Patent Application
20090040498
This application is a continuation of international patent application PCT/EP2007/057776, filed Jul. 27, 2007, which claims the benefit of German patent application serial number DE 10 2006 038 643.4, filed Aug. 17, 2006. International patent application PCT/EP2007/057776 is incorporated herein by reference in it entirety.
The disclosure relates to a microlithographic projection exposure apparatus, and to a microlithographic exposure method.
Microlithographic projection exposure apparatuses are used for the fabrication of microstructured components such as, for example, integrated circuits or LCDs. Such a projection exposure apparatus typically has an illumination device and a projection objective. In the microlithography process, in general, an illumination device is used to illuminate a mask (reticle) whose image is then projected onto a substrate, such as a silicon wafer, via a projection objective. Usually, the substrate is coated with a light-sensitive layer (photoresist) which is arranged in the image plane of the projection objective so that the mask structure is transferred to the light-sensitive coating of the substrate.
In some embodiments, the disclosure provides a microlithographic projection exposure apparatus and a microlithographic exposure method by which a pulse-resolved modulation of the polarization state can be achieved without involving movable, such as rotating, optical components.
In certain embodiments, the disclosure provides a microlithographic projection exposure apparatus that includes a pulsed light source configured to generate pulsed light, an illumination device, a projection objective, and at least one photoelastic modulator between the pulsed light source and the illumination device. The illumination device is configured to illuminate the object plane of the projection objective, and the projection objective is configured to project an image from the object plane of the projection objective to the image plane of the projection objective.
The photoelastic modulator can be subjected to a temporally varying retardation by suitable (e.g. acoustic) excitation. The retardation may in turn be temporally correlated with the pulsed light, such that individual (e.g. successive) pulses of the pulsed light are subjected in each case to a defined retardation and hence to a defined alteration of the polarization state. The alteration can also be different for individual pulses. Movable, such as rotating, optical components can be avoided by using a photoelastic modulator to generate the pulse-resolved variation of the polarization state. This can avoid, for example, stress birefringence induced in such components on account of, for example, centrifugal forces that occur, as well as undesirable influencing of the polarization distribution associated with such stress birefringence.
In some embodiments, by way of example, the above-mentioned temporal correlation can be effected in such a way that two successive pulses of the pulsed light cancel one another out in terms of their polarization effect after emerging from the photoelastic modulator, or are oriented orthogonally with respect to one another in terms of their polarization direction upon emerging from the photoelastic modulator, in order to generate unpolarized light in the illumination device as a result.
In certain embodiments, a polarization-influencing optical element is included in the illumination device.
In the context of the present application, a polarization-influencing optical element should be understood to mean, in principle, any element which has the property of converting an input polarization state of light impinging on the element into a different polarization state, whether it be by rotating the preferred direction of polarization of the light, filtering out the light component of a specific polarization state or converting a first polarization state into a second polarization state. Furthermore, the polarization state can be changed, in principle, both in transmission and in reflection or absorption of the light component of a polarization state.
In some embodiments, the polarization-influencing optical element has four polarizer elements, which are arranged offset by 90° relative to one another in the circumferential direction about an optical axis of the illumination device, two polarizer elements that lie opposite one another being transmissive to light of a first polarization direction and the remaining two polarizer elements being transmissive to light of a second polarization direction perpendicular thereto.
With such a polarization-influencing optical element, in conjunction with a pulse-resolved change in the polarization direction that is carried out according to the manner described above, it is possible, for example, to change between a horizontal illumination setting polarized in the vertical direction and a vertical illumination setting polarized in the horizontal direction, such that it is possible to switch between an illumination setting optimized for vertical structures and an illumination setting optimized for horizontal structures without movable parts and in rapid succession.
In certain embodiments, the polarization-influencing optical element is arranged in a pupil plane of the illumination device.
In some embodiments, the polarization-influencing optical element is a polarization filter.
In certain embodiments, the disclosure provides a microlithographic exposure method, in which pulsed light is provided to an illumination device of a projection exposure apparatus. Pulses of the pulsed light are subjected to changes in their polarization state before entering into the illumination device. The changes in the polarization state are effected using at least one photoelastic modulator arranged in the beam path of the pulsed light.
