Toan Tran

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 12,009,228
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,728,139
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 11,594,428
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods with secondary plasma injection
- Patent number 11,476,093
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,361,941
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Junghoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 11,264,213
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 11,195,699
- Issue date Dec 7, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,004,661
- Issue date May 11, 2021
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
- Patent number 10,903,052
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer plasma erosion protection for chamber components
- Patent number 10,755,900
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Toan Tran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus with concentric pumping for multiple pressure regimes
- Patent number 10,559,451
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Nikolai Nikolaevich Kalnin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 10,550,472
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching systems and methods with secondary plasma injection
- Patent number 10,504,700
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature chuck for plasma processing systems
- Patent number 10,468,285
- Issue date Nov 5, 2019
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for radial and azimuthal control of plasma unif...
- Patent number 10,431,429
- Issue date Oct 1, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 10,354,843
- Issue date Jul 16, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Generalized cylindrical cavity system for microwave rotation and im...
- Patent number 10,340,124
- Issue date Jul 2, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro splice protector
- Patent number 10,209,447
- Issue date Feb 19, 2019
- II-VI Incorporated
- Mark Filipowicz
- G02 - OPTICS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,978,564
- Issue date May 22, 2018
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature chuck for plasma processing systems
- Patent number 9,728,437
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical control features in wafer process equipment
- Patent number 9,132,436
- Issue date Sep 15, 2015
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Low shrinkage dielectric films
- Patent number 9,018,108
- Issue date Apr 28, 2015
- Applied Materials, Inc.
- Sukwon Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flow control features of CVD chambers
- Patent number 8,894,767
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laser power control in a heat-assisted magnetic recording system
- Patent number 8,824,085
- Issue date Sep 2, 2014
- LSI Corporation
- Ross S. Wilson
- G11 - INFORMATION STORAGE
Information Patent Grant
Inductor having a deep-well noise isolation shield
- Patent number 8,686,539
- Issue date Apr 1, 2014
- Xilinx, Inc.
- Vassili Kireev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
T-coil network design for improved bandwidth and electrostatic disc...
- Patent number 8,453,092
- Issue date May 28, 2013
- Xilinx, Inc.
- Vassili Kireev
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Control of termination capacitance for maximum transmitter bandwidt...
- Patent number 8,436,642
- Issue date May 7, 2013
- Xilinx, Inc.
- Vassili Kireev
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Dual-mode amplifier
- Patent number 8,395,446
- Issue date Mar 12, 2013
- Xilinx, Inc.
- Toan D. Tran
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
ADJUSTABLE DE-CHUCKING VOLTAGE
- Publication number 20240363315
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Andrew NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST GAS SWITCHING
- Publication number 20240203695
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Toan Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20230223281
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20220093364
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210398778
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Junghoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING
- Publication number 20210217591
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Toan Q. TRAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER WITH INDUCTIVE POWER SOURCE
- Publication number 20210183620
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Wei Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CONTROL FEATURES OF CVD CHAMBERS
- Publication number 20200149166
- Publication date May 14, 2020
- Applied Materials, Inc.
- Kien N. CHUC
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION
- Publication number 20200111643
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20190385823
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
- Publication number 20190362944
- Publication date Nov 28, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20190326099
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES
- Publication number 20190304756
- Publication date Oct 3, 2019
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Micro Splice Protector
- Publication number 20190137689
- Publication date May 9, 2019
- II-VI Incorporated
- Mark Filipowicz
- G02 - OPTICS
Information Patent Application
SYSTEMS AND PROCESSES FOR PLASMA FILTERING
- Publication number 20190119815
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-LAYER PLASMA EROSION PROTECTION FOR CHAMBER COMPONENTS
- Publication number 20180330923
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Toan Tran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS WITH CONCENTRIC PUMPING FOR MULTIPLE PRESSURE REGIMES
- Publication number 20180233327
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Nikolai Nikolaevich KALNIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...
- Publication number 20180226230
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALKALI METAL AND ALKALI EARTH METAL REDUCTION
- Publication number 20180025900
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Soonam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20170309509
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20170236691
- Publication date Aug 17, 2017
- Applied Materials, Inc.
- Qiwei Liang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20170229326
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...
- Publication number 20170125219
- Publication date May 4, 2017
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Micro Splice Protector
- Publication number 20170075067
- Publication date Mar 16, 2017
- II-VI Incorporated
- Mark Filipowicz
- G02 - OPTICS
Information Patent Application
PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING
- Publication number 20170069466
- Publication date Mar 9, 2017
- Applied Materials, Inc.
- Toan Q. TRAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION
- Publication number 20170062184
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20160225652
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20160225651
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT
- Publication number 20160005572
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Low temperature chuck for plasma processing systems

Cylindrical cavity with impedance shifting by irises in a power-sup...

Process chamber for cyclic and selective material removal and etching

Low temperature chuck for plasma processing systems

Plasma etching systems and methods with secondary plasma injection

Methods and apparatus for processing a substrate

Chemical control features in wafer process equipment

Generalized cylindrical cavity system for microwave rotation and im...

Process chamber for cyclic and selective material removal and etching

Systems and methods for radial and azimuthal control of plasma unif...

Multi-layer plasma erosion protection for chamber components

Apparatus with concentric pumping for multiple pressure regimes

Flow control features of CVD chambers

Plasma etching systems and methods with secondary plasma injection

High temperature chuck for plasma processing systems

Systems and methods for radial and azimuthal control of plasma unif...

Chemical control features in wafer process equipment

Generalized cylindrical cavity system for microwave rotation and im...

Micro splice protector

Chemical control features in wafer process equipment

High temperature chuck for plasma processing systems

Chemical control features in wafer process equipment

Low shrinkage dielectric films

Flow control features of CVD chambers

Laser power control in a heat-assisted magnetic recording system

Inductor having a deep-well noise isolation shield

T-coil network design for improved bandwidth and electrostatic disc...

Control of termination capacitance for maximum transmitter bandwidt...

Dual-mode amplifier

Patents Applicationslast 30 patents

ADJUSTABLE DE-CHUCKING VOLTAGE

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

FAST GAS SWITCHING

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING

CHAMBER WITH INDUCTIVE POWER SOURCE

FLOW CONTROL FEATURES OF CVD CHAMBERS

PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES

Micro Splice Protector

SYSTEMS AND PROCESSES FOR PLASMA FILTERING

MULTI-LAYER PLASMA EROSION PROTECTION FOR CHAMBER COMPONENTS

APPARATUS WITH CONCENTRIC PUMPING FOR MULTIPLE PRESSURE REGIMES

SYSTEMS AND METHODS FOR RADIAL AND AZIMUTHAL CONTROL OF PLASMA UNIF...

ALKALI METAL AND ALKALI EARTH METAL REDUCTION

HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

GENERALIZED CYLINDRICAL CAVITY SYSTEM FOR MICROWAVE ROTATION AND IM...

Micro Splice Protector

PROCESS CHAMBER FOR CYCLIC AND SELECTIVE MATERIAL REMOVAL AND ETCHING

PLASMA ETCHING SYSTEMS AND METHODS WITH SECONDARY PLASMA INJECTION

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

HIGH TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT