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Richard Spear
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
7,678,462
Issue date
Mar 16, 2010
Honeywell International, Inc.
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
7,012,125
Issue date
Mar 14, 2006
Honeywell International Inc.
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
6,969,753
Issue date
Nov 29, 2005
Honeywell International Inc.
Teresa Baldwin
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
6,956,097
Issue date
Oct 18, 2005
Honeywell International Inc.
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Absorbing compounds for spin-on-glass anti-reflective coatings for...
Patent number
6,914,114
Issue date
Jul 5, 2005
Honeywell International Inc.
Teresa Baldwin
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
6,824,879
Issue date
Nov 30, 2004
Honeywell International Inc.
Teresa Baldwin
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Novolac polymer planarization films with high temperature stability
Patent number
6,723,780
Issue date
Apr 20, 2004
Honeywell International Inc.
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Absorbing compounds for spin-on-glass anti-reflective coatings for...
Patent number
6,605,362
Issue date
Aug 12, 2003
Honeywell International Inc.
Teresa Baldwin
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Grant
Novolac polymer planarization films with high temperature stability
Patent number
6,517,951
Issue date
Feb 11, 2003
Honeywell International Inc.
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Novolac polymer planarization films with high temperature stability
Patent number
6,506,441
Issue date
Jan 14, 2003
Honeywell International Inc.
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
6,506,497
Issue date
Jan 14, 2003
Honeywell International Inc.
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Novolac polymer planarization films with high temperature stability
Patent number
6,506,831
Issue date
Jan 14, 2003
Honeywell International Inc.
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Absorbing compounds for spin-on-glass anti-reflective coatings for...
Patent number
6,368,400
Issue date
Apr 9, 2002
Honeywell International
Teresa Baldwin
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
Patent number
6,365,765
Issue date
Apr 2, 2002
Honeywell International Inc.
Teresa Baldwin
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Spin-on glass anti-reflective coatings for photolithography
Patent number
6,268,457
Issue date
Jul 31, 2001
Allied-Signal, Inc.
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
Nanoporous materials and methods of formation thereof
Publication number
20070100109
Publication date
May 3, 2007
Nigel Hacker
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Spin-on-glass anti-reflective coatings for photolithography
Publication number
20050245717
Publication date
Nov 3, 2005
Joseph Kennedy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Novolac polymer planarization films with high temparature stability
Publication number
20040192876
Publication date
Sep 30, 2004
Nigel Hacker
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Absorbing compounds for spin-on-glass anti-reflective coatings for...
Publication number
20030199659
Publication date
Oct 23, 2003
Teresa Baldwin
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Novolac polymer planarization films with high temperature stability
Publication number
20030130482
Publication date
Jul 10, 2003
Nigel Hacker
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Spin-on-glass anti-reflective coatings for photolithography
Publication number
20030120018
Publication date
Jun 26, 2003
Teresa Baldwin
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Spin-on-glass anti-reflective coatings for photolithography
Publication number
20020128388
Publication date
Sep 12, 2002
AlliedSignal Inc.
Joseph Kennedy
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Application
Spin-on-glass anti-reflective coatings for photolithography
Publication number
20020095018
Publication date
Jul 18, 2002
Teresa Baldwin
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Application
Absorbing compounds for spin-on-glass anti-reflective coatings for...
Publication number
20020068181
Publication date
Jun 6, 2002
Teresa Baldwin
C07 - ORGANIC CHEMISTRY
Information
Patent Application
Spin-on-glass anti-reflective coatings for photolithography
Publication number
20020055000
Publication date
May 9, 2002
Honeywell International Inc.
Joseph Kennedy
C03 - GLASS MINERAL OR SLAG WOOL
Information
Patent Application
Novolac polymer planarization films with high temperature stability
Publication number
20020012809
Publication date
Jan 31, 2002
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
NOVOLAC POLYMER PLANARIZATION FILMS WITH HIGH TEMPERATURE STABILITY
Publication number
20020002265
Publication date
Jan 3, 2002
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Novolac polymer planarization films with high temperature stability
Publication number
20010000515
Publication date
Apr 26, 2001
Nigel Hacker
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC