One-Time Programmable (OTP) memory is a memory that can be programmed once and only once. An OTP can be programmed from low to high resistance states, the so-called fuse, such as electrical fuse. Alternatively, an OTP can be programmed from high to low resistance states, the so-called anti-fuse. The programming means can apply a high voltage to an OTP element such as in anti-fuse. Alternatively, the programming means can apply a high current to flow through an OTP element such as in fuse. The OTP memory cell usually has a program selector coupled to an OTP element to switch the desirable OTP element to conduct a high current or high voltage applied.
An electrical fuse is a common OTP that can be constructed from a segment of interconnect, such as polysilicon, silicided polysilicon, silicide, metal, metal alloy, or some combination thereof. The metal can be aluminum, copper, other transition metals, or the non-aluminum metal gate for CMOS. One of the most commonly used electrical fuses is a CMOS gate, fabricated in silicided polysilicon, used as interconnect. The electrical fuse can also be one or more contacts or vias instead of a segment of interconnect. A high current may blow the contact(s) or via(s) into a very high resistance state. The OTP element can be an anti-fuse, where a high voltage makes the resistance lower, instead of higher. The anti-fuse can consist of one or more contacts or vias with an insulator in between. The anti-fuse can also be a CMOS gate coupled to a CMOS body with a thin gate oxide as insulator.
A conventional OTP memory cell is shown in
Another OTP memory cell 15 is shown in
Low density OTP memory (e.g. bit count no more than 256) can be used for chip ID, inventory control, parameter trimming, or configuration settings for SoC integration. Since the low density OTP size is very small, it is imperative having low pin count to further saving the overall size. To reduce pin count, the interface is better to be serial to save many address signals. The addresses are usually incremented or decremented automatically from a starting address after each access cycle.
a) shows a block diagram of a typical 4-bit counter 20 that has T-type flip-flops 21-24 (TFF1-4), AND gates 25 and 26 coupled between TFF2-TFF3 and TFF3-TFF4, respectively.
For a low density OTP, as small as 8-bit to 256-bit, designing the peripheral circuits needs to be very effective; otherwise the overhead would be very high. The counter and flip-flop according to the conventional designs are very ineffective. Hence, there is a need for an invention to achieve highly effective design for a low density OTP.
The present invention relates to effective circuit and system designs for testing a one-time-programmable (OTP) memory. Embodiments of highly effective circuits and systems for low density OTPs are disclosed. Inventions to replace the conventional counters and flip-flop designs can greatly reduce OTP memory size and save cost.
In one embodiment, the counter to generate the next addresses can be replaced by a Linear Feedback Shift Register (LFSR) to save additional gates to implement T-flip-flops and to increment/decrement the addresses. A properly designed n-bit LFSR can generate addresses up to 2n−1 with minimum gate overheads, though the addresses generated are not in increment or decrement manners. In another embodiment, the conventional latch can be designed as two cross-coupled inverters with NMOS input devices that are in serial with at least one NMOS pulldown, which is further gated with a clock to ground. Two stages of latches can be used to construct a DFF, clocked by opposite phases. The new DFF has only 16T, comparing with 24T in the conventional DFF design.
The invention can be implemented in numerous ways, including as a method, system, device, or apparatus (including graphical user interface and computer readable medium). Several embodiments of the invention are discussed below.
As a One-Time Programmable (OTP) memory, one embodiment can, for example, include at least a plurality of OTP cells. The at least one of the OTP cells includes at least: an OTP element fabricated in standard CMOS process; at least one address generator having a plurality of registers constructed as shift registers with the last shift register coupled to the first shift register and operating at each clock cycle; and at least one Exclusive OR (XOR) or equivalent gate being coupled as an input to a shift register and an output from a second shift register, while the other input of the XOR being coupled to a third shift register. The output of the shift registers being used as an address to access the OTP memory in each clock cycle.
As an embodiment in an integrated circuit, one embodiment can, for example, include at least one register constructed as a linear feedback shift register (LFSR) with the register outputs used as addresses to access an OTP memory array. The LFSR can be properly designed to reach maximum length of 2n−1 for an n-bit LFSR. The DFF can be embodied as latches in two stages. Each latch has two cross-coupled inverters with two outputs having NMOS input devices that are in serial with at least one NMOS pulldowns, which is gated with a clock to ground. The inputs to the latches are coupled to the gates of the NMOS input devices. The outputs of the first latch are coupled to the inputs of the second latch. The clocks in the two latches have opposite phases.
As an electronics system, one embodiment can, for example, include at least a processor, and an OTP memory operatively connected to the processor. The OTP memory can include at least one register constructed as a linear feedback shift register (LFSR) with the register outputs used as addresses to access an OTP memory array. The LFSR can be properly designed to reach maximum length of 2n−1 for an n-bit LFSR. The DFF can be embodied as latches in two stages. Each latch has two cross-coupled inverters with two outputs having two NMOS input devices in serial with at least one NMOS pulldowns, which is gated with a clock to ground. The inputs to the latches are coupled to the gates of the NMOS input devices. The outputs of the first latch are coupled to the inputs of the second latch. The clocks in the two latches have opposite phases.
As a method for providing effective embodiments for an OTP memory, one embodiment can, for example, include at least one register constructed as a linear feedback shift register (LFSR) with the register outputs used as addresses to access an OTP memory array. The LFSR can be properly designed to reach maximum length of 2n−1 for an n-bit LFSR. The DFF can be embodied as latches in two stages. Each latch has two cross-coupled inverters with two outputs having two NMOS input devices in serial with at least one NMOS pulldowns, which is gated with a clock to ground. The inputs to the latches are coupled to the gates of the NMOS input devices. The outputs of the first latch are coupled to the inputs of the second latch. The clocks in the two latches have opposite phases.
The present invention will be readily understood by the following detailed descriptions in conjunction with the accompanying drawings, wherein like reference numerals designate like structural elements, and in which:
a) shows a conventional OTP memory cell using MOS as program selector.
b) shows another OTP memory cell using diode as program selector.
a) shows a schematic of a 4-bit counter.
b) shows a schematic of a TFF constructed from a DFF.
a) shows a schematic of an n-bit LFSR in general.
b) shows a schematic of another n-bit LFSR, an equivalent design as the LFSR in
c) shows a schematic of a 3-bit maximum length LFSR as an example.
d) shows a schematic of a 3-bit maximum length LFSR, an equivalent design as the LFSR in
e) shows a schematic of implementation efficient asynchronous counter according to one embodiment.
a) shows a schematic of one embodiment of a DFF according to the preset embodiment.
b) shows a schematic of another embodiment of a DFF according to the preset embodiment.
c) shows a schematic of yet another embodiment of a DFF according to the preset embodiment.
Embodiments disclosed herein use innovations to reduce gate counts for a low density OTP memory. A counter with high gate count is replaced by a Linear Feedback Shift Register (LFSR) to generate addresses in a serial OTP memory. LFSR can generate almost the entire available address spaces with a proper design, except the all 0s state. The all 0s state can be multiplexed in and out at any time to reach the entire 2n address spaces, the same effect as a counter, except that the addresses are not generated incremented or decremented but in a seemingly pseudo-random manner. Either counter or LFSR can be designed based on D-type flip-flops (DFFs). The conventional design for DFFs is based on pass gates to drive a pair of cross-coupled inverters that needs about 24 transistors (24T). A better DFF can be designed with two latches. Each latch has a pair of cross-coupled inverters as two outputs coupled to drains of a pair of NMOS input devices. The gates of the NMOS input devices are coupled to the differential inputs. The sources of NMOS input devices are coupled to the drain of at least one NMOS pulldown whose gate is coupled to a clock and whose source is coupled to ground. The two latches can be cascaded with the outputs of the first latch coupled to the inputs of the second latch to constitute a DFF. The clocks for the two latches have opposite phases. The new DFF has about only ⅔ of gate count as the conventional DFF.
a) depicts a general Linear Feedback Shift Register (LFSR) 60 as one embodiment for generating addresses automatically. The LFSR 60 has n-registers, 61-1 through 61-n, connected in serial and wrapped around, i.e. register 61-1 is coupled to register 61-2, register 61-2 is coupled to register 61-3, and register 61-n is coupled to register 61-1, etc. Each register is coupled to the next register through an XOR, i.e. the output of 61-1 is an input to an XOR 62-1 whose output is the input of the next register 61-2. The other input of the XOR 62-1 is a switch 63-1 that can be coupled to logic 0 or 1, i.e. to ground or to the output of the last register 61-n, respectively. The switches can be hardwired to 0 or 1. With proper setting in the switches, the register outputs can be unique and can have a run length of 2n−1.
