This application claims priority to Japanese Patent Application No. 2006-160991, filed Jun. 9, 2006, in the Japanese Patent Office. The priority application is incorporated by reference in its entirety.
The present disclosure relates to an analyzing electromagnet which is to be used in an ion implanting apparatus, an ion doping (registered trademark) apparatus, or the like, and which deflects an ion beam to perform momentum analysis (for example, mass analysis) of the ion beam, and more specifically to an analyzing electromagnet which analyzes the momentum of a ribbon-like ion beam.
For example, Patent Reference 1 (UM-A-64-7753 (FIG. 1)) discloses an example of a related-art analyzing electromagnet which deflects an ion beam to perform momentum analysis (for example, mass analysis, and the same shall apply hereinafter) of the ion beam.
The analyzing electromagnet 4 comprises a core 6 having an H-like section shape. The core 6 has: a pair of upper and lower magnetic poles 8 which are opposed to each other through a gap 12 in the y direction; and a yoke 10 which connects the magnetic poles 8 together. The plan-view shape of each of the magnetic poles 8 is curved into a sector shape. The opposing faces 9 of the magnetic poles 8 are parallel to each other. A coil 14 is wound around a root portion of each magnetic pole 8. In this example, a magnetic field is upward generated. The magnetic field is diagrammatically indicated by several magnetic force lines 16 (the same shall apply to other figures).
The ion beam 2 has a ribbon-like shape. However, the ribbon-like shape does not mean a shape in which the dimension Wx in the x direction is paper-thin. For example, the dimension Wy in the y direction of the ion beam 2 is about 400 to 900 mm, and the dimension Wx in the x direction is about 30 to 100 mm.
The ion beam 2 having the above-described shape is incident between the upper and lower magnetic poles 8, i.e., on the gap 12. During travel, then, the ion beam 2 is subjected to a Lorentz force which is rightward as viewed in the traveling direction z, to be rightward deflected, thereby analyzing the momentum. In this specification, the case where the ion beam 2 is configured by positive ions will be exemplarily described.
In the case where the ribbon-like ion beam 2 is incident on the analyzing electromagnet 4, the gap length G which is the y-direction length of the gap 12 of the upper and lower magnetic poles 8 must correspond to the dimension Wy in the y direction of the ion beam 2, and hence is very large.
In the gap 12, therefore, the magnetic force lines 16 are largely swollen toward the both outsides in the x direction. The magnetic flux density B in the gap 12 is relatively small in the vicinity of the center 12a between the upper and lower magnetic poles 8 (i.e., of the gap 12), and, as closer to the upper and lower magnetic poles 8 (i.e., as more vertically separated from of the center 12a of the gap 12), the magnetic flux density is relatively larger, so that the magnetic flux density is uneven in the y direction. As the above-mentioned swelling of the magnetic force lines 16 is larger, the degree of the unevenness is larger.
The Lorentz force F which is applied to the ion beam 2 passing through the gap 12 by the magnetic field is indicated by the following expression. In the expression, q is the charge of an ion constituting the ion beam 2, v is the velocity of the ion beam 2 which is constant, and B is the magnetic flux density.
F=qvB [Ex. 1]
As seen also from this expression, when the magnetic flux density B is uneven as described above, also the x-direction Lorentz force Fx which is applied to the ion beam 2 passing through the gap is uneven. As indicated in an example shown in
As a result, even when the ion beam 2 which is straight in the y direction as shown in
When the shape of the ion beam 2 emitted from the analyzing electromagnet 4 is distorted as described above, various problems arise.
On the downstream side of the analyzing electromagnet 4, for example, an analysis slit which cooperates with the analyzing electromagnet 4 to analyze the momentum of the ion beam 2 is usually disposed.
Furthermore, also the orbit of an unwanted ion species (for example, 10B+) having a momentum similar to that of a desired ion species (for example, 11B+) is similarly distorted into an arcuate shape. Therefore, an ion species which cannot originally pass through the slit 22 passes the slit. Also from this point of view, the resolution is lowered.
In addition to the above-described problems in the analysis slit 20, there arises a problem that, when a process such as ion implantation is applied to a target (such as a semiconductor substrate or a glass substrate) with using the ion beam 2 having a shape which is distorted as described above, the uniformity of the process is impaired.
