Claims
- 1. An apparatus for holding a substrate in a processing chamber, comprising:a substrate support member having a body portion and a substrate support surface; and one or more arms extending from the body portion to connect the substrate support member to a base, the base being rigidly mounted to a side wall of the processing chamber.
- 2. The apparatus of claim 1, wherein the substrate support surface substantially conforms to the side wall of the processing chamber.
- 3. The apparatus of claim 1, wherein the one or more arms radially extend from the body portion to the base of the processing chamber.
- 4. The apparatus of claim 1, wherein the substrate support surface further comprises an electrostatic chuck.
- 5. The apparatus of claim 1, wherein the one or more arms comprises one or more conduits providing one or more passageways to connect at least one of a fluid source, a gas source, a DC source and an RF source.
- 6. The apparatus of claim 1, wherein the side wall portion comprises a movable wall.
- 7. The apparatus of claim 6, further comprising:a carriage assembly attached to the movable wall, wherein the carriage assembly is adapted to move the substrate support member between a processing position inside the processing chamber and a cleaning position outside of the processing chamber.
- 8. An apparatus for processing a substrate, comprising:a processing chamber; a substrate support member having a body portion and a substrate support surface; and one or more arms extending from the body portion to fixedly mount the substrate support member to a carriage assembly attached to a side wall portion of the processing chamber for processing.
- 9. The apparatus of claim 8, wherein a peripheral edge of the substrate support member substantially conforms to an adjacent side wall portion.
- 10. The apparatus of claim 8, wherein the one or more arms extend in a substantially lateral direction between the body portion and the side wall portion of processing chamber.
- 11. The apparatus of claim 8, wherein the substrate support surface further comprises an electrostatic chuck.
- 12. The apparatus of claim 8, wherein the one or more arms comprises one or more conduits providing one or more passageways to connect at least one of a fluid source, a gas source, a DC source and an RF source.
- 13. The apparatus of claim 8, wherein the carriage assembly is adapted to move the substrate support member disposed on the movable wall between a processing position inside the processing chamber and a cleaning position outside of the processing chamber.
- 14. The apparatus of claim 8, wherein the processing chamber includes:one or more gas inlets disposed above the substrate support member; and an exhaust system disposed substantially axially below the substrate support member.
- 15. The apparatus of claim 14, wherein the side wall of the processing chamber and the substrate support memberdefine a substantially axial gas flow from the one more gas inlets to the exhaust system.
Parent Case Info
The present application is a continuation application of U.S. application Ser. No. 09/092,565, now U.S. Pat. No. 6,178,918, which was filed on Jun. 5, 1998, and issued on Jan. 30, 2001. Furthermore, the present application claims priority to U.S. patent application Ser. 08/909,580, which is now U.S Pat. No. 5,792,272, filed on Aug. 12, 1997, which is a continuation of U.S. patent application Ser. No. 08/500,493, filed Jul. 10, 1995 now abandoned.
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Continuations (3)
|
Number |
Date |
Country |
Parent |
09/092565 |
Jun 1998 |
US |
Child |
09/575217 |
|
US |
Parent |
08/909580 |
Aug 1997 |
US |
Child |
09/092565 |
|
US |
Parent |
08/500493 |
Jul 1995 |
US |
Child |
08/909580 |
|
US |