The present invention relates to a substrate with one or more via and pad structures for use in circuit assemblies with high reliability and high yield in manufacturing.
The present invention relates to a substrate with via and pad structures for use in circuit assemblies. In an embodiment, the substrate has one or more via and pad structures for connecting a component to conductive layers associated with the substrate. The via and pad structure includes a plated via connected to associated conductive layers, a solder mask surrounding the plated via, and a conductive pad with a conductive trace connected to the plated via, wherein the conductive pad extends beyond the terminal sides of the component to increase solder formation at the terminal sides and the solder mask reduces solder formation at the terminal end of the component. The via and pad structures are applicable to the circuit layouts for a variety of components and high component density can be achieved with reliable solder joints to the component terminal sides rather than the terminal end. The invention also provides a method for calculating the distance the conductive pad extends beyond the terminal side of a component.
The following description includes the best mode of carrying out the invention. The detailed description is made for the purpose of illustrating the general principles of the invention and should not be taken in a limiting sense. The scope of the invention is determined by reference to the claims.
We assign each part, even if structurally identical to another part, a unique reference number wherever that part is shown in the drawing figures. A dashed circle indicates part of a figure that is enlarged in another figure. Any figure showing the enlarged part is indicated by a reference number tied to the dashed circle.
Although components can be arranged along a column or row of the array of plated vias, the tight spacing in an array in a typical PWB limits the component to being placed diagonally as shown. A component 43 representing, for example, a 0402 size (i.e., 0.04″ length×0.02″ width×0.02″ height) chip capacitor, shown in the bottom right of
In via and pad structure 60, the conductive pad 62 has a conductive trace 63 (covered by the keyhole shaped solder mask 64) and connected to a plated via 65. The close proximity of the plated via 65 to the conductive pad 62 means the conductive trace 63 is short in length and has low trace inductance. In the illustrated embodiment, the conductive pad 62 includes a T-shirt shaped structure of a first arm 91, a second arm 92, and a body 93. Preferably, the body 93 extends beyond the length 47 of the arms 91 and 92. The conductive pad 62 has arms 91 and 92 with a width 48 that extends beyond the terminal sides of the component (not shown). Via and pad structure 69 depicts an alternative embodiment, where conductive trace 90 connects the conductive pad 99 to the plated via 73 and a ring shaped solder mask 59 acts as a solder barrier. Conductive pad 99 includes arms 94 and 95 but no body such as the body 93 in conductive pad 62.
The extended conductive pad increases formation of a reliable solder joint on each terminal side of the component. This is shown in via and pad structure 50, which has the solder joints 41, 51 on the terminal sides 75 and 76.
Each solder mask such as the keyhole shaped solder mask 54 is made of non-conductive and non-wettable material such as an epoxy, a photo imageable solder mask, or another suitable material. Solder masks such as solder masks 54 and 64 are keyhole shaped and have a sufficient width 44 to form a solder barrier despite the short length of the conductive traces 56 and 63. For example, a 0402 component would overlay the keyhole shaped solder mask 54. The keyhole shaped solder mask 54 is the same shape as the keyhole shaped solder mask 64 and both have a typical width 44 of 3.5 mil and preferably greater to reduce formation of a solder joint such as at the terminal end 57 of component 53, which prevents solder wicking. Solder joints 41 and 51 form on the terminal sides 75 and 76 and the conductive pad 52. In an alternative embodiment, the solder mask 81 covers the substrate 80 partially or entirely except for the conductive pads such as conductive pad 98 and the plated via holes such as plated via hole 77.
In an embodiment, the via and pad structure 50 has a conductive pad 52 that extends beyond the terminal sides 75 and 76 of the component 53 to increase solder formation on arms 96 and 97. In addition, the arms 96 and 97 are preferably symmetric to the plated via 55 on the substrate 80 so the solder joints 41 and 51 will generate substantially equal surface tension to the terminal sides 75 and 76 of the component 53. This keeps the component 53 aligned with the conductive pads 52 and 98.
In another embodiment of the via and pad structure, the wettability of the plated via can be reduced by applying a chemically compatible plating finish to the surface of the plated via such as a known organic oxidant surface finish or immersion silver. This reduces solder wicking during the solder reflow process.
For example, we can calculate the maximum distance L10 for a 0402 component by using the following values: L1=39.39 mil (1 mm), L3=40 mil, L4=20 mil, L5=10 mil, R=9.5 mil, and X=5 mil.
L2=L1/sin 45°=55.7 mil
L8=(L2−L4)/2=17.9 mil
L7=L3/2−L5=10 mil
L11=R+X=14.5 mil
L9=square root (L112−L72)=10.5 mil
L10=L8−L9=7.4 mil
L10 may be then rounded to 7 mil for the layout. This method can be implemented in computer software where the variables are represented by values to solve other layouts for other component sizes.
This application is a continuation of U.S. application Ser. No. 12/653,358, Method of Reducing Solder Wicking on a Substrate, filed on Dec. 11, 2009, which is a divisional of U.S. application Ser. No. 10/774,115, Substrate with Via and Pad Structures, filed on Feb. 6, 2004, now U.S. Pat. No. 7,645,940, all which are incorporated by reference herein.
Number | Name | Date | Kind |
---|---|---|---|
4413309 | Takahashi et al. | Nov 1983 | A |
4874907 | Ishikawa | Oct 1989 | A |
5303122 | Adams, Jr. et al. | Apr 1994 | A |
5313021 | Sajja et al. | May 1994 | A |
5362927 | Ezaki | Nov 1994 | A |
5384433 | Osann et al. | Jan 1995 | A |
5459287 | Swamy | Oct 1995 | A |
5459642 | Stoddard | Oct 1995 | A |
5637835 | Matern | Jun 1997 | A |
5683788 | Dugan et al. | Nov 1997 | A |
5731960 | Fung | Mar 1998 | A |
5805428 | Singer | Sep 1998 | A |
5811736 | Lauffer et al. | Sep 1998 | A |
6104082 | Berlin et al. | Aug 2000 | A |
6300578 | Hoffmeyer et al. | Oct 2001 | B1 |
6549179 | Youngquist et al. | Apr 2003 | B2 |
6630631 | Dishongh et al. | Oct 2003 | B1 |
7186926 | Maeno | Mar 2007 | B2 |
20030063447 | Cwik et al. | Apr 2003 | A1 |
20030064546 | McCormick et al. | Apr 2003 | A1 |
20030148557 | Lim et al. | Aug 2003 | A1 |
Number | Date | Country | |
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20130221075 A1 | Aug 2013 | US |
Number | Date | Country | |
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Parent | 10774115 | Feb 2004 | US |
Child | 12653358 | US |
Number | Date | Country | |
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Parent | 12653358 | Dec 2009 | US |
Child | 13759960 | US |