Patent Reference 2 (JP-A-2005-327713 (Paragraphs 0087 to 0089, FIGS. 8 and 9)) below discloses an analyzing electromagnet in which first and second sub-magnetic poles are disposed on the both sides of main magnetic poles that sandwich a ribbon-like ion beam in the longitudinal direction, and the gap lengths of the three kinds of magnetic poles are adjusted, whereby magnetic force lines between the main magnetic poles are made parallel to one another. When the technique is employed, the problem that an ion beam is distorted may be solved. However, there arises another problem that the structure is complicated.
Embodiments of the present invention provide an analyzing electromagnet in which such distortion of a ribbon-like ion beam can be reduced by a relatively simple structure.
An analyzing electromagnet according to a first invention is an analyzing electromagnet in which an ion beam having a ribbon-like shape where a dimension in a y direction in a plane intersecting with a traveling direction is larger than a dimension in an x direction perpendicular to the y direction is incident between magnetic poles in which a plan-view shape is curved, and which are opposed to each other through a gap in the y direction, wherein each of the magnetic poles is divided along the traveling direction of the ion beam into three or more odd partial magnetic poles, gaps of odd-numbered partial magnetic pole pairs as counted from an inlet for the ion beam are widened toward an outside of the curvature, and a gap(s) of an even-numbered partial magnetic pole pair(s) as counted from the inlet for the ion beam are widened toward an inside of the curvature.
In the analyzing electromagnet, the gaps of the partial magnetic pole pairs are widened in the manner described above, whereby swelling of magnetic force lines in each of the gaps is made large and the magnetic flux density in each gap is made uneven in the y direction. In a Lorentz force in the x direction which is applied to the ribbon-like ion beam, therefore, a first uneven distribution in which the force in places vertically separated in the y direction from the center of the gap is larger than that in the vicinity of the center is produced.
By contrast, the increase in swelling of the magnetic force lines in each gap causes a second uneven distribution in which the force in the vicinity of the center of the gap is larger than that in places vertically separated from in the y direction the center, to be produced in the x-direction component of the Lorentz force which is applied to the ribbon-like ion beam.
In the gaps of the partial magnetic pole pairs, the ion beam is subjected to both the Lorentz forces of the first and second distributions. The magnitude relationships in the distributions are opposite to each other. When the distributions are combined to each other, therefore, the unevenness of the distribution of the x-direction Lorentz force which is applied to the ribbon-like ion beam can be reduced. Consequently, the above-described distortion of the passing ion beam due to the difference of Lorentz forces acting on the ion beam can be reduced. This action is conducted in each of the partial magnetic pole pairs.
As described above, each of the magnetic poles is divided into three or more odd partial magnetic poles, and the manners of widening the gaps of the partial magnetic pole pairs are alternatingly reversed. Therefore, the divergence or convergence in the y direction of the ion beam emitted from the analyzing electromagnet can be suppressed, and the y-direction dimension of the emitted ion beam can be made close to that of the incident ion beam.
On the contrary to the above, in an analyzing electromagnet according to a second invention, the gaps of the odd-numbered partial magnetic pole pairs as counted from the inlet for the ion beam may be widened toward the inside of the curvature, and the gap(s) of the even-numbered partial magnetic pole pair(s) as counted from the inlet for the ion beam may be widened toward the outside of the curvature.
In an analyzing electromagnet according to a third invention, the gap of at least one of the three or more odd partial magnetic pole pairs may be widened in plural steps.
Preferably, In an analyzing electromagnet according to a fourth invention, the division number of each of the magnetic poles is three.
According to the first and second inventions, the gaps of the partial magnetic pole pairs are widened as described above, whereby the unevenness of the distribution of the x-direction Lorentz force which is applied to the ribbon-like ion beam in the gaps of the partial magnetic pole pairs can be reduced. As a result, distortion of the emitted ribbon-like ion beam can be reduced. Furthermore, this can be realized by a relatively simple structure.
As described above, each of the magnetic poles is divided into three or more odd partial magnetic poles, and the manners of widening the gaps of the partial magnetic pole pairs are alternatingly reversed, whereby the divergence or convergence in the y direction of the ion beam emitted from the analyzing electromagnet can be suppressed, and the y-direction dimension of the emitted ion beam can be made close to that of the incident ion beam. It is possible also to emit an ion beam in which the both dimensions are substantially equal to each other, and which has a high parallelism.