In some embodiments, the disclosure provides a photoelastic modulator in a microlithographic projection exposure apparatus. The photoelastic modulator provides pulse-resolved changes of the polarization state of light passing through the projection exposure apparatus.
Further configurations of the disclosure can be gathered from the description, drawings and claims.
The disclosure is explained in more detail below on the basis of exemplary embodiments illustrated in the accompanying figures, in which:
a-b show schematic illustrations for elucidating the effect of the element from
In general, a PEM is an optical component that is produced from a material exhibiting stress birefringence in such a way that an excitation of the PEM to effect acoustic vibrations leads to a periodically varying mechanical stress and a temporally varying retardation. “Retardation” denotes the difference in the optical paths of two orthogonal (mutually perpendicular) polarization states. PEMs are disclosed, for example, in U.S. Pat. No. 5,886,810 or U.S. Pat. No. 5,744,721. PEMs configured to be used at wavelengths of visible light through to the VUV range (approximately 130 nm) are commercially available from, for example, by the company Hinds Instruments Inc., Hillsboro, Oreg. (USA).
The PEM 120 is excited to effect acoustic vibrations via an excitation unit 140 such that a retardation that varies temporally with a modulation frequency forms in the PEM 120. In general, the modulation frequency is dependent on the mechanical dimensioning of the PEM 120 and typically is in the region of a few tens of kHz. It is assumed in
The pulsed light source 110 generates a first pulse, then, at a point in time at which the retardation in the PEM 120 is precisely zero. A second pulse is generated by the pulsed light source 110 at a point in time at which the retardation in the PEM 120 amounts to half the operating wavelength, that is to say λ/2. The PEM 120 therefore acts on the second pulse as a lambda/2 plate, such that the polarization direction of the second light pulse upon emerging from the PEM 120 is rotated by 90° with respect to its polarization direction upon entering into the PEM 120. Since the PEM 120 is operated at a frequency of a few tens of kHz and the period duration of the excited vibration of the PEM 120 is therefore long in comparison with the pulse duration (approximately 10 nanoseconds) of the pulsed light source 110, a quasi-static retardation acts on the light from the pulsed light source 110 in the PEM 120 during the pulse duration.
Since the two pulses described above are oriented orthogonally with respect to one another in terms of their polarization direction when emerging from the PEM 120, they cancel one another out in pairs in terms of their polarization effect after emerging from the PEM 120 or upon entering into the illumination device 130. Consequently, unpolarized light is produced as a result of the superimposition in the illumination device.
In some embodiments, the excitation of the PEM 120 by the excitation unit 140 is correlated with the emission from the pulsed light source 110 in such a way that a first pulse passes through the PEM 120 at a point in time at which the retardation in the PEM amounts to one quarter of the operating wavelength, that is to say λ/4, (which leads e.g. to left circularly polarized light), and a second pulse is generated by the pulsed light source 110 at a point in time at which the retardation in the PEM 120 is of identical magnitude and opposite sign, that is to say amounts to λ/4 (which then leads to right circularly polarized light) or vice versa. Consequently, the superimposition of a multiplicity of such pairs of light pulses likewise produces unpolarized light when emerging from the PEM 120 or entering into the illumination device 130.
In
The polarization-influencing optical element 232 has an arrangement including four polarizer elements 233 to 236 which are arranged offset by 90° in each case in a light-opaque carrier 237. Such a polarization-influencing optical element is described, for example, in US2005/0140958 A1. The polarization directions or transmission directions of the individual polarizer elements 233 to 236 are designated on the basis of the double-headed arrows P1 to P4 in
As illustrated schematically in
As a result, in
A diffractive optical element (DOE) 231, which is used in the illumination device 230 and is depicted schematically in
Even though the disclosure has been described on the basis of specific embodiments, numerous variations and alternative embodiments can be deduced by the person skilled in the art, e.g. by combination and/or exchange of features of individual embodiments. Accordingly, it goes without saying for the person skilled in the art that such variations and alternative embodiments are also encompassed by the present disclosure, and the scope of the disclosure is only restricted within the meaning of the accompanying patent claims and the equivalents thereof.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10 2006 038 643.4 | Aug 2006 | DE | national |
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/EP2007/057776 | Jul 2007 | US |
| Child | 12197567 | US |