The operation principle of LFSR is very well known and can be found in almost any textbooks on logic design. Finding a maximum length LFSR is briefly explained as follows. A polynomial generator xn+an-1xn-1+ . . . +a2x2+a2x+1 can be assigned to a LFSR, where ai is the value of the switch 62-i, i.e. ai=0, if the switch 62-i is connected to logic 0, or ai=1, if the switch 62-i is connected to the output of register 61-n. If the polynomial generator is primitive in the Galois Field of 2, then the LFSR can generate states with maximum length of 2n−1, if the initial state is not 0 for all registers.
b) shows a schematic of an equivalent embodiment of a general LFSR 60′ as the LFSR 60 shown in
c) shows an example of a maximum length LFSR 70 with n=3. The LFSR 70 has three registers 71-1 to 71-3. The output of the register 71-3 is coupled to the input of the register 71-1. The output of the register 71-1 is coupled to an input of an XOR gate 72-1. The other input of the XOR 72-1 is coupled to the output of the register 71-3. The output of XOR 72-1 is coupled to the input of the register 71-2. The output of the register 71-2 is coupled to the input of the register 71-3. Since only the output of the register 71-1 has an XOR, the coefficient of x1 is 1, while x2 is 0. The coefficient of the x3 and x° are always 1, so that the generator is x3+x+1. This polynomial is primitive, i.e. has no other factors other than 1 and itself. Any n-bit LFSR design that has a primitive polynomial generator can have a maximum length of 2n−1, if the starting state is not all 0s. If this LFSR starts with 001, the next states would be 100, 010, 011, 111, 101, 110, and 001. If the LFSR starts with 000, the next states will be always 000.
d) shows an example of another equivalent embodiment of LFSR 70′, the same LFSR 70 shown in
e) shows an example of implementation efficient asynchronous counter 60″ according to one embodiment. The counter has DFF 62″-1 to 62″-n. The input D of 62″-1 is coupled to the complement output of Q1, Q1B, to toggle Q1 every cycle. The input Ds input of the DFFs 62″-2 to 62″-n are set to 1s. The complement output of Q1, Q1B is coupled to the clock of the next DFF 62″-2. The complement output of Q2, Q2B is coupled to the clock of the next DFF 62″-3. The same connection can be applied to the DFF 62″-3 through 62″-(n−1). In this configuration, the DFFs change states whenever the previous DFFs change states from 1 to 0 to realize an up-counter. Since the state changes are asynchronous to the clock, this is an asynchronous counter.
The above discussions about LFSR are for illustrative purposes, there are many and equivalent embodiments of LFSR designs that can achieve a maximum length of 2n−1. The XORs can be replaced or implemented by XNORs, NANDs, NORs, or other logic gates. Moreover, there can be many embodiments similar to LFSRs that can generate maximum length of states close to 2n, and that are still within the scope of this invention for those skilled in the art.
a) shows a schematic of one embodiment of a DFF 80 according to the present invention. The DFF has a first stage of latch including two cross-coupled inverters 82-1 and 82-2 having two outputs Q′ and QB′. The outputs Q′ and QB′ are coupled to the drains of NMOS devices 82-2 and 82-1, respectively. The gates of NMOS 82-1 and 82-2 are coupled to differential inputs D and DB, respectively. Their sources are coupled through a NMOS 83, with gate coupled to CKB, to ground. The second stage of the latch includes two cross-coupled inverters 84-1 and 84-2 with two outputs Q and QB. The outputs Q and QB are coupled to the drains of NMOS devices 85-1 and 85-2, respectively. The gates of NMOS 85-1 and 85-2 are coupled to the differential outputs Q′ and QB′ from the first latch, respectively. The sources of 85-1 and 85-2 are coupled through a NMOS 86, with gate coupled to CK, to ground. Two MOS 87-1 and 87-2 are used to reset to the outputs Q and QB by asserting a reset RS and a reset bar RSB to the gates of the NMOS pulldown 87-1 and to the gate of the PMOS pullup 87-2, respectively. The clocks for the first and second latches have opposite phases.
b) shows a schematic of another embodiment of a DFF 90 according to the present invention. The DFF has a first stage of latch including two cross-coupled inverters 92-1 and 92-2 with two outputs Q′ and QB′. The outputs Q′ and QB′ are coupled to the drains of NMOS devices 92-2 and 92-1, respectively. The gates of the NMOS 92-1 and 92-2 are coupled to differential inputs D and DB, respectively. The sources of 92-1 and 92-2 are coupled to the drains of NMOS devices 93-1 and 93-2, respectively. The NMOS 93-1 and 93-2 have gates coupled to CKB and sources coupled to ground. The second stage of the latch includes two cross-coupled inverters 94-1 and 94-2 with two outputs Q and QB. The outputs Q and QB are coupled to the drains of NMOS devices 95-2 and 95-1, respectively. The gates of NMOS 95-1 and 95-2 are coupled to differential outputs QB′ and Q′ from the first latch, respectively. The sources of 95-1 and 95-2 are coupled to the drains of NMOS 96-1 and 96-2, respectively. The NMOS 96-1 and 96-2 have gates coupled to CK and sources coupled to ground. Two MOS 97-1 and 97-2 are used to reset to the output node Q by asserting a reset RS and a reset bar RSB to the gates of a NMOS pulldown 97-1 and to the gate of a PMOS pullup 97-2, respectively.
c) shows a schematic of one embodiment of a DFF 80′ according to the present invention. The DFF has a first stage of latch including two cross-coupled inverters 82′-1 and 82′-2 having two outputs Q′ and QB′. The outputs Q′ and QB′ are coupled to the drains of NMOS input devices 82′-1 and 82′-2, respectively. The sources of NMOS 82′-1 and 82′-2 are coupled to differential inputs D and DB, respectively. The gates are coupled to CKB. The second stage of the latch includes two cross-coupled inverters 84′-1 and 84′-2 with two outputs Q and QB. The outputs Q and QB are coupled to the drains of NMOS devices 85′-2 and 85′-1, respectively. The sources of NMOS 85′-1 and 85′-2 are coupled to the differential outputs QB′ and Q′ from the first latch, respectively. The gates of 85′-1 and 85′-2 are coupled to CK. Two MOS 87′-1 and 87′-2 are used to reset to the outputs Q and QB by asserting a reset RS and a reset bar RSB to the gates of the NMOS pulldown 87′-1 and to the gate of the PMOS pullup 87′-2, respectively. The clocks for the first and second latches have opposite phases.
The DFF shown in
The gate counts of an OTP memory can be further saved by using a tree decoder. Since the decoders are mainly NAND gates with addresses and address complement signals as inputs, some of the MOS devices in the logic gates of the decoders can be shared and saved.
The flow chart shown in
The invention can be applied to any OTP memory that has OTP cells including an OTP element coupled to at least one program selectors. The OTP element can be a fuse or anti-fuse. The fuse can be an interconnect fuse or a single or plural of contact/via fuse. The interconnect fuse can include polysilicon, silicided polysilicion, silicide, polymetal, metal, metal alloy, thermally isolated active region, or some combinations thereof. One of the most common fuse is a CMOS gate used as an interconnect. The anti-fuse can be a contact/via with dielectric in between, or a CMOS gate coupled to a CMOS body with gate oxide in between. A diode can be used as program selector. The diode can be a junction diode constructed from a P+ active region on N well and an N+ active region on the same N well as the P and N terminals of the diode, respectively. In another embodiment, a diode can be constructed from a polysilicon structure with two ends implanted by P+ and N+ implants, respectively, In yet another embodiment, the diode can be an isolated active region with two ends implanted by P+ and N+ implants, respectively. The P or N terminal of junction, polysilicon, or active region diode can be implanted by the same source or drain implant in CMOS devices. Either the junction diode, polysilicon diode, or active region diode can be built in standard CMOS processes without any additional masks or process steps.
