Claims
- 1. A method of forming a electrically conductive structure insulatively disposed from a second structure, said method comprising:
providing said second structure; forming said electrically conductive structure of a material that remains substantially conductive after it is oxidized; forming an electrically insulative layer between said second structure and said conductive structure; and oxidizing said conductive structure by subjecting it to an ozone containing atmosphere for a duration of time and at a first temperature.
- 2. The method of claim 1, wherein said conductive structure is comprised of a material selected from the group consisting of: Ir, Ru, Rh, and any combination thereof.
- 3. The method of claim 1, wherein said step of subjecting it to an ozone containing atmosphere is comprised of using ultraviolet emission and an oxygen ambient to form said ozone containing atmosphere over said electrically conductive structure.
- 4. The method of claim 1, wherein said step of subjecting it to an ozone containing atmosphere is comprised of remotely forming ozone and providing said ozone to said electrically conductive structure.
- 5. The method of claim 1, wherein said electrically insulative layer is comprised of a material selected from the group consisting of: tantalum pentoxide, BST, PZT, a silicate, an oxide, a nitride, a combination thereof, and a stack of one or more thereof.
- 6. The method of claim 1, wherein said duration of time is a period of time more than 20 minutes but less than 70 minutes.
- 7. The method of claim 1, wherein said first temperature is around 20 to 600 C.
- 8. The method of claim 1, wherein said first temperature is around 400 to 500 C.
- 9. A method of forming a capacitor over a semiconductor substrate, said method comprising the steps of:
forming a dielectric layer between a first conductive electrode comprised of first conductive material and a second conductive electrode comprised of a second conductive material; and oxidizing said second conductive material by subjecting it to an ozone-containing atmosphere for a period of time greater than 20 minutes but less than 70 minutes.
- 10. The method of claim 9, wherein the temperature of said semiconductor substrate during said step of oxidizing said second conductive material is around 20 to 600 C.
- 11. The method of claim 9, wherein the temperature of said semiconductor substrate during said step of oxidizing said second conductive material is around 400 to 500 C.
- 12. The method of claim 9, further comprising the step of:
oxidizing said first conductive material by subjecting it to an ozone-containing atmosphere for a period of time greater than 20 minutes but less than 70 minutes.
- 13. A method of forming a transistor over a semiconductor substrate, said method comprising the steps of:
forming a conductive gate structure insulatively disposed over said substrate, said conductive gate structure formed of a conductive material; and oxidizing said conductive material by subjecting it to an ozone-containing atmosphere for a period of time greater than 20 minutes but less than 70 minutes.
- 14. The method of claim 13, wherein the temperature of said semiconductor substrate during said step of oxidizing said conductive material is around 20 to 600 C.
- 15. The method of claim 9, wherein the temperature of said semiconductor substrate during said step of oxidizing said conductive material is around 400 to 500 C.
CROSS-REFERENCE TO RELATED PATENT/PATENT APPLICATIONS
[0001] The following commonly assigned patent/patent applications are hereby incorporated herein by reference:
1Patent No./Serial No.Filing DateTI Case No.**/**/1996TI-22027**/**/1998TI-22748
Provisional Applications (1)
|
Number |
Date |
Country |
|
60029976 |
Nov 1996 |
US |
Divisions (1)
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Number |
Date |
Country |
Parent |
09396642 |
Sep 1999 |
US |
Child |
09870631 |
Jun 2001 |
US |