In the first invention, the incident ion beam is first converged by the first partial magnetic pole pair. As compared with the second invention in which the incident ion beam is first diverged by the first partial magnetic pole pair, therefore, the y-direction gap length of the partial magnetic pole pair is not required to be larger than the length corresponding to the y-direction dimension of the incident ion beam. Consequently, there is an advantage that the analyzing electromagnet can be miniaturized.
According to the third invention, in the partial magnetic pole pair in which the gap is widened in plural steps, the distribution of the magnetic field can be adjusted more finely. Consequently, there is a further advantage that the shape of the ion beam can be adjusted more easily.
According to the fourth invention, the division number can be made minimum, and hence the analyzing electromagnet can have the most simplified structure.
Other features and advantages may be apparent from the following detailed description, the accompanying drawings and the claims.
The analyzing electromagnet 40 comprises magnetic poles 80 as substitution for the magnetic poles 8 constituting the related-art analyzing electromagnet 4. The ion beam 2 having the ribbon-like shape which extends in the y direction is incident on a gap of the magnetic poles 80. The plan-view shape of each of the magnetic poles 80 is curved into a sector shape. The center orbit of the ion beam 2 which is to pass through the analyzing electromagnet 40 is denoted by the reference numeral 2d. In the embodiment, both the incident angle α of the ion beam 2 to the magnetic poles 80, and the emission angle β of the ion beam 2 from the magnetic poles 80 are set to be substantially equal to 90 deg.
In the embodiment, each of the magnetic poles 80 is divided along the traveling direction z of the ion beam 2 into three partial magnetic poles 81, 82, 83. The coil 14 is collectively wound around the three partial magnetic poles 81 to 83, and common thereto (the same shall apply to other embodiments which will be described later). As shown in
As shown in
More specifically, in the embodiment, each of the gaps 12 of the partial magnetic pole pairs 81, 83 is widened in three steps. Namely, the upper and lower opposing faces 70 of the partial magnetic pole pairs 81, 83 are formed so as to be parallel in the x direction with each other in a range from the inner end a to a place b which is slightly outward separated therefrom, vertically inclined in a large degree in the y direction in a range from the place b to a place c which is slightly outward separated therefrom, vertically inclined in a medium degree in the y direction in a range from the place c to a place d which is slightly outward separated therefrom, and vertically inclined in a small degree in the y direction in a range from the place d to the outer end e. The upper and lower opposing faces 70 have a shape which is axisymmetric about the center 12a of the gap 12.
By contrast, as shown in
More specifically, in the embodiment, the gap 12 of the partial magnetic pole pair 82 is widened in two steps. Namely, the upper and lower opposing faces 70 of the partial magnetic pole pair 82 are formed so as to be substantially parallel in the x direction with each other in a range from the outer end f to a place g which is slightly inward separated therefrom, vertically inclined in a large degree in the y direction in a range from the place g to a place h which is slightly inward separated therefrom, and vertically inclined in a small degree in the y direction in a range from the place h to the inner end i. The upper and lower opposing faces 70 have a shape which is axisymmetric about the center 12a of the gap 12.
Each of the partial magnetic pole pairs 81 to 83 may be configured by (a) magnetic poles around which the coil 14 is wound, and in which inner side faces of the y direction extend in the x direction (for example, they are substantially parallel with each other), and (b) one or more magnetic pole pieces which are attached to the inner side of the y direction of each of the magnetic poles, and in which the opposing faces 70 are widened in the manner described above to form the gap 12 that is widened in the manner described above (the same shall apply to the other embodiments which will be described later), because of the following reason. Even when the partial magnetic pole pairs are configured as described above, they function in a substantially same manner as a magnetic circuit.
Since the gaps 12 of the partial magnetic pole pairs 81, 83 are widened in the manner described above, the outward swelling of the magnetic force lines 16 in each of the gaps 12 is made large as shown in
Because of the uneveness of the magnetic flux density B, as shown in an example of
By contrast, because of the enlargement of the outward swelling of the magnetic force lines 16 in the gaps 12 of the partial magnetic pole pairs 81, 83, as shown in
The ion beam 2 is subjected to both the Lorentz forces Fx of the first and second distributions, in the gaps 12 of the partial magnetic pole pairs 81, 83. The magnitude relationships in the distributions are opposite to each other. When the distributions are combined to each other, therefore, the unevenness in the y direction of the distribution of the x-direction Lorentz force Fx which is applied to the ribbon-like ion beam 2 can be reduced. Consequently, the above-described arcuate distortion of the passing ion beam 2 due to the difference of Lorentz forces acting on the ion beam 2 can be reduced. This action is conducted in each of the partial magnetic pole pairs 81, 83.