The invention can be implemented in a part or all of an integrated circuit in a Printed Circuit Board (PCB), or in a system. The OTP memory device can be fuse, (such as interconnect, contact, or via fuse) or anti-fuse. The interconnect fuse can be silicided or non-silicided polysilicon fuse, metal fuse, or thermally isolated active region fuse. The anti-fuse can be a gate-oxide breakdown anti-fuse, contact or via anti-fuse with dielectrics in-between. Though the program mechanisms are different, their logic states can be distinguished by different resistance values and can only be programmed once.
Additional information on programmable memory structures and their formation and usage can be found in: (1) U.S. patent application Ser. No. 13/026,650, filed on Feb. 14, 2011 and entitled “CIRCUIT AND SYSTEM FOR USING A POLYSILICON DIODE AS PROGRAM SELECTOR FOR RESISTIVE DEVICES IN CMOS LOGIC PROCESSES,” which is hereby incorporated herein by reference; (2) U.S. patent application Ser. No. 13/026,725, filed on Feb. 14, 2011 and entitled “CIRCUIT AND SYSTEM FOR USING A JUNCTION DIODE AS PROGRAM SELECTOR FOR RESISTIVE DEVICES,” which is hereby incorporated herein by reference; (3) U.S. patent application Ser. No. 13/026,725, filed on Feb. 14, 2011 and entitled “CIRCUIT AND SYSTEM OF USING JUNCTION DIODE AS PROGRAM SELECTOR FOR RESISTIVE DEVICES IN CMOS LOGIC PROCESSES,” which is hereby incorporated herein by reference; (4) U.S. patent application Ser. No. 13/026,650, filed on Feb. 14, 2011 and entitled “CIRCUIT AND SYSTEM OF USING POLYSILICON DIODE AS PROGRAM SELECTOR FOR RESISTIVE DEVICES IN CMOS LOGIC PROCESSES,” which is hereby incorporated herein by reference; and (5) U.S. patent application Ser. No. 13/471,704, filed on May 15, 2012 and entitled “CIRCUIT AND SYSTEM FOR USING A JUNCTION DIODE AS PROGRAM SELECTOR FOR ONE-TIME PROGRAMMABLE DEVICES,” which is hereby incorporated herein by reference.
The above description and drawings are only to be considered illustrative of exemplary embodiments, which achieve the features and advantages of the present invention. Modifications and substitutions of specific process conditions and structures can be made without departing from the spirit and scope of the present invention.
The many features and advantages of the present invention are apparent from the written description and, thus, it is intended by the appended claims to cover all such features and advantages of the invention. Further, since numerous modifications changes will readily occur to those skilled in the art, it is not desired to limit the invention to the exact construction and operation as illustrated and described. Hence, all suitable modifications and equivalents may be resorted to as falling within the scope of the invention.
This application claims priority benefit of an U.S. Provisional Application No. 61/595,171, filed on Feb. 6, 2012 and entitled “CIRCUIT AND SYSTEM OF A LOW DENSITY ONE-TIME PROGRAMMABLE MEMORY,” which is hereby incorporated herein by reference.
Number | Name | Date | Kind |
---|---|---|---|
3198670 | Nissim | Aug 1965 | A |
3715242 | Daniel | Feb 1973 | A |
4148046 | Hendrickson et al. | Apr 1979 | A |
4192059 | Khan et al. | Mar 1980 | A |
5192989 | Matsushita et al. | Mar 1993 | A |
5389552 | Iranmanesh | Feb 1995 | A |
5635742 | Hoshi et al. | Jun 1997 | A |
5962903 | Sung et al. | Oct 1999 | A |
6140687 | Shimomura et al. | Oct 2000 | A |
6243864 | Odani et al. | Jun 2001 | B1 |
6400540 | Chang | Jun 2002 | B1 |
6405160 | Djaja et al. | Jun 2002 | B1 |
6461934 | Nishida et al. | Oct 2002 | B2 |
6483734 | Sharma et al. | Nov 2002 | B1 |
6611043 | Takiguchi | Aug 2003 | B2 |
6731535 | Ooishi et al. | May 2004 | B1 |
6770953 | Boeck et al. | Aug 2004 | B2 |
6803804 | Madurawe | Oct 2004 | B2 |
6813705 | Duesterwald et al. | Nov 2004 | B2 |
6944083 | Pedlow | Sep 2005 | B2 |
6967879 | Mizukoshi | Nov 2005 | B2 |
7212432 | Ferrant et al. | May 2007 | B2 |
7263027 | Kim et al. | Aug 2007 | B2 |
7294542 | Okushima | Nov 2007 | B2 |
7391064 | Tripsas et al. | Jun 2008 | B1 |
7411844 | Nitzan et al. | Aug 2008 | B2 |
7461371 | Luo et al. | Dec 2008 | B2 |
7573762 | Kenkare et al. | Aug 2009 | B2 |
7696017 | Tripsas et al. | Apr 2010 | B1 |
7701038 | Chen et al. | Apr 2010 | B2 |
7764532 | Kurjanowicz et al. | Jul 2010 | B2 |
7802057 | Iyer et al. | Sep 2010 | B2 |
7833823 | Klersy | Nov 2010 | B2 |
7889204 | Hansen et al. | Feb 2011 | B2 |
8008723 | Nagai | Aug 2011 | B2 |
8089137 | Lung et al. | Jan 2012 | B2 |
8115280 | Chen et al. | Feb 2012 | B2 |
8119048 | Nishimura | Feb 2012 | B2 |
8168538 | Chen et al. | May 2012 | B2 |
8179711 | Kim et al. | May 2012 | B2 |
8183665 | Bertin et al. | May 2012 | B2 |
8217490 | Bertin et al. | Jul 2012 | B2 |
8369166 | Kurjanowicz et al. | Feb 2013 | B2 |
8373254 | Chen et al. | Feb 2013 | B2 |
8482972 | Chung | Jul 2013 | B2 |
8488359 | Chung | Jul 2013 | B2 |
8488364 | Chung | Jul 2013 | B2 |
8514606 | Chung | Aug 2013 | B2 |
8570800 | Chung | Oct 2013 | B2 |
20030135709 | Niles et al. | Jul 2003 | A1 |
20030169625 | Hush et al. | Sep 2003 | A1 |
20040057271 | Parkinson | Mar 2004 | A1 |
20040113183 | Karpov et al. | Jun 2004 | A1 |
20050060500 | Luo et al. | Mar 2005 | A1 |
20050110081 | Pendharkar | May 2005 | A1 |
20050124116 | Hsu et al. | Jun 2005 | A1 |
20050146962 | Schreck | Jul 2005 | A1 |
20060072357 | Wicker | Apr 2006 | A1 |
20060092689 | Braun et al. | May 2006 | A1 |
20060104111 | Tripsas et al. | May 2006 | A1 |
20060129782 | Bansai et al. | Jun 2006 | A1 |
20070081377 | Zheng et al. | Apr 2007 | A1 |
20070133341 | Lee et al. | Jun 2007 | A1 |
20070138549 | Wu et al. | Jun 2007 | A1 |
20070279978 | Ho et al. | Dec 2007 | A1 |
20080025068 | Scheuerlein et al. | Jan 2008 | A1 |
20080044959 | Cheng et al. | Feb 2008 | A1 |
20080105878 | Ohara | May 2008 | A1 |
20080151612 | Pellizzer et al. | Jun 2008 | A1 |
20080220560 | Klersy | Sep 2008 | A1 |
20090055617 | Bansai et al. | Feb 2009 | A1 |
20090168493 | Kim et al. | Jul 2009 | A1 |
20090172315 | Iyer et al. | Jul 2009 | A1 |
20090180310 | Shimomura et al. | Jul 2009 | A1 |
20090194839 | Bertin et al. | Aug 2009 | A1 |
20090213660 | Pikhay et al. | Aug 2009 | A1 |
20090309089 | Hsia et al. | Dec 2009 | A1 |
