Stephen P. DeOrnellas

Person

Santa Rosa, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reactor with heated and textured electrodes and surfaces
- Patent number 7,439,188
- Issue date Oct 21, 2008
- Tegal Corporation
- Stephen DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etch reactor and method
- Patent number 7,223,699
- Issue date May 29, 2007
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,958,295
- Issue date Oct 25, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,951,820
- Issue date Oct 4, 2005
- Silicon Valley Bank
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,905,969
- Issue date Jun 14, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for minimizing the critical dimension growth of a feature on...
- Patent number 6,774,046
- Issue date Aug 10, 2004
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,620,335
- Issue date Sep 16, 2003
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition shield for a plasma reactor
- Patent number 6,521,081
- Issue date Feb 18, 2003
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,500,314
- Issue date Dec 31, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,492,280
- Issue date Dec 10, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt silicide etch process and apparatus
- Patent number 6,486,069
- Issue date Nov 26, 2002
- Tegal Corporation
- Steven Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,410,448
- Issue date Jun 25, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cobalt silicide etch process and apparatus
- Patent number 6,391,148
- Issue date May 21, 2002
- Tegal Corporation
- Steven Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,360,686
- Issue date Mar 26, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etch reactor having a plurality of magnets
- Patent number 6,354,240
- Issue date Mar 12, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using a hard mask for critical dimension growth containment
- Patent number 6,287,975
- Issue date Sep 11, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,190,496
- Issue date Feb 20, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,173,674
- Issue date Jan 16, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,170,431
- Issue date Jan 9, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,127,277
- Issue date Oct 3, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,048,435
- Issue date Apr 11, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for minimizing the critical dimension growth of a feature on...
- Patent number 6,046,116
- Issue date Apr 4, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,006,694
- Issue date Dec 28, 1999
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated semiconductor wafer processing system
- Patent number 5,672,239
- Issue date Sep 30, 1997
- Tegal Corporation
- Stephen Paul DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REACTOR WITH HEATED AND TEXTURED ELECTRODES AND SURFACES
- Publication number 20080318432
- Publication date Dec 25, 2008
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etch reactor and method
- Publication number 20050164513
- Publication date Jul 28, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch reactor and method
- Publication number 20020139665
- Publication date Oct 3, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for using a hard mask for critical dimension growth containment
- Publication number 20020132485
- Publication date Sep 19, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor with heated and textured electrodes and surfaces
- Publication number 20020036064
- Publication date Mar 28, 2002
- Tegal Corporation
- Stephen DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for minimizing the critical dimension growth of a feature on...
- Publication number 20010031561
- Publication date Oct 18, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with a deposition shield
- Publication number 20010029894
- Publication date Oct 18, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cobalt silicide etch process and apparatus
- Publication number 20010003676
- Publication date Jun 14, 2001
- Tegal Corporation
- Steven Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INCREASING WAFER THROUGHPUT BETWEEN CLEANI...
- Publication number 20010001413
- Publication date May 24, 2001
- Stephen P. DeOrnellas
- STEPHEN P. DEORNELLAS
- H01 - BASIC ELECTRIC ELEMENTS

Stephen P. DeOrnellas

Person

Patents Grantslast 30 patents

Reactor with heated and textured electrodes and surfaces

Plasma etch reactor and method

Method for using a hard mask for critical dimension growth containment

Method for using a hard mask for critical dimension growth containment

Plasma etch reactor and method

Method for minimizing the critical dimension growth of a feature on...

Plasma etch reactor and method

Deposition shield for a plasma reactor

Plasma etch reactor and method

Method and apparatus for etching a semiconductor wafer with feature...

Cobalt silicide etch process and apparatus

Plasma etch reactor and method for emerging films

Cobalt silicide etch process and apparatus

Plasma reactor with a deposition shield

Plasma etch reactor having a plurality of magnets

Method for using a hard mask for critical dimension growth containment

Plasma etch reactor and method for emerging films

Plasma reactor with a deposition shield

Plasma reactor with a deposition shield

Method and apparatus for etching a semiconductor wafer with feature...

Plasma etch reactor and method for emerging films

Method for minimizing the critical dimension growth of a feature on...

Plasma reactor with a deposition shield

Integrated semiconductor wafer processing system

Patents Applicationslast 30 patents

REACTOR WITH HEATED AND TEXTURED ELECTRODES AND SURFACES

Plasma etch reactor and method

Plasma etch reactor and method

Method for using a hard mask for critical dimension growth containment

Reactor with heated and textured electrodes and surfaces

Method for minimizing the critical dimension growth of a feature on...

Plasma reactor with a deposition shield

Cobalt silicide etch process and apparatus

METHOD AND APPARATUS FOR INCREASING WAFER THROUGHPUT BETWEEN CLEANI...