Also in the partial magnetic pole pair 82, since the gap 12 is widened in the above-described manner, the inward swelling of the magnetic force lines 16 in the gap 12 is made large as shown in
Because of the unevenness of the magnetic flux density B, in the same manner as in the example shown in
By contrast, because of the enlargement of the inward swelling of the magnetic force lines 16 in the gap 12 of the partial magnetic pole pair 82, as shown in
The ion beam 2 is subjected to both the Lorentz forces Fx of the first and second distributions, in the gap 12 of the partial magnetic pole pair 82. The magnitude relationships in the distributions are opposite to each other. When the distributions are combined to each other, therefore, the unevenness in the y direction of the distribution of the x-direction Lorentz force Fx which is applied to the ribbon-like ion beam 2 can be reduced. Consequently, the above-described arcuate distortion of the passing ion beam 2 due to the difference of the Lorentz forces acting on the ion beam 2 can be reduced. This action is conducted in the partial magnetic pole pair 82.
According to the analyzing electromagnet 40, in the partial magnetic pole pairs 81 to 83, as described above, the above-described distortion of the ion beam 2 due to the difference of the Lorentz forces Fx acting on the ion beam 2 passing through the partial magnetic pole pairs can be reduced. This action can be adjusted by, for example, the manner of widening the gaps 12 of the partial magnetic pole pairs 81 to 83, and the lengths of the partial magnetic pole pairs 81 to 83 in the traveling direction z of the ion beam (the same shall apply to the other embodiments such as an analyzing electromagnet 40a which will be described later). As a result, the above-described distortion of the ion beam 2 emitted from the analyzing electromagnet 40 is reduced, and the ion beam 2 which is approximately straight can be emitted.
Therefore, the above-discussed problems due to distortion of the shape of the ion beam 2 can be prevented from occurring. Namely, the amount of a desired ion species can be increased, and the resolution can be enhanced. Furthermore, the uniformity of a target process can be improved.
Moreover, the above-described structure of the magnetic poles 80 is simpler than the magnetic-pole structure disclosed in Patent Reference 2. Therefore, the above-described distortion of the ribbon-like ion beam 2 can be reduced by a relatively simple structure.
Next, the convergence and divergence in the y direction of the ion beam 2 in each of the partial magnetic pole pairs 81 to 83 will be described.
As shown in
By contrast, as shown in
When the gaps 12 of the partial magnetic pole pairs 81 to 83 are widened as described above, therefore, the above-described arcuate distortion of the passing ion beam 2 due to the difference of the Lorentz forces acting on the ion beam 2 can be reduced. At the same time, the ion beam 2 is subjected to a converging or diverging force in the y direction.
In the analyzing electromagnet 40, however, each of the magnetic poles 80 is divided into three partial magnetic poles as described above, and the manners of widening the gaps of the partial magnetic pole pairs 81 to 83 are alternatingly reversed. As shown in
In each of the partial magnetic pole pairs 81 to 83, the ion beam 2 can be converged or diverged with using the swelling of the magnetic force lines 16 of the gap 12. In the analyzing electromagnet 40, therefore, it is possible not to use the edge focus caused by setting the incident angle α and the emission angle β to an angle other than 90 deg. In the analyzing electromagnet 40, consequently, both the incident angle α and the emission angle β are set to be substantially equal to 90 deg. The same shall apply to the analyzing electromagnet 40a which will be described later.