20100091546 | Liu et al. | Apr 2010 | A1 |
20100142254 | Choi et al. | Jun 2010 | A1 |
20100171086 | Lung et al. | Jul 2010 | A1 |
20100232203 | Chung et al. | Sep 2010 | A1 |
20100277967 | Lee et al. | Nov 2010 | A1 |
20100301304 | Chen et al. | Dec 2010 | A1 |
20110128772 | Kim et al. | Jun 2011 | A1 |
20110145777 | Iyer et al. | Jun 2011 | A1 |
20110260289 | Oyamada | Oct 2011 | A1 |
20110297912 | Samachisa et al. | Dec 2011 | A1 |
20110312166 | Yedinak et al. | Dec 2011 | A1 |
20120032303 | Elkareh et al. | Feb 2012 | A1 |
20120044736 | Chung | Feb 2012 | A1 |
20120044737 | Chung | Feb 2012 | A1 |
20120044738 | Chung | Feb 2012 | A1 |
20120044739 | Chung | Feb 2012 | A1 |
20120044740 | Chung | Feb 2012 | A1 |
20120044743 | Chung | Feb 2012 | A1 |
20120044744 | Chung | Feb 2012 | A1 |
20120044745 | Chung | Feb 2012 | A1 |
20120044746 | Chung | Feb 2012 | A1 |
20120044747 | Chung | Feb 2012 | A1 |
20120044748 | Chung | Feb 2012 | A1 |
20120044753 | Chung | Feb 2012 | A1 |
20120044756 | Chung | Feb 2012 | A1 |
20120044757 | Chung | Feb 2012 | A1 |
20120044758 | Chung | Feb 2012 | A1 |
20120047322 | Chung | Feb 2012 | A1 |
20120074460 | Kitagawa | Mar 2012 | A1 |
20120106231 | Chung | May 2012 | A1 |
20120147653 | Chung | Jun 2012 | A1 |
20120147657 | Sekar et al. | Jun 2012 | A1 |
20120209888 | Chung | Aug 2012 | A1 |
20120224406 | Chung | Sep 2012 | A1 |
20120314472 | Chung | Dec 2012 | A1 |
20120314473 | Chung | Dec 2012 | A1 |
20120320656 | Chung | Dec 2012 | A1 |
20120320657 | Chung | Dec 2012 | A1 |
20130148409 | Chung | Jun 2013 | A1 |
20130189829 | Mieczkowski et al. | Jul 2013 | A1 |
20130200488 | Chung | Aug 2013 | A1 |
20130201745 | Chung | Aug 2013 | A1 |
20130201746 | Chung | Aug 2013 | A1 |
20130201748 | Chung | Aug 2013 | A1 |
20130201749 | Chung | Aug 2013 | A1 |
20130215663 | Chung | Aug 2013 | A1 |
20130235644 | Chung | Sep 2013 | A1 |
20140071726 | Chung | Mar 2014 | A1 |
20140131710 | Chung | May 2014 | A1 |
20140131711 | Chung | May 2014 | A1 |
20140131764 | Chung | May 2014 | A1 |
20140133056 | Chung | May 2014 | A1 |
Number | Date | Country |
---|---|---|
1469473 | Jan 2004 | CN |
1691204 | Nov 2005 | CN |
101083227 | May 2007 | CN |
101057330 | Oct 2007 | CN |
101188140 | May 2008 | CN |
101271881 | Sep 2008 | CN |
101483062 | Jul 2009 | CN |
101728412 | Jun 2010 | CN |
03-264814 | Nov 1991 | JP |
I309081 | Apr 2009 | TW |
Entry |
---|
U.S. Appl. No. 13/471,704, filed May 15, 2012. |
U.S. Appl. No. 13/026,650, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,656, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,664, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,678, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,692, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,704, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,717, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,725, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,752, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,771, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,783, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,835, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,840, filed Feb. 14, 2011. |
U.S. Appl. No. 13/026,852, filed Feb. 14, 2011. |
U.S. Appl. No. 13/214,198, filed Aug. 21, 2011. |
U.S. Appl. No. 13/590,044, filed Aug. 20, 2012. |
U.S. Appl. No. 13/590,047, filed Aug. 20, 2012. |
U.S. Appl. No. 13/590,049, filed Aug. 20, 2012. |
U.S. Appl. No. 13/590,050, filed Aug. 20, 2012. |
U.S. Appl. No. 13/214,183, filed Aug. 20, 2011. |
U.S. Appl. No. 13/288,843, filed Nov. 3, 2011. |
U.S. Appl. No. 13/314,444, filed Dec. 8, 2011. |
U.S. Appl. No. 13/397,673, filed Feb. 15, 2012. |
U.S. Appl. No. 13/571,797, filed Aug. 10, 2012. |
U.S. Appl. No. 13/678,539, filed Nov. 15, 2012. |
U.S. Appl. No. 13/678,544, filed Nov. 15, 2012. |
U.S. Appl. No. 13/678,541, filed Nov. 15, 2012. |
U.S. Appl. No. 13/678,543, filed Nov. 15, 2012. |
Ahn, S.J. et al, “Highly Reliable 50nm Contact Cell Technology for 256Mb PRAM,” IEEE VLSI Tech Symp., Jun. 2005, pp. 98-99. |
Alavi, Mohsen, et al., “A PROM Element Based on Salicide Allgomeration of Poly Fuses in a CMOS Logic Process,” IEEE IEDM, 97, pp. 855-858. |
Andre, T. W. et al., “A 4-Mb 0.18um 1T1MTJ Toggle MRAM With Balanced Three Input Sensing Scheme and Locally Mirrored Unidirectional Write Drivers,” IEEE J. of Solid-State Circuits, vol. 40, No. 1, Jan. 2005, pp. 301-309. |
Ang, Boon et al., “NiSi Polysilicon Fuse Reliability in 65nm Logic CMOS Technology,” IEEE Trans. on Dev. Mat. Rel. vol. 7, No. 2, Jun. 2007, pp. 298-303. |
Aziz, A. et al., “Lateral Polysilicon n+p Diodes: Effect of the Grain boundaries and of the p-Implemented Doping Level on the I-V and C-V Characteristics,” Springer Proceedings in Physics, vol. 54, 1991, pp. 318-322. |
Aziz, A. et al., “Lateral Polysilicon PN Diodes: Current-Voltage Characteristics Simulation Between 200K and 400K a Numerical Approach,” IEEE Trans. on Elec. Dev., vol. 41, No. 2, Feb. 1994, pp. 204-211. |
Banerjee, Kaustav et al., “High Current Effects in Salicide Films for Sub-0.25um VLSI Technologies,” IEEE 36th IRPS, 1998, pp. 284-292. |
Bedeschi, F. et al., “4-Mb MOSFET-Selected uTrench Phase-Change Memory Experimental Chip,” IEEE J. of Solid-State Circuits, vol. 40, No. 7, Jul. 2005, pp. 1557-1565. |
Bedeschi, F. et al., “A Bipolar-Selected Phase Change Memory Featuring Multi-Level Cell Storage,” IEEE J. Sol. Stat. Cir., vol. 44, No. 1, Jan. 2009, pp. 217-227. |
Bedeschi, F. et al., “A Fully Symmetrical Sense Amplifier for Non-volatile Memories,” IEEE. Int. Symp. on Circuits and Systems, (ISCAS), vol. 2, 2004, pp. 625-628. |
Bedeschi, F. et al., “An 8Mb Demonstrator for High-Density 1.8V Phase-Change Memories,” VLIS Cir. Symp, Jun. 2004, pp. 442-445. |
Bedeschi, F. et al., “Set and Reset Pulse Characterization in BJT-Selected Phase-Change Memory,” IEEE Int. Symp. on Circuits and Systems (ISCAS), 2005, pp. 1270-1273. |
Braganca, P. M. et al., “A Three-Terminal Approach to Developing Spin-Torque Written Magnetic Random Access Memory Cells,” IEEE Trans. on Nano. vol. 8, No. 2, Mar. 2009, pp. 190-195. |
Cagli, C. et al., “Evidence for threshold switching in the set process of NiO-based RRAM and physical modeling for set, reset, retention and disturb prediction,” IEEE IEDM, 2008, pp. 1-4. |
