Number | Name | Date | Kind |
---|---|---|---|
5935868 | Fang et al. | Aug 1999 | |
5950106 | May et al. | Sep 1999 | |
5965934 | Cheung et al. | Oct 1999 | |
6030901 | Hopper et al. | Feb 2000 | |
6037255 | Hussein et al. | Mar 2000 | |
6080529 | Ye et al. | Jun 2000 |
Entry |
---|
Michael A. Lieberman and Allan J. Lichtenberg, Principles of Plasma Discharges and Material Processing, p. 4 (1994) John Wiley & Sons, Inc. |
Brian Chapman, Glow Discharge Processes, pp. 305, 316-317 (1980) John Wiley & Sons, Inc. |
Wayne M. Moreau, Semiconductor Lithography Principles, Practices, and Materials, pp. 806, 807 (Jan. 1988) 1988 Plenum Press, New York, NY. |