The sequence of the manners of widening the gaps 12 of the partial magnetic pole pairs which are obtained by dividing each of the magnetic poles 80 into three or more odd pieces may be reversed. This will be described with reference to an example in which the division number is three. The gaps 12 of the odd-numbered partial magnetic pole pairs as counted from the inlet for the ion beam 2, i.e., the first and third partial magnetic pole pairs are widened toward the inside of the curvature. The partial magnetic pole pairs are indicated by the reference numerals 81a and 83a. For example, the partial magnetic pole pairs 81a, 83a have the same structure as the partial magnetic pole pair 82 shown in
By contrast, the gap 12 of the even-numbered partial magnetic pole pair as counted from the inlet for the ion beam 2, i.e., the second partial magnetic pole pair is widened toward the outside of the curvature. The partial magnetic pole pair is indicated by the reference numeral 82a. For example, the partial magnetic pole pair 82a has the same structure as the partial magnetic pole pair 81 or 83. Because of the same function as the partial magnetic pole pair 81 or 83, therefore, the partial magnetic pole pair 82a exerts the function of converging the ion beam in the y direction, as diagrammatically indicated as a convex lens in
The analyzing electromagnet 40a shown in
Namely, the incident ion beam 2 can be first diverged by the first partial magnetic pole pair 81a, then converged by the second partial magnetic pole pair 82a, and further diverged by the third partial magnetic pole pair 83a. As a result, the divergence or convergence in the y direction of the ion beam 2 emitted from the analyzing electromagnet 40a can be suppressed, and the y-direction dimension Wy2 of the emitted ion beam 2 can be made close to the y-direction dimension Wy1 of the incident ion beam 2. As a result, it is possible also to emit the ion beam 2 in which the dimensions Wy1 and Wy2 are substantially equal to each other, and which has a high parallelism.
In the partial magnetic pole pairs 81a to 83a, by the same function as the partial magnetic pole pairs 81 to 83, the above-described arcuate distortion of the ion beam 2 due to the difference of the Lorentz forces acting on the passing ion beam 2 can be reduced. As a result, the above-described distortion of the ion beam 2 emitted from the analyzing electromagnet 40a is reduced, and the ion beam which is approximately straight can be emitted.
The difference in function and effect between the analyzing electromagnets 40, 40a will be described. In the analyzing electromagnet 40, as shown in
The functions that the divergence or convergence in the y direction of the emitted ion beam 2 can be suppressed, and that the y-direction dimension Wy2 of the emitted ion beam 2 can be made close to the y-direction dimension Wy1 of the incident ion beam 2 cannot be attained by a configuration other than that in which each of the magnetic poles 80 is divided into three or more odd pieces and the manner of widening the gaps of the partial magnetic pole pairs are alternatingly reversed as described above.
In the case where each of the magnetic poles 80 is divided into even pieces or, for example, two pieces or the partial magnetic pole pairs 81, 82 as shown in
In the case of two pieces or the partial magnetic pole pairs 81a, 82a as shown in
The case where the division number is odd and one (this is identical with the case where the magnetic poles 80 are not divided) is identical with the case shown in
For the above reasons, it is not preferable to set the division number of each of the magnetic poles 80 to one or an even number.
The division number of each of the magnetic poles 80 may be set to an odd number of five or more. This case is identical with the case where, for example, plural sets of partial magnetic pole pairs 82, 83 shown in
However, the case where the division number of each of the magnetic poles 80 is three can attain the above-mentioned effects while the division number is smallest. In this case, therefore, the analyzing electromagnet 40 or 40a can be structured in the simplest manner.
When the gap 12 of each of the partial magnetic pole pairs 81 to 83 of the analyzing electromagnet 40 is widened in plural steps as shown in, for example, the embodiment, the distribution of the magnetic field can be adjusted more finely. Consequently, the shape of the ion beam 2 can be adjusted more easily. Instead of the configuration where all of the partial magnetic pole pairs 81 to 83 are structured as described above, a configuration where at least one of the partial magnetic pole pairs is structured as described above may be employed. Also in this configuration, it is possible to attain the above-mentioned effects. However, the configuration where all of the partial magnetic pole pairs 81 to 83 are structured as described above is preferable because more partial magnetic pole pairs can attain the effects. The above is applicable also to the partial magnetic pole pairs 81a to 83a which have been described with reference to
In stead of the configuration where the gap 12 of each partial magnetic pole pair is widened in plural steps, that where the gap is widened in a linear manner, in a curved manner which is convex toward the center 12a, or in a curved manner which is concave toward the center 12a may be employed. In plural partial magnetic pole pairs, these shapes may be combinedly employed.
In odd-numbered partial magnetic pole pairs as counted from the inlet for the ion beam 2, gaps 12 of the same shape may be employed, or gaps 12 of different shapes may be employed. The above is applicable also to even-numbered partial magnetic pole pairs as counted from the inlet for the ion beam 2.
The core 6 may have a C-like section shape.
While the invention has been described with respect to a limited number of embodiments, those skilled in the art, having benefit of this disclosure, will appreciate that other embodiments can be devised which do not depart from the scope of the invention as disclosed herein. Accordingly, the scope of the invention should be limited only by the attached claims.
Number | Date | Country | Kind |
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P.2006-160991 | Jun 2006 | JP | national |