Chan, W. T. et al., “CMOS Compatible Zero-Mask One-Time Programmable (OTP) Memory Design,” Proc. Int. Conf. Solid State Integr. Cir. Tech., Beijing, China, Oct. 20-23, 2008. pp. 861-864. |
Chan, Wan Tim, et al., “CMOS Compatible Zero-Mask One Time Programmable Memory Design”, Master Thesis, Hong-Kong University of Science and Technologies, 2008. |
Chang, Meng-Fan et al., “Circuit Design Challenges in Embedded Memory and Resistive RAM (RRAM) for Mobile SoC and 3D-IC”, Design Automation Conference (ASP-DAC), 16th Asia and South Pacific, 2011, pp. 197-203. |
Cheng, Yu-Hsing et al., “Failure Analysis and Optimization of Metal Fuses for Post Package Trimming,” IEEE 45th IRPS, 2007, pp. 616-617. |
Chiu, Pi-Feng et al., “A Low Store Energy, Low VDDmin, Nonvolatile 8T2R SRAM with 3D Stacked RRAM Devices for Low Power Mobile Applications,” IEEE VLSI Cir./Tech Symp., Jun. 2010, pp. 229-230. |
Cho, Woo Yeong et al., “A 0.18um 3.0V 64Mb Non-Volatile Phase-Transition Random-Access Memory (PRAM),” ISSCC, Feb. 2004, Sec. 2-1. |
Choi, Sang-Jun et al., “Improvement of CBRAM Resistance Window by Scaling Down Electrode Size in Pure-GeTe Film,” IEEE Elec. Dev., vol. 30, No. 2, Feb. 2009, pp. 120-122. |
Choi, Youngdon et al., “A 20nm 1.8V 8Gb PRAM with 40MB/s Program Bandwidth,” IEEE ISSCC, 2012, pp. 46-47. |
Chung, S. et al., “A 1.25um2 Cell 32Kb Electrical Fuse Memory in 32nm CMOS with 700mV Vddmin and Parallel/Serial Interface,” VLSI Cir. Symp., Jun. 2009, pp. 30-31. |
Chung, S. et al., “A 512×8 Electrical Fuse Memory with 15um2 Cells Using 8-sq Asymmetrical Fuse and Core Devices in 90nm CMOS,” VLSI Cir. Symp., Jun. 2007, pp. 74-75. |
Crowley, Matthew et al., “512Mb PROM with 8 Layers of Antifuse/Diode Cells,” IEEE ISSCC 2003, Sec. 16.4. |
De Sandre, Guido et al., “A 4Mb LV MOS-Selected Embedded Phase Change Memory in 90nm Standard CMOS Technology,” IEEE J. Sol. Stat. Cir, vol. 46. No. 1, Jan. 2011, pp. 52-63. |
De Sandre, Guido et al., “A 90nm 4Mb Embedded Phase-Change Memory with 1.2V 12ns Read Access Time and 1MB/s Write Throughput,” ISSCC 2010, Sec. 14.7. |
Desikan, Rajagopalan et al., “On-Chip MRAM as a High-Bandwidth Low-Latency Replacement for DRAM Physical Memories,” Tech Report TR-02-47, Dept. of Computer Science, University of Texas, Austin, Sep. 27, 2002, 18 pages. |
Dietrich, Stefan et al., “A Nonvolatile 2-Mbit CBRAM Memory Core Featuring Advanced Read and Program Control,” IEEE J. of Solid-Stat Cir., vol. 42, No. 4, Apr. 2007, pp. 839-845. |
Dion, Michael J., “Reservoir Modeling for Electromigration Improvement of Metal Systems with Refractory Barriers,” IEEE 39th IRPS, 2001, pp. 327-333. |
Doorn T. S. et al., “Ultra-fast Programming of Silicided Polysilicon Fuses Based on New Insights in the Programming Physics,” IEEE IEDM, 2005, pp. 667-670. |
Doorn, T. S., “Detailed Qualitative Model for the Programming Physics of Silicided Polysilicon Fuses,” IEEE Trans. on Elec. Dev. vol. 54, No. 12, Dec. 2007, pp. 3285-3291. |
Durlam, M. et al., “A 1-Mbit MRAM Based on 1T1MTJ Bit Cell Integrated With Copper Interconnects,” IEEE J. of Solid-State Circuits, vol. 38, No. 5, May 2003, pp. 769-773. |
Engel, B. et al., “The Science and Technology of Magnetoresistive Tunnel Memory,” IEEE Tran. on Nanotechnology, vol. 1, No. 1, Mar. 2002, pp. 32-38. |
Engel, B.N. et al., “A 4Mb Toggle MRAM Based on a Novel bit and Switching Method,” IEEE Trans. on Mag. vol. 41, No. 1, Jan. 2005, pp. 132-136. |
Fellner, Johannes, et al., “Lifetime Study for a Poly Fuse in a 0.35um Polycide CMOS Process,” IEEE 43rd IRPS, 2005, pp. 446-449. |
Gao, B. et al., “Oxide-Based RRAM: Uniformity Improvement Using a New Material-Oriented Methodology,” IEEE VLSI Tech. Symp., Jun. 2009, pp. 30-31. |
Gao, B. et al., “Oxide-Based RRAM Switching Mechanism: A New Ion-Transport-Recombination Model,” IEDM, Dec. 2008, pp. 563-566. |
Gill, M. et al., “Ovonic Unified Memory-A High Performance Nonvolatile Memory Technology for Stand-Alone Memory and Embedded Applications,” IEEE, ISSCC Dig. of Tech. Paper, Feb. 2002, pp. 202-203. |
Gogl, D. et al., “A 16-Mb MRAM Featuring Bootstrapped Write Drivers,” IEEE J. of Solid-State Circuits, vol. 40, No. 4, Apr. 2005, pp. 902-908. |
Gopalan, C. et al., Demonstration of Conductive Bridging Random Access Memory (CBRAM) in Logic CMOS Process, IEEE Int. Memory Workshop, 2010, pp. 1-4. |
Ha, Daewon and Kim, Kinam, “Recent Advances in High Density Phase Change Memory (PRAM),” IEEE VLSI Tech. Symp. Jun. 2007. |
Hosoi, Y. et al., “High Speed Unipolar Switching Resistance RAM (RRAM) Technology,” IEEE IEDM, Dec. 2006, pp. 1-4. |
Hosomi, M. et al., “A Novel Nonvolatile Memory with Spin Torque Transfer Magnetization Switching: Spin-RAM,” IEEE IEDM Dig. of Tech. Paper, Dec. 2005, pp. 459-463. |
Huang, Chia-En et al., “A New CMOS Logic Anti-Fuse Cell with Programmable Contact,” IEEE IEDM Tech. Dig. 2007, pp. 48-51. |
Im, Jay et al., “Characterization of Silicided Polysilicon Fuse Implemented in 65nm CMOS Technology,” 7th Annual Non-Volatile Memory Technology Symp, (NVMTS) 2006, pp. 55-57. |
Jin, Li-Yan et al., “Low-Area 1-Kb Multi-Bit OTP IP Design,” IEEE 8th Int. Conf. on ASIC (ASICON), 2009. pp. 629-632. |
Johnson, Mark et al., “512Mb PROM with a Three-Dimensional Array of Diode/Antifuse Memory Cells,” IEEE J. of Sol. Stat. Cir., vol. 38, No. 11, Nov. 2003, pp. 1920-1928. |
Kalnitsy, Alexander et al., “CoSi2 Integrated Fuses on Poly Silicon for Low Voltage 0.18um CMOS Applications,” IEEE IEDM 1999, pp. 765-768. |
Kang, Han-Byul et al., “Electromigration of NiSi Poly Gated Electrical Fuse and Its Resistance Behaviors Induced by High Temperature,” IEEE IRPS, 2010, pp. 265-270. |
Kang, Sangbeom et al., “A 0.1um 1.8V 256Mb Phase-Change Random Access Memory (PRAM) with 66Mhz Synchronous Burst-Read,” IEEE J. of Sol. Stat. Cir. vol. 42. No. 1, Jan. 2007, pp. 210-218. |
Kawhara, T. et al., “2Mb Spin-Transfer Torque RAM (SPRAM) with Bit-by-Bit Bidirectional Current Write and Parallelizing-Direction Current Read,” IEEE ISSCC Dig. of Tech. Paper, Feb. 2007, pp. 480-481. |
Ker, Ming-Dou et al., “High-Current Characterization of Polysilicon Diode for Electrostatic Discharge Protection in Sub-Quarter-Micron Complementary Metal Oxide Semiconductor Technology,” Jpn. J. Appl. Phys. vol. 42 (2003) pp. 3377-3378. |
