELIVERY MODULE

PROCESSING APPARATUS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

IN-SITU CVD AND ALD COATING OF CHAMBER TO CONTROL METAL CONTAMINATION

INTEGRATED CLUSTER TOOL FOR SELECTIVE AREA DEPOSITION

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

HIGH PRESSURE WAFER PROCESSING SYSTEMS AND RELATED METHODS