Ker, Ming-Dou et al., “Ultra-High-Voltage Charge Pump Circuit in Low-Voltage Bulk CMOS Processes With Polysilicon Diodes,” IEEE Trans. on Cir. and Sys.-II: Exp. Brief., vol. 54, No. 1, Jan. 2007, pp. 47-51. |
Kim, Deok-Kee et al., “An Investigation of Electrical Current Induced Phase Transitions in the NiPtSi/Polysilicon System,” J. App. Phy. 103, 073708 (2008). |
Kim, I. S. et al., “High Performance PRAM Cell Scalable to sub-20nm Technology with below 4F2 Cell Size, Extendable to DRAM Applications,” IEEE VLSI Tech Symp., Jun. 2010, pp. 203-204. |
Kim, Jinbong et al., “3-Transistor Antifuse OTP ROM Array Using Standard CMOS Process,” IEEE VSLI Cir. Symposium, Jun. 2003, pp. 239-242. |
Kim, O. et al., “CMOS trimming circuit based on polysilicon fusing,” Elec. Lett. vol. 34, No. 4, pp. 355-356, Feb. 1998. |
Klee, V. et al., “A 0.13um Logic-Based Embedded DRAM Technology with Electrical Fuses, Cu Interconnect in SiLK, sub-7ns Random Access Time and its Extension to the 0.10um Generation,” IEEE IEDM, 2001, pp. 407-410. |
Kothandaramam, C. et al., “Electrically programmable fuse (eFUSE) using electromigration in silicides,” IEEE Elec. Dev. Lett., vol. 23, No. 9, pp. 523-525, Sep. 2002. |
Kulkarni, S. et al., “High-Density 3-D Metal-Fuse PROM Featuring 1.37um2 1T1R Bit Cell in 32nm High-K Metal-Gate CMOS Technology,” VLSI Cir. Symp., Jun. 2009 pp. 28-29. |
Kulkarni, S. et al., “A 4Kb Metal-Fuse OTP-ROM Macro Featuring a 2V Programmable 1.37um2 1T1R Bit Cell in 32nm High-K Metal-Gate CMOS,” IEEE J. of Sol. Stat. Cir, vol. 45, No. 4, Apr. 2010, pp. 863-868. |
Kund, Michael et al., “Conductive Bridging RAM (CBRAM): An Emerging Non-Volatile Memory Technology Scalable to Sub 20nm,” IEEE IEDM 2005, pp. 754-757. |
Lai, Han-Chao et al., “A 0.26um2 U-Shaped Nitride-Based Programming Cell on Pure 90nm CMOS Technology,” IEEE Elec. Dev. Lett. vol. 28, No. 9, Sep. 2007, pp. 837-839. |
Lai, S., “Current Status of the Phase Change Memory and Its Future,” IEEE IEDM Dig. of Tech. Paper, Dec. 2003, pp. 255-258. |
Lee, H. Y. et al., “Low Power and High Speed Bipolar Switching with a Thin Reactive Ti Buffer Layer in Robust HfO2 Based RRAM,” IEEE IEDM, 2008, pp. 1-4. |
Lee, K.J., et al., “A 90nm 1.8V 512Mb Diode-Switch PRAM with 266MB/s Read Throughout,” IEEE ISSCC, Dig. of Tech. Paper, Feb. 2007, 3 pgs. |
Lee, Kwang-Jin et al., “A 90nm 1.8V 512Mb Diode-Switch PRAM with 266MB/s Read Throughput,” IEEE J. of Sol. Stat. Cir., vol. 43, No. 1, Jan. 2008, pp. 150-162. |
Lee, M.-J. et al., “Stack Friendly all-Oxide 3D RRAM Using GaInZnO Peripheral TFT Realized Over Glass Substrates,” IEDM, Dec. 2008. pp. 1-4. |
Lee, Man Chiu et al., “OTP Memory for Low Cost Passive RFID Tags,” IEEE Conf. on Electron Devices and Solid-State Circuits (EDSSC), 2007, pp. 633-636. |
Liaw, Corvin et al., “The Conductive Bridging Random Access Memory (CBRAM): A Non-volatile Multi-Level Memory Technology,” 37th European Solid-State Device Research Conference (ESSDERC), 2007, pp. 226-229. |
Lim, Kyunam et al., “Bit Line Coupling Scheme and Electrical Fuse Circuit for Reliable Operation of High Density DRAM,” IEEE VLSI Cir. Symp. Jun. 2001, pp. 33-34. |
Maffitt, T. et al., “Design Considerations for MRAM,” IBM J. Res. & Dev., vol. 50, No. 1, Jan. 2006, pp. 25-39. |
Meng, X.Z. et al., “Reliability Concept for Electrical Fuses,” IEE Proc.-Sci Meas. Technol., vol. 144, No. 2, Mar. 1997, pp. 87-92. |
Min, Byung-Jun et al., “An Embedded Non-volatile FRAM with Electrical Fuse Repair Scheme and One Time Programming Scheme for High Performance Smart Cards,” IEEE CICC, Nov. 2005, pp. 255-258. |
Mojumder, N. N. et al., “Three-Terminal Dual-Pillar STT-MRAM for High Performance Robust Memory Applications,” IEEE Trans. Elec. Dev. vol. 58. No. 5, May 2011, pp. 1508-1516. |
Morimoto, T. et al., “A NiSi Salicide Technology for Advanced Logic Devices,” IEEE IEDM, Dec. 1991, pp. 653-656. |
Neale, Ron, “PCM Progress Report No. 6 Afterthoughts,” http://www.eetimes.com/General/PrintView/4236240, Feb. 13, 2012, 5 pages. |
Nebashi, R. et al., “A 90nm 12ns 32Mb 2T1MTJ MRAM,” IEEE ISSCC Dig. of Tech. Paper, Sess. 27.4, Feb. 2009, 3 pages. |
Ng, K.P. et al., “Diode-Base Gate Oxide Anti-Fuse One-Time Programmable Memory Array in Standard CMOS Process,” IEEE Int. Conf. of Elect. Dev. & Solid-Stat Cir. (EDSSC), Dec. 2009, pp. 457-460. |
Ohbayashi, Shigeki et al., “A 65nm Embedded SRAM With Wafer Level Burn-In Mode, Leak-Bit Redundancy and Cu E-Trim Fuse for Known Good Die,” IEEE J. of Solid. Stat. Cir., vol. 43, No. 1, Jan. 2008, pp. 96-108. |
Oh, G. H. et al., “Parallel Multi-Confined (PMC) Cell Technology for High Density MLC PRAM,” IEEE VLSI Tech. Symp., Jun. 2009, pp. 220-221. |
Oh, J. H. et al., “Full Integration of Highly Manufacturable 512Mb PRAM Based on 90nm Technology,” IEEE IEDM Dig. of Tech. Paper, Dec. 2006, pp. 1-4. |
Osada, K. et al., “Phase Change RAM Operated with 1.5V CMOS as Low Cost Embedded Memory,” IEEE CICC, Nov. 2005, pp. 431-434. |
Park, Don et al., “Study on Reliability of Metal Fuse for Sub-100nm Technology,” IEEE Int. Symp. on Semiconductor Manufacturing (ISSM), 2005, pp. 420-421. |
Park, Jongwoo et al., “Phase Transformation of Programmed NiSi Electrical Fuse: Diffusion, Agglomeration, and Thermal Stability,” 18th IEEE Int. Symp. on Physical and Failure Analysis of Integrated Circuits, (IPFA), 2011, pp. 1-7. |
Park, Young-Bae et al., “Design of an eFuse OTP Memory of 8 Bits Based on a 0.35um BCD Process,” Mobile IT Convergence (ICMIC), 2011 Int. Conf. on, pp. 137-139. |
Pellizzer, F. et al., “Novel uTrench Phase-Change Memory Cell for Embedded and Stand-alone Non-Volatile Memory Applications,” IEEE VLSI Tech Symp. Jun. 2004, pp. 18-19. |
Peng, J. et al., “A Novel Embedded OTP NVM Using Standard Foundry CMOS Logic Technology,” IEEE 21st Non-Volatile Semiconductor Memory Workshop (NVSMW) 2006, pp. 24-26. |
Rizzolo, R. F. et al., “IBM System z9 eFUSE applications and methodology,” IBM J. Res. & Dev. vol. 51 No. ½ Jan./Mar. 2007, pp. 65-75. |
Robson, Norm et al., “Electrically Programmable Fuse (eFuse) from Memory Redundancy to Autonomic Chips,” IEEE CICC, 2007, pp. 799-804. |
Russo, U. et al., “Conductive-Filament Switching Analysis and Self-Accelerated Thermal Dissolution Model for Reset in NiO-based RRAM,” IEDM, Dec. 2007, pp. 775-778. |
Safran, J. et al., “A Compact eFUSE Programmable Array Memory for SOI CMOS,” VLSI Cir. Symp. Jun. 2007, pp. 72-73. |
Sasaki, Takahiko et al., “Metal-Segregate-Quench Programming of Electrical Fuse,” IEEE 43rd IRPS, 2005, pp. 347-351. |
Schrogmeier, P. et al., “Time Discrete Voltage Sensing and Iterative Programming Control for a 4F2 Multilevel CBRAM,” VLSI Cir. Symp., Jun. 2007, pp. 186-187. |
Sheu, Shyh-Shyuan et al., “A 5ns Fast Write Multi-Level Non-Volatile 1K-bits RRAM Memory with Advance Write Scheme,” VLSI Cir. Symp., Jun. 2009, pp. 82-83. |
Sheu, Shyh-Shyuan et al., “Fast-Write Resistive RAM (RRAM) for Embedded Applications,” IEEE Design & Test of Computers, Jan./Feb. 2011, pp. 64-71. |
Shi, Min et al., “Zero-Mask Contact Fuse for One-Time-Programmable Memory in Standard CMOS Processes,” IEEE Dev. Lett. vol. 32, No. 7, Jul. 2011, pp. 955-957. |
Song, Y. J. et al., “Highly Reliable 256Mb PRAM with Advanced Ring Contact Technology and Novel Encapsulating Technology,” IEEE VLSI Tech Symp., Jun. 2006, pp. 153-154. |
Suto, Hiroyuki et al., “Programming Conditions for Silicided Poly-Si or Copper Electrically Programmable Fuses,” IEEE IIRW Final Report, 2007, pp. 84-89. |
Suto, Hiroyuki et al., “Study of Electrically Programmable Fuses Through Series of I-V Measurements,” IEEE IIRW Final Report, 2006, pp. 83-86. |
Suto, Hiroyuki et al., “Systematic Study of the Dopant-Dependent Properties of Electrically Programmable Fuses With Silicide Poly-Si Links Through a Series of I-V Measurements,” IEEE Trans. on Dev. Mat. Rd. vol. 7, No. 2, Jun. 2007, pp. 285-297. |
Takaoka, H. et al., A Novel Via-fuse Technology Featuring Highly Stable Blow Operation with Large On-off Ratio for 32nm Node and Beyond, IEDM, 2007, pp. 43-46. |
Tehrani, S. et al., “Magnetoresistive Random Access Memory Using Magnetic Tunnel Junction,” Proc. of IEEE, vol. 91, No. 5, May 2003, pp. 703-714. |
Tehrani, S., “Status and Outlook of MRAM Memory Technology,” IEEE IEDM Dig. of Tech Paper., Dec. 2006, pp. 1-4. |
Teichmann, J. et al., “One Time Programming (OTP) with Zener Diodes in CMOS Processes,” 33rd Conf. on European Solid-State Device Research (ESSDERC), 2003, pp. 433-436. |
Tian, C. et al., “Reliability Investigation of NiPtSi Electrical Fuse with Different Programming Mechanisms,” IEEE IIRW Final Report, 2007, pp. 90-93. |
Tian, C. et al., “Reliability Qualification of CoSi2 Electrical Fuse for 90nm Technology,” IEEE 44th IRPS, 2006, pp. 392-397. |
Tian, Chunyan et al., “Reliability Investigation of NiPtSi Electrical Fuse with Different Programming Mechanisms,” IEEE Trans. on Dev. Mat. Rel. vol. 8, No. 3, Sep. 2008, pp. 536-542. |
Tonti, W. R. et al., “Product Specific Sub-Micron E-Fuse Reliability and Design Qualification,” IEEE IIRW Final Report, 2003, pp. 36-40. |
Tonti, W. R., “Reliability and Design Qualification of a Sub-Micro Tungsten Silicide E-Fuse,” IEEE IRPS Proceedings, 2004, pp. 152-156. |
Tonti, W. R., “Reliability, Design Qualification, and Prognostic Opportunity of in Die E-Fuse,” IEEE Conference on Prognostics and Health Management (PHM), 2011, pp. 1-7. |
Ueda, T. et al., “A Novel Cu Electrical Fuse Structure and Blowing Scheme utilizing Crack-assisted Mode for 90-45nm-node and beyond,” IEEE VLSI Tech. Sym., Jun. 2006, 2 pages. |
Ulman, G. et al., “A Commercial Field-Programmable Dense eFUSE Array Memory with 00.999% Sense Yield for 45nm SOI CMOS”, ISSCC 2008/ Session 22 / Variation Compensation and Measurement/ 22.4, 2008 IEEE International Solid-State Circuits Conference, pp. 406-407. |
Vimercati, Daniele et al., “A 45nm 1Gbit 1.8V PCM for Wireless and Embedded Applications,” IEEE ISSCC Feb. 2010, 26 pages. |
Vinson, J. E., “NiCr Fuse Reliability—A New Approach,” Southcon/94, Conference Record, 1994, pp. 250-255. |
Walko, J., “Ovshinsky's Memories,” IEE Review, Issue 11, Nov. 2005, pp. 42-45. |
Wang, J. P. et al., “The Understanding of Resistive Switching Mechansim in HfO2-Based Resistive Random Access Memory,” IEDM, 2011, pp. 12.1.1-12.1.4. |
Wikipedia, “Programmable read-only memory”, http://en.wikipedia.org/wiki/Programmable—read-only—memory, downloaded Jan. 31, 2010, 4 pages. |
Worledge, D.C., “Single-Domain Model for Toggle MRAM,” IBM J. Res. & Dev. vol. 50, No. 1, Jan. 2006, pp. 69-79. |
Wu, Kuei-Sheng et al., “The Improvement of Electrical Programmable Fuse with Salicide-Block Dielectrical Film in 40nm CMOS Technology,” Interconnect Technology Conference (IITC), 2010 Int. pp. 1-3. |
Wu, Kuei-Sheng et al., “Investigation of Electrical Programmable Metal Fuse in 28nm and beyond CMOS Technology,” IEEE International Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011, pp. 1-3. |
Yin, M. et al., “Enhancement of Endurance for CuxO based RRAM Cell,” 9th Int. Conf. on Solid-State and Integrated-Circuit Technology (ICSICT) 2008, pp. 917-920. |
Zhu, Jian-Gang, “Magnetoresistive Random Access Memory: The Path to Competitiveness and Scalability,” Proc. of IEEE, vol. 96, No. 11, Nov. 2008, pp. 1786-1798. |
Zhuang, W. W. et al., “Novell Colossal Magnetonresistive Thin Film Nonvolatile Resistance Random Access Memory (RRAM),” IEEE IEDM 2002, pp. 193-196. |
Notice of Allowance for U.S. Appl. No. 13/026,664 mailed Sep. 18, 2012. |
Office Action for U.S. Appl. No. 13/471,704 mailed Jul. 31, 2012. |
Notice of Allowance for U.S. Appl. No. 13/471,704 mailed Oct. 18, 2012. |
Notice of Allowance for U.S. Appl. No. 13/026,678 mailed Sep. 19, 2012. |
Office Action for U.S. Appl. No. 13/026,783 mailed Sep. 27, 2012. |
Office Action for U.S. Appl. No. 13/026,717 mailed Oct. 25, 2012. |
Office Action for U.S. Appl. No. 13/026,650 mailed Nov. 9, 2012. |
Office Action for U.S. Appl. No. 13/026,692 mailed Nov. 9, 2012. |
Office Action for U.S. Appl. No. 13/026,752 mailed Nov. 9, 2012. |
Office Action for U.S. Appl. No. 13/026,656 mailed Nov. 13, 2012. |
Office Action for U.S. Appl. No. 13/026,704 mailed Nov. 23, 2012. |
Office Action for U.S. Appl. No. 13/397,673, mailed Dec. 18, 2012. |
Office Action for U.S. Appl. No. 13/026,840, mailed Dec. 31, 2012. |
Office Action for U.S. Appl. No. 13/026,852, mailed Jan. 14, 2013. |
Office Action for U.S. Appl. No. 13/026,783, mailed Sep. 27, 2012. |
Restriction Requirement for U.S. Appl. No. 13/026,835, mailed Dec. 12, 2012. |
Notice of Allowance for U.S. Appl. No. 13/026,717, mailed Feb. 12, 2013. |
Office Action for U.S. Appl. No. 13/471,704, mailed Jan. 25, 2013. |
U.S. Appl. No. 13/761,048, filed Feb. 6, 2013. |
U.S. Appl. No. 13/761,057, filed Feb. 6, 2013. |
U.S. Appl. No. 13/761,097, filed Feb. 6, 2013. |
U.S. Appl. No. 13/761,045, filed Feb. 6, 2013. |
Office Action for U.S. Appl. No. 13/026,678, mailed Feb. 20, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,783, mailed Mar. 4, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,692, mailed Mar. 15, 2013. |
Office Action for U.S. Appl. No. 13/026,704, mailed Nov. 23, 2012. |
Notice of Allowance for U.S. Appl. No. 13/026,835, mailed Mar. 20, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,664, mailed Apr. 22, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,656, mailed Apr. 22, 2013. |
Jagasivamani et al., “Development of a Low-Power SRAM Compiler”, IEEE Press, 2001, pp. 498-501. |
Liu et al., “A Flexible Embedded SRAM Compiler”, IEEE Press, 2002, 3 pgs. |
Sundrararajan, “OSUSPRAM: Design of a Single Port SRAM Compiler in NCSU FREEPDK45 Process”, Mater of Science in Electrical Engineering, Oklahoma State University, Jul. 2010, 117 pgs. |
Notice of Allowance for U.S. Appl. No. 13/026,835, Mailed Apr. 18, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,704, mailed Apr. 30, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,852, mailed May 10, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,717, mailed May 15, 2013. |
Notice of Allowance for U.S. Appl. No. 13/471,704, mailed May 22, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,678, mailed May 28, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,650, mailed May 30, 2013. |
Restriction Requirement for U.S. Appl. No. 13/314,444, mailed Jun. 7, 2013. |
Restriction Requirement for U.S. Appl. No. 13/214,198, mailed Jun. 13, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,840, mailed Jun. 13, 2013. |
Restriction Requirement for U.S. Appl. No. 13/026,771, mailed Jun. 13, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,752, mailed Jul. 1, 2013. |
Restriction Requirement for U.S. Appl. No. 13/678,543, mailed Jul. 8, 2013. |
Office Action for U.S. Appl. No. 13/026,725, mailed Jul. 19, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,664, mailed Jul. 22, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,692, mailed Jul. 23, 2013. |
Notice of Allowance for U.S. Appl. No. 13/397,673, mailed Jul. 30, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,704, mailed Aug. 2, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,783, mailed Aug. 5, 2013. |
Office Action for U.S. Appl. No. 13/214,198, mailed Aug. 6, 2013. |
Office action for Chinese Patent Application No. 201110279954.7, mailed Jul. 1, 2013. |
Shen et al., “High-K Metal Gate Contact RRAM (CRRAM) in Pure 28 nm CMOS Logic Process”, Electron Devices Meeting (IEDM), 2012 IEEE International, Dec. 2012, 4 pgs. |
Tseng et al., “A New High-Density and Ultrasmall-Cell Size Contact RRAM (CR-RAM) with Fully CMOS-Logic-Compatible Technology and Circuits”, IEEE Transactions on Electron Devices, vol. 58, Issue 1, Jan. 2011, 6 pgs. |
Office Action for U.S. Appl. No. 13/026,783, mailed Sep. 9, 2013. |
Office Action for U.S. Appl. No. 13/314,444, mailed Sep. 9, 2013. |
Office Action for U.S. Appl. No. 13/026,771, mailed Sep. 9, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,852, mailed Sep. 18, 2013. |
Office Action (Ex Parte) for U.S. Appl. No. 13/678,543, mailed Sep. 20, 2013. |
Office Action for U.S. Appl. No. 13/835,308, mailed Sep. 27, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,717, mailed Oct. 1, 2013. |
Office Action for U.S. Appl. No. 13/954,831, mailed Oct. 1, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,656, mailed Oct. 4, 2013. |
Office Action for U.S. Appl. No. 13/214,183, mailed Oct. 25, 2013. |
Chua, “Many Times Programmable z8 Microcontroller”, e-Gizmo.cim, Nov. 21, 2006, pp. 1-5. |
Forum, Intel Multi-byte Nops, asmcommunity.net, Nov. 21, 2006, pp. 1-5. |
CMOS Z8 OTP Microcontrollers Product Specification, Zilog Inc., May 2008, Revision 1, pp. 1-84. |
OTP Programming Adapter Product User Guide, Zilog Inc., 2006, pp. 1-3. |
Notice of Allowance for U.S. Appl. No. 13/026,852, mailed Nov. 15, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,835, mailed Nov. 22, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,725, mailed Dec. 10, 2013. |
Office Action for U.S. Appl. No. 13/026,783, mailed Dec. 23, 2013. |
Notice of Allowance for U.S. Appl. No. 13/026,771, mailed Jan. 15, 2014. |
Office Action for Chinese Patent Application No. 201110244362.1, mailed Sep. 29, 2013. |
Office Action for Chinese Patent Application No. 201110235464.7, mailed Oct. 8, 2013. |
Office Action for Chinese Patent Application No. 201110244400.3, mailed Nov. 5, 2013. |
Office Action for Chinese Patent Application No. 201110244342.4, mailed Oct. 31, 2013. |
Restriction Requirement for U.S. Appl. No. 13/678,541, mailed Feb. 28, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,840, mailed Mar. 6, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,840, mailed Mar. 10, 2014. |
Notice of Allowance of U.S. Appl. No. 13/678,543, mailed Dec. 13, 2013. |
Notice of Allowance for U.S. Appl. No. 13/835,308, mailed Mar. 14, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,835, mailed Mar. 14, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,725, mailed Mar. 31, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,852, mailed Mar. 20, 2014. |
Notice of Allowance for U.S. Appl. No. 13/026,771, mailed Mar. 18, 2014. |
Final Office Action for U.S. Appl. No. 13/214,183, mailed Apr. 17, 2014. |
“Embedded Systems/Mixed C and Assembly Programming”, Wikibooks, Aug. 6, 2009, pp. 1-7. |
Notice of Allowance for U.S. Appl. No. 13/761,097, mailed Jul. 15, 2014. |
Office Action for U.S. Appl. No. 13/571,797, mailed Apr. 24, 2014. |
Number | Date | Country | |
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20130201745 A1 | Aug 2013 | US |
Number | Date | Country | |
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61595171 | Feb 2012 | US |